• Title/Summary/Keyword: DC Glow Discharge

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Design of the discharge cleaning system for KSTAR vacuum vessel (KSTAR 제1벽 세정을 위한 방전세정 시스템 설계)

  • Jeong, S.H.;In, S.R.
    • Journal of the Korean Vacuum Society
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    • v.16 no.5
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    • pp.383-387
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    • 2007
  • In this paper the design of the discharge cleaning system for KSTAR vacuum vessel is described. We first discuss about the parameters which are related the efficiency of discharge cleaning. The RG(RF-assisted Glow) discharge which has the ignition and sustain pressure lower than those in the case of DC discharge, thus has the higher efficiency of discharge cleaning. So we adopt the RG discharge, in practical design, for KSTAR discharge cleaning system. For uniformity of the cleaning effect, we plan to install two discharge cleaning systems in A- and I-port of the KSTAR vacuum vessel. The designed system will be adapted for the study of the fuel recycling and of the boronization as well as the discharge cleaning of the KSTAR vacuum vessel.

A Study on the Glow Discharge Characteristics of Facing Target Plasma Process (대향 음극형 플라즈마 프로세스의 글로우 방전특성에 관한 연구)

  • Park, Chung-Hoo;Cho, Jung-Soo;Kim, Kwang-Hwa;Sung, Youl-Mool
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.43 no.3
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    • pp.478-484
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    • 1994
  • Facing target dc sputtering system developed by Hoshi et al. has simple configuration and high deposition rate under moderate substrate temperature in the range of pressure 5x10S0-4T - 1x10S0-2T torr. In this system, magnetic field should be applied perpendicular to the target surface in order to confine high energy secondary electrons between two targets. Because of this magnetic field, the glow discharge characteristics are very different from dc planar diode system showing some unstable discharge region. In this paper, the glow discharge characteristics of this system have been studied under the condition of Ti targets with Ar-NS12T(10%) as working gas. It is found that this system has stable discharge region under the discharge current density of 15-30(mA/cmS02T). The plasma density and electron temperature are in the range of 10S010Y - 10S011T(CMS0-3T) and 2.5-5(eV), respectively.

Characterization and Emission/Absorption Study of a Grimm-type Glow discharge source in the application of high frequency Glow Discharge (고주파 글로우 방전을 이용한 GRIMM형 방전원의 특성 및 방출/흡광분석법 연구)

  • Suh, Jung-Gee;Woo, Jin-Chun
    • Analytical Science and Technology
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    • v.7 no.2
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    • pp.155-164
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    • 1994
  • A conventional Grimm-type glow discharge source was constructed and applied to radio-frequency(13.56MHz) discharge for metal and ceramic analysis. We investigated the emission spectrum for aluminium and aluminium oxide and the influence of discharge operating paramaters including argon pressure, rf-power and DC-bias voltages at the sample-side electrode. Scanning Electron Microscope(SEM) also was used to investigate the effect of rf-sputtering on the microstructure formation of the aluminium oxide. Linear analytical calibration curves were constructed for Manganese and zinc element in samples of low alloy steel(BAS 401-405) and brass(NIST 1108-1117).

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A study on the RE/DC discharge cleaning for high vacuum SUS chamber (RF/DC 방전을 이용한 고 진공용SUS 용기세정에 관한 연구)

  • 김정형;임종연;서인용;정광화
    • Journal of the Korean Vacuum Society
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    • v.10 no.3
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    • pp.298-302
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    • 2001
  • Cleaning effect of RF/DC discharge to clean the surface of vacuum chamber was studied for various discharge conditions. Glow discharge cleaning without baking reduced the outgassing rate to 1/2, which was similar to that after the only baking treatment alone. Glow discharge cleaning treatment with baking improved the cleaning efficiency and then the outgassing rate was remarkably reduced to 1/20. It was found that the ion energy and the ion density were important factors in cleaning the surface. RF discharge cleaning was more effective than BC discharge cleaning.

