• Title/Summary/Keyword: Electron-Beam

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Effects of Current Intensity on the Reaction Efficiency and Kinetics of Gas Compound Decomposition by Electron Beam in a Continuous Flow System (연속식 흐름 가스상물질의 전자선 분해반응에서 전류 세기가 반응효율 및 kinetics에 미치는 영향)

  • Tak-Hyun Kim;Dong-Woo Kim;Sang-Hee Jo;Jieun Son;Seungho Yu;Tae-Hun Kim;Jong-Seok Park
    • Journal of Radiation Industry
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    • v.18 no.3
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    • pp.235-240
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    • 2024
  • Electron beam technology has recently attracted attention as one of the powerful air pollution control methods. In this study, methyl mercaptan decomposition by electron beam in a continuous gas flow system was studied. To this, the effect of gas flowrate, which is one of important operating variables in the continuous gas flow electron beam process, on methyl mercaptan treatment efficiency was studied. In particular, the treatment efficiency and the reaction kinetics of methyl mercaptan decomposition were compared when calculated based on the absorbed dose and when calculated based on the current intensity of electron beam. When based on the electron beam absorbed dose, the treatment efficiency and 1st-order reaction constant increased as the gas flowrate was increased, contrary to the trends in general chemical reactions. However, when based on the current intensity, the treatment efficiency and 1st-order reaction constant increased as the gas flowrate was decreased, which can be theoretically explained. This is due to the fact that the current intensity increased as the gas flowrate was increased, resulting in improved the electron beam treatment efficiency. In conclusion, it is necessary to consider not only the absorbed dose but also the current intensity of electron beam in order to explain the results of reaction efficiencies and kinetics in the continuous flow electron beam gas treatment process.

TWO DIMENSIONAL SIMULATION OF BEAM INJECTION INTO NEUTRAL PLASMA (Beam 전자와 중성 Plasma 사이의 상호작용에 관한 2차원적 수치계산)

  • 선종호;민경욱
    • Journal of Astronomy and Space Sciences
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    • v.7 no.2
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    • pp.113-123
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    • 1990
  • Two dimensional electrostatic model was used to investigate the interactions between beam electron and neutral plasma. It was found that results heavily depend on the beam density. When the beam electron density is lower than the ambient plasma beam density, many beam electrons exhibit vortex structure through beam-plasma interactions and can propagate into the ambient plasma easily from the injection area. On the other hand, when the beam density larget than that of the neutral ambient plasma, it was found that most of the beam electrons constitute return current and ion with much larger mass than that of the electron can be accelerated according to the magnetic field strength. Furthermore, as external field strength varies, it was found that propagation and interaction of the beam can show large dependence on it.

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Microscale BTS sculptured by electron beam

  • Choi, Haneul;Jeong, Young Woo;Chang, Hye Jung
    • Applied Microscopy
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    • v.49
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    • pp.4.1-4.2
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    • 2019
  • We applied the advanced bitmap-assisted patterning function of focused ion beam to fabricate microscale sculpture of the 'BangTanSoNyeonDan' known as BTS members, the world-wide famous K-pop boyband. With the help of an electron microscope, you can carve your idols on your accessories at micro scale. Fun applications of electron microscopes are not limited to science.

Measurement of Ion-induced Secondary Electron Emission Yield of MgO Films by Pulsed Ion Beam Method

  • Lee, Sang-Kook;Kim, Jae-Hong;Lee, Ji-Hwa;Whang, Ki-Woong
    • Journal of Information Display
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    • v.3 no.1
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    • pp.17-21
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    • 2002
  • Measurement of the ion-induced secondary electron emission coefficient (${\gamma}_i$) for insulating films is hampered by an unavoidable charging problem. Here, we demonstrate that a pulsed ion beam technique is a viable solution to the problem, allowing for accurate measurement of ${\gamma}_i$ for insulating materials. To test the feasibility of the pulsed ion beam method, the secondary electron emission coefficient from n-Si(100) is measured and compared with the result from the conventional continuous beam method. It is found that the ${\gamma}_i$ from n-Si(100) by the ion pulsed beam measured to be 0.34, which is the same as that obtained by continuous ion beam. However, for the 1000 A $SiO_2$ films thermally deposited on Si substrate, the measurement of ${\gamma}_i$ could be carred out by the pulsed ion method, even though the continuous beam method faced charging problem. Thus, the pulsed ion beam is regarded to be one of the most suitable methods for measuring secondary electron coefficient for the surface of insulator materials without experiencing charging problem. In this report, the dependence of ${\gamma}_i$ on the kinetic energy of $He^+$ is presented for 1000 ${\AA}$ $SiO_2$ films. And the secondary electron emission coefficient of 1000 ${\AA}$ MgO e-beam-evaporated on $SiO_2/Si$ is obtained using the pulsing method for $He^+$ and $Ar^+$ with energy ranging from 50 to 200 eV, and then compared with those from the conventional continuous method.

