• 제목/요약/키워드: Electron beam source

검색결과 223건 처리시간 0.026초

Fabrication of carbon nanotube electron beam (C-beam) for thin film modification

  • Kang, Jung Su;Lee, Su Woong;Lee, Ha Rim;Chung, Min Tae;Park, Kyu Chang
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.171.1-171.1
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    • 2015
  • Carbon nanotube emitters is very promising electron emitter for electron beam applications. We introduced the carbon nanotube electron beam (C-beam) exposure technic using triode structure. As a source, the electron beam emit from CNT emitters placed at the cathode by high electric field. Through the gate mesh, with high accelerating energy, the electron can be extracted easily and impact at the anode plate. For thin film modification, after the C-beam exposure on the amorphous silicon thin film, we found phase changes and it showed a high crystallinity from the Raman measurement. We expect that this crystallized film will be a good candidate as a new active layer of TFT.

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Photoneutron yield for an electron beam on tantalum and erbium deuteride

  • Andrew K. Gillespie;Cuikun Lin;R.V. Duncan
    • Nuclear Engineering and Technology
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    • 제56권8호
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    • pp.3084-3089
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    • 2024
  • An electron beam may be used to generate bremsstrahlung photons that go on to create photoneutrons within metals. This serves as a low-energy neutron source for irradiation experiments. In this article, we present simulation results for optimizing photoneutron yield for a 10-MeV electron beam on tantalum foil and erbium deuteride (ErD3). The thickness of the metal layers was varied. A tantalum foil thickness of 1.5 mm resulted in the most photons reaching the second metal layer. When a second metal layer of ErD3 was included, the photoneutron yield increased with the thickness of the secondary layer. When the electron beam was directly incident upon a layer of ErD3, the photoneutron yield did not differ significantly from the yield when a layer of tantalum was included. The directional photoneutron yield reached a maximum level when the thickness of the ErD3 layer was around 12 cm. About 1 neutron was generated per 104 source electrons. When using a 2-mA beam current, it is possible to generate up to 1012 neutrons per second, making this combination a relatively-inexpensive neutron generator.

스테인리스강에 대한 전자빔 용접 잔류응력 예측을 위한 열원 변수 민감도 해석 (Sensitivity Analysis of Heat Source Parameter for Predicting Residual Stress Induced by Electron Beam Welding)

  • 박신제;김훈태;김윤재
    • 한국압력기기공학회 논문집
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    • 제18권2호
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    • pp.61-68
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    • 2022
  • Accurate evaluation of residual stress is important for stress corrosion cracking assessment. In this paper, electron beam welding experiment is simulated via finite element analysis and the sensitivity of the parameters related to the combined heat source model is investigated. Predicted residual stresses arecompared with measured residual stresses. It is found that the welding efficiency affects the size of the tensile residual stress area and the magnitude of maximum longitudinal residual stress. It is also found that the parameter related to the ratio of energy distributed to the two-dimensional heat source has little effect on the size of tthe tensile residual stress area, but affects the size of the longitudinal residual stress in the center of the weld.

전자선에서 Virtual Source Distance의 위치 결정 (Determination of the Virtual Focus Position for Electron Beam with Air Scanning)

  • 권경태;윤화룡;박광호;김정만
    • 대한방사선치료학회지
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    • 제6권1호
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    • pp.89-93
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    • 1994
  • Authors have measured virtual source distance of electron beam from CL/1800 medical linear accelerator, with newly designed method. Beam scanning was performed with the direction of beam axis in the air. Compared results between this study and well established in phantom measurement shows good agreement with in experimental error. And we have found that build-up cap plays very important role in air measurement because of charge build up. The method of in-air measurement of virtual source distance is very easy to set-up and generate accurate results.

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Microwave Electric Field and Magnetic Field Simulations of an ECR Plasma Source for Hyperthermal Neutral Beam Generation

  • 이희재;김성봉;유석재;조무현;남궁원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.501-501
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    • 2012
  • A 2.45 GHz electron cyclotron resonance (ECR) plasma source with a belt magnet assembly configuration (BMC) was developed for hyperthermal neutral beam (HNB) generation. A plasma source for high flux HNB generation should be satisfied with the requirements: low pressure operation, high density, and thin plasma. The ECR plasma source with BMC achieved high density at low operation pressure due to electron confinement enhancement caused by high mirror ratio and drifts in toroidal direction. The 2.45 GHz microwave launcher had a circularly bended WR340 waveguide with slits. The microwave E-field profile induced by the microwave launcher was studied in this paper. The E-field profile was a cups field perpendicular to B-filed at ECR zone. The optimized E-field profile and B-field were found for effective ECR heating.

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대전력 전자 빔의 개발 및 응용에 관한 연구 (A Study of Development and Application with High Power Electron Beam)

  • 김원섭;김종만;김경식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 기술교육전문연구회
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    • pp.169-173
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    • 2003
  • In this paper, we present a design and experiment study of high power large diameter backward wave oscillator. Analysis is made within the scope of linear theory of absolute instibility. The Electron beam generator may be atteractive source of high power millimeter microwaves which has simpler structure.

