• Nuclear Engineering and Technology
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• v.52 no.11
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• pp.2652-2659
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• 2020

The methyl iodide (CH₃I) removal performance of tri-ethylene-di-amine impregnated activated carbon (TEDA-AC) used in the air cleaning unit of nuclear power plants (NPPs) should be maintained at least 99% between 24 month-performance test period. In order for evaluating the effectiveness of TEDA-AC on the removal performance of CH₃I in nuclear power plant during the operation of NPPs, the long-term test for up to 15 months was carried out under the simulated operating conditions (e.g., 25 ℃, RH 50%, ppb level poisoning gases injection) at nuclear power plants (NPPs). The TEDA-AC samples were analyzed with the Brunauer-Emmett-Teller (BET) specific surface area and TEDA content as well as CH₃I penetration test. It is clearly evident that more than 99% of CH₃I removal performance of TEDA-AC was observed in the TEDA-AC samples during 15 months of long-term operation under the simulated NPP operating conditions including the ppb level of organic and oxide form of poisoning gases. BET specific surface area and TEDA content that can affect the CH₃I removal performance of TEDA-AC were also maintained as those in new TEDA-AC during 15 months of long-term operation.

• Proceedings of the Korean Professional Engineer Association Conference
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• 1984.03a
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• pp.52-60
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• 1984

As far as we handle industrial products, the painting process is prerequisite; and the preparatory treatment of materials is, therefore, indispensable to the above process. However, it is a matter for regret that people are liable to overlook the importance the treatment of materials at the preparatory stage, giving themselves up to the surface of finished goods. The preparatory treatment of materials is like backstage personnel (operations) in dramatic performance; the performance cannot be successful without the support of backstage operations in surface treatment. The various methods which are being applied widely as preparatory treatment are as follow: (1) the method by using hand tools such as grinders, etc. (2) the method with blasting (3) the method with chemical coating (4) the method by getting rid of fatty substance with organic solvent The methods No. 1 and No. 2 are in use mainly for larger structures, and those No. 3 and No. 4, either singly or combined, are applied for mass-produced, smaller items (acid cleaning is applied for getting rid of rust, as the case may be). The method No. 3 is used mainly as anti-rust by forming zinc phosphate film on the surface of steel plate or enhancing the bonding power of paints by taking advantage of irregular surfaces of films. Recently are no the market steel plates treated directly with film-coating by omitting the process No. 3. Furthermore, those goods painted include not only nonferrous goods but plastics and elastomer. The present discourse describes the cleaning process by using the steam of organic acid, picked up from among No. 4, and its equipment applied.

• Corrosion Science and Technology
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• v.8 no.6
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• pp.209-216
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• 2009

In this study the effect of different surface finishing techniques on the pitting corrosion behaviour of a commercial 304 stainless steel alloy was investigated. Surface finishing methods were divided into two categories, i.e. mechanical and chemical. Mechanical treatment methods include power tooling such as grinding, emery paper brushing, stainless steel wire brushing and stainless steel shot blasting. Chemical treatment methods include chemical passivation (phosphoric acid, citric acid, nitric acid) and electro-cleaning (phosphoric acid and citric acid). Potentiodynamic polarization experiments were carried out in 3.5 wt. % NaCl solution at room temp. (20 $^{\circ}C$). The results showed that chemical treatment methods improved the corrosion resistance of stainless steel 304, measured in terms of pitting potential ($E_{pit}$). Corrosion resistance of the specimens was increased in the order of; electro-cleaning > manual passivation > mechanical cleaning. Surface of electro-cleaned specimens was smoother than rest of the surface treatment methods. Chrome content in chemically treated specimens was higher than in mechanically treated specimens as shown by EDX analysis.

• Proceedings of the IEEK Conference
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• 1998.10a
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• pp.495-498
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• 1998

Mobile computers have restrictions for size, weight, and power consumption that are different from traditional workstations. Storage device must be smaller, lighter. Low power consumed storage devices are needed. At the present time, flash memory device is a reasonable candidate for such device. But flash memory has drawbacks such as bulk erase operation and slow program time. This causes of worse average write performances. This paper suggests a storage method which improves write performance.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 1999.11a
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• pp.184-188
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• 1999

The power semiconductor switching devices(PSSD) continuously developed, Power Electronic Technology using PSSD is gradually extended. The high frequency inverter to generate the large power high frequency subject to power electronic technology pursuit various applications. Also, in emboss with environmental destruction problem cause the atmosphere and the water pollution to growth of the commercial society, the research in favor of cleaning environmental a pollutant actively proceed. Therefore, This paper describe study on the high frequency pulse power supply. The theoretical results are in good agreement with the experimental ones. The proposed pulse power supply is considerated to be useful for discharge lamp.