A Study on the Properties of TiN Films by Using Electron Beam Irradiation (전자-빔 조사를 이용한 TiN 박막의 물성변화에 관한 연구)

  • Shin, C.H.;Sung, Y.J.;Lim, S.Y.;Shin, G.W.;Jeong, C.W.;Kim,, S.K.;Kim, J.H.;You, Y.Z.;Kim, Dae-Il
    • Journal of the Korean Society for Heat Treatment
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    • v.23 no.1
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    • pp.29-33
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    • 2010
  • Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

Secondary Electron Emission Characteristics of Functional Layer in AC-PDP

  • Son, Chang-Gil;Han, Young-Gyu;Kim, Yong-Hee;Cho, Byeong-Seong;Hong, Young-Jun;Song, Ki-Baek;Bae, Young-Joo;Kim, In-Tae;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.736-739
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    • 2009
  • We have studied that the secondary electron emission characteristics of functional layers which have different kinds of MgO sub-micrometer size powder in AC-PDP. We used cathodoluminescence(CL) and gamma focused ion beam (${\gamma}$-FIB) system for measurement of secondary electron emission characteristics. Also we made 6 inch test panel which applied functional layers for evaluation of discharge characteristics.

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Electron Reflecting Layer with the WO3-ZnS:Cu.Al-PbO-SiO2 System Concerned in Doming Property of Shadow Mask in CRT

  • Kim, Sang-Mun;Cho, Yoon-Lae
    • Journal of the Korean Ceramic Society
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    • v.39 no.12
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    • pp.1124-1127
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    • 2002
  • In this paper, we studied the effects of the electron reflection on shadow mask on which the electron reflecting materials with $WO_3-ZnS:Cu.Al-PbO-SiO_2$ system were screen-printed and we evaluated the variation of the electron beam mislanding in CRT. As a result, the green emitted spectra on the electron reflecting layer are observed due to the transformation of the electron energy, when the electron impacted on shadow mask. The beam mislanding is reduced about 40% in comperision with that of CRT made by the conventional method.

Numerical Analysis for the Image Evaluation of a Thermionic SEM (열전자형 주사전자현미경 결상특성의 수치해석)

  • Jung, H.U.;Park, M.J.;Kim, D.H.;Jang, D.Y.;Park, K.
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.6
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    • pp.153-158
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    • 2007
  • The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

Investigation of Wetting Characteristics of Polymer Surfaces according to Electron Beam Irradiation (고분자 표면의 전자빔 조사에 따른 젖음특성 고찰)

  • Lee, Hyun Joong;Park, Keun;Kim, Byung Nam
    • Journal of the Korean Society for Precision Engineering
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    • v.33 no.1
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    • pp.45-51
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    • 2016
  • The present study uses an electron beam (e-beam) to modify the wetting characteristics of thermoplastic polymer surfaces. A high energy e-beam irradiated various polymer surfaces (PET, PMMA, and PC), with variations in irradiation time and applied current. The water contact angles were measured on the e-beam irradiated surfaces in order to investigate the changes in the surface energy and the relevant wettability. Furthermore, XPS analyses were performed to investigate the chemical composition change in the e-beam irradiated surfaces; the results showed that the hydrophilic groups (C-O) increased after the electron beam irradiation. Also, water collection tests were performed for various polymer samples in order to investigate the effect of the surface energy on the ability of water collection, from which it can be seen that the irradiated surfaces revealed better water-collecting capability than pure polymer surfaces.