• Title/Summary/Keyword: Doping Distribution

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Varistor Application of Cr-doped ZnO-Sb2O3 Ceramics (Cr을 첨가한 ZnO-Sb2O3 세라믹스의 바리스터 응용)

  • Hong, Youn-Woo;Shin, Hyo-Soon;Yeo, Dong-Hun;Kim, Jin-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.11
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    • pp.854-858
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    • 2010
  • In this study, we have investigated the effects of Cr dopant on the sintering and electrical properties of ZnO-$Sb_2O_3$ (ZS) ceramics for varistor application. Spinel phases including $\alpha-$ and $\beta$-type was formed at ZS system and $\alpha$-spinel was stabilized by Cr doping in ZS system. Densification of ZS and ZSCr system was retarded to $1000^{\circ}C$ by the formation of spinel at $800^{\circ}C$. The morphology and its distribution of spinel phases in ZS system was homogeneous but disturbed by Cr doping. In ZSCr the densification of ZnO compared with ZS system was more retarded by low concentration of Zn interstitial defects induced by Cr doping in addition to the effect of spinel phase formation. The defects in each system were identified as attractive coulombic center (ZS: 0.13 eV, ZSCr: 0.12 eV) and singly charged oxygen vacancy $V_0^{\cdot}$ (ZSCr: 0.33 eV). In all ZS and ZSCr system have week varistor behavior by the formation of double Schottky barrier at grain boundary but its stability of barrier was very sensitive to sintering temperature.

RADIAL UNIFORMITY OF NEUTRON IRRADIATION IN SILICON INGOTS FOR NEUTRON TRANSMUTATION DOPING AT HANARO

  • KIM MYONG-SEOP;LEE CHOONG-SUNG;OH SOO-YOUL;HWANG SUNG-YUL;JUN BYUNG-JIN
    • Nuclear Engineering and Technology
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    • v.38 no.1
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    • pp.93-98
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    • 2006
  • The radial uniformity of neutron irradiation in silicon ingots for neutron transmutation doping (NTD) at HANARO is examined by both calculations and measurements. HANARO has two NTD holes named NTD1 and NTD2. We have been using the NTD2 hole for 5 in. NTD commercial service, and we intend to use two holes for 6 in. NTD. The objective of this study is to predict the radial uniformity of 6 in. NTD at the two holes. The radial neutron flux distributions inside single crystal and noncrystal silicon loaded at the NTD2 hole are calculated by the VENTURE code. For NTD1, the radial distributions of the reaction rate for a 6 in. NTD with a neutron screen are calculated by MCNP, and measured by gold wire activation. The results of the measurements are compared with those of the calculations. From the VENTURE calculation, it is confirmed that the neutron flux distribution in the single crystal silicon is much flatter than that in the non-crystal silicon. The non-uniformities of the measurements for radial neutron irradiation are slightly larger than those of the calculations. However, excluding local dips in the measurements, the overall trends of the distributions are similar. The radial resistivity gradient (RRG) for a 5 in. silicon ingot is estimated to be about $1.5\%$. For a 6 in. ingot, the RRG of a silicon ingot irradiated at HANARO is predicted to be about $2.1\%$. Also, from the experimental results, we expect that the RRG would not be larger than $4.4\%$.

Breakdown Voltage for Doping Concentration of Sub-10 nm Double Gate MOSFET (10 nm 이하 DGMOSFET의 도핑농도에 따른 항복전압)

  • Jung, Hakkee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2017.05a
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    • pp.688-690
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    • 2017
  • Reduction of breakdown voltage is serious short channel effect (SCE) by shrink of channel length. The SCE occurred in on-state transistor raises limitation of operation range of transistor. The deviation of breakdown voltage for doping concentration is investigated with structural parameters of sub-10 nm double gate (DG) MOSFET in this paper. To analyze this, thermionic and tunneling current are derived from analytical potential distribution, and breakdown voltage is defined as drain voltage when the sum of two currents is $10{\mu}A$. As a result, breakdown voltage increases with increase of doping concentration. Breakdown voltage decreases by reduction of channel length. In order to solve this problem, it is found that silicon and oxide thicknesses should be kept very small. In particular, as contributions of tunneling current increases, breakdown voltage increases.

