• 한국분말재료학회지
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• 제18권3호
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• pp.277-282
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• 2011

[ $LiCoO_2$ ] a cathode material for lithium rechargeable batteries, was prepared using recycled $Co_3O_4$. First, the cobalt hydroxide powders were separated from waste WC-Co hard metal with acid-base chemical treatment, and then the impurities were eliminated by centrifuge method. Subsequently, $Co_3O_4$ powders were prepared by thermal treatment of resulting $Co(OH)_2$. By adding a certain amount of $Li_2CO_3$ and $LiOH{\cdot}H_2O$, the $LiCoO_2$ was obtained by sintering for 10 h in air at $800^{\circ}C$. The synthesized $LiCoO_2$ particles were characterized by X-ray diffraction (XRD) and Scanning Electron Microscope (SEM) analysis.

• 한국방사성폐기물학회:학술대회논문집
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• 한국방사성폐기물학회 2005년도 Proceedings of The 6th korea-china joint workshop on nuclear waste management
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• pp.300-315
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• 2005

Recently plasma surface-cleaning or surface-etching techniques have been focused in the respect of decontamination of spent or used nuclear parts and equipment. In this study decontamination rate of metallic cobalt surface was experimentally investigated via its surface etching rate with a $CF_4-O_2$ mixed gas plasma and metallic surface wastes of cobalt oxides were simulated and decontaminated with $NF_3$ - Ar mixed gas plasma. Experimental results revealed that a mixed etchant gas with about $80{\%}\;CF_4-20{\%}\;O_2$ gives the highest reaction rate of cobalt disk and the rate reaches with a negative 300 DC bias voltage up to $0.43\;{\mu}m$/min at $380^{\circ}C$ and $20{\%}\;NF_3-80\%$ Ar mixed gas gives $0.2\;{\mu}m$/min of reaction rate of cobalt oxide film.

• 대한화학회지
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• 제38권2호
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• pp.92-100
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• 1994

초미립 코발트 치환 산화철 분말을 새로운 유기금속 전구체인 $Co_xFe_{1-x}(N_2H_3COO)_2(N_2H_4)_2$ (x = 0, 0.01, 0.02, 0.03, 0.05, 0.10, 1.00)을 열분해화 산화과정으로 제조하였다.유기금속 전구체는 몰비 x : 1-x인 Co(II)와 Fe(II)를 hydrazinocarboxylic acid와 반응시켜서 합성하였고, 합성을 정량분석, 및 적외선분광기를 사용하며, 합성을 정량분석, 원소분석 및 적외선분광기를 사용하여 확인하였다. 유기금속 전구체의 열분해 과정은 TG-DTG 와 DSC로 살펴보았다. 코발트치환 산화철 분말은 유기금속 전구체를 대기 중에서 $350^{\circ}C$ 와 $450^{\circ}C$에서 6시간 열처리하여 제조하였다. 산화철의 결정상은 각각 ${\gamma}-Fe_2O_3$ 및 ${\gamma}-Fe_2O_3$ 와 ${\alpha}-Fe_2O_3$의 혼합상이었다. 입자의 형태는 구형에 가까운 모양이었고 크기는 $0.05{\mu}m$ 이하의 초미립이었다. 코발트 치환 산화철의 보자력과 각형비는 코발트 함량 또는 열처리 온도가 높아질 수록 증가하였다.

• 한국전기전자재료학회논문지
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• 제31권5호
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• pp.335-340
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• 2018

Transition metal oxide materials have attracted widespread attention as Li-ion battery electrode materials owing to their high theoretical capacity and good Li storage capability, in addition to various nanostructured materials. Here, we fabricated a CoO Li-ion battery in which Co nanoparticles (NPs) are deposited into a current collector through electrophoretic deposition (EPD) without binding and conductive agents, enabling us to focus on the intrinsic electrochemical properties of CoO during the conversion reaction. Through optimized Co NP synthesis and electrophoretic deposition (EPD), CoO Li-ion battery with 630 mAh/g was fabricated with high cycle stability, which can potentially be used as a test platform for a fundamental understanding of conversion reaction.

