• Journal of information and communication convergence engineering
• /
• 제13권4호
• /
• pp.280-285
• /
• 2015

Double random phase encryption (DRPE) is one of the well-known optical encryption techniques, and many techniques with DRPE have been developed for information security. However, most of these techniques may not solve the fundamental security problem caused by using fixed phase masks for DRPE. Therefore, in this paper, we propose a key phase mask updating scheme for DRPE to improve its security, where a spatial light modulator (SLM) is used to implement key phase mask updating. In the proposed scheme, updated key data are obtained by using previous image data and the first phase mask used in encryption. The SLM with the updated key is used as the second phase mask for encryption. We provide a detailed description of the method of encryption and decryption for a DRPE system using the proposed key updating scheme, and simulation results are also shown to verify that the proposed key updating scheme can enhance the security of the original DRPE.

• 한국멀티미디어학회논문지
• /
• 제19권6호
• /
• pp.1043-1051
• /
• 2016

In this paper, double encryption technique of binary image using random phase mask and 2-step phase-shifting digital holography is proposed. After phase modulating of binary image, firstly, random phase mask to be used as key image is generated through the XOR operation with the binary phase image. And the first encrypted image is encrypted again through the fresnel transform and 2-step phase-shifting digital holography. In the decryption, simple arithmetic operation and inverse Fresnel transform are used to get the first decryption image, and second decryption image is generated through XOR operation between first decryption image and key image. Finally, the original binary image is recovered through phase modulation.

• Journal of Information Display
• /
• 제13권2호
• /
• pp.61-66
• /
• 2012

The double-layered Ti/Si barrier metal is demonstrated for the source/drain Cu interconnections in oxide semiconductor thin-film transistors (TFTs). The transmission electromicroscopy and ion mass spectroscopy analyses revealed that the double-layered barrier structure suppresses the interfacial reaction and the interdiffusion at the interface after thermal annealing at $350^{\circ}C$. The underlying Si layer was found to be very useful for the etch stopper during wet etching for the Cu/Ti layers. The oxide TFTs with a double-layered Ti/Si barrier metal possess excellent TFT characteristics. It is concluded that the present barrier structure facilitates the back-channel-etch-type TFT process in the mass production line, where the four- or five-mask process is used.

• 한국광학회지
• /
• 제13권1호
• /
• pp.79-83
• /
• 2002

회전항을 첨가한 임의 위상판(random phase mask; RPM)을 이용하여 광학상 암호화 장치의 암호화수준을 향상시키는 방법을 제시하였다. 이중 임의 위상판으로 암호화된 광학상은 광굴절 LiNbO$_3$:Fe 결정에 기록되고 위상공액파를 이용하여 재생하였으며, 세기변조 함수를 이용하여 아날로그 입력상에 대한 암호화 수준을 분석하였다.

• 한국정보통신학회논문지
• /
• 제17권2호
• /
• pp.461-466
• /
• 2013

사회가 고도의 디지털 정보화 시대로 발전함에 따라 영상복원 등 디지털 영상처리 기술분야에 관한 많은 연구가 진행되고 있다. 임펄스 잡음에 훼손된 영상을 복원하는데 대표적인 방법은 SM(Standard Median) 필터가 있지만, SM 필터는 에지영역에서 오류를 나타내어 영상의 품질을 저하시킨다. 본 논문에서는 임펄스 잡음환경에서 훼손된 영상을 복원하기 위해 화소를 중심으로 하여 이중 마스크를 취하는 변형된 메디안 필터 알고리즘을 제안하였다. 이중 마스크를 취함에 따라 제안한 방법은 우수한 잡음제거 및 에지보존 특성을 나타내었고 영상의 화질을 개선하였다.

