• Title/Summary/Keyword: Distribution pattern and Uniformity

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A Study of Measurement and Analysis of Flow Distribution in a Close-Coupled Catalytic Converter (근접장착식 촉매장치의 유동분포 측정 및 해석에 관한 연구)

  • Jo, Yong-Seok;Kim, Deuk-Sang;Ju, Yeong-Cheol
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.25 no.4
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    • pp.533-539
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    • 2001
  • In this study, results from an experimental and numerical study of flow distribution in a close-coupled catalytic converter (CCC) are presented. The experiments were carried out using a glow measurement system. Flow distribution at the exit of the first monolith in the CCC was measured using a pitot tube under steady and transient flow conditions. Numerical analysis was done using a CF D code at the same test conditions, and the results were compared with the experimental results. Experimental results showed that the uniformity index of exhaust gas velocity decreases as Reynolds number increases. Under the steady flow conditions, flow through each exhaust pipe concentrates on a small region of the monolith. Under the transient flow conditions, flow through each exhaust pipe with the engine firing order interacts with each other to spread the flow over the monolith face. The numerical analysis results support the experimental results, and help explain the flow pattern in the entry region of the CCC.

Optimization of Electrode Pattern for Multilayer Ceramic Heater by Finite Element Method (유한요소법에 의한 적층형 세라믹 히터의 전극 패턴 최적화)

  • Han, Yoonsoo;Kim, Shi Yeon;Yeo, Dong-Hun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.12
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    • pp.776-781
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    • 2017
  • In this study, we investigated the effect of electrode pattern design on the thermal shock resistance and temperature uniformity of a ceramic heater. A cordierite substrate with a low thermal expansion coefficient was fabricated by tape casting, and a tungsten electrode was printed and used as a heating element. The temperature distribution of the ceramic heater was calculated by a finite-element method (FEM) by considering various electrode patterns, and the tensile stress distribution due to the thermal stress was calculated. In the electrode pattern with a single-line width, the central part of the ceramic heater was heated to the maximum temperature, and the position of the ceramic heater having a double-line width was changed to the maximum temperature, depending on the position of the minimum line width pattern. The highest tensile stress was found along the edges of the ceramic heater. The temperature gradient at the edge determined the tensile stress intensity. The smallest tensile stress was observed for electrode pattern D, which was expected to be advantageous in resisting thermal shock failures in ceramic heaters.

Computational Study on Design of the AIG for the Enhancement of Ammonia Injection in the SCR System (SCR 시스템 내 암모니아 분사 균일도 개선을 위한 AIG 설계에 관한 해석적 연구)

  • Seo, Moon-Hyeok;Chang, Hyuksang
    • Clean Technology
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    • v.18 no.4
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    • pp.410-418
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    • 2012
  • The performance of the ammonia injection gun (AIG) used for maximizing the utilization of reducing agent in the selective catalytic reduction (SCR) system is decided by several parameters such as the pattern of flow distribution, geometry of the air distribution manifold (ADM) and the array and geometry of nozzles. In the study, the uniformity of jet flows from the nozzles in AIG was analyzed statistically by using the computational fluid dynamics (CFD) method to evaluate the role of design parameters on the performance of the SCR system. The uniformity of jet flows from the nozzles is being deteriorated with increasing the supplying flow rate to the AIG. Distribution rates to each branch pipe become lower with decreasing distance to the header, and flow rates from nozzle are also reduced with decreasing distance to the header. The uniformity of jet flows from nozzles becomes stable significantly when the ratio of summative area of nozzles to each sectional area of the branch pipe is below 0.5.

Temperature Analysis of Electrostatic Chuck for Cryogenic Etch Equipment (극저온 식각장비용 정전척 쿨링 패스 온도 분포 해석)

  • Du, Hyeon Cheol;Hong, Sang Jeen
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.2
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    • pp.19-24
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    • 2021
  • As the size of semiconductor devices decreases, the etching pattern becomes very narrow and a deep high aspect ratio process becomes important. The cryogenic etching process enables high aspect ratio etching by suppressing the chemical reaction of reactive ions on the sidewall while maintaining the process temperature of -100℃. ESC is an important part for temperature control in cryogenic etching equipment. Through the cooling path inside the ESC, liquid nitrogen is used as cooling water to create a cryogenic environment. And since the ESC directly contacts the wafer, it affects the temperature uniformity of the wafer. The temperature uniformity of the wafer is closely related to the yield. In this study, the cooling path was designed and analyzed so that the wafer could have a uniform temperature distribution. The optimal cooling path conditions were obtained through the analysis of the shape of the cooling path and the change in the speed of the coolant. Through this study, by designing ESC with optimal temperature uniformity, it can be expected to maximize wafer yield in mass production and further contribute to miniaturization and high performance of semiconductor devices.

