• Journal of the Korean Crystal Growth and Crystal Technology
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• v.12 no.6
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• pp.283-287
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• 2002

We have studied Zr(Si)N film as a diffusion barrier between Cu metal and Si substrate for application of interconnection metal in ULSI circuits. Zr(Si)N film was deposited with reactive DC magnetron sputtering system using $Ar/N_2$mixed gas. The value of the resistivity was the lowest for the ZrN film using 29 : 1 of Ar : $N_2$reactant gas ratio at room temperature and decreased with increasing of Si substrate temperature. As the value of ZrN film resistivity was decreased, the direction of crystal growth was toward to (002) plane. The barrier property of ZrN film added with Si was improved. But Si was added too much in ZrN film, the barrier property was degraded. The adhesive property was improved with increasing of Si in ZrN. For the analysis of the film, XRD, Optical microscopy, Scretch tester, so on were used.

• Journal of the Korean Ceramic Society
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• v.32 no.11
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• pp.1241-1245
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• 1995

Ultrathin oxynitride (SiOxNy) films, 8nm thick, were formed on Si(100) in furnace using O2 and N2O as reactant gas. Compared with conventional furnace grown oxide, oxynitride dielectrics show better characteristics of Qbd and I-V, and less flat-band voltage shift. Excellent diffusion barrier property to dopant (BF2) is also confirmed.

• Journal of Surface Science and Engineering
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• v.27 no.1
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• pp.19-28
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• 1994

A study on adhesion property of evaporated Al-Cr films was conducted on steel sheet by using two-source evaporator. Adhesion of Al-Cr coated steel was evaluated by tape test after $180^{\circ}$bending. Adhesion was decreased with increasing the Cr content in Al-Cr films. It was thought that the decrease in adhesion with increasing Cr content be related to insufficient wetting and diffusion of Cr atoms in the film. Best adhesion was achieved in the case of pure aluminum film..

• Korean Journal of Materials Research
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• v.5 no.1
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• pp.87-95
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• 1995

The effect of stuffing of TiN on the diffusion barrier property between A1 and Si was investigated. The stuffing of TiN was performed by annealing in a Nz ambient at $450^{\circ}C$ for 30min. By TEM analysis, it is identified that there are solid-free or open spaces of a b u t 10-20$\AA$ between the grains of asdeposited TiN. In the case of stuffed TiN, the width of solid-free or open spaces has been reduced to about 10$\AA$ or below. The combination of RBS and AES analyses showed that the asdeposited TiN had about 7at.% of oxygen, and that the stuffed TiN had about 10-15at.% of oxygen. The diffusion barrier test result shows that after annealing at $650^{\circ}C$ for lhour, the asdeposited TiN fails due to the formation of A1 spikes and Si pits in the Si substrate. However, in the case of stuffed TiN, there is no indication of Al spikes and Si pits at the same annealing condition. Thus, it is concluded that this stuffing of TiN significantly improves the diffusion barrier property of TiN between A1 and Si. It is considered that the stuffing effect results from the reduced diffusion through grain boundaries due to the reduced spacing of grain boundaries.

• Proceedings of the Korean Institute of Building Construction Conference
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• v.y2004m10
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• pp.71-76
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• 2004

This paper investigate that the effect of the concrete containing mineral admixtures(pozzolanic materials such as fly-ash, ground granulated blast-furnace slag, silica fume and meta kaolin) on the resistance properties to chloride ion invasion. The purposed testing procedure was applied to the concrete added mineral admixtures for $3\sim4$ replacement ratios under W/B ratios ranged from 0.40 to 0.55. Specimens were immersed in $3.6\%$ NaCl solution for 330 days, and penetration depth, water soluble chloride contents and acid soluble chloride contents were measured in 28, 91, 182 and 330 days. Then, diffusion coefficient were calculated using total chloride contents. As a results. the kinds of mineral admixture and replacement ratios had a great effect on the resistance property of the concrete to chloride ion invasion compared with the plain concrete. And the optimal replacement ratios of mineral admixture had a limitation for each admixtures. The amount of acid soluble chloride ions and water soluble chloride ions were varied with the kinds of mineral admixtures and the penetration depth from the concrete skin. Chloride diffusion coefficient of each concretes decreased with the time elapsed. and the diffusion coefficients of the concrete immersed salt water for 330 days had a establishment with the compressive strength measured before immersing.

