• Title/Summary/Keyword: Demagnification

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Design of a Condenser Lens System using a Thin Lens Combination (얇은 렌즈 조합을 이용한 집속 렌즈 시스템 설계)

  • Lim, Sun-Jong;Choi, Ji-Yeon
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.20 no.5
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    • pp.517-522
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    • 2011
  • Most of SEM is double condenser lens system. Two condenser lenses are required to provide the high demagnification ratios necessary for forming nanometer probes. The thin lens concept provides a highly useful basis for preliminary calculations in a broad range of situations. It is an easy way to understand the electron beam paths in column. Demagnification is easily calculated by this method. In this paper, we present design processes for condenser lens's demagnification by using thin lens combination model. Also, we verify the reliability of our design processes by comparing the modeled demagnification with these of corrected condenser lens.

A Study on the Optimum Design of the Condenser Lens of a Compact Electrostatic-Type SEM (전기장형 소형 주사전자현미경의 집속렌즈의 최적 설계에 대한 연구)

  • Kim, Ki-Hwan;Jang, Dong-Young;Park, Man-Jin
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.3
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    • pp.270-277
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    • 2015
  • In this paper, we describe the production of a specific electrostatic-type scanning electron microscope based on miniaturization for application in other types of vacuum equipment. The initial configuration of the SEM starts with a minimal configuration that allows people to view sample images. After improving the stability of the SEM operation and resolution, we conducted experiments on identifying the characteristics and development of an einzel-type condenser lens with reference to the demagnification lens system of an SEM. The experiments were conducted at an acceleration voltage of 5 kV and we found the shape of the lens to be more reliable than a conventional lens. The lens was then added to improve the resolution in the nanometer region. The current measured on the sample was approximately 40 pA and its magnification was 4,000 times.

Hardware Design for the Control Signal Generation of Electron Optic by Focal Length (Focal length에 의한 전자 렌즈의 제어 신호 생성을 위한 하드웨어 설계)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.5
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    • pp.96-100
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    • 2007
  • Condenser lens and objective lens are used to demagnify the image of the crossover to the final spot size. In lens, electrons are focused by magnetic fields. This fields is fringing field. It is important in electron focusing. Electron focusing occurs the radial component field and axial component field. Radial component produces rotational force and axial component produces radial force. Radial force causes the electron's trajectory to curve toward the optic axis and corss it. Focal length decreases as the current of lens increases. In this paper, we use the focal length for desiging the hardware of lens current control and present the results.

Microlens Fabrication by Using Excimer Laser (엑사이머 레이저를 이용한 마이크로렌즈 제작)

  • 김철세;김재도;윤경구
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.2
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    • pp.33-39
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    • 2003
  • A new microlens fabrication technique, the excimer laser lithography is developed. This bases on the pulsed laser irradiation and the transfer of a chromium-on-quartz reticle on to the polymer surface with a proper projection optics system. An excimer laser lithography system with 1/4 and 1/20 demagnification ratios was constructed first, and the photoablation characteristics of the PMMA and Polyimide were experimentally examined using this system. For two different shapes of microlenses, a spherical lens and a cylindrical lens, fabrication techniques were investigated. One for the spherical lens is a combination of the mask pattern projection and fraction effect. The other for the cylindrical lens is a combination of the mask pattern projection and the relative movement of a specimen. The result shows that various shapes of micro optical components can be easily fabricated by the excimer laser lithography.

Image-Quality Enhancement for a Holographic Wavefront Color Printer by Adaptive SLM Partitioning

  • Hong, Sunghee;Stoykova, Elena;Kang, Hoonjong;Kim, Youngmin;Hong, Jisoo;Park, Joosup;Park, Kiheon
    • Journal of the Optical Society of Korea
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    • v.19 no.1
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    • pp.29-37
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    • 2015
  • The wavefront printer records a volume-reflection hologram as a two-dimensional array of elemental holograms from computer-generated holograms (CGHs) displayed on a spatial light modulator (SLM). The wavefront coming from the object is extracted by filtering in the spatial-frequency domain. This paper presents a method to improve color reproduction in a wavefront printer with spatial division of exposures at primary colors, by adaptive partitioning of the SLM in accordance with the color content encoded in the input CGHs, and by the controllable change of exposure times for the recording of primary colors. The method is verified with a color wavefront printer with demagnification of the object beam. The quality of reconstruction achieved by the proposed method proves its efficiency in eliminating the stripe artifacts that are superimposed on reconstructed images in conventional mosaic recording.

Optimal Electron Beam Characteristics by Lenses Analysis Using Scanning Electron Microscopy (주사전자현미경 렌즈의 해석을 통한 최적의 빔 특성 연구)

  • Bae, Jinho;Kim, Dong Hwan
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.39 no.1
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    • pp.1-9
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    • 2015
  • This paper presents a design method for optimizing the focused beam characteristics, which are mainly determined by the condenser lenses in a scanning electron microscopy (SEM) design. Sharply reducing the probe diameter of electron beams by focusing the condenser lens (i.e., the rate of condensation) is important because a small probe diameter results in high-performance demagnification. This study explored design parameters that contribute to increasing the SEM resolution efficiently using lens analysis and the ray tracing method. A sensitivity analysis was conducted based on those results to compare the effects of these parameters on beam focusing. The results of this analysis on the design parameters for the beam characteristics can be employed as basic key information for designing a column in SEM.

The Design and Construction of the Nuclear Microprobe (핵 마이크로프로브 설계 및 제작)

  • Woo, Hyung-Ju;Kim, Jun-Gon;Choi, Han-Woo;Hong, Wan;Kim, Young-Seok;Lee, Jin-Ho;Kim, Ki-Dong;Yang, Tae-Gun
    • Journal of the Korean Vacuum Society
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    • v.10 no.3
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    • pp.380-386
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    • 2001
  • A nuclear microprobe system with adjustable precision object slits and a magnetic quadrupole doublet was designed by the beam optics simulation using a first order matrix formalism, and installed in a $30^{\circ}$ beam line connected with KIGAM 1.7 MV Tandem VDG Accelerator. Demagnification factors for x and y axis are calculated to be 25 and 4.9, respectively, and a minimum beam spot side is expected to be about 5 $\mu\textrm{m}$ for 3 MeV proton beams with a current of about 1 nA. A multi-purpose octagonal target chamber has been built to facilitate MeV ion-beam analytical techniques of PIXE, RBS, ERDA, and ion beam micro-machining. It contains X-ray and particle detectors, a zoom microscope, a Faraday cup, a 4-axis sample manipulator and a high vacuum pumping system. The system performance of the nuclear microprobe is now being tested, and automatic manipulator control and data acquisition system will be installed for routine applications of micro ion-beam analytical techniques.

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