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A Study on the Characteristics of High Pressure DC Glow Discharge with a Narrow Gap (좁은 간격의 고압 DC 글로우 방전에서의 방전물성에 관한 연구)

  • Park, Jae-Seong;Jeong, Heui-Seob;Shin, Buhm-Jae;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.435-437
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    • 1995
  • It is important to understand tile behaviours of tile high pressure DC glow discharge with a micro gap inside a pixel of the plasmas display panel. We prepared a narrow gap discharge system and have measured electron temperature and density by means of double probe methods in high pressure which was between 100torr and 200torr. And the electrode gap was 7mm. When the pressure varied from 100torr to 200torr, the negative glow was created at a distance less than 1mm from the cathode. And the length of the faraday dark space decreased from 8mm to 5mm. Hence probe measurements was mainly, performed in the region of the Faraday dark space. The dependence of electron temperature and density on the pressure and current density was same with that of the general flow discharge, i.e. as the pressure increased the electron temperature decreased and the density increased. But the spatial electron density distribution in the Faraday dark space was highly distorted because of the effect of high pressure.

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Analysis on DC Glow Discharge Properties of Ar Gas at the Atmosphere Pressure (대기압 Ar 가스의 직류 글로우 방전 특성분석)

  • So, Soon-Youl
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.59 no.4
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    • pp.417-422
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    • 2010
  • Atmosphere Plasma of Gas Discharge (APGD) has been used in plasma sources for material processing such as etching, deposition, surface modification and so on due to having no thermal damages. The APGD researches on AC source with high frequency have been mainly processed. However, DC APGD studies have been not. In order to understand APGD further, it is necessary to study on fundamental properties of DC APGD. In this paper, we developed a one-dimensional fluid simulation model with capacitively coupled plasma chamber at the atmosphere pressure (760 [Torr]). Nine kinds of Ar discharge particles such as electron (e), positive ions ($Ar^+$, $Ar_2^+$) and neutral particles ($Ar_m^*$, $Ar_r^*$, $Ar_h^*$, $Ar_2^*$(1), $Ar_2^*$(3) and Ar gas) are considered in the computation. The simulation was worked at the current range of 1~15 [mA]. The characteristics of voltage-current were calculated and the structure of Joule heating were discussed. The spatial distributions of Ar DC APGD and the mechanism of power consumption were also investigated.

RF Glow Discharge Characteristics of Argon at Low Gas Pressure (저기압하의 아르곤 가스의 RF 글로우 방전특성)

  • Kwak, D.J.;Kim, D.H.;Park, C.H.
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1382-1384
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    • 1995
  • In order to study the structure of RF glow discharge driven at 13.56MHz in argon, the discharge voltage, current and phase shift between them will be measured over a wide range of discharge parameters(gas pressure between 1mTorr and 50mTorr with discharge power between 20mW and 200W). In this paper, the dc glow discharge characteristics and plasma parameters of both FTS and CPMS systems are studied experimentally. It is found that for CPMS system discharge is stablized under wider ranges of magnetic field and pressure than for FTS system. The plasma density and electron temperature of the plasma for these two systems are in the range of $10^{10}{\sim}7{\times}10^{11}[cm^{-3}]$ and $3.5{\sim}6.5$[eV], respectively.

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Numerical Analysis of Micro-Discharge in Plasma Display Panel Using 2-Fluid, 2-Dimensional MD equations (2차원, 2유체 MHD 식을 이용한 플라즈마 디스플레이 판넬의 미소 방전 특성 해석)