• JSTS:Journal of Semiconductor Technology and Science
• /
• 제10권2호
• /
• pp.134-142
• /
• 2010

A comparative study on the trade-off between the drive current and the total gate capacitance in double-gate (DG) and triple-gate (TG) FinFETs is performed by using 3-D device simulation. As the first result, we found that the optimum ratio of the hardmask oxide thickness ($T_{mask}$) to the sidewall oxide thickness ($T_{ox}$) is $T_{mask}/T_{ox}$=10/2 nm for the minimum logic delay ($\tau$) while $T_{mask}/T_{ox}$=5/1~2 nm for the maximum intrinsic gate capacitance coupling ratio (ICR) with the fixed channel length ($L_G$) and the fin width ($W_{fin}$) under the short channel effect criterion. It means that the TG FinFET is not under the optimal condition in terms of the circuit performance. Second, under optimized $T_{mask}/T_{ox}$, the propagation delay ($\tau$) decreases with the increasing fin height $H_{fin}$. It means that the FinFET-based logic circuit operation goes into the drive current-dominant regime rather than the input gate load capacitance-dominant regime as $H_{fin}$ increases. In the end, the sensitivity of $\Delta\tau/{\Delta}H_{fin}$ or ${{\Delta}I_{ON}}'/{\Delta}H_{fin}$ decreases as $L_G/W_{fin}$ is scaled-down. However, $W_{fin}$ should be carefully designed especially in circuits that are strongly influenced by the self-capacitance or a physical layout because the scaling of $W_{fin}$ is followed by the increase of the self-capacitance portion in the total load capacitance.

• Journal of Mechanical Science and Technology
• /
• 제20권9호
• /
• pp.1361-1370
• /
• 2006

An electronic beam mis-landing phenomenon on the RGB (red/green/blue) -fluorescent surface has been considered as one of serious problems to be solved in cathode-ray tube (CRT), which is generally caused by mechanical shock and vibration. In this work, structural design concepts on the major parts of the CRT, such as a frame, a shadow mask, and a spring, are studied to improve the mechanical shockproof character of a CRT by FEM-analyses and experimental approaches ; a frame is newly designed to have strength employing the double-corner-beads which reduces considerably the distortion of the frame and the shadow mask : the edge-bead of a shadow-mask is redesigned to maintain the wide curved surface of a shadow-mask after mechanical shock : finally, a spring supporting the frame and the shadow-mask is designed to have enough flexibility along drop-direction. As an example, a conventional type of a 15inch CRT was utilized to demonstrate the feasibility and usefulness of this work. Overall, some favorable information on the structural design of the CRT is achieved, and the mechanical shockproof character of a 15-inch CRT is improved in the degree of 3G $(1G=9.81m/s^2)$ as an average-value.

• 한국정밀공학회지
• /
• 제17권8호
• /
• pp.100-105
• /
• 2000

In this study the structural design concepts of main parameters of a Cathode Ray Tube(CRT) such as frame spring and shadow mask were proposed to guarantee a failure-proof CRT under mechanical shock. With computer simulation and experiments some information on the structural design concept was obtained as followings: the frame and the shadow mask of the CRT needed designing to increase strength so double-beads shape at the corner of frame was newly designed for it, And the spring which interconnected frame with panel glass was required to deform elastically for the purpose of absorbing the shock energy in the direction of drop. A new type of spring 'twisting spring' was designed to achieve the flexibility in that direction. By using it the deformation energy of a shadow mask could reduced to some degree. To accomplish those simulations commerical codes Pam-Crash and I-DEAS were used and a typical CRT was analyzed as an example to prove the usefulness of this study.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
• /
• pp.189-189
• /
• 2015

