• Title/Summary/Keyword: Diffraction Grating

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Bragg Gratings Generated by Coupling of Surface Plasmons Induced on Metal N anoparticles

  • Song, Seok-Ho;Won, Hyong-Sik;Choi, Ki-Young;Oh, Cha-Hwan;Kim, Pill-Soo;Shin, Dong-Wook
    • Journal of the Optical Society of Korea
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    • v.8 no.1
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    • pp.6-12
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    • 2004
  • Diffraction Bragg gratings consisting of metal (silver) nanoparticles are generated inside a soda-lime glass substrate. After ion-exchanging and annealing processes in the glass, the silver nanoparticles are first formed with the particle diameters of 10 nm ∼ 30 nm. By interfering two CW laser beams at ∼ 60 ${\mu}{\textrm}{m}$ deep under the surface of the nanoparticles-dispersed glass, Bragg gratings with thickness of 15 ${\mu}{\textrm}{m}$ and period of 3.5 ${\mu}{\textrm}{m}$ are generated. Diffraction efficiency of the gratings formed by two TE-polarized beams is three times higher than that by two TM-polarized beams. From this polarization dependence, we have found that strong coupling of the surface plasmons induced on the metal particles may contribute dominantly to generate the diffraction grating.

Implementation of real-time free-space optical interconnection using spatial light modulator (공간광변조기를 이용한 실시간 자유공간 광연결 구현)

  • Lee, Deug-Ju;Kang, Bong-Gyun;Kim, Nam;Suh, Ho-Hyung
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.22 no.5
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    • pp.956-966
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    • 1997
  • Dynamic free-space optical interconnection system is experimented by a holographic crossbar with single-state switching architecture. For dynamic operation, electrically addressed liquid-crystal spatial light modulator and diffraction gratings are used in place of passive holograms of matrix-matrix crossbar. Diffraction gratings are consisted of regular cells which have different phase delays. This pixelated phase grating array displayed on SLM(Spatial Light modulator) deflects an input beam toward a wanted direction or splits an input beam into many beams and then steers them to desired positions. Through the experimental results, free-space optical interconnection is dynamically perfomed using a computer, SLM and phase diffraction gratings.

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Optical Characteristic and Image Recording of Reflection Type Photopolymer in Transmission Structure (투과형 기록구조에서 반사형 포토폴리머의 광학 특성 및 미세패턴 기록)

  • Jeong, Hyen-Seop;Kim, Nam;Yun, Jin-Seon;Park, Tae-Hyeong;Shin, Chang-Won
    • Korean Journal of Optics and Photonics
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    • v.18 no.1
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    • pp.8-13
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    • 2007
  • In this paper, we analyze the optical properties of the transmission grating recorded in a reflection-type photopolymer. Recording and reconstruction of the micropattern using a total internal reflection hologram applied to a reflection type photopolymer are studied. The transmission-type photopolymer was shown to have the maximum diffraction efficiency in $40^{\circ}C$ symmetric structure. However, that of reflection type photopolymer was more than 90% at $60{\sim}80^{\circ}$. The line and point patterns with the interval of $1{\mu}m$ are recorded successfully and can be observed when the micro objective lenses with 10 and 100 time magnification are used.

Analysis of structure and properties of wavelength demultiplexing using photopolymer phase grating (포토폴리머 위상 격자를 이용한 파장 역다중화 구조 및 특성 분석)

  • Choi, Won-Jun;An, Jun-Won;Kim, Nam;Lee, Kwon-Yeon
    • Korean Journal of Optics and Photonics
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    • v.13 no.1
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    • pp.44-50
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    • 2002
  • A new wavelength demultiplexing scheme using holographic volume phase grating formed in photopolymer is proposed and demonstrated. Through the analysis and experiments of the design parameters such as wavelength selectivity, operating spectral range, spatial channel distance and spatial intensity distribution of each channel, we proved that the proposed demultiplexing scheme is promising for wavelength division multiplexing (WDM). From the experimental results, the 3 dB bandwidth of 0.21nm and the crosstalk level of 26 dB for a 0.8 nm channel spacing are observed.

Beam deflection using photorefractive volume grating in Ce-SBN:60 crystal (Ce-SBN:60결정에서 광굴절 부피격자를 이용한 광편향)

  • Ahn, Jun-Won;Kim, Nam;Lee, Kwon-Yeon;Kim, Hye-young;Won, Yong-Hyup
    • Korean Journal of Optics and Photonics
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    • v.8 no.4
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    • pp.315-319
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    • 1997
  • In photorefractive crystals, light deflection is achieved by dynamic photorefractive volume grating, which is induced by the interference of two writing beams. In this paper, we implemented and analyzed the light deflector using Ce-SBN:60 crystals, which is doped with CeO$_2$ and photorefractive effect is induced by low intensity. And we measured maximum coupling coefficient, effective charge density, diffraction efficiency as the intensity ratio and response time.

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Characteristics of Polarization hologram in a side-chain polymalonic ester (측쇄형 광기능성 고분자 PCN에서의 편광홀로그램 특성)

  • 주원제;오차환;송석호;김필수;김봉철;한양규
    • Korean Journal of Optics and Photonics
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    • v.10 no.5
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    • pp.386-390
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    • 1999
  • Erasable polarization holographic grating was recorded with two-wave mixing in PCN which was side-chain liquid crystalline polymalonic esters containing two symmetrical 4-cyanoazobenzene as photoresponsive groups. The diffraction efficiency of recorded grating was measured and the characteristics of recording, decay in a dark room and erasing by circularly polarized light were investigated. As the results, birefringence, $\Delta$n of PCN was measured $6.5{\times}10^{-2}$, which was 0~100 times higher than those of crystals such as Fe:$LiNbO_3$, Ce:$BaTiO_3$ crystals. Dark decay rates was $4.3{\times}10^{-5}$ %/hour, which showed the possibility of application as data storage media.

