• Title/Summary/Keyword: Co deposition

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Gradient YZO Buffer Deposition on RABiTS for Coated Conductor

  • Kim, T.H.;Kim, H.S.;Ko, R.K.;Song, K.J.;Lee, N.J.;Ha, D.W.;Ha, H.S.;Oh, S.S.;Pa, K.C.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.240-241
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    • 2007
  • In general, high temperature superconducting coated conductors have intermediary buffers layer consisting of seed, diffusion barrier and cap layers. Simplification of the oxide materials buffer architecture in the fabrication of high temperature superconducting coated conductors is required because the deposition of multi-layers buffer architecture leads to a longer manufacturing time and a higher cost process of coated conductors. Thus, single buffer layer deposition seems to be important for practical coated conductor manufacturing process. In this study, a single gradient layered buffer deposition process of YZO for low cost coated conductors has been tried using DC reactive sputtering technique. About several thick YZO gradient single buffer layers deposited by DC co-sputtering process were found to act as a diffusion layer.

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Assessment Corrosion and Bioactive Behavior of Bioglass Coating on Co-Cr-Mo Alloy By Electrophoretic Deposition For Biomedical Applications

  • Areege K. Abed;Ali. M. Mustafa;Ali M. Resen
    • Corrosion Science and Technology
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    • v.23 no.3
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    • pp.179-194
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    • 2024
  • A layer-by-layer coating was produced using electrophoretic deposition for a HA/Al2O3 coating layer and a bioglass coating layer on Co-Cr-Mo alloy with a roughness of 0.5 ㎛ (400 emery paper SiC). The corrosion behaviour was analyzed by assessing the coating layers' exceptional corrosion resistance, which outperformed the substrate. Cr ion release test using AAS was carried out, indicating that factional graded coating inhibited ion release from the uncoated substrate to coated sample. The porosity was expressed as a percentage, representing the extent of imperfections on the surface of all coatings. These imperfections fell within an acceptable range of 1% to 3%. The roughness of the coated surface was measured using atomic force microscopy, which revealed an excellent roughness value of 3.32 nm. Tape test technique for adhesion revealed that the removal area of the substrate coating layer varied by 11.92%. X-ray diffraction analysis confirmed the presence of all coating material peaks and verified phases of the deposited coating layers. These findings provided evidence that the coating composition remains unaffected by the electrophoretic deposition process. The bioactivity was assessed by immersion in a simulated bodily fluid, which revealed the formation of HCA during a period of 5 days.

An Analysis of the Quality Attributes of Semiconductor Deposition Equipment Using Kano Model: Implications from the Perspective of Complex Products and Systems (CoPS) (카노(Kano) 모델을 활용한 반도체 증착장비 분야 품질 만족 특성 분석: 복합제품시스템(CoPS) 관점에서의 시사점)

  • Lee, Seung Hwan;Kim, Byung-Keun;Ji, Ilyong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.5
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    • pp.28-38
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    • 2020
  • Semiconductor deposition equipment is an important example of Complex Products and Systems (CoPS) and requires in-depth understanding of user requirements. For this reason, we analyzed and compared users' and producers' perspectives on the quality attributes of semiconductor deposition equipment using the Kano model. The results show that the patterns of users' perspectives were different from those of producers. Out of 22 level-2 quality attributes, producers evaluated all 22 attributes as attractive qualities, but users evaluated only 6 as "attractive," 10 as "indifferent," 2 as "must have," and 4 as "other." Although all quality attributes were attractive for producers, only those related to reliability were attractive or must-have qualities, and all others were "indifferent." This result implies that the perspectives on quality attributes may be different between users and producers, and producers should revise their perspectives and strategies. In addition, the results support the characteristics of CoPS suggested by literature implying that performance is more important than economies of scale and cost reduction. It is suggested that producers of semiconductor deposition equipment strategize their approaches to users by considering the characteristics of CoPS.

