• 제목/요약/키워드: Electrical/Optical Properties

검색결과 2,237건 처리시간 0.034초

Influence of ZnO Thickness on the Optical and Electrical Properties of GZO/ZnO Bi-layered Films

  • Kim, Sun-Kyung;Kim, So-Young;Kim, Seung-Hong;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Daeil;Yoon, Dae Young;Choi, Dong Yong
    • Transactions on Electrical and Electronic Materials
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    • 제15권4호
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    • pp.198-200
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    • 2014
  • 100 nm thick Ga doped ZnO (GZO) thin films were deposited with RF magnetron sputtering on polyethylene terephthalate (PET) and ZnO coated PET substrate and then the effect of the ZnO thickness on the optical and electrical properties of the GZO films was investigated. GZO single layer films had an optical transmittance of 83.7% in the visible wavelength region and a sheet resistance of $2.41{\Omega}/{\square}$, while the optical and electrical properties of the GZO/ZnO bi-layered films were influenced by the thickness of the ZnO buffer layer. GZO films with a 20 nm thick ZnO buffer layer showed a lower sheet resistance of $1.45{\Omega}/{\square}$ and an optical transmittance of 85.9%. As the thickness of ZnO buffer layer in GZO/ZnO bi-layered films increased, both the conductivity and optical transmittance in the visible wavelength region were increased. Based on the figure of merit (FOM), it can be concluded that the ZnO buffer layer effectively increases the optical and electrical performance of GZO films as a transparent and conducting electrode without intentional substrate heating or a post deposition annealing process.

Ga$_2$O$_3$ 첨가에 따른 SiO$_2$-PbO-K$_2$O-Al$_2$O$_3$계 적외선 센서용 Glass fiber의 광학적 특성 (Optical properties of the glass fiber by adding Ga$_2$O$_3$ in the SiO$_2$-PbO-K$_2$O-Al$_2$O$_3$ system for Infrared sensor)

  • 윤상하;강월호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1996년도 춘계학술대회 논문집
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    • pp.68-71
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    • 1996
  • In the study, the thermal and optical properties of SiO$_2$-PbO-K$_2$O-Al$_2$O$_3$ g1asses were investigated. According to Ga$_2$O$_3$ addictions, the properties of bulk glass, transition temperature and softening temperature were increased, whereas thermal expansion coefficient was decreased; In the optical properties, refractive index was increased, and IR cut-off wavelength was enlarged from 4.64$\mu\textrm{m}$ to 5.22$\mu\textrm{m}$. But, the optical loss of fiber was decreased.

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Electro-optical Properties of Twisted Nematic Liquid Crystal Displays Fabricated with TIPS-pentacene Doping

  • Lee, Jin-Woo
    • Transactions on Electrical and Electronic Materials
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    • 제14권2호
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    • pp.82-85
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    • 2013
  • This paper introduces 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS pentacene) doped liquid crystal (LC) alignment properties on a rubbed polyimide (PI) layer as a function of the doping concentration of TIPS pentacene. Pretilt angles, photomicrographs, and electro-optical properties of TIPS pentacene doped LCs were comparable to those of pure LCs. However, TIPS pentacene in a LC medium supported twisted nematic-liquid crystal displays (TN-LCDs) to improve electro-optical properties. The threshold voltages observed in the TN cells decreased as the TIPS pentacene concentration increased. In addition, suitable response times were observed in TN cells.

Changes in Electrical and Optical Properties and Chemical States of the Amorphous In-Ga-Zn-O Thin Films Depending on Growth Temperature

  • Yoo, Han-Byeol;Thakur, Anup;Kang, Se-Jun;Baik, Jae-Yoon;Lee, Ik-Jae;Park, Jae-Hun;Kim, Ki-Jeong;Kim, Bong-Soo;Shin, Hyun-Joon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.346-346
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    • 2012
  • We investigated electrical and optical properties and chemical states of amorphous In-Ga-Zn-O (a-IGZO) thin films deposited at different substrate temperatures (from room temperature to $300^{\circ}C$). a-IGZO thin films were fabricated by radio frequency magnetron sputtering using $In_2O_3$ : $Ga_2O_3$ : ZnO = 1 : 1 : 1 target, and their electrical and optical properties and chemical states were investigated by Hall-measurement, UV-visible spectroscopy and x-ray photoelectron spectroscopy (XPS), respectively. The data showed that as substrate temperature increased, carrier concentration increased, but mobility, conductivity, transmittance in the shorter wavelength region (>350 nm), and the Tauc-plot-estimated optical bandgap decreased. XPS data indicated that the intensity of In 3d peak compared to Ga 3d peak increased but the intensity of Zn 3d peak compared to Ga 3d decreased, and that, from the deconvoluted O 1s peak, defects or oxygen vacancies and non-quaternary contents increased as the temperature increased. The relative intensity changes of the In, Zn, and O 1s sub-component are suggested to explain the changes in electrical and optical properties.

