• Title/Summary/Keyword: Electron beam method

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New Fabrication Method of the Electron Beam Microcolumn and Its Performance Evaluation (초소형 전자칼럼의 제작 및 특성 연구)

  • Ahn S;Kim D. W;Kim Y. C;Ahn S. J;Kim Y. J;Kim H. S
    • Korean Journal of Materials Research
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    • v.14 no.3
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    • pp.186-190
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    • 2004
  • An electron beam microcolumn composed of an electron emitter, micro lenses, scan deflector, and focus lenses have been fabricated and tested in the STEM mode. In this paper, we report a technique of precisely aligning the electron lenses by the laser diffraction patterns instead of the conventional alignment method based on aligner and STM. STEM images of a standard Cu-grid were observed using a fabricated microcolumn under both the retarding and accelerating modes.

The Effects of Electron Beam Exposure Time on Transmission Electron Microscopy Imaging of Negatively Stained Biological Samples

  • Kim, Kyumin;Chung, Jeong Min;Lee, Sangmin;Jung, Hyun Suk
    • Applied Microscopy
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    • v.45 no.3
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    • pp.150-154
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    • 2015
  • Negative staining electron microscopy facilitates the visualization of small bio-materials such as proteins; thus, many electron microscopists have used this conventional method to visualize the morphologies and structures of biological materials. To achieve sufficient contrast of the materials, a number of imaging parameters must be considered. Here, we examined the effects of one of the fundamental imaging parameters, electron beam exposure time, on electron densities generated using transmission electron microscopy. A single site of a negatively stained biological sample was illuminated with the electron beam for different times (1, 2, or 4 seconds) and sets of micrographs were collected. Computational image processing demonstrated that longer exposure times provide better electron densities at the molecular level. This report describes technical procedures for testing parameters that allow enhanced evaluations of the densities of electron microscopy images.

Formation of Silicon nanocrystallites by ion beam assisted electron beam deposition

  • Won Chel Choi
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.68-69
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    • 1998
  • Nano-crystalline silicon(nc-Si) thin films were directly depposited by ion beam assisted electron beam depposition (IBAED) method. The visibe luminescence in IBAED sampples were originated from not an oxygen bond but Si nano-crystallites. And we can conclude that the ion beam would be contribute to the suppression of the Si-O bond formation.

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Study about Conversion Efficiency of c-Si Solar Cells Using Low energy(40keV) Electron Beam (40keV 저에너지 전자빔을 이용한 단결정 Si 태양전지의 변환 효율에 관한 연구)

  • Yoon J.P.;Kang B.B.;Park S.J.;Yoon P.H.;Cha I.S.
    • Proceedings of the KIPE Conference
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    • 2003.07b
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    • pp.942-948
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    • 2003
  • This paper about the small electron beam irradiator for solar cell's efficiency. Many things are studied by method to increase conversion efficiency of solar cell. We selected electron beam by method for conversion efficiency of solar cell. Energy bands of this electron beam irradiator is 80keV(max.). And, solar cells that apply in this paper are crystal Si. Average efficiency of solar cell that applies in this experiment is 10$\%$. This system manufactured low energy electron beam irradiator. And, electron beam irradiation to solar cell in vacuum chamber of this irradiator. Irradiation area is 20*20 [mm2] by 40[keV].

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Environmentally-Friendly Pretreatment of Rice Straw by an Electron Beam Irradiation (전자선 조사를 이용한 볏짚의 친환경 전처리 공정)

  • Lee, Byoung-Min;Lee, Jin-Young;Kim, Du-Yeong;Hong, Sung-Kwon;Kang, Phil-Hyun;Jeun, Joon-Pyo
    • KSBB Journal
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    • v.29 no.4
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    • pp.297-302
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    • 2014
  • The autoclaving assisted by an irradiation pretreatment method was developed without toxic chemicals to produce fermentable sugars for their conversion to bioethanol. In the first step, electron beam irradiation (EBI) of rice straw was performed at various doses. The electron beam-irradiated rice straw was then autoclaved with DI water at $120^{\circ}C$ for 1 h. A total sugar yield of 81% was obtained from 300 kGy electron beam-irradiated rice straw after 72 h of enzymatic hydrolysis by Cellulase 1.5L (70 FPU/mL) and Novozyme-188 (40 CbU/mL). Also, the removal of hemicellulose and lignin was 32.0% and 32.5%, respectively. This result indicates that the environmentally-friendly pretreatment method of rice straw by an electron beam irradiation could be applied for bioethanol production in plant.

