• 제목/요약/키워드: Current Blocking Layer

검색결과 96건 처리시간 0.027초

Efficient Organic Light-emitting Diodes using Hole-injection Buffer Layer

  • Chung, Dong-Hoe;Kim, Sang-Keol;Lee, Joon-Yng;Hong, Jin-Woong;Cho, Hyun-Nam;Kim, Young-Sik;Kim, Tae-Wan
    • Journal of Information Display
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    • 제4권1호
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    • pp.29-33
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    • 2003
  • We have investigated the effects of hole-injection buffer layer in organic light-emitting diodes using copper phthalocyanine (CuPc), poly(vinylcarbazole)(PVK), and Poly(3,4-ethylene dioxythiophene):poly(styrenesulfonate) (PEDOT: PSS) in a device structure of $ITO/bufferr/TPD/Alq_3/Al$. Polymer PVK and PEDOT:PSS buffer layer were produced using the spin casting method where as the CuPc layer was produced using thermal evaporation. Current-voltage characteristics, luminance-voltage characteristics and efficiency of device were measured at room temperature at various a thickness of the buffer layer. We observed an improvement in the external quantum efficiency by a factor of two, four, and two and half when the CuPc, PVK, and PEDOT:PSS buffer layer were used, respectively. The enhancement of the efficiency is assumed to be attributed to the improved balance of holes and elelctrons resulting from the use of hole-injection buffer layer. The CuPc and PEDOT:PSS layer function as a hole-injection supporter and the PVK layer as a hole-blocking one.

A Simulation-Based Study of FAST TCP Compared to SCTP: Towards Multihoming Implementation Using FAST TCP

  • Arshad, Mohammad Junaid;Saleem, Mohammad
    • Journal of Communications and Networks
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    • 제12권3호
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    • pp.275-284
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    • 2010
  • The current multihome-aware protocols (like stream control transmission protocol (SCTP) or parallel TCP for concurrent multipath data transfer (CMT) are not designed for high-capacity and large-latency networks; they often have performance problems transferring large data files over shared long-distance wide area networks. It has been shown that SCTP-CMT is more sensitive to receive buffer (rbuf) constraints, and this rbuf-blocking problem causes considerable throughput loss when multiple paths are used simultaneously. In this research paper, we demonstrate the weakness of SCTP-CMT rbuf constraints, and we then identify that rbuf-blocking problem in SCTP multihoming is mostly due to its loss-based nature for detecting network congestion. We present a simulation-based performance comparison of FAST TCP versus SCTP in high-speed networks for solving a number of throughput issues. This work proposes an end-to-end transport layer protocol (i.e., FAST TCP multihoming as a reliable, delaybased, multihome-aware, and selective ACK-based transport protocol), which can transfer data between a multihomed source and destination hosts through multiple paths simultaneously. Through extensive ns-2 simulations, we show that FAST TCP multihoming achieves the desired goals under a variety of network conditions. The experimental results and survey presented in this research also provide an insight on design decisions for the future high-speed multihomed transport layer protocols.

SOI BMFET 의 고온 특성 분석 (High Temperature Characteristics of SOI BMFET)

  • 임무섭;김성동;한민구;최연익
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1579-1581
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    • 1996
  • The high temperature characteristics of SOI BMFET are analyzed by the numerical simulation and compared with MOS-gated SOI power devices at high temperatures. The proposed SOI BMFET combines bipolar operation in the on-state with unipolar FET operation in the off-state, so that it may be suitable for high temperature operation without any significant degradation of performance such as the leakage current and blocking capability. The simulation results show that SOI BMFET with a higher doped n-resurf layer is the most promising device far high temperature application as compared with MOS-gated SOI power devices, exhibiting the low on-state voltage drop as well as the excellent forward blocking capability at high temperature.

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The Field Modulation Effect of a Fluoride Plasma Treatment on the Blocking Characteristics of AlGaN/GaN High Electron Mobility Transistors

  • Kim, Young-Shil;Seok, O-Gyun;Han, Min-Koo;Ha, Min-Woo
    • Transactions on Electrical and Electronic Materials
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    • 제12권4호
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    • pp.148-151
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    • 2011
  • We designed and fabricated aluminium gallium nitride (AlGaN)/GaN high electron mobility transistors (HEMTs) with stable reverse blocking characteristics established by employing a selective fluoride plasma treatment on the drainside gate edge region where the electric field is concentrated. Implanted fluoride ions caused a depolarization in the AlGaN layer and introduced an extra depletion region. The overall contour of the depletion region was expanded along the drift region. The expanded depletion region distributed the field more uniformly and reduced the field intensity peak. Through this field modulation, the leakage current was reduced to 9.3 nA and the breakdown voltage ($V_{BR}$) improved from 900 V to 1,400 V.

