• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.421-421
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• 2012

Graphene has drawn enormous attention owing to its outstanding properties, such as high charge mobility, excellent transparence and mechanical property. Synthesis of Graphene by chemical vapor deposition (CVD) is an attractive way to produce large-scale Graphene on various substrates. However the fatal limitation of CVD process is high temperature requirement(around $1,000^{\circ}C$), at which many substrates such as Al substrate cannot endure. Therefore, we propose plasma enhanced CVD (PECVD) and decrease the temperature to $400^{\circ}C$. Fig. 1 shows the typical structure of RF-PECVD instrument. The quality of Graphene is affected by several variables. Such as plasma power, distance between substrate and electronic coil, flow rate of source gas and growth time. In this study, we investigate the influence of these factors on Graphene synthesis in vacuum condition. And the results were checked by Raman spectra and conductivity measurement.

• 한국광학회:학술대회논문집
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• 한국광학회 2006년도 하계학술발표회 논문집
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• pp.91-92
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• 2006

Liquid crystal (LC) alignment on $a-SiO_x$ thin film was investigated by means of X-ray photoemission spectroscopy and optical transmittance as we varied the deposition temperature and the target-to-substrate distance. LC molecules can be aligned vertically on $a-SiO_x$ film when the stoichiometric parameter x of $a-SiO_x$ is smaller than 1.56, but they can be aligned homogeneously when x is larger than 1.56. We also found that whether liquid crystals can be aligned vertically or homogeneously on $a-SiO_x$ film can be predicted simply by measuring the change in optical transmittance by deposition of $a-SiO_x$ thin film layers.

• 한국가시화정보학회지
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• 제21권3호
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• pp.15-22
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• 2023

This research introduces an innovative approach for fabricating microstructure surfaces using spray-coating deposition. The resulting surface, referred to as Magnetically Responsive Microstructures (MRM), exhibits hierarchically structured micro-pillar arrays with remarkably high aspect ratios. The fabrication process involves precisely mixing PDMS and hexane with Carbonyl iron powders, followed by ultrasonication and spray-coating on the top of a PDMS substrate placed on the neodymium magnet. The MRM surface shows hydrophobic properties, characterized by a contact angle surpassing 150° and an aspect ratio exceeding 10. Through a comprehensive exploration of critical parameters, including spray amount, magnet-substrate distance, and solution ratio enhanced dynamic tunability and exceptional hydrophobic characteristics are attained. This novel approach holds significant potential for diverse applications in the realm of dynamically tunable microstructures and magnetically responsive surfaces.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.787-790
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• 2003

A rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of $E{\times}B$ field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

• 열처리공학회지
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• 제34권5호
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• pp.239-244
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• 2021

Following Silicon Carbide, single crystal diamond continues to attract attention as a next-generation semiconductor substrate material. In addition to excellent physical properties, large area and productivity are very important for semiconductor substrate materials. Research on the increase in area and productivity of single crystal diamonds has been carried out using various devices such as HPHT (High Pressure High Temperature) and MPECVD (Microwave Plasma Enhanced Chemical Vapor Deposition). We hit the limits of growth rate and internal defects. However, HFCVD (Hot Filament Chemical Vapor Deposition) can be replaced due to the previous problem. In this study, HFCVD confirmed the distance between the substrate and the filament, the accompanying growth rate, the surface shape, and the Raman shift of the substrate after vapor deposition according to the vapor deposition temperature change. As a result, it was confirmed that the difference in the growth rate of the single crystal substrate due to the change in the vapor deposition temperature was gained up to 5 times, and that as the vapor deposition temperature increased, a large amount of polycrystalline diamond tended to be generated on the surface.

• 한국대기환경학회지
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• 제14권5호
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• pp.433-442
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• 1998

The removal procedure of particles in the atmosphere was simulated in the saturated and dry conditions to know the effect of the saturated atmosphere on the size distributions of particles. The particles were divided into 5 ranges, 0.0mm, 0.0∼0.65mm, 0.65∼2mm, 2∼10mm and more than 10mm, and the gases were classified into the smallest range for calculation. At the dry condition, particles grew only by the collision -coalescence and were removed by gravitation. The particles in the range of 2.0∼10mm fell mostly at the 30 km distance from the pollutant source because of gravitation. The particles larger than 10 pm were removed at the 10 km distance from the pollutant source because of their gravity. But the particles larger than 10pm appeared again at more than 30km distance. It is considered that they have been grown during the smaller particles had been advected and diffused at that distance, and it needed about 1 hour from the moment of release. At the saturated condition, particles grew by both the collision-coalescence and condensation. The model showed that the condensation makes more number of particles larger than 10mm and then the particles were removed due to their large gravity. Only a few particles existed at the range of 0.65∼10mm and larger thats 10mm. It is concluded that the saturated atmosphere is effective on removing PM-10.

