• 제목/요약/키워드: Energy Diffusion

검색결과 1,538건 처리시간 0.034초

수분확산(水分擴散)의 활성화(活性化)에너지 모델 (A Model for Activation Energy of Moisture Diffusion in Wood)

  • 강호양
    • Journal of the Korean Wood Science and Technology
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    • 제20권4호
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    • pp.21-30
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    • 1992
  • An activation energy equation for moisture diffusion in wood was developed with an assumption that activation energy is directly proportional to wood specific gravity. Theoretical activation energies obtained from the activation energy equation were revealed to be always lower than actual activation energies, which implies that activation energy isn't affected only by wood specific gravity. The other affecting factors are possibly anatomical structures of wood which determine a ratio of vapor diffusion to bound water diffusion in wood. For the convenience of estimating actual activation energy by using the activation energy equation, thirteen kinds of species were categorized into three groups according to their anatomical structures.

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메탄-수소 층류확산화염에서 $H_2$와 H의 선호확산이 NO 거동에 미치는 영향에 관한 연구 (A Study on NO Emission Behavior through Preferential Diffusion of $H_2$ and H in $CH_4-H_2$ Laminar Diffusion Flames)

  • 박정;권오붕;윤진한;길상인
    • 한국수소및신에너지학회논문집
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    • 제18권3호
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    • pp.265-274
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    • 2007
  • A study has been conducted to clarify NO emission behavior through preferential diffusion effects of $H_2$ and H in methane-hydrogen diffusion flames. A comparison is made by employing three species diffusion models. Special concerns are focused on what is the deterministic role of the preferential diffusion effects in flame structure and NO emission. The behavior of maximum flame temperatures with three species diffusion models is not explained by scalar dissipation rate but the nature of chemical kinetics. The preferential diffusion of H into reaction zone suppresses the populations of the chain carrier radicals and then flame temperature while that of $H_2$ produces the increase of flame temperature. These preferential diffusion effects of $H_2$ and H are also discussed about NO emissions through the three species diffusion models.

Theoretical studies on the stabilization and diffusion behaviors of helium impurities in 6H-SiC by DFT calculations

  • Obaid Obaidullah;RuiXuan Zhao;XiangCao Li;ChuBin Wan;TingTing Sui;Xin Ju
    • Nuclear Engineering and Technology
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    • 제55권8호
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    • pp.2879-2888
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    • 2023
  • In fusion environments, large scales of helium (He) atoms are produced by a radical transformation along with structural damage in structural materials, resulting in material swelling and degradation of physical properties. To understand its irradiation effects, this paper investigates the stability, electronic structure, energetics, charge density distribution, PDOS and TDOS, and diffusion processes of He impurities in 6HSiC materials. The formation energy indicates that a stable, favorable position for interstitial He is the HR site with the lowest energy of 2.40 eV. In terms of vacancy, the He atom initially prefers to substitute at pre-existing Si vacancy than C vacancy due to lower substitution energy. The minimum energy paths (MEPs) with migration energy barriers are also calculated for He impurity by interstitial and vacancy-mediated diffusion. Based on its calculated energy barriers, the most possible diffusion path includes the exchange of interstitial and vacancy sites with effective migration energies ranging from 0.101 eV to 1.0 eV. Our calculation provides a better understanding of the stabilization and diffusion behaviors of He impurities in 6H-SiC materials.

THE EFFECT OF SI-RICH LAYER COATING ON U-MO VS. AL INTERDIFFUSION

  • Ryu, Ho-Jin;Park, Jae-Soon;Park, Jong-Man;Kim, Chang-Kyu
    • Nuclear Engineering and Technology
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    • 제43권2호
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    • pp.159-166
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    • 2011
  • Si-rich-layer-coated U-7 wt%Mo plates were prepared in order to evaluate the diffusion barrier performance of the Si-rich layer in U-Mo vs. Al interdiffusion. Pure Si powder was used for coating the U-Mo plates by annealing at $900^{\circ}C$ for 1 h under vacuum of approximately 1 Pa. Si-rich layers containing more than 60 at% of Si were formed on U-7 wt%Mo plates. Diffusion couple tests were conducted in a muffle furnace at $560-600^{\circ}C$ under vacuum using Si-rich-layer-coated U-Mo plates and pure Al plates. Diffusion couple tests using uncoated U-Mo plates and Al-(0, 2 or 5 wt%)Si plates were also conducted for comparison. Si-rich-layer coatings were more effective in suppressing the interaction during diffusion couple tests between coated U-Mo plate and Al, when compared with U-Mo vs. Al-Si diffusion couples, since only small amounts of Al in the coating could be found after the diffusion couple tests. Si-rich-layer-coated U-7wt%Mo particles were also prepared using the same technique for U-7 wt%Mo plates to observe the microsturctures of the coated particles.

Direct Measurement of Diffusion Length in Mixed Lead-halide Perovskite Films Using Scanning Photocurrent Microscopy

  • Kim, Ahram;Son, Byung Hee;Kim, Hwan Sik;Ahn, Yeong Hwan
    • Current Optics and Photonics
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    • 제2권6호
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    • pp.514-518
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    • 2018
  • Carrier diffusion length in the light-sensitive material is one of the key elements in improving the light-current conversion efficiency of solar-cell devices. In this paper, we measured the carrier diffusion length in lead-halide perovskite ($MAPbI_3$) and mixed lead-halide ($MAPbI_{3-x}Cl_x$) perovskite devices using scanning photocurrent microscopy (SPCM). The SPCM signal decreased as we moved the focused laser spot away from the metal contact. By fitting the data with a simple exponential curve, we extracted the carrier diffusion length of each perovskite film. Importantly, the diffusion length of the mixed-halide perovskite was higher than that of the halide perovskite film by a factor of 3 to 6; this is consistent with the general expectation that the carrier mobility will be higher in the case of the mixed lead-halide perovskites. Finally, the diffusion length was investigated as a function of applied bias for both samples, and analyzed successfully in terms of the drift-diffusion model.

