• Journal of Surface Science and Engineering
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• v.44 no.4
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• pp.155-164
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• 2011

Electron beam evaporation source is widely used to prepare thin films by physical vapor deposition because it is very effective to vaporize materials and there is virtually no limit to vaporize materials including metals and compounds such as oxide. In this study, evaporation characteristics of various metals and compounds from an electron beam evaporation source have been studied. The 180 degree deflection type electron beam evaporation source which has 6-hearth crucibles and is capable of inputting power up to 10 kW was employed for evaporation experiment. 36 materials including metals, oxides and fluorides have been tested and described in terms of optimum crucible liner, evaporation state, stability, and so on. Various crucible liners have been tried to find out the most effective way to vaporize materials. Two types of crucible liners have been employed in this experiment. One is contact type liner, and the other is non-contact type one. It has been tried to give the objective information and the most effective evaporation method on the evaporation of materials from the electron beam evaporation source. It is concluded that the electron beam evaporation source can be used to prepare good quality films by choosing the appropriate crucible liner.

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.37-42
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• 2009

The performance of an OLED(organic luminescent emitting device) fabrication system strongly depends on the design of the evaporation cell-source. Trends in display sizes have hauled the enlargement of mother glass substrates. The enlargement of substrates requires the improvement and the enlargement of the effusion cell-source for OLED evaporation process. The deposited layers should be as uniform as possible, and therefore it is important to know the effusion profile of the molecules emitted from the cell-source. Conventional 2D DSMC algorithm cannot be used for simulating the new concept cell-source design, such as a linear source. This work concerns the development of 3D DSMC (direct simulation Monte Carlo) analysis for simulating the behavior of the evaporation cell-sources. In this paper, the 3D DSMC algorithm was developed and the film thickness profiles were obtained by the numerical analysis.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.186-189
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• 2007

The organic deposition chamber has been developed using belt source evaporation techniques for the first time. The deposition chamber is consisted of the belt source, organic vapor source, and the mask alignment assembly. The rollers operate for the thin metal belt to continuously move with the automatic tension control. It has been proved for the belt source evaporation easy to operate and the alignment of the substrate/shadow mask becomes so simple to use in AMOLED manufacturing industry.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1171-1174
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• 2008

We studied the properties of vapor flux distributions of nozzle shaped thermal evaporation sources and the factors, which can change the flux distributions such as nozzle structure. We used a simulation and experiment methods for this study. By using the results of our study, we improved the Circular Nozzle Source, which can make uniform thin films without substrate rotation, into more efficient source.

• Journal of the Semiconductor & Display Technology
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• v.19 no.3
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• pp.19-22
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• 2020

The thermal evaporation source is used to prepare thin films by physical vapor deposition. Materials of metals, organic materials, were tested and explained for thermal evaporation experiments. The developed effusion cell performance depends on the type of deposition material, the size of the crucible, the performance of the reflector, etc. and the proper conditions were found by producing, comparing and analyzing several sets of effusion cell to quantitatively evaluate the performance of the cell. The effusion cell for thermal evaporation source is used to prepare thin films of Ag, Cu, Mg.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.930-932
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• 2007

In order to understand the doping control for the belt source evaporation, the Alq3 and NPB were codeposited on the Ta plate to re-sublimate. The very slow heating $(0.1^{\circ}C/s)$ of the Ta plate shows the separated rate signals of Alq3 and NPB sublimated from the Alq3-mixed NPB organic film on Ta plate. The ratio of the vapor rates of Alq3 and NPB was measured as same as that of each sublimation rates. Therefore, the doping control of the belt source evaporation is of the ratio of the vaporization rates of host and dopants.

• Korean Journal of Materials Research
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• v.27 no.10
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• pp.530-533
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• 2017

ZnO micro/nanocrystals with different morphologies were synthesized by thermal evaporation of various zinc source materials in an air atmosphere. Zinc acetate, zinc carbonate and zinc iodide were used as the source materials. No catalysts or substrates were used in the synthesis of the ZnO crystals. The scanning electron microscope(SEM) image showed that the morphology of ZnO crystals was strongly dependent on the source materials, which suggests that source material is one of the key factors in controlling the morphology of the obtained ZnO crystals. Tetrapods, nanogranular shaped crystals, spherical particles and crayon-shaped crystals were obtained using different source materials. The X-ray diffraction(XRD) pattern revealed that the all the ZnO crystals had hexagonal wurtzite crystalline structures. An ultraviolet emission was observed in the cathodoluminescence spectrum of the ZnO crystals prepared via thermal evaporation of Zn powder. However, a strong green emission centered at around 500 nm was observed in the cathodoluminescence spectra of the ZnO crystals prepared using zinc salts as the source materials.

• Korean Journal of Materials Research
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• v.21 no.1
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• pp.56-66
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• 2011

Multi-source evaporation is one of the methods to improve the thickness uniformity of thin films deposited by evaporation. In this study, a simulator for the relative thickness profile of a thin film deposited by a multi-source evaporation system was developed. Using this simulator, the relative thickness profiles of the evaporated thin films were simulated under various conditions, such as the number and arrangements of sources and source-to-substrate distance. The optimum conditions, in which the thickness uniformity is minimized, and the corresponding efficiency, were obtained. The substrate was a 5th generation substrate (dimensions of 1300 mm ${\times}$ 1100 mm). The number of sources and source-to-substrate distance were varied from 1 to 6 and 0 to the length of the major axis of the substrate (1300 mm), respectively. When the source plane, the area on which sources can be located, is limited to the substrate dimension, the minimum thickness uniformity, obtained when the number of sources is 6, was 3.3%; the corresponding efficiency was 16.6%. When the dimension of the source plane is enlarged two times, the thickness uniformity is remarkably improved while the efficiency is decreased. The minimum thickness uniformity, obtained when the number of sources is 6, was 0.5%; the corresponding efficiency was decreased to 9.1%. The expansion of the source plane brings about not only the improvement of the thickness uniformity, but also a decrement of the efficiency and an enlargement of equipment.

• Journal of the Semiconductor & Display Technology
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• v.23 no.3
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• pp.35-38
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• 2024

High efficiency evaporation source is developed to perform a vacuum deposition process in which a deposition material is heated and vaporized to eject from a solid state to a gaseous state. In order to obtain a uniform thin film, conditions such as the structure of the effusion cell, the distance between the effusion cell and the substrate, nozzle size, and evaporation angle must be optimized. In this experiment, organic material Alq3 and metal Al thin film deposition process was performed using the effusion cell and thin film characteristics was analyzed.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1600-1602
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• 2007

TPS (Temperature Programmed Sublimation) technology is known to research for the plane evaporation of the organic film.[5] Using TPS technology, the plane source evaporation of NPB organic film has been studied for the first time. The NPB organic film consists of nano scale film phase and bulk phase on a substrate. The 400 ${\AA}$ in film phase thickness of NPB sublimates at the $175^{\circ}$ of the Ta made metal plate. It was proved that the sublimation temperature of the organic film has much lower than that of the organic powder. ($130^{\circ}$ is lower for Alq3 and $90^{\circ}$ is lower for NPB.)