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Transmission Grating Formation in High Refractive-index Amorphous Thin Films Using Focused-Ion-Beam Lithography (접속이온빔 리소그라피를 이용한 고굴절 비정질 박막 투과 격자 형성)

  • Shin, Kyung;Kim, Jin-Woo;Park, Jeong-Il;Lee, Hyun-Yong;Lee, Young-Jong;Chung, Hong-Bay
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.50 no.1
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    • pp.6-10
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    • 2001
  • In this study, we investigated the optical properties of sub-wavelength a-Si thin film transmission gratings, especially the polarization effect, the phase difference and the birefringence by using linearly polarized He-Ne laser beam (632.8nm). The a-Si transmission grating of the thickness $of < 0.1 \mum$ with four-type period($\Lambda = 0.4 \mum and 0.6 \mum$ for sub-wavelength and $\Lambda = 1.0 \mum and 1.4 \mum$ for above-wavelength) on quartz substrates have been fabricated using 50 KeV Ga+ Focused-Ion-Beam(FIB) Milling and $CF_4$Reactive-Ion-Etching(RIE) method. Finally, we obtained the trating array of a-Si thin film with a period $0.4 \mum, 0.6 \mum, 1.0 \mum, 1.4 \mum$ which have nearly equal finger spacing and width, sucessfully. Especially, for gratings with $\Lambda = 0.6 \mum(linewidth=0.25 \mum, linespace=0.35\mum), the \etamax at \theta_в=17.0^{\circ}$ is estimated to be 96%. As the results, we believe that the sub-wavelength grating arrayed a-Si thin film has the applicability as the optical device and components.

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1.55 μm continuous tuning external cavity laser (1.55 μm 연속 가변 외부 공진기형 레이저)

  • 김강호;권오기;심은덕;이동훈;김종회;김현수;오광룡;김동유
    • Korean Journal of Optics and Photonics
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    • v.14 no.3
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    • pp.321-326
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    • 2003
  • We constructed grating- tuned external cavity semiconductor lasers using Littman and Littrow configuration, for which the wavelengths are tuned by rotation of the grating. This wavelength tunable semiconductor laser is one of the main devices of WDM optical communication. In Littman configuration, the wavelength range of about 60 nm (The C- and L-band range of 1,530~1,590 nm) was obtained by changing the incidence angle of the grating about $\pm$1$^{\circ}$ from the incidence angle of 70$^{\circ}$. In the 40 nm tuning range, the output power variation was less than 1.25 ㏈ and the side mode suppression ratio(SMSR) was 32 ㏈. In Littrow configuration (The incidence angle and the first order diffraction angle is the same, i.e. $\alpha$=$\delta$), the wavelength tuning range was about 80 nm for the same conditions used in Littman configuration except the incidence angle ($\alpha$=49$^{\circ}$). In 60 nm tuning range, the output power variation was less than 1.5 ㏈ and SMSR was 35 ㏈.

Color Filter Based on a Sub-Wavelength Patterned Poly-Silicon Grating Fabricated using Laser Interference Lithography (광파장 이하의 주기를 갖는 다결정 실리콘 격자 기반의 컬러필터)

  • Yoon, Yeo-Taek;Lee, Hong-Shik;Lee, Sang-Shin;Kim, Sang-Hoon;Park, Joo-Do;Lee, Ki-Dong
    • Korean Journal of Optics and Photonics
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    • v.19 no.1
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    • pp.20-24
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    • 2008
  • A color filter was proposed and demonstrated by incorporating a subwavelength patterned 1-dimensional grating in poly silicon. It was produced by employing the laser interference lithography method, providing much wider effective area compared to the conventional e-beam lithography. A $SiO_2$ layer was introduced on top of the silicon grating layer as a mask for the etching of the silicon, facilitating the etching of the silicon layer. It was theoretically found that the selectivity of the filter was also improved thanks to the oxide layer. The parameters for the designed device include the grating pitch of 450 nm, the grating height of 100 nm and the oxide-layer height of 200 nm. As for the fabricated filter, the spectral pass band corresponded to the blue color centered at 470 nm and the peak transmission was about 40%. Within the effective area of $3{\times}3mm^2$, the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated in terms of the rate of the relative transmission efficiency, which was found to be equivalent to 1.5%/degree.

Measurement of Refractive Index Profile of Optical Fiber Using the Diffraction Phase Microscope (회절위상현미경을 이용한 광섬유의 굴절률 프로파일 측정)

  • Jafar-Fard, Mohammad R.;Moon, Sucbei
    • Korean Journal of Optics and Photonics
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    • v.23 no.4
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    • pp.135-142
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    • 2012
  • We have developed a measurement method of the refractive index profile of an optical fiber by using diffraction phase microscopy. In the microscope system, the reference light was extracted directly from the probe light that passed through the sample by means of pinhole filtering with a diffraction grating. The spatial interference pattern produced by the probe light and the reference light was processed to generate the phase image of the sample fiber. The index profile was obtained by the inverse Abel transform of the phase profile. In order to remove the background phase that originated from the index difference between the cladding and the surrounding medium, the background phase was calculated from the phase data of the cladding to make a core phase profile that can be directly transformed to the index profile of the core without the full phase image that includes the entire cladding part.