• Title/Summary/Keyword: Electron beam method

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Fabrication technology of the focusing grating coupler using single-step electron beam lithography (Single-step 전자빔 묘화 장치를 이용한 Focusing Grating Coupler 제작 연구)

  • Kim, Tae-Youb;Kim, Yark-Yeon;Sohn, Yeung-Joon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.976-979
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

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Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

Charge Accumulation in Glass under E-beam irradiation (E-beam 조사하에서 유리의 전하 측정)

  • Kim, Dae-Yeol;Choi, Yong-Sung;Hwang, Jong-Sun;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.268-269
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    • 2008
  • Charging of spacecraft occurs in plasma and radiation environment. Especially, we focused on an accident caused by internal charging in a glass material that was used as the cover plate of solar panel array, and tried to measure the charge distribution in glass materials under electron beam irradiation by using a PEA (Pulsed Electro-Acoustic method) system. In the case of a quartz glass (pure $SiO_2$), no charge accumulation was observed either during or after the electron beam irradiation. On the contrary, positive charge accumulation was observed in glass samples containing metal-oxide components. It is found that the polarity of the observed charges depends on the contents of the impurities. To identify which impurity dominates the polarity of the accumulated charge, we measured charge distributions in several glass materials containing various metal-oxide components and calculated the trap energy depths from the charge decay characteristics of all glass samples.

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A Study on the Analysis of Magnetic Field in Magnetic Deflection Yoke Based on the Oblate Spheroidal coordinates (Oblate Spheroidal 좌표계를 이용한 자기 편형요크내의 자장 해석에 관한 연구)

  • Seo, Jeong-Doo;Yoo, Hyeong-Seon
    • Journal of the Korean Society for Precision Engineering
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    • v.10 no.3
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    • pp.117-124
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    • 1993
  • This paper presents the study on the magnetic field analysis of magnetid deflection yoke using integral equation method. An integral equation method is developed for the computer modeling of the magnetic fields produced by color CRT and T.V. deflection yoke. Deflection of electron beams using magnetic fields is applied in a variety of display instruments such as te.evision receivers, electron probe instruments, etc. The magnetic field is solved by dividing these into the finite elements in the whole domain : the saddle coil which deflects the electron heam horizontally, the toroidal coil which deflects it vertically, magnetic core which enhances the magnetid fields genterated by the both coils. Using oblate spheroidal coordinates, this paper has had an easier access to the shape of magnetic deflection yoke chasing the boundaries than other coordinates.

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Experimentally Minimized Contaminative Condition of Carbonaceous Artifacts in Transmission Electron Microscope (투과전자현미경에 타소질 불순물의 오염 최소화를 위한 실험 조건)

  • Kim, Young-Min;Choi, Joo-Hyoung;Song, Kyung;Kim, Yang-Soo;Kim, Youn-Joong
    • Applied Microscopy
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    • v.39 no.1
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    • pp.73-77
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    • 2009
  • Contaminative artifacts such as carbonaceous materials on carbon-coated microgrids are unavoidable, which is induced by electron beam exposure inside electron microscopes. This phenomenon raise a source to produce confusing information to the samples investigated by analytical TEM, which should be alleviated as much as possible. As experimental precautions for reducing this unwanted effect, the use of $LN_2$ cooled anti-contaminator and pre-illumination of electron beam at low magnification can be helpful. Nevertheless, we should be cautious to set an illumination condition for microanalysis because the contaminative effect is dependent with the types of irradiation situations, which is well known to be a decisive factor for causing the carbonaceous artifacts. Accordingly, it is necessary that optimal illumination to minimize the contaminative effect should be selected for improving the accuracy of microanalysis. In this paper, we introduce the practical method to determine the optimal illumination condition by evaluating the contaminative effect as a function of instrumental spot size, which is directly linked with electron current density.

Development of Irreversible Micro-size Ferromagnetic Structures by Hydrogenation and Electron-beam Lithography (수소화 및 전자빔 사진식각 기술에 의한 비가역적 마이크로 크기의 강자성 구조체 개발)

  • Yun Eui-Jung
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.1 s.343
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    • pp.7-12
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    • 2006
  • In this study, we developed irreversible and stable micro-size ferromagnetic structures utilizing hydrogenation and electron-beam lithography processes. The compositionally modulated (CM) Fe-Zr thin films that had average compositions $Fe_XZr_{100-x}$ with $x=65-85\%$ modulation periods of similar to 1 nm, and total thicknesses of similar to 100 m were prepared. The magnetic properties of CM Fe-Zr thin films were measured using a SQUID magnetometer, VSM and B-H loop tracer. After hydrogenation, the CM films exhibited larger magnetic moment increases than similar homogeneous alloy films for all compositions and かey showed largest increase in $Fe_{80}Zr_{20}$ composition. After aging in air at $300^{\circ}K$ the hydrogenated $Fe_{80}Zr_{20}$ CM films showed much larger magnetic moment increases, indicating that they relax to a stable, irreversible, soft magnetic state. The selective hydrogenation through electron-beam lithographed windows were performed after the circle shaped windows were prepared on $Fe_{80}Zr_{20}$ CM films by electron beam lithography. The hydrogenation through electron-beam resist and W lithographic techniques give a $49\%$ magnetic moment increase. This method can be applied to nano scale structures.

