• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.5-10
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• 2010

Among a variety of cleaning processes, the cryogenic carbon dioxide ($CO_2$) cleaning has merits because it is highly efficient in removing very fine particles, innoxious to humans and does not produce residuals after the cleaning, which enables us to extend its area of coverage in the semi-conductor fabrication society. However, the cryogenic carbon dioxide cleaning method has some technical research issues in aspect to particles' adhesion and removal. To resolve these issues, performing an analysis for the identification of particle adhesion mechanism is needed. In this study, a research was performed by a theoretical approach. To this end, we extended the G-T (Greenwood-Tripp) model by applying the JKR (Johnson-Kendall-Roberts) and Lennard-Jones potential theories and the statistical characteristics of rough surface to investigate and identify the contact, adhesion and deformation mechanisms of soft or hard particles on the rough substrate. The statistical characteristics of the rough surface were taken into account through the employment of the normal probability distribution function of the asperity peaks on the substrate surface. The effects of surface roughness on the pull-off force for these particles were examined and discussed.

• Journal of the Korean Society of Combustion
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• v.17 no.3
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• pp.30-45
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• 2012

An existing unit of power plant is considered to refurbish it for possible application of carbon capture and storage(CCS). Conceptual design of the plant includes basic considerations on the national and international situation of energy use, environmental concerns, required budget, and time schedule as well as the engineering concept of the plant. While major equipment of the recently upgraded power plant is going to be reused, a new boiler for air-oxy fired dual mode operation is to be designed. Cryogenic air separation unit is considered for optimized capacity, and combustion system accommodates flue gas recirculation with multiple cleaning and humidity removal units. The flue gas is purified for carbon dioxide separation and treatment. This paper presents the background of the project, participants, and industrial background. Proposed concept of the plant operation is discussed for the possible considerations on the engineering designs.

• Journal of the Semiconductor & Display Technology
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• v.7 no.4
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• pp.29-33
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• 2008

Rapid increase of integrity for recent semiconductor industry highly demands the development of removal technology of contaminated particles in the scale of a few microns or even smaller. It is known that the surface cleaning technology using $CO_2$ snow has its own merits of high efficiency. However, the detailed removal mechanism of particles using this technology is not yet fully understood due to the lack of sophisticated research endeavors. The detachment mechanism of particles from the substrates is known to be belonged in four types; rebounding, sliding, rolling and lifting. In this study, a modeling effort is performed to explain the detachment mechanism of a contaminant particle due to the rebounding caused by the vertical collision of the $CO_2$ snow. The Hertz and Johnson-Kendall-Roberts(JKR) theories are employed to describe the contact, adhesion and deformation mechanisms of the particles on a substrate. Numerical simulations are followed for several representative cases, which provide the perspective views on the dynamic characteristics of the particles as functions of the material properties and the initial inter-particle collision velocity.