• Title/Summary/Keyword: Electroplating method

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A comprehensive review of techniques for biofunctionalization of titanium

  • Hanawa, Takao
    • Journal of Periodontal and Implant Science
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    • v.41 no.6
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    • pp.263-272
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    • 2011
  • A number of surface modification techniques using immobilization of biofunctional molecules of Titanium (Ti) for dental implants as well as surface properties of Ti and Ti alloys have been developed. The method using passive surface oxide film on titanium takes advantage of the fact that the surface film on Ti consists mainly of amorphous or low-crystalline and nonstoichiometric $TiO_2$. In another method, the reconstruction of passive films, calcium phosphate naturally forms on Ti and its alloys, which is characteristic of Ti. A third method uses the surface active hydroxyl group. The oxide surface immediately reacts with water molecules and hydroxyl groups are formed. The hydroxyl groups dissociate in aqueous solutions and show acidic and basic properties. Several additional methods are also possible, including surface modification techniques, immobilization of poly(ethylene glycol), and immobilization of biomolecules such as bone morphogenetic protein, peptide, collagen, hydrogel, and gelatin.

Technical Trend of TSV(Through Silicon Via) Filling for 3D Wafer Electric Packaging (3D 웨이퍼 전자접합을 위한 관통 비아홀의 충전 기술 동향)

  • Ko, Young-Ki;Ko, Yong-Ho;Bang, Jung-Hwan;Lee, Chang-Woo
    • Journal of Welding and Joining
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    • v.32 no.3
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    • pp.19-26
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    • 2014
  • Through Silicon Via (TSV) technology is the shortest interconnection technology which is compared with conventional wire bonding interconnection technology. Recently, this technology has been also noticed for the miniaturization of electronic devices, multi-functional and high performance. The short interconnection length of TSV achieve can implement a high density and power efficiency. Among the TSV technology, TSV filling process is important technology because the cost of TSV technology is depended on the filling process time and reliability. Various filling methods have been developed like as Cu electroplating method, molten solder insert method and Ti/W deposition method. In this paper, various TSV filling methods were introduced and each filling materials were discussed.

The fabrication of electrodes with low resistance and fine pattern for PDP

  • Cho, Soo-Je;Ryu, Byung-Gil;Park, Myung-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.107-108
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    • 2000
  • We propose the method which is possible to fabricate the electrodes with the fine pattern and low resistance by photolithography and electroplating. The widths of pattern fabricated were 30, 50, 70 and 100um and the thickness could be up to $10{\mu}m$. The resistivity of the copper electrode electroplated was below $2.0{\mu}{\Omega}$ cm which is about half of photosensitive silver electrode. Dielectric layer was coated on the electrodes by screen printing and the pores harmful to the discharge were not formed after heat treatment. In the viewpoint of resistance and patterning, this method has much higher potential for large area display than other methods like screen printing, photosensitive conductive paste method and sputtering.

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A Study on the Self-annealing Characteristics of Electroplated Copper Thin Film for DRAM Integrated Process (DRAM 집적공정 응용을 위한 전기도금법 증착 구리 박막의 자기 열처리 특성 연구)

  • Choi, Deuk-Sung;Jeong, Seung-Hyun
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.3
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    • pp.61-66
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    • 2018
  • This research scrutinizes the self-annealing characteristics of copper used to metal interconnection for application of DRAM fabrication process. As the time goes after the copper deposited, the grain of copper is growing. It is called self-annealing. We use the electroplating method for copper deposition and estimate two kinds of electroplating chemicals having different organic additives. As the time of self-annealing is elapsed, sheet resistance decreases with logarithmic dependence of time and is finally saturated. The improvement of sheet resistance is approximately 20%. The saturation time of experimental sample is shorter than that of reference sample. We can find that self-annealing is highly efficient in grain growth of copper through the measurement of TEM analysis. The structure of copper grain is similar to the bamboo type useful for current flow. The results of thermal excursion characteristics show that the reliability of self-annealed sample is better than that of sample annealed at higher temperature. The self-annealed sample is not contained in hillock. The self-annealed samples grow until $2{\mu}m$ and develop in [100] direction more favorable for reliability.

Sensitivity of Electroplating Conditions on Young's Modulus of Thin Film (니켈박막의 공정조건에 따른 탄성계수 변화)

  • Kim, Sang-Hyun
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.8
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    • pp.88-95
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    • 2008
  • Young's modulus of electroplated nickel thin film is systematically investigated using the resonance method of atomic force microscope. Thin layers of nickel to be measured are electroplated onto the surface of an AFM silicon cantilever and Young's modulus of plated nickel film is investigated as a function of process conditions such as the plating temperature and applied current density. It is found that Young's modulus of plated nickel thin film is as high as that of bulk nickel at low plating temperature or low current density, but decreases with increasing plating temperature or current density. The results imply that the plating rate increases as increasing the plating temperature or current density, therefore, slow plating rate produces a dense plating material due to the sufficient time fur nickel ions to form a dense coating.