• Journal of Powder Materials
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• v.23 no.6
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• pp.432-436
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• 2016

We investigate the microstructural and magnetic property changes of $DyH_2$, $Cu+DyH_2$, and $Al+DyH_2$ diffusion-treated NdFeB sintered magnets with the post annealing (PA) temperature. The coercivity of all the diffusion-treated magnets increases with increasing heat treatment temperature except at $910^{\circ}C$, where it decreases slightly. Moreover, at $880^{\circ}C$, the coercivity increases by 3.8 kOe in Cu and 4.7 kOe in Al-mixed $DyH_2$-coated magnets, whereas this increase is relatively low (3.0 kOe) in the magnet coated with only $DyH_2$. Both Cu and Al have an almost similar effect on the coercivity improvement, particularly over the heat treatment temperature range of $790-880^{\circ}C$. The diffusivity and diffusion depth of Dy increases in those magnets that are treated with Cu or Al-mixed $DyH_2$, mainly because of the comparatively easy diffusion path provided by Cu and Al owing to their solubility in the Nd-rich grain boundary phase. The formation of a highly anisotropic $(Nd,\;Dy)_2Fe_{14}B$ phase layer, which acts as the shell in the core-shell-type structure so as to prevent the reverse domain movement, is the cause of enhanced coercivity of diffusion-treated Nd-Fe-B magnets.

• Korean Journal of Materials Research
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• v.6 no.7
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• pp.678-683
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• 1996

In the fabrication processes of thin film thermoelectrics, a subsequent annealing treatment is inevitable to reduce the defects and residual stresses introduced during the film growth, and to make the uniform carrier concentration of the film. However, the diffusion-induced atomic redistribution and the broadening of p/n junction region are expected to affect the thermoelectric properties of thin film modules. The present study intends to investigate the diffusion at the p/n junctions of thermoelectric thin films and to relate it to the property changes. The film junctions of p-type(Bi0.5Sb1.5Te3)and n-type(Bi2Te2.4Se0.6)were prepared by the flash evaporation method. Aluminum thin layer was employed as a diffusion barrier between p-and n-type films of the junction. This was found to be an effective barrier by showing a negligible diffusion into both type films. After annealing treatment, the thermoelectric properties of p/n couples with aluminum barrier layer were accordingly retained their properties without any deterioration.

• Journal of Welding and Joining
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• v.22 no.1
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• pp.77-82
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• 2004

The effect of bonding condition on tensile properties of joints diffusion bonded spheroidal graphite cast iron, FCD60 to Cr-Mo steel, SCM 440 was investigated. Diffusion bonding was performed with various temperatures, holding times, pressures and atmospheres. All tensile specimens were fractured at the bonding interface. The tensile strength and elongation was increased with increasing bonding temperature. Especially, tensile strength of joints bonded at 1123K was higher than that of a raw material, FCD60, and tensile strength of joints bonded at 1173K was equal to that of a raw material, SCM440, but elongation of all joints was lower than those of raw materials. There was little the effect of holding time on the tensile properties. In comparison with bonding atmosphere, the difference of tensile strength was not observed, but elongation of joint bonded at vacuum(6.7mPa and 67mPa) was higher than that of Ar gas. Higher the degee of vacuum, elongation increased. Tensile properties of diffusion bonds depended on microstructures of cast iron at the interface and void ratio. Microstructures of cast iron at interface changed with temperature, because decarburizing and interdiffusion at the interface occurs and transformation of austenite-1 ferrite + graphite occurs on the cooling process. The void ratio decreased with increasing temperature, especially, effected on the elongation.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.207-210
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• 2005

In this paper, a two-dimensional cross-channel model was applied to investigate influence of the gas diffusion layer(GDL) property and flow field geometry in the anode side for proton exchange membrane fuel cell(PEMFC). The GDL is made of a porous material such as carbon cloth, carbon paper, or metal wire mesh. To the simplicity, the GDL is represented as a block of material containing numerous pathways through which gaseous reactants and liquid water can pass. The purpose of present work was to study the effect of the GDL thickness and the porosity, and flow field geometry by computational fluid dynamics(CFD)

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.1
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• pp.46-54
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• 2002

Plasma Display Panel (PDP) is required to be both the determination of white point of each gray level and the inverse gamma correction since no-balanced RGB cell and linear property of PDP, respectively. However, these two methods cause degradation of grey level representation and undesirable false contour in the dark areas on PDP. In this paper, we implemented real time image processor of the proposed error diffusion algorithm and unsharp masking operation to protect the blurring image caused by the error diffusion. Experimental results showed drastic improvements of gray level representation and reduction of undesirable false contour.