• 한국표면공학회지
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• 제37권5호
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• pp.249-252
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• 2004

Effects of HA and TiN coating on the electrochemical characteristics of Ti-6AI-4V alloys for bone plates were investigated using various test methods. Ti-6AI-4V alloys were fabricated by using a vacuum induction furnace and bone plates were made by laser cutting and polishing. HA was made of extracted tooth sintered and then tooth ash was used as HA coating target. The TiN and HA film coating on the surface were carried on using electron-beam physical vapor deposition (EB-PVD) method. The corrosion behaviors of the samples were examined through potentiodynamic method in 0.9% NaCI solutions at $36.5\pm$$1^{\circ}C$ and corrosion surface was observed using SEM and XPS. The surface roughness of TiN coated bone plates was lower than that of tooth ash coated plates. The structure of TiN coated layer showed the columnar structure and tooth ash coated layer showed equiaxed and anisotrophic structure. The corrosion potential of the TiN coated specimen is comparatively high. The active current density of TiN and tooth ash coated alloy showed the range of about $1.0xl0^{-5}$ $A\textrm{cm}^2$, whereas that of the non-coated alloy was$ 1.0xl0^{-4}$ $A\textrm{cm}^2$. The active current densities of HA and TiN coated bone plates were smaller than that of non-coated bone plates in 0.9% NaCl solution. The pitting potential of TiN and HA coated alloy is more drastically increased than that of the non-coated alloy. The pit number and pit size of TiN and HA coated alloy decreased in compared with those of non-coated alloy. For the coated samples, corrosion resistance increased in the order of TiN coated, tooth ash coated, and non-coated alloy.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.115-115
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• 2008

본 논문에서는 최적화된 ECMP 공정을 위하여 I-V 특성 곡선과 CV법을 이용하여 패시베이션 막의 active, passive, transient, trans-passive 영역의 전기화학적 특성을 알아보았으며, Cu막의 표면 형상을 Scanning Electron Microscopy (SEM) 측정과 금속 화학적 조성을 Energy Dispersive Spectroscopy (EDS) 분석을 통해 분석하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.123-123
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• 2008

본 논문에서는 Cu의 ECMP 적용을 위해 $HNO_3$ 전해액의 active, passive, transient, trans-passive 영역을 I-V 특성 곡선을 통해 알아보았고, LSV (Linear sweep voltammetry)와 CV (Cyclic voltammetry)법을 통하여 전기화학적 특성을 비교 분석하였다.

• 공업화학
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• 제10권2호
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• pp.212-217
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• 1999

기체투과 특성을 관찰하기 위해 양극산화에 의해 세공직경의 크기가 서로 다른 상부층과 하부층으로 이루어진 이중기하구조의 다공성 알루미나막을 제조하였다. 양극산화는 황산 전해질 하에서 직류에 의한 정전류법으로 행하였으며, 양질의 막을 얻기 위해 열산화, 화학연마, 전해연마 등의 전처리를 한 후 양극산화를 행하였다. 양극산화에 의한 알루미나 막의 제조에서 세공직경은 전해질의 종류 및 농도, 전해 온도, 전류밀도 등에 의존하는데, 전류밀도를 극도로 낮추어 세공직경이 20 nm 이하인 상부층을 제조하고 전류밀도를 높여서 세공직경이 36 nm인 하부층을 제조하였다. 막의 두께는 전기량에 의해 조절되어 상부층의 두께는 약 $6{\mu}m$이었으며 하부층을 포함하는 막의 총 두께는 약 $80{\sim}90{\mu}m$로 제조되었다. 제조된 막은 가압법에 의한 기체투과 실험을 행하였다. 제조된 막의 기체투과 기구는 Knudsen 흐름을 따르는 것을 확인하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.149-149
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• 2017

Aluminum alloys have poor corrosion resistance compared to the pure aluminum due to the additive elements. Thus, anodizing technology artificially generating thick oxide films are widely applied nowadays in order to improve corrosion resistance. Anodizing is one of the surface modification techniques, which is commercially applicable to a large surface at a low price. However, most studies up to now have focused on its commercialization with hardly any research on the assessment and improvement of the physical characteristics of the anodized films. Therefore, this study aims to select the optimum temperature of sulfuric electrolyte to perform excellent corrosion resistance in the harsh marine environment through electrochemical experiment in the seawater upon generating porous films by variating the temperatures of sulfuric electrolyte. To fabricate uniform porous film of 5083 aluminum alloy, we conducted electro-polishing under the 25 V at $5^{\circ}C$ condition for three minutes using mixed solution of ethanol (95 %) and perchloric (70 %) acid with volume ratio of 4:1. Afterward, the first step surface modification was performed using sulfuric acid as an electrolyte where the electrolyte concentration was maintained at 10 vol.% by using a jacketed beaker. For anode, 5083 aluminum alloy with thickness of 5 mm and size of $2cm{\times}2cm$ was used, while platinum electrode was used for cathode. The distance between the two was maintained at 3 cm. Anodic polarization test was performed at scan rate of 2 mV/s up to +3.0 V vs open circuit potential in natural seawater. Surface morphology was compared using 3D analysis microscope to observe the damage behavior. As a result, the case of surface modification showed a significantly lower corrosion current density than that without modification, indicating excellent corrosion resistance.

