Electrical Properties of $TiO_2$ and $Al_2O_3/TiO_2$ Thin Films Deposited by E-beam Evapration
(전자빔 증착법에 의한 $TiO_2$ 박막 및 $Al_2O_3/TiO_2$ 박막의 전기적 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2004.04b
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- pp.5-8
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- 2004