• 한국세라믹학회지
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• 제49권1호
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• pp.78-83
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• 2012

The electrophoretic deposition(EPD) of ZnO nano-sized colloids is investigated by changing the colloid number concentration, applied force, and deposition time. The change of the colloid size in a suspension was examined by the different colloid number concentrations (N = $3.98{\times}10^{15}$, N = $3.98{\times}10^{14}$, and N = $3.98{\times}10^{13}$) with an increase of the deposition time and applied forces. Deposition behavior was investigated by changing the applied fields (from DC 5 V to 50 V) and the deposition time (5 min to 25 min). The surface microstructures of the as-deposited films were investigated by SEM. The dried films were sintered from $850^{\circ}C$ to $1,050^{\circ}C$ for 2 h and then the microstructures were also explored by SEM. The agglomeration rate was enhanced by increasing the colloid number concentration of colloids. Colloid number concentration in a suspension must be rapidly decreased at higher values of the electric field. ZnO nano-sized colloids had the highest zeta potential value of over -28 mV in methanol. A homogeneous microstructure was obtained at colloid number concentration of N = $3.98{\times}10^{13}$, applied DC field of 5 V/cm and 15 min of deposition time at an electrode distance of 1.5 cm. Under these conditions, the deposited films were sintered at $850^{\circ}C$ and $1,050^{\circ}C$ for 2 h. The results show a typical pore-free surface morphology of a uniform thickness of 400 nm under these experimental conditions.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2007년도 제34회 KOSCO SYMPOSIUM 논문집
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• pp.19-24
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• 2007

The deposition behavior of soot particles in a diffusion flame along a solid wall was examined experimentally by getting rid of the effect of natural convection utilizing microgravity environment. The microgravity environment was realized by using a drop tower facility. The fuel for the flame was an ethylene ($C_2H_4$) and the surrounding oxygen concentration 35% with the surrounding air velocity of $V_a$=2.5, 5, and 10 cm/s. Laser extinction method was adopted to measure the soot volume fraction distribution between the flame and burner wall. The results show that observation of soot deposition in normal flame was difficult from buoyancy and the relative position of flame and solid surface changes with time. The soot particle distribution region moves closer to the surface of the wall as the surrounding air velocity is increased. And the experiments determined the trace of the maximum soot concentration line. It was found that the distance between soot line and flame line is around 5 mm. That is, the soot particle near the flame zone tends to move away from flame zone because of thermophoretic force and to concentrate at a certain narrow area inside of the flame, finally, to adhere the solid wall.

• E2M - 전기 전자와 첨단 소재
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• 제10권3호
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• pp.217-225
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• 1997

In this study, the PVDF organic thin film was fabricated by the physical vapor deposition method to be dry-process. The distance of heat source and substrate was 5[cm] and the temperature of substrate was 30[.deg. C], when the pressure had reached 2.0 x 10$^{-5}$ [Torr], the temperature of heat source was reached to 285[.deg. C] to heat at 6-8[.deg. C/min] rate, the shutter was opened and deposition was started. TG-DTA(Thermogravimetric-Differential Thermal Analysis) spectrum of PVDF pellets showed that endothermic peak arose at 170[.deg. C] and exothermic peak at 524[.deg. C], but that of thin PVDF film showed that endothermic peak arose at 145[.deg. C] and exothermic peak at 443[.deg C]. The current density was increased linearly with increasing voltage but increased nonlinearly with higher electric field than 250[kV/cm] and activation energy was about 0.667[eV] at the temperature of 30-90[.deg. C].

• 암석학회지
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• 제22권4호
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• pp.273-289
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• 2013

강하화산재는 농업과 기반시설에 다양한 형태의 피해를 발생시킬 수 있는 악명 높은 재해이며, 특별히 항공과 인체 건강에 가장 유해하다. 본 연구는 백두산 화산으로부터 폭발적 분화에 의하여 화산재가 확산되고 퇴적되는 것을 모델링하기 위한 목적으로 개념적인 모델 설계를 논의하고자 한다. 이는 모델의 가정과 경계 조건에 대한 토의와 더불어 개념적인 모델의 상세 다이어그램, 가능한 입력 파라미터, 단위, 방정식에 대한 논의를 포함한다. 모델에 포함되어 있는 두 가지 주요 과정은 화산재의 확산과 퇴적이며, 만약 모델이 설계되면 모델을 실행시켜 얻을 수 있는 것은 분연주에 포함된 미세 화산재의 총량, 화산재의 이동 거리, 지표면에 침적되는 화산재 두께 등이다.