• 한국재료학회지
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• 제27권3호
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• pp.137-143
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• 2017

Boron-doped diamond (BDD) electrode has an extremely wide potential window in aqueous and non-aqueous electrolytes, very low and stable background current and high resistance to surface fouling due to weak adsorption. These features endow the BDD electrode with potentially wide electrochemical applications, in such areas as wastewater treatment, electrosynthesis and electrochemical sensors. In this study, the characteristics of the BDD electrode were examined by scanning electron microscopy (SEM) and evaluated by accelerated life test. The effects of manufacturing conditions on the BDD electrode were determined and remedies for negative effects were noted in order to improve the electrode lifetime in wastewater treatment. The lifetime of the BDD electrode was influenced by manufacturing conditions, such as surface roughness, seeding method and rate of introduction of gases into the reaction chamber. The results of this study showed that BDD electrodes manufactured using sanding media of different sizes resulted in the most effective electrode lifetime when the particle size of alumina used was from $75{\sim}106{\mu}m$ (#150). Ultrasonic treatment was found to be more effective than polishing treatment in the test of seeding processes. In addition to this, BDD electrodes manufactured by introducing gases at different rates resulted in the most effective electrode lifetime when the introduced gas had a composition of hydrogen gas 94.5 vol.% carbon source gas 1.6 vol.% and boron source gas 3.9 vol.%.

• Restorative Dentistry and Endodontics
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• 제28권5호
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• pp.363-368
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• 2003

The purpose of this study is to evaluate the effect of additional enamel etching with phosphoric acid on the microleakage of the adhesion of self-etching primer system. Class V cavity($4mm{\times}3mm{\times}1.5mm$) preparations with all margins in enamel were prepared on buccal surface of 42 extracted human upper central incisor teeth. Prepared teeth were randomly divided into 3 groups. Group 1：no additional pretreatment with 37% phosphoric acid (NE). Group 2：additional pretreatment with 37% phosphoric acid for 10 seconds (E10s). Group 3：additional pretreatment with 37% phosphoric acid for 20 seconds (E20s). The adhesives(Clearfil SE $Bond^{\circledR}$, Kuraray, Osaka, Japan) and composite resins(Clearfil $AP-X^{\circledR}$, Osaka, Kuraray, Japan) were applied following the manufacturer's instructions. All the specimens were finished with the polishing disc(3M dental product, St Paul, MN, USA), thermocycled for 500 cycles between $5^{\circ}C$ and $55^{\circ}C$ and resected apical 3-mm root. 0.028 stainless steel wire was inserted apically into the pulp chamber of each tooth and sealed into position with sticky wax. Surrounding tooth surface was covered with a nail varnish 2 times except areas 1mm far from all the margins. After drying for one day, soaked the samples in the distilled water. Microleakage was assessed by electrochemical method(System 6514, $Electrometer^{\circledR}$), Keithley, USA) in the distilled water. In this study, the microleakage was the lowest in group 1 (NE) and the highest in group 3(E20s)(NE

• 공업화학
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• 제8권5호
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• pp.756-762
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• 1997

본 실험에서는 황산용액에서 전기화학적으로 금속 알루미늄판을 양극산화하여 원통형 세공구조를 갖고 있는 alumina막을 형성시켰다. 양극화에 사용된 알루미늄 시료는 전해연마, 화학연마 및 열산화와 같은 전처리 공정을 거쳐서 준비하였으며, 형성된 알루미나막의 세공분포와 두께 등을 SEM과 BET를 사용하여 조사하였다. 그 결과 산화피막이 Keller모델과 같은 기하 구조로 이루어져 있으며. 균일한 세공 분포를 지니고 있음을 볼 수 있었다. 그리고 산화막의 세공크기와 두께는 황산전해질의 농도, 반응온도 그리고 전류밀도와 같은 양극산화 공정변수에 의존함을 알수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.123.1-123.1
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• 2017

Hybrid solar cells have intensively studied in recent years due to their advantages such as cost effectiveness and possibility of applications in flexible and transparent devices. It is critical to fabricate individual layer composed of organic and inorganic materials in the hybrid solar cell at low cost. Therefore, it is required to manufacture cheaply and enhance the photon-to-electricity conversion efficiency of each layer in the flexible solar cell industry. In this research, we fabricated pure Cu metal mesh electrode prepared by using electroplating and/or electroless plating on the Ni mold which was manufacture through photolithography, electroforming, and polishing process. Copper mesh was formed on the surface of nickel metal working master when pulsed electrolytic copper deposition were performed at various plating parameters such as plating time, current density, and so on. After electrodeposition at 2ASD for 5~30seconds, the line/pitch/thickness of copper mesh sheet was $1.8{\sim}2.0/298/0.5{\mu}m$.

• Corrosion Science and Technology
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• 제21권5호
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• pp.360-371
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• 2022

Electropolishing has various parameters because an electrochemical reaction is applied. Accordingly, experiments to determine factors and levels of electropolishing conditions are in progress for various materials. The purpose of this investigation was to optimize conditions for electropolishing using the taguchi method for UNS S31603. Factors such as electrolyte composition ratio, electrolyte temperature, and electropolishing process time were selected. Electropolishing was optimized using analysis of variance (ANOVA), signal-to-noise ratio (the smaller the better characteristics), and surface analysis. Results of ANOVA revealed that only the electrolyte composition ratio among factors was effective for surface roughness. As a result of statistical analysis of the signal-to-noise ratio, the highest signal-to-noise ratio was calculated under electropolishing conditions with sulfuric acid and phosphoric acid ratio of 4:6, an electrolyte temperature of 75 ℃, and electropolishing process time of 7 minutes. In addition, the surface roughness after electropolishing under the above conditions was 0.121 ㎛, which was improved by more than 88% compared to mechanical polishing.