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http://dx.doi.org/10.5395/JKACD.2003.28.5.363

THE EFFECT OF ADDITIONAL ENAMEL ETCHING ON MICROLEAKAGE OF THE ADHESION OF SELF-ETCHING PRIMER SYSTEM  

Yoon, Jung-Jin (Department of Conservative Dentistry, College of Dentistry, Dankook University)
Min, Kyung-San (Department of Conservative Dentistry, College of Dentistry, Dankook University)
Hong, Chan-Ui (Department of Conservative Dentistry, College of Dentistry, Dankook University)
Publication Information
Restorative Dentistry and Endodontics / v.28, no.5, 2003 , pp. 363-368 More about this Journal
Abstract
The purpose of this study is to evaluate the effect of additional enamel etching with phosphoric acid on the microleakage of the adhesion of self-etching primer system. Class V cavity($4mm{\times}3mm{\times}1.5mm$) preparations with all margins in enamel were prepared on buccal surface of 42 extracted human upper central incisor teeth. Prepared teeth were randomly divided into 3 groups. Group 1:no additional pretreatment with 37% phosphoric acid (NE). Group 2:additional pretreatment with 37% phosphoric acid for 10 seconds (E10s). Group 3:additional pretreatment with 37% phosphoric acid for 20 seconds (E20s). The adhesives(Clearfil SE $Bond^{\circledR}$, Kuraray, Osaka, Japan) and composite resins(Clearfil $AP-X^{\circledR}$, Osaka, Kuraray, Japan) were applied following the manufacturer's instructions. All the specimens were finished with the polishing disc(3M dental product, St Paul, MN, USA), thermocycled for 500 cycles between $5^{\circ}C$ and $55^{\circ}C$ and resected apical 3-mm root. 0.028 stainless steel wire was inserted apically into the pulp chamber of each tooth and sealed into position with sticky wax. Surrounding tooth surface was covered with a nail varnish 2 times except areas 1mm far from all the margins. After drying for one day, soaked the samples in the distilled water. Microleakage was assessed by electrochemical method(System 6514, $Electrometer^{\circledR}$), Keithley, USA) in the distilled water. In this study, the microleakage was the lowest in group 1 (NE) and the highest in group 3(E20s)(NE
Keywords
Self etching primer; Microleakage; Electrometer; Phosphoric acid; Electrochemical method; Enamel etching;
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Times Cited By KSCI : 1  (Citation Analysis)
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