• 제목/요약/키워드: Electroplating method

검색결과 143건 처리시간 0.103초

A comprehensive review of techniques for biofunctionalization of titanium

  • Hanawa, Takao
    • Journal of Periodontal and Implant Science
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    • 제41권6호
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    • pp.263-272
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    • 2011
  • A number of surface modification techniques using immobilization of biofunctional molecules of Titanium (Ti) for dental implants as well as surface properties of Ti and Ti alloys have been developed. The method using passive surface oxide film on titanium takes advantage of the fact that the surface film on Ti consists mainly of amorphous or low-crystalline and nonstoichiometric $TiO_2$. In another method, the reconstruction of passive films, calcium phosphate naturally forms on Ti and its alloys, which is characteristic of Ti. A third method uses the surface active hydroxyl group. The oxide surface immediately reacts with water molecules and hydroxyl groups are formed. The hydroxyl groups dissociate in aqueous solutions and show acidic and basic properties. Several additional methods are also possible, including surface modification techniques, immobilization of poly(ethylene glycol), and immobilization of biomolecules such as bone morphogenetic protein, peptide, collagen, hydrogel, and gelatin.

3D 웨이퍼 전자접합을 위한 관통 비아홀의 충전 기술 동향 (Technical Trend of TSV(Through Silicon Via) Filling for 3D Wafer Electric Packaging)

  • 고영기;고용호;방정환;이창우
    • Journal of Welding and Joining
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    • 제32권3호
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    • pp.19-26
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    • 2014
  • Through Silicon Via (TSV) technology is the shortest interconnection technology which is compared with conventional wire bonding interconnection technology. Recently, this technology has been also noticed for the miniaturization of electronic devices, multi-functional and high performance. The short interconnection length of TSV achieve can implement a high density and power efficiency. Among the TSV technology, TSV filling process is important technology because the cost of TSV technology is depended on the filling process time and reliability. Various filling methods have been developed like as Cu electroplating method, molten solder insert method and Ti/W deposition method. In this paper, various TSV filling methods were introduced and each filling materials were discussed.

The fabrication of electrodes with low resistance and fine pattern for PDP

  • Cho, Soo-Je;Ryu, Byung-Gil;Park, Myung-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.107-108
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    • 2000
  • We propose the method which is possible to fabricate the electrodes with the fine pattern and low resistance by photolithography and electroplating. The widths of pattern fabricated were 30, 50, 70 and 100um and the thickness could be up to $10{\mu}m$. The resistivity of the copper electrode electroplated was below $2.0{\mu}{\Omega}$ cm which is about half of photosensitive silver electrode. Dielectric layer was coated on the electrodes by screen printing and the pores harmful to the discharge were not formed after heat treatment. In the viewpoint of resistance and patterning, this method has much higher potential for large area display than other methods like screen printing, photosensitive conductive paste method and sputtering.

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DRAM 집적공정 응용을 위한 전기도금법 증착 구리 박막의 자기 열처리 특성 연구 (A Study on the Self-annealing Characteristics of Electroplated Copper Thin Film for DRAM Integrated Process)

  • 최득성;정승현
    • 마이크로전자및패키징학회지
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    • 제25권3호
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    • pp.61-66
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    • 2018
  • 본 연구에서는 DRAM 제조 집적공정의 금속배선으로 사용하는 구리의 자기 열처리(self-annealing) 후 박막 특성 변화에 대한 연구를 진행하였다. 구리를 증착하고 상온에서 시간이 경과하면 구리가 성장하여 결정체 크기 변화가 생기는데 이를 자기 열처리라고 부른다. 구리 금속의 증착은 전기 도금법(electroplating)을 사용하였다. 구리 도금액으로 유기 첨가물이 다른 두 가지 시료인 기준 도금액과 평가 도금액 두 용액에 대해 평가 하였다. 자기 열처리 시간이 경과함에 따라 시간에 대해 면 저항 값의 변화가 없는 영역과 이후 급격하게 떨어지는 구간으로 나누어지고 최종적으로 포화면 저항 값을 보인다. 최종적인 면 저항 값은 초기 값 대비 20% 개선 효과를 보인다. 평가 전해액의 자기 열처리 효과가 기준 용액 대비 더 빠른 시간 안에 이루어졌는데 이는 유기 첨가물의 차이 때문이다. 개선의 효과 분석으로 TEM 장비를 이용하여 결정체 변화를 관찰하였고 자기 열처리 공정에 의해 효과적인 결정체 성장이 이루어졌음을 발견했다. 또한 단면 TEM 측정 결과 자기 열처리 된 시료는 전류 방향으로의 결정체 경계면 숫자가 줄어드는 bamboo 구조를 보인다. 열적 열하 특성(thermal excursion characteristics) 측정 결과 고온 열처리 대비 자기 열처리 시료가 hillock 특성이 보이지 않고 이는 박막의 신뢰성 특성을 향상 시킨다. Electron backscattered diffraction (EBSD) 측정 결과 결정체가 $2{\mu}m$까지 성장한 결정체를 관찰하였고 스트레스에 의한 void를 억제하는데 유리한 (100) 면 비중이 증가하는 방향으로 결정체 성장이 이루어짐을 알 수 있다.