Plasmonics, sensor, field effect transistors, solar cells 등 다양한 적용분야를 가지는 실리콘 구조체는 제작공정에 의해 전기적 및 광학적 특성이 달라지기 때문에 적합한 나노구조 제작방법이 요구되고 있다. 나노구조체 제작방법으로는 Photo lithography, Extreme ultraviolet lithography (EUV), Nano imprinting lithography (NIL), Block copolymer (BCP) 방식의 방법들이 연구되고 있으며, 특히 BCP는 direct self-assembly 특성을 가지고 있으며 가격적인 면에서도 큰 장점을 가진다. 하지만 BCP를 mask로 사용하여 식각공정을 진행할 경우 BCP가 버티지 못하고 변형되어 mask로서의 역할을 하지 못한다. 이러한 문제를 해결하기 위하여 본 논문에서는 BCP와 질화막을 이용한 double mask 방법을 사용하였다. 기판 위에 BCP를 self-assembly 시키고 mask로 사용하여 hole 부분으로 노출된 기판을 Ion gun을 통해 질화 시킨 후에 BCP를 제거한다. 기판 위에 hole 모양의 질화막 표면은 BCP와 다르게 etching 공정 중 변형되지 않는다. 이러한 질화막 표면을 mask로 사용하여 pillar pattern의 실리콘 나노구조체를 제작하였다. 질화막 mask로 사용되는 template은 PS와 PMMA로 구성된 BCP를 사용하였다. 140kg/mol의 polystyrene과 65kg/mol의 PMMA를 톨루엔으로 용해시키고 실리콘 표면 위에 spin coating으로 도포하였다. Spin coat 후 230도에서 40시간 동안 열처리를 진행하여 40nm의 직경을 가진 PS-b-PMMA self-assembled hole morphology를 형성하였다. 질화막 형성 및 etching을 위한 장비로 low-energy Ion beam system을 사용하였다. Reactive Ion beam은 ICP와 3-grid system으로 구성된 Ion gun으로부터 형성된다. Ion gun에 13.56 MHz의 frequency를 갖는 200W 전력을 인가하였다. Plasma로부터 나오는 Ion은 $2{\Phi}$의 직경의 hole을 가지는 3-grid hole로 추출된다. 10~70 voltage 범위의 전위를 plasma source 바로 아래의 1st gird에 인가하고, 플럭스 조절을 위해 -150V의 전위를 2nd grid에 인가한다. 그리고 3rd grid는 접지를 시켰다. chamber내의 질화 및 식각가스 공급은 2mTorr로 유지시켰다. 그리고 기판의 온도는 냉각칠러를 이용하여 -20도로 냉각을 진행하였다. 이와 같은 공정 결과로 100 nm 이상의 높이를 갖는 40 nm직경의 균일한 Silicon pillar pattern을 형성 할 수 있었다.

• Journal of Preventive Medicine and Public Health
• /
• 제54권1호
• /
• pp.31-36
• /
• 2021

Objectives: Non-traditional materials are used for mask construction to address personal protective equipment shortages during the coronavirus disease 2019 (COVID-19) pandemic. Reusable masks made from surgical sterilization wrap represent such an innovative approach with social media frequently referring to them as "N95 alternatives." This material was tested for particle filtration efficiency and breathability to clarify what role they might have in infection prevention and control. Methods: A heavyweight, double layer sterilization wrap was tested when new and after 2, 4, 6, and 10 autoclave sterilizing cycles and compared with an approved N95 respirator and a surgical mask via testing procedures using a sodium chloride aerosol for N95 efficiency testing similar to 42 CFR 84.181. Pressure testing to indicate breathability was also conducted. Results: The particle filtration efficiency for the sterilization wrap ranged between 58% to 66%, with similar performance when new and after sterilizing cycles. The N95 respirator and surgical mask performed at 95% and 68% respectively. Pressure drops for the sterilization wrap, N95 and surgical mask were 10.4 mmH2O, 5.9 mmH2O, and 5.1 mmH2O, respectively, well below the National Institute for Occupational Safety and Health limits of 35 mmH2O during initial inhalation and 25 mmH2O during initial exhalation. Conclusions: The sterilization wrap's particle filtration efficiency is much lower than a N95 respirator, but falls within the range of a surgical mask, with acceptable breathability. Performance testing of non-traditional mask materials is crucial to determine potential protection efficacy and for correcting misinterpretation propagated through popular media.