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라디오파 마그네트론 스퍼터링으로 성장한 질소와 알루미늄 도핑된 ZnO 박막의 특성 (Properties of Nitrogen and Aluminum Codoped ZnO Thin Films Grown by Radio-frequency Magnetron Sputtering)

  • 조신호;조선욱
    • 한국표면공학회지
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    • 제41권4호
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    • pp.129-133
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    • 2008
  • Nitrogen and aluminum codoped ZnO(NAZO) thin films were grown on glass substrates with changing the nitrogen flow ratio by radio-frequency magnetron sputtering. The structural, optical, and electrical properties of the NAZO films were investigated. The surface morphologies and the structural properties of the thin films were analyzed by using the X-ray diffraction and scanning electron microscopy. The NAZO thin film, deposited at nitrogen flow ratio of 0%, showed a strongly c-axis preferred orientation and the lowest resistivity of $3.2{\times}10^{-3}{\Omega}cm$. The intensity of ZnO(002) diffraction peak was decreased gradually with increasing the nitrogen flow ratio. The optical properties of the films were measured by UV-VIS spectrophotometer and the optical transmittances for all the samples were found to be an average 90% in the visible range. Based on the transmittance value, the optical bandgap energy for the NAZO thin film deposited at nitrogen flow ratio of 0% was determined to be 3.46 eV. As for the electrical properties, the carrier concentration and the hall mobility were decreased, but the electrical resistivity was increased as the nitrogen flow ratio was increased.

Atomic Layer Deposition법에 의한 Al-doped ZnO Films의 전기적 및 광학적 특성 (Electrical and Optical Properties of Al-doped ZnO Films Deposited by Atomic Layer Deposition)

  • 안하림;백성호;박일규;안효진
    • 한국재료학회지
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    • 제23권8호
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    • pp.469-475
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    • 2013
  • Al-doped ZnO(AZO) thin films were synthesized using atomid layer deposition(ALD), which acurately controlled the uniform film thickness of the AZO thin films. To investigate the electrical and optical properites of the AZO thin films, AZO films using ALD was controlled to be three different thicknesses (50 nm, 100 nm, and 150 nm). The structural, chemical, electrical, and optical properties of the AZO thin films were analyzed by X-ray diffraction, X-ray photoelectron spectroscopy, field-emssion scanning electron microscopy, atomic force microscopy, Hall measurement system, and UV-Vis spectrophotometry. As the thickness of the AZO thin films increased, the crystallinity of the AZO thin films gradually increased, and the surface morphology of the AZO thin films were transformed from a porous structure to a dense structure. The average surface roughnesses of the samples using atomic force microscopy were ~3.01 nm, ~2.89 nm, and ~2.44 nm, respectively. As the thickness of the AZO filmsincreased, the surface roughness decreased gradually. These results affect the electrical and optical properties of AZO thin films. Therefore, the thickest AZO thin films with 150 nm exhibited excellent resistivity (${\sim}7.00{\times}10^{-4}{\Omega}{\cdot}cm$), high transmittance (~83.2 %), and the best FOM ($5.71{\times}10^{-3}{\Omega}^{-1}$). AZO thin films fabricated using ALD may be used as a promising cadidate of TCO materials for optoelectronic applications.