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Absorption, Distribution, Metabolism, and Excretion of CKD-732, a Novel Antiangiogenic Fumagillin Derivative, in Rats, Mice, and Dogs

  • Lee, Ho-Sup;Park, Won-Kyu;Son, Hoe-Joo;Lee, Sung-Sook;Kim, Joon-Kyum;Ahn, Soon-Kil;Hong, Chung-Il;Min, Hye-Ki;Kim, Myung-Soo;Myung, Seung-Woon
    • Archives of Pharmacal Research
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    • v.27 no.2
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    • pp.265-272
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    • 2004
  • The pharmacokinetics of CKD-732 (6-0-4-[dimethyl-aminoethoxy)cinnamoyl]-fumagillolㆍhemioxalate) was investigated in male SD rats and beagle dogs after bolus intravenous administration. The parent compound and metabolites obtained from in vitro and in vivo samples were determined by LC/MS. The main metabolite was isolated and identified as an N-oxide form of CKD-732 by NMR and LC/MS/MS. CKD-732 was metabolized into either M11 or others by rapid hydroxylation, demethylation, and hydrolysis. The blood level following the intravenous route declined in first-order kinetics with $T_{1}$2/$\beta$ values of 0.72-0.78 h for CKD-732 and 0.92-1.09 h for M11 in rats at a dose of 7.5-30 mg/kg. In dogs, $T_{1}$2/$\beta$ values of CKD-732 and M11 were 1.54 and 1.79 h, respectively. Moreover, AUC values increased dose dependently for CKD-732 and M11 in rats and dogs. The CLtot and Vdss did not change significantly with increasing dose, indicating linear pharmacokinetic patterns. The excretion patterns through the urine, bile, and feces were also examined in the animals. The total amount excreted in urine, bile, and feces was 2.13% for CKD-732 and 1.29% for M11 in rats, and 1.58% for CKD-732 and 2.28% for M11 in dogs.

Tc and Jc distribution in in situ processed MgB2 bulk superconductors with/without C doping

  • Kim, C.J.;Kim, Y.J.;Lim, C.Y.;Jun, B.H.;Park, S.D.;Choo, K.N.
    • Progress in Superconductivity and Cryogenics
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    • v.16 no.2
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    • pp.36-41
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    • 2014
  • Temperature dependence of magnetic moment (m-T) and the magnetization (M-H) at 5 K and 20 K of the in situ processed $MgB_2$ bulk pellets with/without carbon (C) doping were examined. The superconducting critical temperature ($T_c$), the superconducting transition width (${\delta}T$) and the critical current density ($J_c$) were estimated for ten test samples taken from the $MgB_2$ bulk pellets. The reliable m-T characteristics associated with the uniform $MgB_2$ formation were obtained for both $MgB_2$ pellets. The $T_cs$ and ${\delta}Ts$ of all test samples of the undoped $MgB_2$ were the same each other as 37.5 K and 1.5 K, respectively. The $T_cs$ and ${\delta}Ts$ of the C-doped $MgB_2$ were 36.5 K and 2.5 K, respectively. Unlike the m-T characteristics, there existed the difference among the M-H curves of the test samples, which might be caused by the microstructure variation. In spite of the slight $T_c$ decrease, the C doping was effective in enhancing the $J_c$ at 5 K.

Optical Properties of $Sb_2S_3$ and Ag Doped $Sb_2S_3$ Thin Films ($Sb_2S_3$ 박막과 Ag 도핑한 $Sb_2S_3$ 박막의 광학적인 특성)

  • Kim, Jong-Ki;Park, Jung-Il;Lee, Hyun-Yong;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1959-1961
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    • 1999
  • We prepared the $Ag[100\AA])/Sb_2S_3[3000\AA]$ films using the thermal evaporator. The films were exposed by the blue-pass filtered mercury lamp and the polarized He-Ne laser. We have investigated the dependence of the induced optical energy with Ag-doping and have observed the transmittance variation near the optical absorption edge with the light source. It was shown that the energy gap of this thin film was largely changed by exposing He-Ne laser, the light source of the near energy gap of this thin film. It is because of the structural change from Ag-doping. It is investigated that the dissolution, the diffusion, and the field effect of the Ag thin film generate the Ag spatial distribution.