Fabrication of Copper Micromesh Sheets Using PDMS Flexible Mold (PDMS 유연 몰드를 이용한 구리 마이크로 메쉬 시트의 제작)

  • Jung, Sun-Nyeong;Kang, Chang-Kun;Jung, Im-Deok;Bae, Kong-Myeong;Park, Chi-Yeol;Jung, Phill-Gu;Ko, Jong-Soo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.31 no.12
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    • pp.1194-1199
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    • 2007
  • A unique fabrication method for a copper micromesh is proposed and demonstrated. A PDMS mold was fabricated using a microcasting process and then used as a flexible mold in copper electroplating. The fabricated copper micromesh was well formed and connected without any cracks within the entire mold area. The experimental results verified that the fabricated features of the copper micromesh accurately followed the shape of the microstructures of the PDMS mold. This unique fabrication method provides an easy yet precise means of producing three-dimensional metal microstructures.

Preparation of Thin Nickel Foam for Nickel-Metal Hydride Battery (Ni-MH 전지용 thin nickel foam의 제조)

  • 신준호;김기원
    • Journal of the Korean institute of surface engineering
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    • v.28 no.2
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    • pp.83-91
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    • 1995
  • A new method for preparation of thin nickel foam for Ni-MH battery was investigated. In this method, fine graphite powders of $1\mu\textrm{m}$$2\mu\textrm{m}$ diameter were pasted into pores of thin polyurethane foam film in order to supply electric conducting seeds for nickel deposition by electroless plating reaction. After electroless plating, remaining polyurethane foam was removed chemically by organic solvent treatment and graphite particles also removed by ultrasonic cleaning. Porosity of formed nickel foam was about 85% During electroplating, porosity of the nickel foam decreased less than 5% up to $30\mu\textrm{m}$ coating thickness. And then it was electroplated and heat-treated to improve mechanical strength and ductility. Finally, thin nickel foam for Ni electrode of Ni-MH battery with 80% porosity and $350\mu\textrm{m}$~X$400\mu\textrm{m}$ thickness was obtained.

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Residual Stress Measurement of Micro Gold Electroplated Structure (마이크로 금 전해 도금 구조물의 잔류응력 측정)

  • Baek, Chang-Wook;Ahn, Yoo-Min
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.12
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    • pp.195-200
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    • 2000
  • In order to find a residual stress in the micro-machined beam, first natural frequency of the beam that has the residual stress inside is analyzed using the Rayleigh's energy method. Micro gold electroplated structure is fabricated by surface micro-machining process. The made structure is clamped-clamped beam and its 1st natural frequency is measured by resonance method. For the better estimation of the residual stress, an equivalent length of micro-machined beam to ideal beam is calculated by FEM. The residual stress is estimated from the equivalent length and the measured natural frequency.

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Micro-lens Patterned LGP Injection Mold Fabrication by LIGA-reflow Process (LIGA-reflow 응용 Micro-lens Pattern 도광판 금형 제작)

  • Hwang C.J.;Kim J.D.;Chung J.W.;Ha S.Y.;Lee K.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2004.05a
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    • pp.241-244
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    • 2004
  • Microlens patterned micro-mold fabrication method for Light Guiding Plate(LGP), kernel part of LCD-BLU(Back Light Unit), was presented. Instead of erosion dot pattern for LCP optical design, microlens pattern, fabricated by LIGA-reflow process, was applied. Optical pattern design method was also developed not only for negative pattern LGP, but also positive pattern LGP. In order to achieve flow balance during the micro-injection molding process and dimensional accuracy, two LGP pattern was made in one micro-mold.

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A Basic Study of replication and brightness for micro injection molding with ${\sim}50{\mu}m$ micro-lens pattern mold ($50{\mu}m$ Microlens 패턴 금형의 미세사출성형 전사성과 전광특성 기초연구)

  • Hwang C. J.;Ko Y. B.;Heo Y. M.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2004.10a
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    • pp.280-283
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    • 2004
  • Micro-lens patterned micro-mold fabrication method for Light Guiding Plate(LGP), kernel part of LCD-BLU(Back Light Unit), was presented. Instead of erosion dot pattern for LGP optical design, micro-lens pattern, fabricated by LIGA-reflow process, was applied. Optical pattern design method was also developed not only for negative pattern LGP, but also positive pattern LGP. During injection molding process, experimental study was conducted to improve replication quality and brightness of ${\sim}50um$ micro-lens pattern mold. The effect of mold temperature for the replication quality of micro-lens array was studied.

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