• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
• /
• pp.310-313
• /
• 2005

CW laser dopant activation (CLDA) is suggested as an alternative to conventional thermal annealing. The sheet resistance of the ion doped poly-Si after CLDA is sufficiently low compared to the value measured after thermal annealing. The surface damage due to ion doping on the poly-Si can be recovered while CW laser scan for dopant activation. Therefore, the CLDA can be applied to LTPS processing.

• 한국세라믹학회지
• /
• 제34권8호
• /
• pp.843-853
• /
• 1997

The effect of dopant on microwave dielectric properties of (1-x)MgTiO3-xCaTiO3 ceramics, known to be used as microwave dielectric resonators for global positioning system and personal communication system, has been analyzed in terms of variations in defect concentrations and microstructural features with its addition. The addition of dopants was revealed to result in a significant change in the microstructure as well as defect concentration of the ceramics. For instance, the quality factor is proportional to sintered density of the ceramics by inversely proportional to grain size as well as vacancy concentration. Accordingly, it is believed that the dopant effect on the microwave dielectric properties should be separately analyzed with either microstructural change or the change in vacancy concentration.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.267-267
• /
• 2013

Band engineering of a nanowire is related to the question what is the minimum size of a nanowire-based device. At the subnanometer scale, there has been a long standing problem whether it is possible to both control an energy band of an isolated nanowire by a dopant and measure it using angle-resolved photoemission spectroscopy (ARPES). This is because an extra atom in the subnanometer wire plays as a defect rather than a dopant and it is challenging to assemble isolated subnanometer wires into an array for an ARPES measurement. We demonstrate that only one of multiple metallic subnanometer wires canbe controlled electronically by a dopant maintaining the whole metallic bands of other wires, which was observed directly by ARPES. Here,the multiple metallic subnanometer wires were produced on a stepped Si(111) surface by a self-assembly method. The selective band engineering proves that the selectively-controlled metallic wire is nearly isolated electronically from other metallic wires and an electronic structure controlcan be realized down to subnanometer scale.

• 한국분말야금학회:학술대회논문집
• /
• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part2
• /
• pp.955-956
• /
• 2006

Fe-doped $TiO_2$ nanopowders were prepared by mechanical alloying (MA) varying Fe contents up to 8.0 wt.%. The UV-vis absorption showed that the UV absorption for the Fe-doped powder shifted to a longer wavelength (red shift). The absorption threshold depends on the concentration of nano-size Fe dopant. As the Fe concentration increased up to 4 wt.%, the UV-vis absorption and the magnetization were increased. The benefical effect of Fe doping for photocatalysis and ferromagnetism had the critical dopant concentration of 4 wt.%. Based on the UV absorption and magnetization, the dopant level is localized to the valence band of $TiO_2$.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.346-349
• /
• 2009

We investigated the doping effects of $ReO_3$ in different p-type organic semiconductors on the formation of charge transfer complexes and the electrical conductivity by comparing the absorption in ultraviolet-visible-nearinfrared (UV-Vis-NIR) and the current density-voltage characteristics of the hole only devices, respectively. The large energy difference between the HOMO level of host and Fermi energy level of dopant (${\Delta}E$=$E_{HOHO,host}$ - $E_{F,dopant}$) gives higher concentration of CT complexes and enhanced conductivity.

• 한국전기전자재료학회논문지
• /
• 제17권7호
• /
• pp.708-712
• /
• 2004

Shallow $p^+-n$ junctions were formed by ion implantation and dual-step annealing processes. The dopant implantation was performed into the crystalline substrates using BF$_2$ ions. The annealing was performed with a rapid thermal processor and a furnace. FA+RTA annealing sequence exhibited better junction characteristics than RTA+FA thermal cycle from the viewpoint of junction depth and sheet resistance. A new simulator is designed to model boron diffusion in silicon. The model which is used in this simulator takes into account nonequilibrium diffusion, reactions of point defects, and defect-dopant pairs considering their charge states, and the dopant inactivation by introducing a boron clustering reaction. Using initial conditions and boundary conditions, coupled diffusion equations are solved successfully. The simulator reproduced experimental data successfully.

• 한국전기전자재료학회논문지
• /
• 제27권10호
• /
• pp.642-647
• /
• 2014

For feasible study of opto-electrical application regarding to oxide semiconductor, we implemented the N doped ZnO growth using a atomic layer deposition technique. The p-type ZnO deposition, necessary for ZnO-based optoelectronics, has considered to be very difficulty due to sufficiently deep acceptor location and self-compensating process on doping. Various sources of N such as $N_2$, $NH_3$, NO, and $NO_2$ and deposition techniques have been used to fabricate p-type ZnO. Hall measurement showed that p-type ZnO was prepared in condition with low deposition temperature and dopant concentration. From the evaluation of photoluminescence spectroscopy, we could observe defect formation formed by N dopant. In this paper, we exhibited the electrical and optical properties of N-doped ZnO thin films grown by atomic layer deposition with $NH_3OH$ doping source.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
• /
• pp.1133-1137
• /
• 2005

In this paper, a renovated approach in the fabrication of red organic light-emitting diodes (OLEDs) is described. The hard-to-control doping process required for dopant-based red OLEDs can be avoided due to the novel red fluorophores that are not concentration quenching in solid state. Doping is in general a must for phosphorescence OLEDs because of the triplet-triplet annihilation, a common problem for phosphorophore dopants. However, we have recently found that extraordinary red iridium complex showing relatively short emission lifetime render the non-doped phosphorescence red OLED possible.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
• /
• pp.907-909
• /
• 2003

We report a novel method of activation-annealing, named as induction annealing (IA). IA is realized by applying alternating electric field induced by alternatingmagnetic filed applied to the sample. We observed the enhanced kinetics of dopant activation by using IA.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
• /
• pp.648-650
• /
• 2007

We demonstrate highly efficient White Polymer Electrophosphorescent Light-emitting Diode using newly developed green and red light emitting heteroleptic iridium complex, Ir-(pq)2tpy, and blue light emitting fluorescent dopant, BczVBi. The best luminous efficiency reached 28cd/A with maximum luminance of 87000cd/m2. The scheme for determining optimum device architecture and dopant concentrations were constructed.