Effect of a Multi-Step Gap-Filling Process to Improve Adhesion between Low-K Films and Metal Patterns

  • Lee, Woojin;Kim, Tae Hyung;Choa, Yong-Ho
    • Korean Journal of Materials Research
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    • v.26 no.8
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    • pp.427-429
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    • 2016
  • A multi-step deposition process for the gap-filling of submicrometer trenches using dimethyldimethoxysilane (DMDMOS), $(CH_3)_2Si(OCH_3)_2$, and $C_xH_yO_z$ by plasma enhanced chemical vapor deposition (PECVD) is presented. The multi-step process consisted of pre-treatment, deposition, and post-treatment in each deposition step. We obtained low-k films with superior gap-filling properties on the trench patterns without voids or delamination. The newly developed technique for the gap-filling of submicrometer features will have a great impact on inter metal dielectric (IMD) and shallow trench isolation (STI) processes for the next generation of microelectronic devices. Moreover, this bottom up gap-fill mode is expected to be universally for other chemical vapor deposition systems.

Highly Conformal Deposition of Pure Co Films by MOCVD Using Co2(CO)8 as a Precursor (Co2(CO)8 (Dicobalt Octacarbonyl) 전구체를 이용한 MOCVD Co 박막의 균일한 증착 특성 및 높은 순도에 관한 연구)

  • Lee, Jeong-Gil;Lee, Jae-Gab
    • Korean Journal of Materials Research
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    • v.16 no.2
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    • pp.106-110
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    • 2006
  • We have investigated the effect of the experimental variables such as temperature and pressure on conformality of Co films deposited over high aspect ratio trenches using $Co_2(CO)_8$ as a precursor. The results show that the conformality of Co films is a strong function of temperature and process pressure. Lowering the pressure and temperature significantly improves the conformality. As the pressure decreases from 0.6 Torr to 0.2 Torr at $50^{\circ}C$, the bottom coverage of Co films over $0.2{\mu}m$ width trenches with an aspect ratio of 13 to 1 significantly increases to 85%. However, further increasing the temperature from 50 to $60^{\circ}C$ at the pressure of 0.2 Torr degrades the bottom coverage to 14%. In contrast, the extremely low pressure of 0.03 Torr allows the excellent conformal deposition of Co films up to $70^{\circ}C$. This can be attributed to the suppression of homogeneous reaction in the gas phase, which can create the intermediate products with high sticking coefficient. In addition, the Co films deposited at $50^{\circ}C$ show the low resistivity with negligible contamination. As a result, the newly developed Co process using MOCVD can be implemented into the next generation devices with complex shapes.

Impedance Matching of Electrically Small Antenna with Ni-Zn Ferrite Film

  • Lee, Jaejin;Hong, Yang-Ki;Lee, Woncheol;Park, Jihoon
    • Journal of Magnetics
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    • v.18 no.4
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    • pp.428-431
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    • 2013
  • We demonstrate that a partial loading of $Ni_{0.5}Zn_{0.5}Fe_2O_4$ (Ni-Zn ferrite) film remarkably improves impedance matching of electrically small $Ba_3Co_2Fe_{24}O_{41}$ ($Co_2Z$) hexaferrite antenna. A 3 ${\mu}m$ thick Ni-Zn ferrite film was deposited on a silicon wafer by the electrophoresis deposition process and post-annealed at $400^{\circ}C$. The fabricated Ni-Zn ferrite film has saturation magnetization of $268emu/cm^3$ and coercivity of 89 Oe. A partial loading of the Ni-Zn ferrite film on the $Co_2Z$ hexaferrite helical antenna increases antenna return loss to 24.7 dB from 9.0 dB of the $Co_2Z$ antenna. Experimental results show that impedance matching and maximum input power transmission to the antenna without additional matching elements can be realized, while keeping almost the same size as the $Co_2Z$ antenna size.

Development and Application of Anti-Corrosive Steel Using Electro-Deposition of Sea Water (1) -Development of Electro-Deposition System Using Sea Water (해수전착 코팅을 이용한 내부식성 철근의 개발 및 적용성에 대한 연구 (1) -해수전착 코팅 시스템 개발)

  • Kwon, Seung Jun;Lee, Myeong Hoon;Park, Sang Soon
    • Journal of the Korea institute for structural maintenance and inspection
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    • v.16 no.5
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    • pp.78-87
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    • 2012
  • This study is for developing a system for electro-deposition utilizing sea water containing various ions like calcium and magnesium. This is the first step research for the final goal which is a development of anti-corrosive steel for RC structure, so that this paper is mainly focused on the development for electro-deposition system. Optimum conditions for steel coating is obtained through various tests considering anode type, temperature, duration time, and current density. The composition of electro-deposition is analyzed through SEM, EDS, and XRD and it is evaluated to be $CaCO_3$ and $Mg(OH)_2$. Through measuring polarization potential and current density in the coated steel, the coating layer from the developed system is evaluated to have high resistance to steel corrosion. Additional tests and discussions on durability and structural performance in the coated steel from this work will be performed for the second step research.

