• Proceedings of the Materials Research Society of Korea Conference
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• 1997.05a
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• pp.113-113
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• 1997

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2006.10a
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• pp.18-18
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• 2006

• Transactions on Electrical and Electronic Materials
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• v.7 no.3
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• pp.118-122
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• 2006

Diamond-like carbon (DLC) films were prepared on silicon substrates by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the tribological properties of the DLC films using friction force microscopy (FFM). The films were annealed at various temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The surface morphology and surface energy of the films were examined using atomic force microscopy and contact angle measurement, respectively. The hardness of the DLC film was measured as a function of the post annealing temperature using a nano-indenter. The tribological characteristics were investigated by atomic force microscopy in FFM mode.

• Bulletin of the Korean Chemical Society
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• v.16 no.9
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• pp.813-818
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• 1995

A diamond-like carbon (DLC) film was produced on a TiO2 substrate using a plasma enhance chemical vapor deposition (PECVD) method. The CH4-H2 plasma was produced by applying 400 V DC. The DLC film with the best crystalline structure was obtained when the concentration of CH4 in H2 was 0.75 percent by volume and total pressure was 40 torr. The presence of the diamond structure was confirmed by Raman spectroscopy, X-ray diffraction, and scanning electron microscopy methods. It was found that the diluting gas H2 played an important role in producing a DLC film using a PECVD method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.7
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• pp.631-635
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• 2006

The properties of metal interlayered DLC films between the Si substrate and the DLC films were studied. DC magnetron sputtering method has been used to deposit intermediate layers of metals. And RF-PECVD method has been employed to synthesize DLC onto substrates of the silicon and metal layers. After we used metal Inter-layers, such as chromium, nickel, titanium and we studied tribological properties of the DLC films. The thickness of films were observed by field emission scanning electron microscope (FE-SEM). Also the surface morphology of the films were observed by an atomic force microscope (AFM). The crystallographic properties of the films were analyzed with X-ray diffraction (XRD), the friction coefficients were investigated by AFM in friction force microscope (FFM) mode. Tribological performances of the films were estimated by nano-indenter, stress tester measurement.

• The Korean Journal of Ceramics
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• v.4 no.1
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• pp.9-14
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• 1998

Diamond-like carbon(DLC) films were deposited on buffer-layered ZnS substrates by radio frequency plasma enhanced chemical vapor deposition(RF-PECVD) method. Ge and GeC buffer layera were used between DLC and ZnS substrates to promote the adhesion of DLC on ZnS substrates. Ge buffer layers were sputter deposited by RF magnetron sputtering and $GeC^1$ buffer layers were deposited by same method except using acetylene reactive gas. The relatinship between film properties and deposition conditions was investigated using gas pressure, RF power and dc bias voltage as PECVD parameters. The hardness of DLC films were measured by micro Vickers hardness test and the adhesion of DLC films on buffer-layered ZnS substrates were studied by Sebastian V stud pull tester. The optical properties of DLC films on butter-layered ZnS substrates were characterized by ellipsometer and FTIR spectroscopy.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.1
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• pp.27-32
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• 2004

The diamond-like carbon (DLC) films were deposited on the Si (100) wafer by a rf-PECVD method as a function of the mixture rate of methane-hydrogen gas and bias voltage. The bonding structure and mechanical properties of these deposited DLC films were investigated using FT-IR, Raman, and nano-indenter. The deposition rates of DLC films increased with increased flow rate of methane in the gas mixtures and increased bias voltage. The $sp^3/sp^2$ bonding ratio of carbon in thin film and the hardness increased with increasing flow rate of hydrogen in the gas mixtures and increasing bias voltage.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.37-37
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• 2008

고온에서 안정적인 DLC막을 성막하기 위해 PECVD공정에서 실리콘을 첨가하여 제조하였다. 기존의 실리콘첨가 DLC막과는 다르게 고온에서 생성됨으로 마이크로 클러스터 형태의 DLC구조로서 disordered 영역이 넓게 존재하고 있어 I(D)/I(G)비에서의 변화가 있는 것이 관찰되었다. 실리콘 양이 증가할수록 값이 낮아지는 것이 관찰되는데 이는 실리콘량이 증가하면서 수소의 위치에 실리콘이 결합하면서 sp3 단일구조형태의 코팅 막을 만드는 것이 관찰된다. 고온 어닐링효과로 내부구조에서 다량의 sp2구조가 관찰되는 것으로서 DLC막이 어느 정도 흑연화되지만, 실리콘이 SiC에서 SiOx로 $SiO_2$와 SiOH막으로 바뀌는 면서 마찰계수가 낮은 DLC막을 유지할 것으로 기대되며, XPS와 FT-IR분석에 의해 이러한 상들의 존재를 관찰할 수 있었다. 특히 공정상 TMS이 증가하면 첨가된 Si에 의해 형성되는 막이 초기부터 OH기를 다량 포함하고 있는 것을 알 수 있었고, 온도 상승에 의해서 실리콘표층에 더욱 많은 SiOx계열의 물질이 생성되는 것이 명확하게 발견되었다.

• Journal of the Korean Vacuum Society
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• v.14 no.3
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• pp.165-170
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• 2005

There is an increasing interest in developing novel coating to improve the blood compatibility of medical implants. Diamond-like carbon(DLC) and titanium nitride(TiN) films have been proposed as potential biomedical coatings due to their chemical k physical properties and moderate biocompatibility. To study the correlation between blood compatibility and physical properties of the films, the fibrinogen adsorption on the surface as well as morphology & wettability were investigated. The quantity of fibrinogen adsorption are Tower for TiN than DLC, which correlates with a higher hydrophilicity of TiN film. To reduce the quantity of fibrinogen adsorption on the film, plasma treatment and furnace annealing were performed, respectively. With the use of oxygen plasma and furnace annealing, the amount of fibrinogen adsorption on TiN film was remarkably reduced, while there was no decrease of the quantity with DLC.

• Journal of the Korean Vacuum Society
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• v.9 no.4
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• pp.328-334
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• 2000

DLC (Diamond-Like Carbon) films were deposited by ECR-PECVD (electron cyclotron resonance plasma-enhanced chemical vapor deposition) method with the variation of substrate bias voltage under the others are constant except it. We have investigated the ion bombardment effect induced by the substrate bias voltage on films during the deposition of film. The characteristics of the film were analyzed using the Dektak surface profiler, SEM, FTIR spectroscopy, Raman spectroscopy and Nano Indentation tester. FTIR spectroscopy analysis shows that the amount of dehydrogenation in films was increased with the increase of substrate bias voltage and films thickness was decreased. Raman scattering analysis shows that integrated intensity ratio $(I_D /I_G)$ of the D and G peak was increased as the substrate bias voltage increased, and films hardness was increased. From these results, it can be concluded that films deposited at this experimental have the enhanced characteristics of DLC because of the ion bombardment effect on films during the deposition of film.