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Analytical Model for the Threshold Voltage of Long-Channel Asymmetric Double-Gate MOSFET based on Potential Linearity  

Yang, Hee-Jung (Department of Information Electronic Eng., Ewha Womans University)
Kim, Ji-Hyun (Department of Information Electronic Eng., Ewha Womans University)
Son, Ae-Ri (Department of Information Electronic Eng., Ewha Womans University)
Kang, Dae-Gwan (Hynix Semiconductor Inc.)
Shin, Hyung-Soon (Department of Information Electronic Eng., Ewha Womans University)
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Abstract
A compact analytical model of the threshold voltage for long-channel Asymmetric Double-Gate(ADG) MOSFET is presented. In contrast to the previous models, channel doping and carrier quantization are taken into account. A more compact model is derived by utilizing the potential distribution linearity characteristic of silicon film at threshold. The accuracy of the model is verified by comparisons with numerical simulations for various silicon film thickness, channel doping concentration and oxide thickness.
Keywords
threshold voltage model; asymmetric; double-gate MOSFETs; semiconductor device modeling;
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