Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2008.06a
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- Pages.123-123
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- 2008
Effect of copper surface to $HNO_3$ electrolyte
$HNO_3$ 전해액이 Cu 표면에 미치는 영향
- Park, Sung-Woo (Department of Electrical Engineering, Chosun University) ;
- Han, Sang-Jun (Department of Electrical Engineering, Chosun University) ;
- Lee, Young-Kyun (Department of Electrical Engineering, Chosun University) ;
- Lee, Woo-Sun (Department of Electrical Engineering, Chosun University) ;
- Seo, Yong-Jin (Department of Electrical Engineering, Daebul University)
- Published : 2008.06.19
Abstract
본 논문에서는 Cu의 ECMP 적용을 위해
Keywords
- Electrochemical Mechanical Polishing (ECMP);
- $HNO_3$;
- Linear sweep voltammetry (LSV);
- Cyclic voltammety (CV)