Design and Analysis of Magnetic Field Control in Electron Lenses for a E-Beam Writer (전자빔 가공기용 자기 렌즈의 자기장 제어구조 설계)

  • 노승국;이찬홍;백영종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.401-404
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    • 2004
  • The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

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GaAs Epilayer Growth on Si(100) Substrates Cleaned by As/Ga Beam and Its RHEED Patterns (As과 Ga 빔 조사에 의해 세척된 Si(100) 기판 위에 GaAs 에피층 성장과 RHEED 패턴)

  • Yim, Kwang-Gug;Kim, Min-Su;Leem, Jae-Young
    • Journal of the Korean institute of surface engineering
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    • v.43 no.4
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    • pp.170-175
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    • 2010
  • The GaAs epitaxial layers were grown on Si(100) substrates by molecular beam epitaxy(MBE) using the two-step method. The Si(100) substrates were cleaned with different surface cleaning method of vacuum heating, As-beam, and Ga-beam at the substrate temperature of $800^{\circ}C$. Growth temperature and thickness of the GaAs epitaxial layer were $800^{\circ}C$ and 1 ${\mu}m$, respectively. The surface structure and epitaxial growth were observed by reflection high-energy electron diffraction(RHEED) and scanning electron microscope(SEM). Just surface structure of the Si(100) substrate cleaned by Ga-beam at $800^{\circ}C$ shows double domain ($2{\times}1$). RHEED patterns of the GaAs epitaxial layers grown on Si(100) substrates with cleaning method of vacuum heating, As-beam, and Ga-beam show spot-like, ($2{\times}4$) with spot, and clear ($2{\times}4$). From SEM, it is found that the GaAs epitaxial layers grown on Si(100) substrates with Ga-beam cleaning has a high quality.

Construction of the Double Shutter Drift tube Apparatus for Electron Swarm Method (전자군방법을 위한 Double Shutter Drift Tube실험장치 구축)

  • Jeon, Byung-Hoon
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1483_1484
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    • 2009
  • The electron collision cross sections for gases have been determined by electron beam and electron swarm method. Especially, measurements by electron swarm method is carried out by using the double shutter drift tube given by T.O.F. and Double shutter method.

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Chemical and Thermal Characterizations of Electron Beam Irradiated Jute Fibers (전자빔 조사된 황마섬유의 화학적 및 열적 특성분석)

  • Ji, Sang Gyu;Cho, Donghwan;Lee, Byung Cheol
    • Journal of Adhesion and Interface
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    • v.11 no.4
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    • pp.162-167
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    • 2010
  • In the present work, the effect of electron beam irradiation on the chemical and thermal characteristics of cellulose-based jute fibers was explored by means of chemical analysis, electron spin resonance analysis, ATR-FTIR spectroscopy, thermogravimetric analysis and thermomechanical analysis. Jute fiber bundles were uniformly irradiated in the range of 2~100 kGy by a continuous method using a conveyor cartin an electron beam tunnel. Electron beam treatment, which is a physical approach to change the surfaces, more or less changed the chemical composition of jute fibers. It was also found that the radicals on the jute fibers can be increasingly formed with increasing electron beam intensity. However, the electron beam irradiation did not change significantly the chemical functional groups existing on the jute fiber surfaces. The electron beam irradiation influenced the thermal stability and thermal shrinkage/expansion behavior and the behavior depended on the electron beam intensity.

Fabrication of carbon nanostructures using electron beam lithography and pyrolysis for biosensing applications (전자빔 리소그래피와 열처리를 이용한 탄소 나노구조물의 제작 및 바이오센싱 응용연구)

  • Lee, Jung-A;Lee, Kwang-Cheol;Park, Se-Il;Lee, Seung-S.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1727-1732
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    • 2008
  • We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

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