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몬테카를로 시뮬레이션을 이용한 복숭아의 방사선 조사 (Monte Carlo Simulation of Irradiation Treatment of Peaches (Prunus persica L. Batsch))

  • 김종순;김동현;박종민;최원식;권순홍
    • 한국산업융합학회 논문집
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    • 제21권6호
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    • pp.337-344
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    • 2018
  • Food irradiation is important not only in ensuring safety but also improving antioxidant activity of peaches. Our objective was to establish the best irradiation treatment for peaches by calculating dose distribution using Monte Carlo simulation. 3-D geometry and component densities of peaches, extracted from CT scan, were entered into MCNP to obtain simulated dose distribution. Radiation energies for electron beam were 1.35 MeV (low energy) and 10 MeV (high energy). Co (1.25 MeV) and the Husman irradiator, containing three sealed Cs source rods in an annular array, were used for gamma irradiation. At 1.35 MeV electron beam simulation, electrons penetrated well beyond the peach skin, enough for surface treatment for microorganisms and allergens. At 10 MeV electron beam simulation, for top-beam only treatment, doses at the core were the highest and for double beam treatment, the electron energy was absorbed by the entire sample. At Co source, the radiation doses were presented on the whole area. At Cs source, the dose uniformity ratios were 2.78 for one source and 1.48 for three ones at 120 degrees interval. Proper control of irradiation treatment is critical to establish confidence in the irradiation process.

전자빔 증착시 이온빔 보조증착 장비의 사용에 따른 $SiO_2 & TiO_2$ 박막의 광학적 특성 (Optical properties of $SiO_2$ and $TiO_2$ thin films deposited by electron beam process with and without ion-beam source)

  • 송명근;양우석;권순우;이형만;김우경;이한영;윤대호;송요승
    • 한국결정성장학회지
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    • 제17권4호
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    • pp.145-150
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    • 2007
  • 다층간섭필터 제작을 위한 $SiO_2 & TiO_2$ 박막을 electron-beam을 이용하여 제작하였다. 이온빔 보조증착 장비를 이용한 경우, 아르곤 가스와 산소 가스의 비율에 따라 양극전류를 변화시키며 증착하였고, 전자빔만을 사용한 경우에는 $100{\sim}250^{\circ}C$까지 $50^{\circ}C$ 간격으로 온도를 조정하여 증착하였다 $SiO_2$ 박막의 경우 표면 거칠기는 $200^{\circ}C$와 양극전류 0.2A에서 가장 낮은 값을 보였으며, 굴절률은 이온빔 보조 장치를 사용한 박막이 전자빔만을 사용하여 증착한 박막보다 전체적으로 0.1 정도 낮았다. $TiO_2$의 경우 표면거칠기는 상온과 양극전류 0.2A에서 가장 낮으며, 굴절률은 이온빔 보조 증착장치를 사용한 박막이 전자빔만으로 증착한 경우보다 전체적으로 낮은 값을 나타내었다.

탄소나노튜브를 이용한 고휘도 X-선원용 전자빔원 개발 (Development of an electron source using carbon nanotube field emittes for a high-brightness X-ray tube)

  • 김선규;허성환;조성오
    • 한국진공학회지
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    • 제14권4호
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    • pp.252-257
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    • 2005
  • 고휘도 마이크로빔 X-선원에 사용할 고휘도 전자빔원을 탄소나노튜브를 이용하여 설계, 제작하였다. 전자빔원은 탄소나노튜브 팁을 이용한 음극, 전자빔 인출용 그리드, 전자빔 가속용 양극으로 이루어진 삼극관 형태의 구조를 가진다. 설계된 휘도 값을 얻기 위하여 X-선 발생부에서의 전자빔 직경이 5 $\mu$m 이하, 빔전류가 약 30 $\mu$A 이상이 요구된다 이러한 요구조건을 만족시키기 위하여, EGUN Code를 이용하여 전자빔의 궤적 및 공간분포 등을 계산함으로써, 탄소나노튜브 팁 및 전자빔원의 구조 등을 최적화 하였다. 제작된 탄소나노튜브 팁은 직경 200 $\mu$m 의 텅스텐 와이어를 전기화학적으로 에칭하여 그 끝을 뽀족하게 만든 뒤 텅스텐의 끝 부분에 탄소나 노튜브를 화학기상법으로 증착하여 제작하였다. 제작된 탄소나노튜브를 이용하여 전자빔 인출실험을 수행하였다. 개발 중인 탄소나노튜브 팁을 이용한 고휘도 전자빔원의 설계 특성 및 기초 실험결과를 보고한다.

유도결합 플라즈마를 이용한 집속이온빔용 고휘도 이온원의 개발 및 특성연구 (Development and characteristic study of high brightness ion source using inductively coupled plasma for focused ion beam)

  • Kim, Yoon-Jae;Park, Dong-Hee;Hwang, Yong-Seok
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.494-499
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    • 2004
  • A ion source using inductively coupled plasma has been tested in order to test its feasibility as a high brightness ion source for focused ion beam. When operating the ion source with filter magentas in front of plasma electrode for a negative ion source, lower remittances are expected. Extracted beam remittances are measured with an Allison-type scanning device for various plasma parameters and extraction conditions. The normalized omittance has been measured to be around 0.2$\pi$mmmrad with beam currents of up to 0.55 ㎃. In particular, noting that multicusp magnets have a role in decreasing the remittance as well as increasing plasma discharge efficiency, transverse magnetic field has been confirmed to be a useful tool fur decreasing remittance via electron energy control.

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