ONO 구조의 nc-si NVM의 전기적 특성

  • 백경현;정성욱;장경수;유경열;안시현;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.136-136
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    • 2011
  • 반도체 및 전자기기 산업에 있어서 NVM은 아주 중요한 부분을 차지하고 있다. NVM은 디스플레이 분야에 많은 기여를 하고 있는데, 측히 AMOLED에 적용이 가능하여 온도에 따라 변하는 구동 전류, 휘도, color balance에 따른 문제를 해결하는데 큰 역할을 한다. 본 연구에서는 bottom gate 구조의 nc-Si NVM 실험을 진행하였다. P-type silicon substrate (0.01~0.02 ${\Omega}-cm$) 위에 Blocking layer 층인 SiO2 (SiH4:N2O=6:30)를 12.5nm증착하였고, Charge trap layer 층인 SiNx (SiH4:NH3=6:4)를 20 nm 증착하였다. 마지막으로 Tunneling layer 층인 SiOxNy은 N2O (2.5 sccm) 플라즈마 처리를 통해 2.5 nm 증착하였다. 이러한 ONO 구조층 위에 nc-Si을 50 nm 증착후에 Source와 Drain 층을 Al 120 nm로 evaporator 이용하여 증착하였다. 제작한 샘플을 전기적 특성인 Threshold voltage, Subthreshold swing, Field effect mobility, ON/OFF current ratio, Programming & Erasing 특성, Charge retention 특성 등을 알아보았다.

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Performance Comparison of CuPc, Tetracene, Pentacene-based Photovoltaic Cells with PIN Structures

  • Hwang, Jong-Won;Kang, Yong-Su;Park, Seong-Hui;Lee, Hye-Hyun;Jo, Young-Ran;Choe, Young-Son
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.311-312
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    • 2010
  • The fabricated photovoltaic cells based on PIN heterojunctions, in this study, have a structure of ITO/poly(3, 4-ethylenedioxythiophene)-poly(styrenesulfonate)(PEDOT:PSS)/donor/donor:C60(10nm)/C60(35nm)/2, 9-dimethyl-4, 7-diphenyl-1, 10-phenanthroline(8nm)/Al(100nm). The thicknesses of an active layer(donor:C60), an electron transport layer(C60), and hole/exciton blocking layer(BCP) were fixed in the organic photovoltaic cells. We investigated the performance characteristics of the PIN organic photovoltaic cells with copper phthalocyanine(CuPc), tetracene and pentacene as a hole transport layer. Discussion on the photovoltaic cells with CuPc, tetracene and pentacene as a hole transport layer is focussed on the dependency of the power conversion efficiency on the deposition rate and thickness of hole transport layer. The device performance characteristics are elucidated from open-circuit-voltage(Voc), short-circuit-current(Jsc), fill factor(FF), and power conversion efficiency($\eta$). As the deposition rate of donor is reduced, the power conversion efficiency is enhanced by increased short-circuit-current(Jsc). The CuPc-based PIN photovoltaic cell has the limited dependency of power conversion efficiency on the thickness of hole transport layer because of relatively short exciton diffusion length. The photovoltaic cell using tetracene as a hole transport layer, which has relatively long diffusion length, has low efficiency. The maximum power conversion efficiencies of CuPc, tetracene, and pentacene-based photovoltaic cells with optimized deposition rate and thickness of hole transport layer have been achieved to 1.63%, 1.33% and 2.15%, respectively. The photovoltaic cell using pentacene as a hole transport layer showed the highest efficiency because of dramatically enhanced Jsc due to long diffusion length and strong thickness dependence.

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제조 공정의 개선을 통한 백색 LED 칩의 성능 개선 (The Improvement for Performance of White LED chip using Improved Fabrication Process)

  • 류장렬
    • 한국산학기술학회논문지
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    • 제13권1호
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    • pp.329-332
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    • 2012
  • LED는 저 전력, 긴 수명, 고 휘도, 빠른 응답, 친환경적인 특성의 여러 장점을 갖고 있기 때문에 청색과 녹색 LED는 교통신호, 옥외 디스플레이, 백색 LED는 LCD 후면광 등의 응용 제품에 사용되고 있다. 여기서 LED의 성능을 향상하기 위하여 출력전력과 소자의 신뢰성을 높이고, 동작전압을 낮추어야 LED 칩의 고효율화가 이루어져야 하는데, 이는 에피택셜층, 표면요철, 패턴이 있는 사파이어 기판, 칩 설계의 최적화, 특수 공정의 개선 등의 기술이 우수해야 한다. 본 연구에서는 측면 에칭 기술과 절연층 삽입기술을 이용하여 사파이어 에피 웨이퍼 위에 GaN-기반 백색 LED 칩을 제작하여 그 성능을 조사하였다. LED 칩의 성능을 개선하기 위한 최적화 설계와 CBL(current blocking layer) 삽입 기술의 개선된 공정을 통하여 LED 칩 성능의 향상을 확인할 수 있었으며, 출력 전력은 광 출력 7cd, 순방향 인가전압 3.2V의 값을 얻었다. 현재의 LCD 후면광원으로 사용되고 있는 LED 칩의 출력에 비하여 성능이 개선되었으며, 의료기기 및 LCD LED TV의 후면광원으로 사용할 수 있을 것으로 기대된다.