  • Choi, Kyung-Cheol;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.911-914
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    • 1992
  • We have investigated the micro-discharge in plasma display panel using 2 dimensional 2 fluid MHD equations. Plasma display utilizes the physical phenomena of the normal glow or abnormal glow and is considered to be able to provide the largest display area among various flat panel. 2 fluid, 2 dimensional Magneto-Hydro-Dynamic equations are applied to Computational field of 100${\times}$800${\mu}m^2$. Time varing glows and after-glows were investigated for 11 $\mu$sec. We obtained the distribution of the microscopic variables such as the density, temperature, velocity of Ne+Ar0.1% gas plasma. During the first 6$\mu$ sec, glow discharge dued to DC pulse was investigated. Time varing phenomena of after-glow was also investigated during the last 5 $\mu$set. From results, it was found that the driving efficiency of a DC Plasma Display Panel could be improved when the diffusion of ions and electrons are controlled by the pulses applied to the auxiliary anode.

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Glow discharge cleaning 법에 의한 stainless steel의 outgassing rate 감소

  • 임종연;이상균;서인용;최상철;홍승수;신용현;정광화
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.40-40
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    • 1999
  • 가속기나 토카막과 같은 거대한 진공 장치의 용기 내벽을 청정화 하기 위해서는 용기 전체의 열처리(굽기, Baking)와 글로우 방전(Glow discharge) 법을 병행하여 사용한다. Baking은 일반 기체(N2, O2, 그리고 CO2)와 물(H2O)의 탈착에 효과적이고, Glow discharge cleaning은 탄소(Carbon-based)와 산소(Oxygen-based) 화합물의 탈착에 효과적이다. 특히 Glow discharge cleaning의 경우에는 전극의 모양, 진공 용기의 재질과 모양, 전극간의 거리, 사용되는 반응 기체의 압력 등에 따라 그 효과에 큰 차이가 있으므로 다각적인 연구가 필요하다. 본 연구에서는 그림 1과 같이 시험용 스테인레스(AISI 304와 AISI 316LN) 진공 용기를 설치하고, 시험 용기의 한쪽은 배기 용기와 oriffice로, 다른 편은 불순물의 정성.정량 분석을 위해 RGA(Residual gas analyser) 용기와 oriffice로 연결하였다. 전체 시스템 중에서 배기 부분과 분석 부분은 15$0^{\circ}C$에서 24시간 가열하여 전체의 기저 진공도를 1$\times$10-8Torr로 하였다. 기저 진공도의 용기에 고순도의 반응기체 (He, Ar, Ar+He, Ar+H2, Ar+N2 등)를 주입한후, DC 전압(0.8~1.5kV)을 변화하며 글로우 방전의 최적조건을 찾았다. 방전 동안 시험용 용기에서 방출되는 반응 기체 이외의 기체를 RGA로 측정하였고 외부에 Thermocouple을 여러곳에 장착하여 온도 변화를 측정하였다. 이상의 결과로부터 진공 용기 표면적으로부터의 불순물 탈착(desorption)과 불순물 분석, 플라즈마와 내벽의 상호작용등에 대한 결론을 얻을 수 있었다. 또한 Baking과 Glow discharge cleaning을 동시에 수행하여 Baking 온도의 낮춤에 따른 영향 평가도 수행하였다.

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Formation of Ti-0 Biomedical Film on Ti6A14V Alloy by DC Glow Plasma Oxidizing

  • Zheng, C.L.;Cui, F.Z.;Xu, Z.
    • Journal of Korean Vacuum Science & Technology
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    • v.6 no.1
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    • pp.16-21
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    • 2002
  • Ti-0 film is a kind of biocompatible surface materials. In this paper, a new method, glow discharge plasma oxidizing, has been used in synthesizing Ti-O gradient films on Ti6A14V substrates. The effects of ion bombardment and process parameters on the structures of titanium oxide layers have been investigated. The results demonstrate that DC glow plasma oxidizing is more efficient in preparation of dense, hard, and high adhesive Ti-O biomedical films on titanium and its alloys. Samples treated by this method show higher hardness values than by others. Especially, in the condition of hollow cathode discharge, the ion bombardment enhances ionization of oxygen, promotes the oxygen permeation and facilitates the formation of the oxide of low valence states of titanium.

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