Effect of Electron-Beam Irradiation on Flavor Components in Pear (Pyrus pyrifolia cv. Niitaka) (전자선 조사가 신고배의 향기성분에 미치는 영향)

  • Kim, Won;Shim, Sung-Lye;Ryu, Keun-Young;Jun, Sam-Nyeo;Jung, Chan-Hee;Seo, Hye-Young;Song, Hyun-Pa;Kim, Kyong-Su
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.37 no.2
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    • pp.195-202
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    • 2008
  • This study was performed to examine the effects of electron beam irradiation on volatile flavor components of Shingo pear (Pyrus pyrifolia cv. Niitaka) and on their changes according to storing period following irradiation. Volatile flavor components in pear were extracted using simultaneous steam distillation and extraction (SDE) apparatus and analyzed by GC/MS. 46 components were identified in control whereas 45, 44, 48 and 51 components were identified in irradiated samples by electron beam at 0.25, 0.5, 1, and 3 kGy, respectively. Hexanal, n-hexanol, and (E)-2-hexenal were identified as the major volatile flavor components of all samples. The characteristic volatile flavor components of irradiated pear by electron beam were similar to those of control, and their effects depending on irradiation source were not different. In addition, there was no noticeable change in volatile flavor components of pear with storage at $4^{\circ}C$ for 30 days or with irradiation. Sensory evaluation indicated that the consumer receptiveness tended to be higher at a low level of radiation dose under 1 kGy than control, albeit not significant. Therefore, electron beam irradiation at low level of radiation dose under 1 kGy could be considered as an effective method to exterminate vermin and thus to improve the shelf-stability of pear without deterioration.

Address discharge delay reduction in AC PDP by applying MgO nanoparticle under protective layer

  • Seo, Ki-Ho;Shin, Seung-Ha;Choi, Man-Soo;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.355-358
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    • 2008
  • We report a method for improving characteristics of AC PDP in this study. This improvement is obtained by spreading MgO nanoparticles on transparent dielectric layer. These nanoparticles are covered with MgO protective layer by electron beam evaporation. MgO nanoparticle has difference in cathodoluminescence stronger than MgO layer by electron beam evaporation. This method worked for reducing statistical delay especially. Efficacy, discharge voltage and luminance were also improved But these improvements has limited lifetime because continuous ion bombardments changed characteristic of MgO surface.

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Study on the bainitic microstructure in low carbon HSLA steels (저탄소.저합금 강의 베이나이트 미세 구조 연구)

  • Kang, J.S.;Ahn, S.S.;Yoo, J.Y.;Park, C.G.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.10a
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    • pp.154-157
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    • 2007
  • The austenite phase observed in low carbon HSLA steels is well known to be decomposed to various bainitic microstructures, such as granular bainite, acicular ferrite and bainitic ferrite during continuous cooling process. These bainitic microstructures have been usually identified by using either scanning electron microscope (SEM) or transmission electron microscope (TEM). However, SEM and TEM images do no exactly coincide, because of the quite different sample preparation method in SEM and TEM observations. These conventional analysis method is, thus, not suitable for characterization of the complex bainitic microstructure. In this study, focused ion beam (FIB) technique was applied to make site-specific TEM specimens and to identify the 3-dimensional grain morphologies of the bainitic microstructure. The morphological feature and grain boundary characteristics of each bainitic microstructure were exactly identified.

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Growth and Structural Characterizations of CdSe/GaAs Eppilayers by Electron Beam Evaporation Method

  • Yang, Dong-Ik;Sung-Mun ppark
    • Proceedings of the Korean Vacuum Society Conference
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    • 1995.02a
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    • pp.36-36
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    • 1995
  • The cubic (zinc blende) CdSe eppilayers were grown on GaAs(100) substrates by electron beam (e-beam) evapporation technique. X-ray scans with copper $K\alpha$ radiation indicate that the CdSe eppilayers are zinc blende. The lattice pparameter obtained from the (400) reflection is 6.077$\AA$, which is in excellent agreement with the value repported in the literature for zinc blende CdSe. The orientation of as-grown CdSe eppilayer is determined by electron channeling ppatterns(ECpp). The crystallinity of heteroeppitaxial CdSe layers were investigated based on the double crystal x-ray rocking curve(DCRC). The deppendence of the rocking curve width on layer thickness was studied. The FWHM(full width at half maximum) of CdSe eppilayers grown on GaAs(100) substrates is decreasing with increasing eppilayer thickness. The carrier concentration and mobility of the as-grown eppilayers deduced Hall data by van der ppauw method, are about 7$\times$1017 cm-3 and 2$\times$102 $\textrm{cm}^2$ / sec at room tempperature, resppectively. The energy gapp was determinded from the pphotocurrent sppectrum. In pphotocurrent sppectrum of a 1-${\mu}{\textrm}{m}$-thick CdSe eppilayer at 30K, the ppeak at 1.746 eV is due to the free exciton of cubic CdSe. In summary, We have shown that eppilayers of zinc blende CdSe can be grown on GaAs(100) substrates by e-beam, desppite the large mismatch between eppilayer and substrate, as well as the natural ppreference for CdSe to form in the wurtzite structure.

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