• Title/Summary/Keyword: Electron Cyclotron Resonance

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Visible Photoluminescence from Hydrogenated Amorphous Silicon Substrates by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD로 증착한 a-Si : H/Si으로 부터의 가시 PHotoluminescence)

  • Shim, Cheon-Man;Jung, Dong-Geun;Lee, Ju-Hyeon
    • Korean Journal of Materials Research
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    • v.8 no.4
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    • pp.359-361
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    • 1998

  • Visible photoluminescence(PU was observed from hydrogenated amorphous silicon deposited on silicon(a-Si : H/Si) using electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR- PECVD) with silane ($SiH_{4}$) gas as the reactant source. The PL spectra from a-Si : H/Si were very similar to those from porous silicon. Hydrogen contents of samples annealed under oxygen atmosphere for 2minutes at $500^{\circ}C$ by rapid thermal annealing were reduced to 1~2%, and the samples did not show visible PL, indicating that hydrogen has a very important role in the PL process of a- Si : H/Si. As the thickness of deposited a-Si : H film increased, PL intensity decreased. The visi¬ble PL from a-Si: H deposited on Si by ECR-PECVD with $SiH_{4}$ . is suggested to be from silicon hydrides formed at the interface between the Si substrate and the deposited a-Si : H film during the deposition.

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ECR 플라즈마 반응로의 설계변수 분석

  • Gang, Bong-Gu;Park, Seong-Ho
    • ETRI Journal
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    • v.11 no.2
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    • pp.100-108
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    • 1989

  • 본 연구에서는 초고집적 반도체소자의 제작을 위해 기존 건식 식각장비를 미래의 유명한 식각장비로서 부각될 ECR(Electron Cyclotron Resonance)형 플라즈마 식각기로의 구조 및 성능 개선을 위해 플라즈마 발생실, 이를 둘러싸는 자기장 형성코일, 그리고 공정반응실의 주요한 설계변수를 추출하여 이론적 계산에 의해 최적화함으로써, 차후 prototype ECR 건식 식각장치를 제작하기 위한 기반기술을 구축하였다.

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