• Title/Summary/Keyword: Circular Dot

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Study of the Characteristics of Dot Pattern Designs in Modern Fashion (현대패션에 나타난 도트문양의 표면유형과 특성에 관한 연구)

  • Kim, Sun-Young
    • Journal of the Korean Society of Costume
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    • v.59 no.4
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    • pp.41-53
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    • 2009
  • This study analyzed expression types of dot patterns and derived out inherent characteristics to provide fundamental resources for advancement of high value added creative designs. As a result of the study, Firstly, the circular motive was used to form silhouettes or as a symbol of a decoration. Secondly, a simple form and color dot pattern was used to create one side, or a circular shaped accessory was used to be recognized as a construction line or a decoration line. Thirdly, textile printing is mainly used but handicraft and decorative images were used to add vitality through piece technique, embroidery, collage, cut-out, patch work, etc. Fourthly, different circular motives were integrated, partitioned and duplicated for abstract geometrical images. Fifthly, variations were added by mixing different dot patterns that are arranged regularly and irregularly in different sizes and gaps creating compounded designs with handicraft touches, different angles or on top of each other. Sixthly, hybrid images were created with rearrangement of dot patterns and by adding floral shapes, stripes or other abstract and geometrical shapes. Such various and creative attempts construct new formative beauty in fashion design and I believe that it can establish the development of unique images that satisfies the taste of today's consumers.

A Experimental Study on the Complex Waterproofing Method of Exposure using PE Textiles of Mesh type and Highly Viscous Urethane (망사형 PE직물과 고점도 우레탄을 이용한 복층형 노출 방수공법에 관한연구)

  • Shao, Xu-Dong;Song, Je-Young;Kim, Young-Suk;Oh, Sang-Keun
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2011.05a
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    • pp.127-130
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    • 2011
  • The duplex waterproofing construction method has been investigated to improve various problems (how to fix the sheet, breaking, air/water pocket, and cracks caused by different materials) of the existing rooftop exposed waterproofing construction method. By using fiber sheet, Net PE fabric, and thixotropy urethane with high viscosity, the waterproofing construction method is to glue the ground and waterproof course by circular dot. The method is also to construct the waterproof course with high hardness by using waterproof membrane coatings in upper hybrid system. By gluing the ground and the waterproof course by circular dot, the study is expected to be useful to minimize the simultaneous breaking in the waterproof course as tensile stress is buffer in case of the ground crackling. Also, since the waterproofing construction method is good at moving and emitting vapor from the ground, it is considered to be effective to minimize any damages caused by air/water pocket and get loose of the waterproof course.

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Design and Implementation of Circular Dot Pattern Code (CDPC) and Its Recognition Algorithm which is robust to Geometric Distortion and Noise (대화형 인쇄물 구현을 위한 기하변형과 잡음에 강인한 원형 점 패턴코드의 설계와 인식 알고리즘 구현)

  • Shim, Jae-Youn;Kim, Seong-Whan
    • Proceedings of the Korea Information Processing Society Conference
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    • 2011.11a
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    • pp.1166-1169
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    • 2011
  • In this paper, we design a Circle dot Code, In our scheme, we design a dot patterns for increasing maximum capacity and also for increasing robustness to Affine Transformation. Our code Can be extended according number of data circle. We use three data circle vision code. In this type code, after acquiring camera images for the Circle dot Codes, and perform error correction decoding using four position symbols and six CRC symbols. We perform graph based dot code analysis which determines the topological distance between dot pixels. Our code can be bridged the real world and ubiquitous computing environment.

DNA Chip using Single Stranded Large Circular DNA: Low Background and Stronger Signal Intensity

  • Park, Jong-Gu
    • Biomedical Science Letters
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    • v.10 no.2
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    • pp.75-84
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    • 2004
  • Massive identification of differentially expressed patterns has been used as a tool to detect genes that are involved in disease related process. We employed circular single stranded sense molecules as probe DNA for a DNA chip. The circular single stranded DNAs derived from 1,152 unigene cDNA clones were purified in a high throughput mode from the culture supernatant of bacterial transformants containing recombinant phagemids and arrayed onto silanized slide glasses. The DNA chip was examined for its utility in detection of differential expression profile by using cDNA hybridization. Hybridization of the single stranded probe DNA were performed with Cy3- or Cy5-labeled target cDNA preparations at $60^\circ$C. Dot scanning performed with the hybridized slide showed 29 up-regulated and 6 down-regulated genes in a cancerous liver tissue when compared to those of adjacent noncancerous liver tissue. These results indicate that the circular single stranded sense molecules can be employed as probe DNA of arrays in order to obtain a precious panel of differentially expressed genes.

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Model-Based Color- Image Halftoning Algorithm Using Dot-Pattern Database (도트 패턴 데이터 베이스를 이용한 모델 기반 칼라 영상 중간조 알고리즘)

  • Kim, Kyeong-Man;Song, Kun-Woen;Min, Gak;Kim, Jeong-Yeop;Ha, Yeong-Ho
    • Journal of the Institute of Electronics Engineers of Korea SP
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    • v.38 no.2
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    • pp.208-217
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    • 2001
  • Model-based color image halftoning method using dot-pattern database is proposed for low-resolution color image printing. Dot-pattern database used in the proposed method is based on Blue-Noise Mask. The database consists of dot-patterns constructed by circular dot-overlap model according to each color value. In halftoning procedure, input color value is reproduced as the dot-pattern selected to minimize the difference between the color values of the original image and those of the printed image. Also, the contrast sensitivity function as a human visual model is used to improve the perceived quality of the printed image in dot-pattern selection. Thus, the proposed method can substantially reproduce the color values of the pixels in original image and obtain better image quality. In the experiment, the proposed method has less ΔΕ/Sub ab/ between the original image in monitor and the printed one than that of ED and BNM halftoning. This result approves that the proposed method reproduces better image quality.

