• Title/Summary/Keyword: Deposited Metal

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Electrical Characteristics of PECVD $Ta_2O_5$ Dielectic Thin Films on HSG and Rugged Polysilicon Electrodes (입체표면 폴리실리콘 전극에서 PECVD $Ta_2O_5$ 유전박막의 전기적 특성)

  • Cho, Yong-Beom;Lee, Kyung-Woo;Chun, Hui-Gon;Cho, Tong-Yul;Kim, Sun-Oo;Kim, Hyeong-Joon;Koo, Kyung-Wan;Kim, Dong-Won
    • Journal of the Korean Vacuum Society
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    • v.2 no.2
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    • pp.246-254
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    • 1993
  • In order to increase the capacitance of storage electrode in the DRAM capacitor, two approaches were performed. First, hemispherical and rugged poly silicon films were made by LPCVD to increase the effective surface area of storage electrode. The even surface morphology of conventional poly silicon electrode was changed into the uneven surface of hemispherical of rugged poly silicon films. Second, PECVD $Ta_2O_5$ dielectric films were deposited and thermally treated to study the dielectrical characteristics of $Ta_2O_5$ film on each electrode. MIS capacitors with $Ta_2O_5$ films were electrically characterized by I-V, C-V and TDDB measurements. As a result, the capacitance of the electrode with uneven surface were increased by a factor of 1.2~1.5 and leakage current was increased compared with those of even surface. TDDB result indicates that the electrode with uneven surface has dielectrically more degraded than that of even surface. These results can be helpful as a basic research to develop new generation DRAM capacitors with $Ta_2O_5$ films.

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Role of Aluminum Top-layer on Synthesis of Carbon Nanotubes using Laminated Catalyst(Al/Fe/Al) layer (적층구조 촉매층(Al/Fe/Al)을 이용한 탄소나노튜브의 합성에서 최상층 알루미늄 층의 역할)

  • Song, W.;Choi, W.C.;Jeon, C.;Ryu, D.H.;Lee, S.Y.;Shin, Y.S.;Park, C.Y.
    • Journal of the Korean Vacuum Society
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    • v.16 no.5
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    • pp.377-382
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    • 2007
  • In this study, we report the synthesis of the single-walled carbon nanotubes(SWCNTs) using laminated catalyst(Al/Fe/Al) layer deposited by sputter on Si(001). SWCNTs are grown by thermal chemical vapor deposition (TCVD) method. As the results of scanning electron microscopy(SEM), high resolution transmission electron microscopy(HR-TEM) and Raman spectroscopy, we confirmed the SWCNTs bundles with narrow diameter distribution of $1.14{\sim}1.32\;nm$ and average G&D ratio of 22.76. Compare to the sample having Fe/Al catalyst layer, it can be proposed that the top-aluminum incorporated with iron catalyst plays an important role in growing process of CNTs as a agglomeration barrier of the Fe catalyst. Thus, we suggest that a proper quantity of aluminium metal incorporated in Fe catalyst induce small and uniform iron catalysts causing SWCNTs with narrow diameter distribution.

Assessment of the Combustion Diffusion Pattern and Fire Risk of a Water Purifier Damaged by a General Fire (일반화염에 의해 소손된 정수기의 연소 확산 패턴 및 화재위험성 평가)

  • Choi, Chung-Seog
    • Fire Science and Engineering
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    • v.26 no.3
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    • pp.35-39
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    • 2012
  • This paper analyzes the combustion diffusion pattern when a water purifier is artificially ignited outside and inside in order to provide data to examine the cause of fire of a water purifier damaged by fire. The analysis result of the combustion diffusion pattern of a water purifier shows that the combustion diffused at a higher speed when it was ignited inside the purifier than when ignited outside. It took approximately 360 seconds for the water purifier to be half-burned when ignited on the outside, and approximately 180 seconds when ignited from inside. That is, it is thought that the internal combustion speed is higher because the internal ignition causes the generated heat to be accumulated and radiated instantly. It was observed that the water purifier damaged by fire caused by external ignition showed a uniform carbonization pattern and the carbide burned down at the bottom were gradually deposited. The water purifier damaged by internal ignition showed a relatively clear boundary of carbonized surface, which formed a V-pattern. The difference in the combustion patterns presents an objective base from which to determine where the fire started. By the time the purifier was half-burned by fire, the built-in fuse had not melted and the power supply protection device did not operate. In addition, as was found in the case of the fuse damaged by a general fire, carbonization occurred at the metal holder, and it is thought that this fact may be used as a basis from which to determine the cause of a fire.