• Current Applied Physics
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• 제18권11호
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• pp.1399-1402
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• 2018

Nanorod films of cobalt oxide ($Co_3O_4$) have been grown by a unique oblique angle deposition (OAD) technique in an e-beam evaporator for supercapacitor electrode applications. This technique offers a non-chemical route to achieve large aspect ratio nanorods. The fabricated electrodes at OAD $80^{\circ}$ exhibited a specific capacitance of 2875 F/g. The electrochemically active surface area was $1397cm^{-2}$, estimated from the non-Faradaic capacitive current region. Peak energy and power densities obtained for $Co_3O_4$ nanorods were 57.7 Wh/Kg and 9.5 kW/kg, respectively. The $Co_3O_4$ nanorod electrode showed a good endurance of 2000 charge-discharge cycles with 62% retention. The OAD approach for fabricating supercapacitor nanostructured electrodes can be exploited for the fabrication of a broad range of metal oxide materials.

• 대한치과보철학회지
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• 제35권1호
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• pp.78-94
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• 1997

The purpose of this experiment was to determine the effects of various treatments on denture base resin to metal bond for cobalt-chromium alloy. The metal surface was treated as follows. Group 1 : Sandblasted with $50{\mu}m$ aluminum oxide. Group 2 : Sandblasted with $250{\mu}m$ aluminum oxide. Group 3 : Sandblasted with $250{\mu}m$ aluminum oxide and followed by silicoating. Group 4 : Electrochemically etched. Group 5 : treated with oxidizing solution. Group 6 : Beaded with $200{\mu}m$ retention structure and followed by silicoating. All specimens were applied with 4-META resin and were thermocycled 1000 times at temperature of $5^{\circ}C$ to $55^{\circ}C$. The effects of various surface treatments on the bond strength between 4-META resin and metal interface were measured by using the universal testing machine. All specimens were observed with SEM. The results were as follows 1. The bond strength of 4-META resin were significantly higher to Co-Cr alloy. 2. The bond strength decreased in the following orders : group 6, group 3, groups 1 and 2, group 4, group 5 and there was no statistically significant difference in bond strength among groups 1 and 2.(p>0.05) 3. The bond strength of cobalt-chromium alloy to 4-META resin were not significantly different.(p>0.05) 4. The treated surface of groups 1, 2 and 3 has more fine undercut than that of groups 4 and 5 with SEM. 5. Stable adhesion can be achieved when mechanically roughened metal surface by sandblasting than treating in an electrochemical etching and an oxidizing solution with potassium manganate.

• 한국진공학회지
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• 제9권4호
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• pp.335-340
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• 2000

코발트실리사이드형성에 있어서 Capping layer로써의 Ti의 역할에 대한 연구를 수행하였다. 실리콘 산화막이 제거된 Si(100)기판과 $H_2SO_4$에 의한 chemical oxide를 형성한 Si(100)기판 위에 Co와 Ti를 증착한 후 열처리 온도 증가에 따른 계면반응과 상변화 등의 미세구조와 면저항 특성의 변화를 four point prove, XRD, TEM, SIMS등의 분석을 통하여 TiN capping, capping layer가 없는 경우에 대하여 비교하였다. 실리콘 산화막이 제거된 Si 기판 상에서 Ti capping의 경우 TiN capping, capping layer가 없는 경우보다 높은 온도에서 $CoSi_2$상이 형성되었으며, chemical oxide가 형성된 Si 기판 상에서는 Ti capping의 경우 코발트 실리사이드 박막을 형성 할 수 있었다. 이것은 capping layer인 Ti가 1차 RTA(Rapid Thermal Annealing)동안 Si 기판 방향으로 확산 침투하여 Co와 Si 사이에 존재하는 실리콘 산화막을 분해하는 역할을 하기 때문이다.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 1991년도 춘계연구발표회 논문개요집
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• pp.91-92
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• 1991

• 한국재료학회:학술대회논문집
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• 한국재료학회 1999년도 추계학술발표강연 및 논문개요집
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• pp.112-112
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• 1999

• 한국전기화학회:학술대회논문집
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• 한국전기화학회 2001년도 춘계총회 및 학술발표회
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• pp.56-56
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• 2001