확산필름 부착 위치에 따른 광선반 성능개선 연구 (Research of the Performance Improvement of a Light Shelf Depending on the Diffusion Film Installation Position)

  • 박은수;이행우;송석재;김용성
    • KIEAE Journal
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    • 제17권3호
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    • pp.91-97
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    • 2017
  • Purpose: Various studies on a light shelf are in progress, but it has the problem of glare occurrence. The present study suggested a diffusion film as the method for resolving the glare problem, and aimed to establish light shelf-related basic data by conducting the performance evaluation of a light shelf depending on the installation position of the diffusion film. Method: To carry out the light shelf performance evaluation depending on the diffusion film installation position, three cases were established: no diffusion film installation (Case 1), diffusion film installation on the reflector (Case 2), and diffusion film installation on the upper glass surface of the window for light shelf installation (Case 3); and the energy reduction performance, luminance, and luminance contrast were analyzed based on a testbed. Result: The conclusions of this study are as follows. 1) When the diffusion film was applied, the amount of light introduced through the light shelf decreased, and the average indoor illumination decreased accordingly. 2) For Case 3, the lighting energy reduction performance was identical to the lighting energy reduction efficiency of the existing light shelf; and for Case 2, it was found to be inappropriate as the lighting energy consumption increased compared to that of the existing light shelf. 3) The analysis of the glare for the cases established in this study showed that the luminance contrast was low for Case 3, and thus the glare problem could be minimized. 4) The specific angle of the light shelf could induce the glare problem by increasing the luminance depending on the external condition. 5) Based on the aforementioned contents, the installation position of the diffusion film for improving the lighting performance and glare problem of the light shelf was found to be the upper glass surface of the window for light shelf installation.

센서네트워크용 Sequenced Directed Diffusion 기법 연구 (A study on a sequenced directed diffusion algorithm for sensor networks)

  • 장재신
    • 한국정보통신학회논문지
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    • 제11권5호
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    • pp.889-896
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    • 2007
  • 센서기술 및 무선통신 기술의 발달로 센서네트워크에 대한 연구가 가속화되고 있다. 센서노드는 크기 및 용량의 제한 때문에 간단하면서 에너지를 효율적으로 사용할 수 있는 프로토콜을 설계하는 것이 매우 중요하다. 기존 센서네트워크용 라우팅 프로토콜로 널리 알려져 있는 directed diffusion 프로토콜은 간단하다는 장점을 갖지만 Interest/Exploratory data 메시지를 Flooding 기법에 따라 전송하게 됨에 따라 에너지 소모가 크다는 단점을 가지고 있다. 따라서 본 논문에서는 directed diffusion 기법이 가진 단점을 보완하면서 각 센서노드가 에너지를 균형 있게 소비할 수 있는 설계된 센서 네트워크 용 라우팅 기법을 제안하고 시뮬레이션을 통해 성능평가를 수행하였다. 성능평가 결과에 따르면 본 연구에서 제안한 라우팅 프로토콜이 기존 directed diffusion 기법에 비해 에너지를 훨씬 효율적으로 사용하면서 센서노드간 에너지 소비 불균형 문제를 해결하고 있음을 수치계산 결과를 통해 확인할 수 있었다.

Drift Diffusion of Radiation-produced Point Defects to Edge Dislocation

  • Park, S.S.;Chang, K.O.;Choi, S.P.;Kim, C.O.
    • Nuclear Engineering and Technology
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    • 제31권2호
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    • pp.151-156
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    • 1999
  • Under the heavy irradiation of crystalline materials when the production and the recombination of interstitials and vacancies are included, the diffusion equations become nonlinear. An effort has been made to arrange an appropriate transformation of these nonlinear differential equations to more solvable Poisson's equations, finally analytical solutions for simultaneously calculating the concentrations of interstitials and vacancies in the angular dependent Cottrell's potential of the edge dislocation have been derived from the well-known Green's theorem and perturbation theory.

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Formation and Growth of Hydride Blisters in Zr-2.5Nb Pressure Tubes

  • Cheong, Yong-Moo;Gong, Un-Sik;Choo, Ki-Nam;Kim, Sung-Soo;Kim, Young-Suk
    • Nuclear Engineering and Technology
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    • 제33권2호
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    • pp.192-200
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    • 2001
  • Hydride blisters were formed on the outer surface of Zr-2.5Nb pressure tube by a non- uniform steady thermal diffusion process. A thermal gradient was applied to the pressure tube with a heat bath kept at a temperature of 415$^{\circ}C$ and an aluminum cold finger cooled with flowing water of 15$^{\circ}C$. Optical microscopy and tree-dimensional laser profilometry were used to characterize the hydride blisters with different hydrogen concentrations and thermal diffusion time. Hydride blisters were expected to start at a hydrogen concentration of 30 - 70 ppm and a thermal diffusion time of 4 - 6$\times$10$^{5}$ sec. The hydride blister size increases with higher hydrogen concentrations and longer thermal diffusion time . Some of the samples revealed cracks on the hydride blisters. The ratio of hydride blister depth to height was estimated as approximately 8: 1.

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