Study on the Vibrational Scraping of Uranium Product from a Solid Cathode of Electrorefiner (진동 탈리에 의한 전해정련 고체음극에서의 우라늄 생성물 회수 연구)

  • Park, Sungbin;Kang, Young-Ho;Hwang, Sung Chan;Lee, Hansoo;Paek, Seungwoo;Ahn, Do-Hee
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.13 no.4
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    • pp.315-319
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    • 2015
  • A high-throughput electrorefiner has been developed for commercialization use by enhancing the uranium recovery from the reduced metal which is produced from the oxide reduction process. It is necessary to scrap and effectively collect uranium dendrites from the surface of the solid cathode for high yield. When a steel electrode is used as the cathode in the electrorefining process, uranium is deposited and regularly stuck to the steel cathode during electrorefining. The sticking coefficient of a steel cathode is very high. In order to decrease the sticking coefficient of the steel cathode effectively, vibration mode was applied to the electrode in this study. Uranium dendrites were scraped and fell apart from the steel cathode by a vibration force. The vibrational scraping of the steel cathode was compared to the self-scraping of the graphite cathode. Effects of the applied current density and the vibration stroke on the scraping of the uranium dendrites were also investigated.

Process Optimization of PECVD SiO2 Thin Film Using SiH4/O2 Gas Mixture

  • Ha, Tae-Min;Son, Seung-Nam;Lee, Jun-Yong;Hong, Sang-Jeen
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.434-435
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    • 2012
  • Plasma enhanced chemical vapor deposition (PECVD) silicon dioxide thin films have many applications in semiconductor manufacturing such as inter-level dielectric and gate dielectric metal oxide semiconductor field effect transistors (MOSFETs). Fundamental chemical reaction for the formation of SiO2 includes SiH4 and O2, but mixture of SiH4 and N2O is preferable because of lower hydrogen concentration in the deposited film [1]. It is also known that binding energy of N-N is higher than that of N-O, so the particle generation by molecular reaction can be reduced by reducing reactive nitrogen during the deposition process. However, nitrous oxide (N2O) gives rise to nitric oxide (NO) on reaction with oxygen atoms, which in turn reacts with ozone. NO became a greenhouse gas which is naturally occurred regulating of stratospheric ozone. In fact, it takes global warming effect about 300 times higher than carbon dioxide (CO2). Industries regard that N2O is inevitable for their device fabrication; however, it is worthwhile to develop a marginable nitrous oxide free process for university lab classes considering educational and environmental purpose. In this paper, we developed environmental friendly and material cost efficient SiO2 deposition process by substituting N2O with O2 targeting university hands-on laboratory course. Experiment was performed by two level statistical design of experiment (DOE) with three process parameters including RF power, susceptor temperature, and oxygen gas flow. Responses of interests to optimize the process were deposition rate, film uniformity, surface roughness, and electrical dielectric property. We observed some power like particle formation on wafer in some experiment, and we postulate that the thermal and electrical energy to dissociate gas molecule was relatively lower than other runs. However, we were able to find a marginable process region with less than 3% uniformity requirement in our process optimization goal. Surface roughness measured by atomic force microscopy (AFM) presented some evidence of the agglomeration of silane related particles, and the result was still satisfactory for the purpose of this research. This newly developed SiO2 deposition process is currently under verification with repeated experimental run on 4 inches wafer, and it will be adopted to Semiconductor Material and Process course offered in the Department of Electronic Engineering at Myongji University from spring semester in 2012.

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SnO2 Nanowire Networks on a Spherical Sn Surface: Synthesis and NO2 sensing properties (구형 Sn 표면의 SnO2 나노와이어 네트워크: 합성과 NO2 감지 특성)

  • Pham, Tien Hung;Jo, Hyunil;Vu, Xuan Hien;Lee, Sang-Wook;Lee, Joon-Hyung;Kim, Jeong-Joo;Heo, Young-Woo
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.142.2-142.2
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    • 2018
  • One-dimensional metal oxide nanostructures have attracted considerable research activities owing to their strong application potential as components for nanosize electronic or optoelectronic devices utilizing superior optical and electrical properties. In which, semiconducting $SnO_2$ material with wide-bandgap Eg = 3.6 eV at room temperature, is one of the attractive candidates for optoelectronic devices operating at room temperature [1, 2], gas sensor [3, 4], and transparent conducting electrodes [5]. The synthesis and gas sensing properties of semiconducting $SnO_2$ nanomaterials have become one of important research issues since the first synthesis of SnO2 nanowires. In this study, $SnO_2$ nanowire networks were synthesized on a basis of a two-step process. In step 1, Sn spheres (30-800 nm in diameter) embedded in $SiO_2$ on a Si substrate was synthesized by a chemical vapor deposition method at $700^{\circ}C$. In step 2, using the source of these Sn spheres, $SnO_2$ nanowire (20-40 nm in diameter; $1-10{\mu}m$ in length) networks on a spherical Sn surface were synthesized by a thermal oxidation method at $800^{\circ}C$. The Au layers were pre-deposited on the surface of Sn spherical and subsequently oxidized Sn surface of Sn spherical formed SnO2 nanowires networks. Field emission scanning electron microscopy and high-resolution transmission electron microscopy images indicated that $SnO_2$ nanowires are single crystalline. In addition, the $SnO_2$ nanowire is also a tetragonal rutile, with the preferred growth directions along [100] and a lattice spacing of 0.237 nm. Subsequently, the $NO_2$ sensing properties of the $SnO_2$ network nanowires sensor at an operating temperature of $50-250^{\circ}C$ were examined, and showed a reversible response to $NO_2$ at various $NO_2$ concentrations. Finally, details of the growth mechanism and formation of Sn spheres and $SnO_2$ nanowire networks are also discussed.

