• Journal of the Korean institute of surface engineering
• /
• v.50 no.2
• /
• pp.72-84
• /
• 2017

In this work, electrophoretic paint (E-paint) was deposited on AZ31 Mg alloy after four different surface pretreatments: knife abrading, SiC paper abrading, deionized (DI) water immersion and NaOH immersion. The deposition process of E-paint was studied by analyses of voltage-time and current-time curves, amount of deposited paint, current efficiency and surface oxide film resistance and the adhesion of E-paint was examined by tape test before and after immersion in DI water for 500 h at $40$^{\circ}C$. It was found that the induction time for the deposition, the amount of deposited paint and the current efficiency are inversely proportional to the resistances of surface films prepared by different surface pretreatment methods. The electrophoretic painting showed longer inductance time, larger amount of deposited paint and higher current efficiency on the highly conducting surfaces, such as knife-abraded and SiC-abraded surfaces than on the less conducting surfaces, such as DI water-immersed and NaOH-immersed samples. Excellent adhesion was observed on the E-paintings deposited onto knife-abraded and SiC-abraded AZ31 Mg alloy samplesSiC-abraded AZ31 Mg alloy samples.

• Korean Journal of Metals and Materials
• /
• v.49 no.5
• /
• pp.406-410
• /
• 2011

ZnO nanorods were prepared by the electrodeposition route on conductive Au/Si substrates. The effects of deposition time on the microstructural evolution and optical properties of ZnO nanorods were investigated. With increasing deposition time from 1 h to 20 h, the diameter and length of the ZnO nanorods increased gradually to about 328 nm and 6.55${\mu}m$, respectively. The ZnO nanorods were dense and vertically well-aligned. The photoluminescence (PL) peaks corresponding to the near band edge of ZnO were observed. With increasing deposition time, the intensity of PL peaks increased with nanorod growth up to 4 h and then decreased. This might be due to the degradation of crystal quality caused by merging of nanorods.

• Journal of the Korean Solar Energy Society
• /
• v.33 no.2
• /
• pp.11-17
• /
• 2013

Silicon nitride($SiN_x:H$) deposited by radio frequency plasma enhanced chemical vapor deposition(RF-PECVD) is commonly used for anti-reflection coating and passivation in crystalline silicon solar cell fabrication. In this paper, characteristics of the deposited silicon nitride was studied with change of working pressure, deposition temperature, gas ratio of $NH_3$ and $SiH_4$, and RF power during deposition. The deposition rate, refractive index and effective lifetime were analyzed. The (100) p-type silicon wafers with one-side polished, $660-690{\mu}m$, and resistivity $1-10{\Omega}{\cdot}cm$ were used. As a result, when the working pressure increased, the deposition rate of SiNx was increased while the effective life time for the $SiN_x$-deposited wafer was decreased. The result regarding deposition temperature, gas ratio and RF power changes would be explained in detail below. In this paper, the optimized condition in silicon nitride deposition for silicon solar cell was obtained as 1.0 Torr for the working pressure, $400^{\circ}C$ for deposition temperature, 500 W for RF power and 0.88 for $NH_3/SiH_4$ gas ratio. The silicon nitride layer deposited in this condition showed the effective life time of > $1400{\mu}s$ and the surface recombination rate of 25 cm/s. The crystalline silicon solar cell fabricated with this SiNx coating showed 18.1% conversion efficiency.

• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.1 no.1
• /
• pp.23-28
• /
• 2002

Fused deposition modelling(FDM) is a rapid prototyping(RP) process that fabricates part layer by layer by deposition of molte thermoplastic material extrude from a nozzle. RP system has benefits. Benefit would be the ability to experiment with physical objects of any complexity m a relatively short period of time. But it has a matter of surface roughness and geometric accuracy. We study on Influence of tangent line angle on surface roughness at fused deposition.