Effects of Deposition Conditions on Magnetic Properties of SmCo/Cr (스퍼터 제조조건에 따르는 SmCo/Cr 박막의 자기적 특성에 관한 연구)

  • 나태준;고광식;이성래
    • Journal of the Korean Magnetics Society
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    • v.9 no.6
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    • pp.312-320
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    • 1999
  • Effect of deposition conditions on the magnetic properties of SmCo/Cr prepared by a RF magnetron sputtering method was studied. We obtained the maximum coercivity of 3.2 kOe in the sample of Cr(50 nm)/SmCo(40 nm, 50W, 20 mT)/Cr(150 nm, 100 W, 30 mT). The coercivity of the SmCo/Cr depends largely on the roughness of the Cr underlayer and the composition of SmCo. The roughness of the Cr underlayer increased with increasing the Ar pressure and thickness, and promoted the isolation of SmCo grains which resulted in an enhanced coercivity. The composition of the SmCo was changed with RF power and Ar pressure due to the mass difference between Sm and Co and the resputtering phenomena. The maximum coercivity was obtained in the composition of about 20 at.% Sm. The mechanism of magnetization reversal of the present SmCo films changed from domain wall motion to domain rotation as the RF power and the Ar pressure increase. This was though to be due to the defects, such as the roughness of Cr surface, porous column boundaries etc., which inhibit domain wall movement.

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Microcrystalline Silicon for Thin Film Transistor

  • Milovzorov, D.;Kim, K.B.;Lisachenko, M.;Seo, J.W.;Lee, K.Y.;Chung, H.K.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1320-1322
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    • 2005
  • Microcrystalline silicon films were deposited on glass substrate by using plasma-enhanced chemical vapor deposition (PECVD) method. The crystalline volume fraction was estimated by means of Raman spectrometer with argon laser as light source. The high hydrogen dilution of silane gas was used for increase in content of crystal silicon phase.

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Multi Quantum Well 구조를 이용한 Red에서 Green으로의 energy transfer mechanism의 이해

  • Kim, Gang-Hun;Park, Won-Hyeok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.145-145
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    • 2015
  • 처음 유기물의 인광 발견 이후 Host-dopant 시스템을 이용하여 Emission layer(EML)을 Co-deopsition 하는 방법으로 주로 인광 유기 발광 다이오드를 제작 하였다. [1] co-deposition을 이용해 만든 유기 발광 다이오드에 많은 장점이 있지만, 반대로 소자를 제작하는데 있어서는 많은 문제점을 가지고 있다. [2-4] 이러한 문제점을 개선하기 위하여 co-deposition 대신 non-doped Multi Quantum Well(MQW) 구조를 사용하여 doping 하지 않는 방법을 이용하는 논문들이 보고 되고 있다. Hole, electron, exciton이 MQW 구조를 지나면서, dopant well 안에 갇히게 되고, 그 안에서 다른 layer 간에 energy transfer와, hole-electron leakage가 줄어 들어, 더 효율적인 유기 발광 다이오드를 만들 수 있게 된다. [5-7] 이 연구에서는 CBP를 Potential Barrier로 사용하고, Ir(ppy)3 (Green dopant), Ir(btp)2 (Red dopant) 를 각각 Potential Well로 사용하였고, 두께는 CBP 9nm, dopant 1nm로 하였다. 이러한 소자를 만들고 dopant를 3개의 well에 적당히 배치하여, 각 well에서의 실험적인 발광 량 과, EML 안에서의 발광 mechanism 그리고 각 potential barrier를 줄여가며 dexter, forster에 의한 energy transfer에 대하여 알 수 있었다.

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