Pressure Distribution by Rubber Roller in Large-area UV Imprinting Lithography Process (대면적 UV 임프린팅 공정에서 고무 롤러에 의한 압력분포)

  • Kim, Nam-Woong;Kim, Kug-Weon;Lee, Woo-Young
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.2
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    • pp.91-96
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    • 2010
  • In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we consider the roll-to-plate type imprinting process. In the process a glass mold, which is placed upon the 2nd generation TFT-LCD glass sized substrate(370${\yen}$470 mm), is rolled by a rubber roller to achieve a uniform residual layer. The pressure distribution on the glass mold by rolling of the rubber roller is crucial information to analyze mold deformation, transferred pattern quality, uniformity of residual layer and so forth. In this paper the quantitative pressure distribution induced by rolling of the rubber roller was calculated with finite element analysis under the assumption of Neo-Hookean hyperelastic constitutive relation. Additionally the numerical results were verified by the experiments.

LGP Output Characteristics Depending in BLU Pattern Size (BLU 패턴 크기에 따른 LGP 출력 특성 연구)

  • Kim, Young-Chul
    • Korean Journal of Optics and Photonics
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    • v.19 no.1
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    • pp.43-47
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    • 2008
  • Nowadays, the pattern size of BLU (Back Light Unit) adopted in TFT-LCD (Thin Film Transistor Liquid Crystal Display) is typically a few tens of micrometers. However, recently, researches on the TFT-LCD output characteristics depending on various types of BLU patterns are being performed in order to improve the output and uniformity. In this study, we analyzed the influence of pattern size, distribution, and areal ratio on the output characteristics.

Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology (입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구)

  • Ha, Joohwan;Park, Sodam;Lee, Hakji;Shin, Seokyoon;Byun, Changwoo
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.3
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    • pp.101-104
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    • 2022
  • Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.

Effects of the Floor Pannel on Flows in a Vertical Laminar Flow Type Clean Room (수직 층류형 클린룸의 바닥 패널이 실내기류에 미치는 영향)

  • Kang, S.H.;Jeon, W.P.;Oh, M.D.
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.2 no.4
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    • pp.303-315
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    • 1990
  • Uniformity of velocity is quite important design points of a vertical laminar flow type clean room. In the present paper, flows in a room with a bottom pannel are numerically simulated by using a low-Reynolds number $k-{\epsilon}$ model, and a new flow model of the pannel are suggested. Resistance coefficient of the pannel and size of the exhaust channel show considerable effects on flow pattern and uniformity of flow on the bottom. Reflection coefficient also has important roles. A possibility to obtain the uniform and unidirectional flow is tested by adjusting the distribution of resistance coefficient of the pannel. Such a numerical simulation of the flow will be a good method to get optimun design parameters.

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Design of Light Guide Plate to Improve Optical Characteristics for Large-Area Edge-lit LED Display (대면적 엣지형 LED 디스플레이의 광특성 향상을 위한 도광판설계)

  • Lee, Jae-Yong;Shin, Min-Ho;Kim, Jong-Sub;Kim, Young-Joo
    • Transactions of the Society of Information Storage Systems
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    • v.9 no.1
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    • pp.10-16
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    • 2013
  • Through the rapid development of LED TV, a large-area edge-lit backlight unit is widely researched in the display industry for enhancing the optical efficiency, luminous uniformity and slim design. In addition, an edge-lit backlight unit includes many optical sheets such as reflection sheet, prism sheet and diffuser sheet. However the function can be replaced by the carefully patterned light guide plate (LGP). Micro patterns which located on the top and bottom surface of light guide plate was designed by ray-tracing optical simulation. The designed patterns improved the light characteristics of LGP, including optical extraction efficiency and intensity distribution uniformity. These results suggest that it is very effective method to design edge-lit LGP with micro-patterns on both sides for large-area display and to reduce the fabrication cost.

Analysis on Fertilizer Application Uniformity of Centrifugal Fertilizer Distributor

  • Kim, JiMan;Woo, Dukgam;Kim, Taehan
    • Journal of Biosystems Engineering
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    • v.43 no.4
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    • pp.420-425
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    • 2018
  • Purpose: Chemical fertilizers contribute to agricultural productivity. Annually, 450,000 tons of chemical fertilizers are used in Korea, which is 268 kg per hectare (MAFRA, 2016). However, excessive use causes problems such as environmental pollution and soil acidification. This study proposes use conditions for a fertilizer distributor that can reduce excessive fertilization by analyzing distribution patterns. Methods: This study analyzed fertilizer application uniformity according to the number of blades on a centrifugal fertilizer distributor (three or four blades), orifice gate open ratio (50 or 100%), and blade rotation speed (400, 500, or 600 rpm). Results: When using four blades, the coefficient of variation (CV) was lower than when using three by 11-13% points, and the CV using the 50% open ratio was 10-30% points lower than using the 100% open ratio. The CV at 500 rpm blade rotating speed was 9-12% points lower than that for 400 and 600 rpm. Conclusions: The CV with four blades, 50% orifice gate open ratio, and 500 rpm of blade rotating speed was 18.4%, which provided the most uniform fertilization.