• Journal of Welding and Joining
• /
• v.34 no.1
• /
• pp.35-40
• /
• 2016

Recent developments of Laser metal 3D deposition with wire feeding are reviewed which provide an alternative to powder feeding method. The wire feeding direction, angle and position as well as laser power, wire feeding rate, and deposition speed are found to be key parameters to make quality deposition with high throughput. When compared with the powder feed, the wire feed shows higher material efficiency, higher deposition rate, and smoother surface. Large elongated columnar grains which have epitaxial growth across deposit layers are observed in deposit cross sections. The growth direction is parallel to the thermal gradient during the deposit process. Tensile properties are found to be dependent on the direction due to the anisotropic deposit property. A real-time feedback control is demonstrated to be effective to improve the deposition stability.

• Journal of the Korean Ceramic Society
• /
• v.24 no.6
• /
• pp.519-526
• /
• 1987

TiC was deposited onto several substrate steels by the Chemical Vapor Deposition technique from TiCl4-CH4-H2 gas mixtures in the horizontal resistance furnace. Deposition rates and morphologies of the coatings were investigated with the carbon contents. Deposition thickness increased linearly with the deposition time in the Presence of CH4 gas. The various interlayers of coating by EDS and X-ray Diffraction were proved as Cr7C3 and Fe3C. Chromium contents did not affect the preferred orientation of TiC deposit. The deposition was controlled by a mass transport and a surface reaction in case of 1 wt% C-5.25 wt% Cr steel irrespective of deposition temperature.

• Journal of the Korean Ceramic Society
• /
• v.28 no.1
• /
• pp.1-10
• /
• 1991

Zirconium dioxide(ZrO2) thin films have been deposited by chemical vapor deposition technique involving the application of gas mixture of ZrCl4, and H2O into silicon wafers. The relationships between the deposition rate and various reaction parameters such as the deposition time, the gas flow rate, the deposition temperature, and the composition of reactant gases were studied. The film was identified as nearly stoichiometric monoclinic ZrO2. The apparent activation energy is about 19Kcal/mole at surface chemical reaction controlled region. The deposition rate is mainly influenced by the H2O-forming reacting between CO2 and H2.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.05b
• /
• pp.54-56
• /
• 2001

The $SiH_4$ soak step is widely used during the CVD Tungsten(W) plug deposition process on the Ti/TiN barrier metal to prevent the $WF_6$ attack to the underlayer metal. We tried to reduce or skip the time of $SiH_4$ soak process to optimize W-plug deposition process on Via. The electrical characteristics including Via resistance and the structure of W film are affected according to $SiH_4$ soak time. The elimination possibility of $SiH_4$ soak process was confirmed in the case of that the CVD W film grows on the stable Ti/TiN underlayer.

• Analytical Science and Technology
• /
• v.33 no.2
• /
• pp.108-114
• /
• 2020

Gloves are very important evidence at a crime scene; specifically, rubber gloves can be found easily at homes. Therefore, crime scene investigators attempt to develop fingerprints inside the rubber gloves that are discovered, for identifying unknown suspects. This study compared the effectiveness of three different methods that are used for developing latent prints on gloves with aging time. These were the powder, cyanoacrylate fuming, and multi-metal deposition I methods. The powder method achieved good results for 1-3 days of aged prints, and the cyanoacrylate fuming method worked well on 2-week-old prints. In comparison, multi-metal deposition I method developed good quality fingerprints for 6 weeks of aging time.

• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
• /
• 2003.02a
• /
• pp.133-136
• /
• 2003

The CeO$_2$ thin films were deposited on the biaxially textured Ni substrates by MOCVD process. The (200) oriented CeO$_2$ films were formed at the deposition temperature(Td) of 500~52$0^{\circ}C$, the oxygen partial pressure(PO2) of 0.90~3.33 torr and the deposition time(t) of 3~25 min. The surface roughness and gain size rapidly increased at Td $\geq$ 52$0^{\circ}C$ due to the grain growth. The surface roughness also increased as the deposition time increased. The optimized deposition conditions of the CeO$_2$ films for the YBCO coated conductor were Td= 500~51$0^{\circ}C$, PO2= 2.30 torr and t= 10~12 min.