니켈박막의 공정조건에 따른 탄성계수 변화 (Sensitivity of Electroplating Conditions on Young's Modulus of Thin Film)

  • 김상현
    • 한국정밀공학회지
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    • 제25권8호
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    • pp.88-95
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    • 2008
  • Young's modulus of electroplated nickel thin film is systematically investigated using the resonance method of atomic force microscope. Thin layers of nickel to be measured are electroplated onto the surface of an AFM silicon cantilever and Young's modulus of plated nickel film is investigated as a function of process conditions such as the plating temperature and applied current density. It is found that Young's modulus of plated nickel thin film is as high as that of bulk nickel at low plating temperature or low current density, but decreases with increasing plating temperature or current density. The results imply that the plating rate increases as increasing the plating temperature or current density, therefore, slow plating rate produces a dense plating material due to the sufficient time fur nickel ions to form a dense coating.

PDMS 유연 몰드를 이용한 구리 마이크로 메쉬 시트의 제작 (Fabrication of Copper Micromesh Sheets Using PDMS Flexible Mold)

  • 정순녕;강창근;정임덕;배공명;박치열;정필구;고종수
    • 대한기계학회논문집A
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    • 제31권12호
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    • pp.1194-1199
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    • 2007
  • A unique fabrication method for a copper micromesh is proposed and demonstrated. A PDMS mold was fabricated using a microcasting process and then used as a flexible mold in copper electroplating. The fabricated copper micromesh was well formed and connected without any cracks within the entire mold area. The experimental results verified that the fabricated features of the copper micromesh accurately followed the shape of the microstructures of the PDMS mold. This unique fabrication method provides an easy yet precise means of producing three-dimensional metal microstructures.

Ni-MH 전지용 thin nickel foam의 제조 (Preparation of Thin Nickel Foam for Nickel-Metal Hydride Battery)

  • 신준호;김기원
    • 한국표면공학회지
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    • 제28권2호
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    • pp.83-91
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    • 1995
  • A new method for preparation of thin nickel foam for Ni-MH battery was investigated. In this method, fine graphite powders of $1\mu\textrm{m}$$2\mu\textrm{m}$ diameter were pasted into pores of thin polyurethane foam film in order to supply electric conducting seeds for nickel deposition by electroless plating reaction. After electroless plating, remaining polyurethane foam was removed chemically by organic solvent treatment and graphite particles also removed by ultrasonic cleaning. Porosity of formed nickel foam was about 85% During electroplating, porosity of the nickel foam decreased less than 5% up to $30\mu\textrm{m}$ coating thickness. And then it was electroplated and heat-treated to improve mechanical strength and ductility. Finally, thin nickel foam for Ni electrode of Ni-MH battery with 80% porosity and $350\mu\textrm{m}$~X$400\mu\textrm{m}$ thickness was obtained.

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마이크로 금 전해 도금 구조물의 잔류응력 측정 (Residual Stress Measurement of Micro Gold Electroplated Structure)

  • 백창욱;안유민
    • 한국정밀공학회지
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    • 제17권12호
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    • pp.195-200
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    • 2000
  • In order to find a residual stress in the micro-machined beam, first natural frequency of the beam that has the residual stress inside is analyzed using the Rayleigh's energy method. Micro gold electroplated structure is fabricated by surface micro-machining process. The made structure is clamped-clamped beam and its 1st natural frequency is measured by resonance method. For the better estimation of the residual stress, an equivalent length of micro-machined beam to ideal beam is calculated by FEM. The residual stress is estimated from the equivalent length and the measured natural frequency.

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LIGA-reflow 응용 Micro-lens Pattern 도광판 금형 제작 (Micro-lens Patterned LGP Injection Mold Fabrication by LIGA-reflow Process)

  • 황철진;김종덕;정재완;하수용;이규현
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.241-244
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    • 2004
  • Microlens patterned micro-mold fabrication method for Light Guiding Plate(LGP), kernel part of LCD-BLU(Back Light Unit), was presented. Instead of erosion dot pattern for LCP optical design, microlens pattern, fabricated by LIGA-reflow process, was applied. Optical pattern design method was also developed not only for negative pattern LGP, but also positive pattern LGP. In order to achieve flow balance during the micro-injection molding process and dimensional accuracy, two LGP pattern was made in one micro-mold.

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$50{\mu}m$ Microlens 패턴 금형의 미세사출성형 전사성과 전광특성 기초연구 (A Basic Study of replication and brightness for micro injection molding with ${\sim}50{\mu}m$ micro-lens pattern mold)

  • 황철진;고영배;허영무
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 추계학술대회논문집
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    • pp.280-283
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    • 2004
  • Micro-lens patterned micro-mold fabrication method for Light Guiding Plate(LGP), kernel part of LCD-BLU(Back Light Unit), was presented. Instead of erosion dot pattern for LGP optical design, micro-lens pattern, fabricated by LIGA-reflow process, was applied. Optical pattern design method was also developed not only for negative pattern LGP, but also positive pattern LGP. During injection molding process, experimental study was conducted to improve replication quality and brightness of ${\sim}50um$ micro-lens pattern mold. The effect of mold temperature for the replication quality of micro-lens array was studied.

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