• Applied Microscopy
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• 제37권3호
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• pp.199-208
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• 2007

본 장치는 실험자가 레이저 빔과 광학 렌즈를 조정하여 이미지 및 회절도형의 형성, 보강 및 소멸간섭과 같은 파동광학 현상을 이해하도록 제작된 실험 장치이다. 실험장치는 광원으로 쓰이는 레이저빔과 빔의 광축을 정렬하는 광원 부분과 시료대, 대물렌즈, 중간렌즈, 확대렌즈, CCD system, 컴퓨터, 그리고 렌즈를 상하 조절하는 경통부분으로 구성된다. 본 장치를 통해서 다양한 회절격자의 이미지 및 회절도형을 최대 약 44배 확대할 수 있고, 최대 약 5um의 분해능을 가지고 분석할 수 있다. 이 장치는 전자현미경 이용자들이 TEM의 원리를 보다 쉽게 이해하는데 도움을 주리라 기대한다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.395-398
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• 2002

The spherical aberration and optical integer (f) of the electron gun's main lens in color CRT is obtained, using electron beam trajectory. A spherical aberration is obtained from the relation between the object plane and the image of a beam trajectory. To analyze beam profile, 3rd and 1st order coefficient were obtained and used. It is shown that, in practice, they are applied to electron gun design.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.1017-1020
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• 2004

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

• 한국공작기계학회논문집
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• 제16권6호
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• pp.153-158
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• 2007

The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

• Journal of Information Display
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• 제2권1호
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• pp.43-46
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• 2001

To meet the demand of the display market for large, flat, high-resolution screen, the Super Common eXtended field Oval lens (S-CXO) has been developed with resolution improvement of 10% or more compared to a conventional electron gun. A new main lens structure is adopted, to enhance the effectiveness of aperture and the performance. The new main lens can be assembled using an existing assembly system

• 한국공작기계학회논문집
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• 제17권5호
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• pp.52-57
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• 2008

Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lenes and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. Backscattered electron provide an useful signal for composition and local specimen surface inclination. Secondary electron is used far the formation of surface imagination. The steady electron beam probe is very important for the imagination formation and the brightness. In this paper, we show the results of developed elements that create electron beam probe and the measured beam probe in various acceleration voltages by Faraday cup. These data are used to analysis and improve the performance of the system in the development.

• 세라미스트
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• 제22권4호
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• pp.368-380
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• 2019

A ceramic is used as a key material in various fields. Accordingly, the use of scanning electron microscopy is increased for the purpose of evaluating the reliability and defects of advanced ceramic materials. The scanning electron microscope is developed to overcome the limitations of optical microscopy and uses accelerated electrons for imaging. Various signals such as SE, BSE and characteristic X-rays provide useful information about the surface microstructure of specimens and, the content and distribution of chemical components. The development of electron guns, such as FEG, and the improved lens system combined with the advanced in-lens detectors and STEM-in-SEM system have expanded the applications of SEM. Automated SEM-EDS analysis also greatly increases the amount of data, enabling more statistically reliable results. In addition, X-ray CT, XRF, and WDS, which are installed in scanning electron microscope, have transformed SEM a more versatile analytical equipment. The performance and specifications of the scanning electron microscope to evaluate ceramics were reviewed and the selection criteria for SEM analysis were described.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2005년도 춘계학술대회 논문집
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• pp.15-18
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• 2005

We have designed and fabricated a thermal scanning electron microscopy. It includes an electron source, two condenser lenses, one objective lens, a scanning coil and a stigmator coil for focusing in column and also have a secondary electron detector for constructing the image in chamber with a high vacuum condition and control part for operating the SEM. Especially, in order for us to find out the optical characteristics, our attention and studies have been concentrated on the effects of two condenser lenses and one objective lens for high resolution with SEM. Finally, we developed a high resolution thermal scanning electron microscopy.

• 한국정밀공학회지
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• 제25권3호
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• pp.15-22
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• 2008

• 한국전자파학회논문지
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• 제27권9호
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• pp.817-824
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• 2016

본 논문에서는 KSTAR의 ECEI(Electron Cyclotron Emission Imaging) 장치에 사용되는 100 GHz 미니렌즈의 성능을 향상하기 위해 변형된 타원형 렌즈 안테나 설계를 제안하고 있다. 기존 타원형 렌즈 구조의 밑면에 반구형 렌즈를 추가하고, 이 반구형 렌즈의 끝점에 100 GHz CPS 다이폴 안테나를 위치하게 하였다. 기하광학적 설계를 통해 안테나에서 방사된 전자파가 반구형 렌즈의 표면에서 전반사가 일어나도록 함으로써 안테나 패턴이 주빔 방향으로 집속되는 효과를 나타나게 하였다. 이 설계의 유효성은 3차원 EM 시뮬레이터로서 확인하였다. 제안된 반구형렌즈가 추가된 타원형 렌즈의 안테나 이득은 23.8 dB인데, 기존의 타원형 렌즈에 비해 2.2 dB 향상되었으며, 사이드 로브 레벨은 E-plane과 H-plane에서 2.6 dB, 3.4 dB 감소하였음을 확인하였다.