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Mixed rare earth $(Nd_{1/3}Eu_{1/3}Gd_{1/3})Ba_2Cu_3O_{7-d}$ thin films by PLD (PLD법에 의한 혼합된 희토류계$(Nd_{1/3}Eu_{1/3}Gd_{1/3})Ba_2Cu_3O_{7-x}$ 고온 초전도 박막)

  • Ko, Rock-Kil;Bae, Sung-Hwan;Jung, Myung-Jin;Jang, Se-Hoon;Song, Kyu-Jeong;Park, Chan;Sohn, Myung-Hwan;Kang, Suk-Ill;Oh, Sang-Soo;Ha, Dong-Woo;Ha, Hong-Soo;Kim, Ho-Sup;Kim, Young-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.05a
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    • pp.3-3
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    • 2009
  • In order to investigate the possibility of using mixed rare earth $(Nd_{1/3}Eu_{1/3}Gd_{1/3})Ba_2Cu_3O_{7-x}$ (NEG123) as the superconducting layer of the HTS coated conductor, the NEG123 thin film was deposited epitaxialy on LAO(100) single crystal and IBAD_YSZ metal templates by pulsed laser deposition. Systematic studies were carried out to investigate the influences of deposition parameters of PLD on the micro structure, texture and superconducting properties of NEG-123 coated conductor. Deposition at oxygen partial pressure of 600 mTorr was needed to routinely obtain high quality NEG123 films with $J_c$'s (77K) over 2 MA/$cm^2$ and Tc's over 90K (${\Delta}T{\sim}2\;K$). We verified from magnetization study that the NEG123 has an improved in-field Jc as the field increases at temperatures between 10 K and 77 K compared with Gd123. The $J_c$ (77K, self field) and the value of onset $T_c$ of NEG123 thin film on LAO substrate was $4.0MA/cm^2$ and 92K, respectively. This is the first report, to the best of our knowledge, of coated conductors with NEG123 film as the superconducting layer which have Ic and Jc over 40 A/cm-width and 1.6 MA/$cm^2$ at 77K, self field. This study shows the possibility of using NEG123 film as the superconducting layer of the HTS coated conductor which can be used in high magnetic field power electric devices.

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Electrical Properties of ReMnO3(Re:Y, Ho, Er) Thin Film Prepared by MOCVD Method (화학 기상 증착법으로 제조한 ReMnO3(Re:Y, Ho, Er) 박막의 전기적 특성)

  • Kim, Eung-Soo;Chae, Jung-Hoon;Kang, Seung-Gu
    • Journal of the Korean Ceramic Society
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    • v.39 no.12
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    • pp.1128-1132
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    • 2002
  • $ReMnO_3$(Re:Y, Ho, Er) thin films were prepared by MOCVD method available to non-volatile memory device with MFS-FET structure. $ReMnO_3$ thin films were deposited on the Si(100) substrate at 700${\circ}C$ for 2h. When the films were post-annealed at 900${\circ}C$ for 1h in air, the single phase of hexagonal $ReMnO_3$ thin films were detected. Ferroelectric properties of $ReMnO_3$ thin films were dependent on the degree of c-axis orientation in the single phase of hexagonal structure and remnant polarization (Pr) of $YMnO_3$ thin films with high degree of c-axis orientation was 105 nC/$cm^2$. Leakage current density was dependent on the grain size of microstructure and that of $YMnO_3$ thin films with grain size of 100∼150 nm was $10^{-8}$ A/$cm^2$ at applied voltage of 0.5 V.