MgO 또는 ZnO를 첨가한 $LiNbO_3$단결정 성장 및 특성 : (II) 전기적 및 광학적 특성 (Single crystals growth and properties of $LiNbO_3$ doped with MgO or ZnO : (II) The electrical and optical properties)

  • 조현;심광보;오근호
    • 한국결정성장학회지
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    • 제6권4호
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    • pp.532-542
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    • 1996
  • Floating zone(FZ)법으로 육성하고 annealing한 undoped $LiNbO_3$ 단결정 및 MgO 또는 ZnO를 첨가한 $LiNbO_3$ 단결정의 전기적,광학적 특성을 조사하였다. 전기전도도, 유전율 및 전이온도, 전기.기계결합계수등의 전기적 특성과 광투과율, 굴절율 등의 광학적 특성을 측정하였으며, 비선형 광학특성의 척도라 할 수 있는 비선형 굴절율을 이론적으로 계산하였다. Undoped $LiNbO_3$ 단결정과 MgO 또는 ZnO를 첨가한 $LiNbO_3$ 단결정의 전기적, 광학적 특성을 비교함으로서 MgO 또는 ZnO의 첨가가 $LiNbO_3$ 단결정의 전기적 및 광학적 특성에 미치는 영향을 조사하였다.

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Controllability of Structural, Optical and Electrical Properties of Ga doped ZnO Nanowires Synthesized by Physical Vapor Deposition

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제14권3호
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    • pp.148-151
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    • 2013
  • The control of Ga doping in ZnO nanowires (NWs) by physical vapor deposition has been implemented and characterized. Various Ga-doped ZnO NWs were grown using the vapor-liquid-solid (VLS) method, with Au catalyst on c-plane sapphire substrate by hot-walled pulsed laser deposition (HW-PLD), one of the physical vapor deposition methods. The structural, optical and electrical properties of Ga-doped ZnO NWs have been systematically analyzed, by changing Ga concentration in ZnO NWs. We observed stacking faults and different crystalline directions caused by increasing Ga concentration in ZnO NWs, using SEM and HR-TEM. A $D^0X$ peak in the PL spectra of Ga doped ZnO NWs that is sharper than that of pure ZnO NWs has been clearly observed, which indicated the substitution of Ga for Zn. The electrical properties of controlled Ga-doped ZnO NWs have been measured, and show that the conductance of ZnO NWs increased up to 3 wt% Ga doping. However, the conductance of 5 wt% Ga doped ZnO NWs decreased, because the mean free path was decreased, according to the increase of carrier concentration. This control of the structural, optical and electrical properties of ZnO NWs by doping, could provide the possibility of the fabrication of various nanowire based electronic devices, such as nano-FETs, nano-inverters, nano-logic circuits and customized nano-sensors.

수직 Bridgman법에 의한 InSe 단결정의 성장 및 Sn 도핑에 따른 전기.광학적 특성에 관한 연구 (A study on the growth and electrical-optical characteristics of undoped-InSe and Sn-doped Inse single crystals by vertical bridgman method)

  • 정희준;송필근;문동찬;김선태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.481-484
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    • 1999
  • The undoped-InSe and Sn-doped InSe single crystals were grown by vertical Bridgman method and their properties were invesigated. These crystals were obtained by lowering the quartz ampoule for growth in the furnace and growth rate at optimum condition is 0.4mm/hr. The orientations and the crystallinites of these crystals were identified by X-ray diffraction(XRD), double crystal rocking curve(DCRC) and etch-pit density(EPD) measurements. From the Raman spectrum at room temperature, TO, LO modes together with their overtones and combinations were observed. Optical properties were investigated by photoluminescence at 12K and direct band gap of these crystals obtained from optical absorption spectrum. Compared with undoped-lnSe, electrical properties of Sn-doped InSe were increased and the electrical conductivity type were n-type. But electrical properties along growth direction of crystals and radial direction of wafer showed nearly uniform distribution.

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A Study of Optical Properties of Assembled Plasma Display Panel with 3-D Optical Code

  • Park, Hyun-Myung;Kang, Jungwon
    • 반도체디스플레이기술학회지
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    • 제11권1호
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    • pp.67-71
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    • 2012
  • The optical properties of PDP, such as the transmittance and reflectance, were analyzed with 3D optical code. Three different ITO-less structures in the front panel are examined. In the assembled panel study, the test 1 structure shows 16.6% and 10.2% higher reflectance than the structures of tests 2 and 3, respectively. In order to check the validation of the simulation result, three 7.5-inch test panels having the same geometry and property are fabricated as simulation models. The calculated reflective properties are compared to the measured data from real panels. The relative difference extracted from the simulation and measurement methods is less than 4.9% and are well matched.