• The Transactions of the Korean Institute of Electrical Engineers B
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• v.49 no.12
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• pp.807-812
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• 2000

With the increasing demands for clean environment, development of air cleaning systems has been received increasing attention. One of the key technologies in the electrostatic precipitator (EP) is high voltage pulsed power supply, which affects the performance of the overall system. In this study, a high voltage microsecond pulse power supply for the EP is developed for 500MW coal power plants. The power supply has dc source and a pulsed one. The ratings of the dc and the pulse source are 60kV, 800mA and 70kV, 400mA, respectively. The width of pulse voltage is 140us and the max. pulse repetition frequency is 200Hz.

• The KIPS Transactions:PartA
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• v.9A no.4
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• pp.399-404
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• 2002

Along the evolution of information and communication technologies, manufacturing embedded systems such as PDA (personal digital assistant), HPC (hand -held PC), settop box. and information appliance became realistic. And RTOS (real-time operating system) and filesystem have been played essential re]os within the embedded systems as well. For the filesystem of embedded systems, flash memory has been used extensively instead of traditional hard disk drives because of embedded system's requirements like portability, fast access time, and low power consumption. Other than these requirements, nonvolatile storage characteristic of flash memory is another reason for wide adoption in industry. However, there are some technical challenges to cope with to use the flash memory as an indispensable component of the embedded systems. These would be relatively slow cleaning time and the limited number of times to write-and-clean. In this paper, a new cleaning policy is proposed to overcome the problems mentioned above and relevant performance comparison results will be provided. Ranking cleaning policy(RCP) decides when and where to clean within the flash memory considering the cost of cleaning and the number of times of cleaning. This method will maximize not only the lifetime of flash memory but also the performance of access time and manageability. As a result of performance comparison, RCP has showed about 10 ~ 50% of performance evolution compared to traditional policies, Greedy and Cost-benefit methods, by write throughputs.

• Journal of Power System Engineering
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• v.13 no.6
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• pp.63-69
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• 2009

The experiment was performed to check operating characteristics of fouling auto removal apparatus for multi pass type heat exchanger using ejector. The results showed as following. The ejector suction flow rate increased with the head of operating pump of ejector. Proper suction flow rate showed $7.2{\sim}10.2m^3/h$ for ball collection in case of pump head 35~50m. The head of ejector outlet pipe is below 4.1m in case of 40m, the head of operating pump of ejector to confirm ejector suction flow rate 8.4m3/h. Lattice space of ball separator is allowed 6~10.3mm in ranges of ball diameter are 15~25mm and when mass flow of cooling water is 3.0m/sec. Average of passing time of balls is 1.2~2.8sec depend on the velocity of flow and the size of balls.

• Journal of Korean Society of Steel Construction
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• v.12 no.2 s.45
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• pp.177-185
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• 2000

An experimental research to evaluate the slip coefficients of high-strength friction-type bolt connection of weathering steel plate has been performed in this paper. The test specimens with mill scale or shot blast had been exposed in open air during 3 and 6 months and cleaning of rust surface by hand brushing, power tool brushing and no cleaning was considered. The relaxation of bolt clamping force had also been measured during 600 hours. It was found that slip coefficients increased to the value over 0.6 with exposure except mill scale surface by power tool brushing. The relaxation of bolt tension force in exposed specimens also increased and maximum value reached to about 10%.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.7
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• pp.424-432
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• 2000

The plasma surface treatment, using hydrogen gas, of the silicon wafer was investigated as a pretreatment for the application to silicon-on-insulator (SOI) wafers using the silicon direct bonding technique. The chemical reactions of hydrogen plasma with surfaces were used for both the surface activation and the removal of surface contaminants. As a result of exposure of silicon wafer to the plasma, an active oxide layer was formed on the surface, which was rendered hydrophilic. The surface roughness and morphology were estimated as functions of plasma exposing time as well as of power. The surface became smoother with decreased incident hydrogen ion flux by reducing plasma exposing time and power. This process was very effective to reduce the carbon contaminants on the silicon surface, which was responsible for a high initial surface energy. The initial surface energy measured by the crack propagation method was 506 mJ/m2, which was up to about three times higher than that of a conventional RCA cleaning method.