The Heat Treatment Effect of ZrO2 Buffer Layer on the Electrical Properties of Pt/SrBi2Ta2O9/ZrO2/Si Structure (ZrO2완충층의 후열처리 조건이 Pt/SrBi2Ta2O9/ZrO2/Si 구조의 전기적 특성에 미치는 영향)

  • 정우석;박철호;손영국
    • Journal of the Korean Ceramic Society
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    • v.40 no.1
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    • pp.52-61
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    • 2003
  • $SrBi_2Ta_2O_9(SBT)$and$ZrO_2$thin films for MFIS structure(Metal-Ferroelectric-Insulator-Semiconductor) were deposited by RF magnetron sputtering method. In order to investigate the effect of heat treatment of insulator layers and MFIS structure, the insulator layers were heat treated from $550^{circ}C;to; 850^{\circ}C$in conventional furnace or RTA furnace under$O_2$and Ar ambient, respectively. After then, C-V characteristics and leakage current were measured. The capacitor with 20 nm thick $ZrO_2$layer treated at RTA$750^{circ}C;in;O_2$ atmosphere had the largest memory window. The C-V and leakage current characteristics of the$Pt/SBT(260nm)/ZrO_2(20nm)/Si$structure were better than those of$Pt/SBT(260nm)/Si$ structure. These results showed that$ZrO_2$films took a role of buffer layer effectively.

플라즈마 표면 처리를 이용한 ZnO 습식성장 패터닝 기술 연구

  • Lee, Jeong-Hwan;Park, Jae-Seong;Park, Seong-Eun;Lee, Dong-Ik;Hwang, Do-Yeon;Kim, Seong-Jin;Sin, Han-Jae;Seo, Chang-Taek
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.330-332
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    • 2013
  • 소 분위기에서 플라즈마 표면 처리의 경우 기판 표면에 존재하는 수소와 탄소 유기물들이 산소와 반응하여 $H_2O$$CO_2$ 등으로 제거되며 표면에 오존 결합을 유도하여 표면 에너지를 증가시키는 것으로 알려져 있다. ZnO 나노구조물을 성장시키는 방법으로는 MOCVD (Metal-Organic Chemical Vapor Deposited), PLD (Pulsed Laser Deposition), VLS (Vapor-Liquid-Solid), Sputtering, 습식화학합성법(Wet Chemical Method) 방법 등이 있다. 그중에서도 습식화학합성법은 쉽게 구성요소를 제어할 수 있고, 저비용 공정과 낮은 온도에서 성장 가능하며 플렉서블 소자에도 적용이 가능하다. 그러므로 본 연구에서는 플라즈마 표면처리에 따라 표면에너지를 변화하여 습식화학합성법으로 성장시킨 ZnO nanorods의 밀도를 제어하고 photolithography 공정 없이 패터닝 가능성을 유 무를 판단하는 연구를 진행하였다. 기판은 Si wafer (100)를 사용하였으며 세척 후 표면에너지 증가를 위한 플라즈마 표면처리를 실시하였다. 분위기 가스는 Ar/$O_2$를 사용하였으며 입력전압 400 W에서 0, 5, 10, 15, 60초 동안 각각 실시하였다. ZnO nanorods의 seed layer를 도포하기 위하여 Zinc acetate dehydrate [Zn $(CH_3COO)_2{\cdot}2H_2O$, 0.03 M]를 ethanol 50 ml에 용해시킨 후 스핀코팅기를 이용하여 850 RPM, 15초로 5회 실시하였으며 $80^{\circ}C$에서 5분간 건조하였다. ZnO rods의 성장은 Zinc nitrate hexahydrate [$Zn(NO_3)_2{\cdot}6H_2O$, 0.025M], HMT [$C6H_{12}N_4$, 0.025M]를 deionized water 250 ml에 용해시켜 hotplate에 올리고 $300^{\circ}C$에서 녹인 후 $200^{\circ}C$에서 3시간 성장시켰다. ZnO nanorods의 성장 공정은(Fig. 1)과 같다. 먼저 플라즈마 처리한 시편의 표면에너지 측정을 위해 접촉각 측정 장치[KRUSS, DSA100]를 이용하였다. 그 결과 0, 5, 10, 15, 60 초로 플라즈마 표면 처리했던 시편이 각각 Fig. l, 2와 같이 $79^{\circ}$, $43^{\circ}$, $11^{\circ}$, $6^{\circ}$, $7.8^{\circ}$로 측정되었으며 이것을 각각 습식화학합성법으로 ZnO nanorods를 성장 시켰을 때 Fig. 3과 같이 밀도 차이를 확인할 수 있었다. 이러한 결과를 바탕으로 기판의 표면에너지를 제어하여 Fig. 4와 같이 나타나며 photolithography 공정없이 ZnO nanorods를 패터닝을 할 수 있었다. 본 연구에서는 플라즈마 표면 처리를 통하여 표면에너지의 변화를 제어함으로써 ZnO nanorods 성장의 밀도 차이를 나타냈었다. 이러한 저비용, 저온 공정으로 $O_2$, CO, $H_2$, $H_2O$와 같은 다양한 화학종에 반응하는 ZnO를 이용한 플렉시블 화학센서에 응용 및 사용될 수 있고, 플렉시블 디스플레이 및 3D 디스플레이 소자에 활용 가능하다.

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