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Model-based Dithering Using Dot Pattern Selection (도트 패턴 선택을 이용한 모델 기반 디더링)

  • Lee, Chae-Soo;Park, Yang-Woo;Uam, Tae-Uk;Jang, Joo-Seok;Ha, Yeong-Ho
    • Journal of the Institute of Electronics Engineers of Korea SP
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    • v.38 no.3
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    • pp.247-257
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    • 2001
  • New methods are proposed for printing a full resolution image on a limited output device. The proposed algorithm uses a dot-pattern database that models overlapping phenomena among neighbor printing dots. To solve the problem of dot-overlap, the gray levels of dot-pattern sets were calculated using a circular dot-overlap model and then measured by a spectrometer. Thereafter, in order to improve the visual quality of the color dithering, the contrast sensitivity function of the human visual system was used. As a result, the optimal dot-pattern can be selected from the database. Consequently, the proposed algorithm can produce high quality images while using low-cost color devices.

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Design for Hybrid Circular Bragg Gratings for a Highly Efficient Quantum-Dot Single-Photon Source

  • Yao, Beimeng;Su, Rongbin;Wei, Yuming;Liu, Zhuojun;Zhao, Tianming;Liu, Jin
    • Journal of the Korean Physical Society
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    • v.73 no.10
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    • pp.1502-1505
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    • 2018
  • We present a design for hybrid circular Bragg gratings (hCBGs) for efficiently extracting single-photons emitted by InAs quantum dots (QDs) embedded in GaAs. Finite-difference time-domain simulations show that a very high photon collection efficiency (PCE) up to 96% over a 50 nm bandwidth and pronounced Purcell factors up to 19 at cavity resonance are obtained. We also systematically investigate the geometry parameters, including the $SiO_2$ thickness, grating period, gap width and the central disk radius, to improve the device performances. Finally, the PCEs and the Purcell factors of QDs located at different positions of the hCBG are studied, and the results show great robustness against uncertainties in the location of the QD.

Effects of high temperatures and hygrothermals on the collapse characteristics of CFRP thin-walled laminates (고온 .senter dot. 고습환경이 CFRP 적층 원통부재의 압궤특성에 미치는 영향)

  • 곽훈이;김정호;양인영
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1995.10a
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    • pp.650-654
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    • 1995
  • In this study, in order to measure energy-absorbing charactistics in collapse test of CFRP thin-walled laminates and interpretate the cause of decreasing age when collapse test is carried out under the environments of high temperatures and hygrothermals, the moisture absorbing behavior according to the variety of orientation angel is observed and collapse characteristics is compared with the influence of high temperatures and hygrothermals. Especially, we supposed to clearly understand reationship between collapse characteristics in proportion to the variety of orientation angel and moisture absorbing. The value of the maximum loading, mean loading,rate of energy absorption energy per unit volume and mass in CFRP thin-walled laminates on the high temperatures and hygrothermals is measured lower than under no moisture absorbing. The maximum collapse loading in dynamic impact test is taken measurement lower than in static collapse test regarding compared with collapse characteristics conformity with the variety of the CFRP circular laminates in high temperatures and hygrothermals. But the absorbed energy per unit mass and volume is almost same and the biggest amount of energy is shown in the CFRP circular laminates with orientation angel of 15 .deg.. Therefore, in the case of use to CFRP circular laminates with axisymmetric mode, CFRP thin-walled structal members with orientation angel of 10 .deg. , 15 . deg. are generally useful.

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Characteristics of Graphene Quantum Dot-Based Oxide Substrate for InGaN/GaN Micro-LED Structure (InGaN/GaN Micro-LED구조를 위한 그래핀 양자점 기반의 산화막 기판 특성)

  • Hwang, Sung Won
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.167-171
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    • 2021
  • The core-shell InGaN/GaN Multi Quantum Well-Nanowires (MQW-NWs) that were selectively grown on oxide templates with perfectly circular hole patterns were highly crystalline and were shaped as high-aspect-ratio pyramids with semi-polar facets, indicating hexagonal symmetry. The formation of the InGaN active layer was characterized at its various locations for two types of the substrates, one containing defect-free MQW-NWs with GQDs and the other containing MQW-NWs with defects by using HRTEM. The TEM of the defect-free NW showed a typical diode behavior, much larger than that of the NW with defects, resulting in stronger EL from the former device, which holds promise for the realization of high-performance nonpolar core-shell InGaN/GaN MQW-NW substrates. These results suggest that well-defined nonpolar InGaN/GaN MQW-NWs can be utilized for the realization of high-performance LEDs.

Fabrication of Master for a Spiral Pattern in the Order of 50nm (50nm급 불연속 나선형 패턴의 마스터 제작)

  • Oh, Seung-Hun;Choi, Doo-Sun;Je, Tae-Jin;Jeong, Myung-Yung;Yoo, Yeong-Eun
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.4
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    • pp.134-139
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    • 2008
  • A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.