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Characteristic Analyses of Residual Particles Generated in Amorphous Carbon Layer Deposition (Amorphous carbon layer 증착 중 발생하는 입자의 증착 조건별 특성 분석)

  • Kim, Dong-Bin;Jeong, Won-Jun;Mun, Ji-Hun;Park, Hye-Ji;Sin, Jae-Su;Kim, Tae-Wan;Kim, Tae-Seong;Gang, Sang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.118.2-118.2
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    • 2016
  • 3D NAND 제조에 있어 high-aspect-ratio etch 공정을 견뎌낼 수 있는 hardmask 소재로서 amorphous carbon layer (ACL) 가 각광받고 있으며 hardmask로서의 특성을 향상시키기 위해 다양한 연구가 진행중에 있다 [1]. 본 연구팀의 기존 연구에서 질소 및 붕소 doping 된 ACL 박막의 etch rate 및 Raman 분석을 통해 박막 특성을 확인한 바 있었으나, 공정 중 arcing이 일어나는 등 의도치 않은 문제로 인해 공정 최적화에 일부 문제가 존재하였다. 본 연구에서는 plasma enhanced chemical vapor deposition (PECVD) 공정을 통해 C6H12 기체 및 doping을 위한 NH3 와 B2H6 두 기체를 이용하여 특성 개선된 ACL을 증착하는 과정에서 발생하는 arcing 및 증착 특성을 규명하고자 진공 내 입자의 수농도를 실시간 측정할 수 있는 particle beam mass spectrometer(PBMS)를 적용, 특정 공정 사건 진단 및 해당 사건에서 발생하는 입자를 분석, 증착된 박막의 Raman spectroscopy 결과와 비교 분석하였다.

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Preparation of Ce0.8Gd0.2O1.9 Powder Using CeO2 Powder and Gd Precipitation and Effect of CoO doping on Sintering

  • Sim, Soo-Man
    • Journal of the Korean Ceramic Society
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    • v.52 no.6
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    • pp.521-526
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    • 2015
  • $Ce_{0.8}Gd_{0.2}O_{1.9}$(GDC20) powder was prepared from a mixture of submicron-sized $CeO_2$ powder and Gd precipitates using ammonium carbonate $((NH_4)_2CO_3)$ as a precipitant. The mixture was calcined at $700^{\circ}C$ for 4 h followed by ball-milling that resulted in the GDC powder with an average particle size of $0.46{\mu}m$. The powder had a very uniform particle size distribution with particle sizes ranging from $0.3{\mu}m$ to $1{\mu}m$. Sintering of undoped GDC samples did not show a relative density of 99.2% until the temperature was increased to $1500^{\circ}C$, whereas GDC samples doped with 5 mol% CoO exhibited a significant densification at lower temperature reaching a relative density of 97.6% at $1100^{\circ}C$ and of 98.8% at $1200^{\circ}C$.

Analytical Model for the Threshold Voltage of Long-Channel Asymmetric Double-Gate MOSFET based on Potential Linearity (전압분포의 선형특성을 이용한 Long-Channel Asymmetric Double-Gate MOSFET의 문턱전압 모델)

  • Yang, Hee-Jung;Kim, Ji-Hyun;Son, Ae-Ri;Kang, Dae-Gwan;Shin, Hyung-Soon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.2
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    • pp.1-6
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    • 2008
  • A compact analytical model of the threshold voltage for long-channel Asymmetric Double-Gate(ADG) MOSFET is presented. In contrast to the previous models, channel doping and carrier quantization are taken into account. A more compact model is derived by utilizing the potential distribution linearity characteristic of silicon film at threshold. The accuracy of the model is verified by comparisons with numerical simulations for various silicon film thickness, channel doping concentration and oxide thickness.

Analysis of Dimension Dependent Subthreshold Swing for FinFET Under 20nm (20nm이하 FinFET의 크기변화에 따른 서브문턱스윙분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.10
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    • pp.1815-1821
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    • 2006
  • In this paper, the subthreshold swing has been analyzed for FinFET under channel length of 20nm. The analytical current model has been developed , including thermionic current and tunneling current models. The potential distribution by Poisson equation and carrier distribution by Maxwell-Boltzman statistics are used to calculate thermionic emission current and WKB(Wentzel-Kramers-Brillouin) approximation to tunneling current. The cutoff current is obtained by simple adding two currents since two current is independent. The subthreshold swings by this model are compared with those by two dimensional simulation and two values agree well. Since the tunneling current increases especially under channel length of 10nm, the characteristics of subthreshold swing is degraded. The channel and gate oxide thickness have to be fabricated as am as possible to decrease this short channel effects, and this process has to be developed. The subthreshold swings as a function of channel doping concentrations are obtained. Note that subthreshold swings are resultly constant at low doping concentration.