정공 저지층의 재료변화에 따른 청색유기발광소자의 특성분석 (Analysis of Characteristics of the Blue OLEDs with Changing HBL Materials)

  • 김중연;강명구;오환술
    • 전자공학회논문지 IE
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    • 제43권4호
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    • pp.1-7
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    • 2006
  • 본 연구에서는 정공 저지층이 없는 Type I과 정공 저지층으로 두께가 30${\AA}$인 BCP와 BAlq 재료를 사용한 Type II의 청색 유기발광소자를 제작하였다. ITO 박막 위에 $N_2$ 가스에서 플라즈마 출력이 200 W 일 때, 5.02 eV의 일함수 값을 갖는 ITO를 얻을 수 있었다. Type I 소자는 ITO/2-TNATA/$\alpha$-NPD/DPVBi/$Alq_3$/LiF/Al:Li 구조로 되어 있으며, Type II 소자는 ITO/2-TNATA/$\alpha$-NPD/DPVBi/정공 저지층/$Alq_3$/LiF/Al:Li 구조로 되어 있다. Type I과 Type II 소자의 특성을 비교하였다 제작된 소자 중에서 특성이 가장 우수한 것은 정공 저지층으로 두께가 30${\AA}$인 BAlq 재료를 사용한 Type II 소자이었고, 인가전압 10 V 에서 소자의 전류밀도는 226.75$mA/cm^2$, 휘도는 10,310$cd/cm^2$, 발광효율은 4.55 cd/A, 전력효율은 1.43 lm/W 이었다. EL 스펙트럼의 최대 발광 파장은 456 nm 반치폭은 57 nm 이었고 색좌표값은 x = 0.1438, y = 0.1580 로 NTSC 색좌표 Deep blue영역(x = 014, y = 0.08)에 근접한 순수한 청색에 가까운 값을 얻었다.

유기발광소자 특성에 미치는 PTFE 버퍼층의 영향 (Effect on the Characteristics of Organic Light-Emitting Devices due to the PTFE buffer layer)

  • 정준;오용철;정동희;정동관;김상걸;이수원;홍진웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.1070-1073
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    • 2003
  • We have studied the characteristics of organic light-emitting diodes(OLEDs) with the PTFE buffer layer. The OLEDs have been based on the molecular compounds, N,N'-diphenyl-N,N'-bis (3-methylphenyl)-1, 1'- biphenyl-4, 4'-diamine (TPD) as a hole transport, tris(8-hydroxyquinolinoline) aluminum (III) ($Alq_3$) as an electron transport and the Polytetrafluoroethylene (PTFE) as a buffer layer. The devices of structure were fabricated ITO/PTFE/TPD(40nm)/$Alq_3$(60nm)/Al( 150nm) to see the effects of the PTFE buffer layer in organic EL devices. The thickness of the PTFE layer varied from 0.5 to 10[nm]. We were measured Current-Voltage-Luminance Characteristics and Luminance efficiency due to the variation of PTFE thickness. the PTFE layer was reported that helped to enhance the hole tunneling injection and effectively impede induim diffusion from the ITO electrode. We have obtained an improvement of luminance efficiency when the PTFE thickness is 0.5[nm] is used. The improvement of efficiency of is expected due to a function of hole-blocking of PTFE in OLEDs.

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그라우팅을 통한 방조제 바닥보호공 차수공법 현장 적용성 검증 (The verification of the application of grouting in the bottom protection work of sea dikes in the field)

  • 이소열;최세경;정일한
    • 한국지반공학회:학술대회논문집
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    • 한국지반공학회 2010년도 추계 학술발표회
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    • pp.29-39
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    • 2010
  • By understanding the construction process of sea dikes and the current state of the thickness and speed of fluid in the bottom layer protection work of final closure gaps, a construction method applicable for the blocking of bottom layer work will be selected. The three construction methods selected will be tested in site through various methods, and the reinforcement of bottom layer protection and impervious effect will be verified. The verification results are as follows: 1) The overall riprap layer were 0.5~1.0m thicker than planned so that the grouting depth and grout input amount increased 2) The applied construction methods permeability of riprap layers were improved from $\alpha{\times}10^{-2}cm/s$ before the construction to $\alpha{\times}10^{-4}cm/s$ after construction. 3) The results of core extraction in order to grossly verify the hardening time and durability allowed the identification of grout injection effect. The amount of filling of the injection was difficult to judge because the slime in many areas made the reading of borehole photography difficult.

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