• Title/Summary/Keyword: Chromium mask

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Case study of Hexavalent Chromium and Silica Exposure Assessment and Respiratory Fit-test for Paint Manufacturing Worker (페인트 제조 작업자의 6가 크롬 및 실리카 노출평가와 호흡보호구 밀착도 검사 사례)

  • Lee, Hyun Seok;Kim, Boowook
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.31 no.4
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    • pp.295-303
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    • 2021
  • Objective: Paint manufacturing industry workers are exposed to various lung cancer carcinogenic substances including hexavalent chromium and crystalline silica. Studies have been conducted on lung cancer in Paint manufacturing industry workers and the concentration of hexavalent chromium in paint industry; however, the concentration of crystalline silica and hexavalent chromium and cases of lung cancer in a single Paint factory has never been reported in Korea. Methods: To determine whether the cancer was related to his work environment, we assessed the level of exposure to carcinogens during pouring and mixing talc and pigment. In addition, a mask fit test was performed for the worker. Results: Analysis of talc and silica bulk powder materials showed that crystalline silica (quartz) was 5% in talc and 100% in silica. The green and yellow pigments contained 87% and 92% of lead chromate, respectively. Our quantitative analysis of pigment powder samples showed that the hexavalent chromium contents quantified in the green and yellow pigment samples were 87% and 92%, respectively. In order to estimate his exposure level of hexavalent chromium, we measured a personal exposure level of hexavalent chromium for a worker in accordance with the National Institute for Occupational Safety and Health #7605 method. The results showed that the worker was exposed to the high level of hexavalent chromium (0.033 mg m-3). In addition, the talc powder also contained 5% quartz, and the worker's exposure level to respirable quartz exceeded OEL. As a result of the respiratory protection fit test for workers, the overall Fit Factor was '15' when wearing a second-grade mask and '25' when wearing a first-grade mask, significantly lower than the US Occupational Safety and Health Agency (OSHA) pass value of "100". Conclusion: Workers who pouring and mixing powder materials such as talc or colored pigments in paint manufacturing company may be exposed to high concentrations of carcinogenic substances. These findings indicate that it is necessary to local ventilation system inspection, safety and health education for employers and workers, and periodically monitoring and manage the working environment.

Microlens Fabrication by Using Excimer Laser (엑사이머 레이저를 이용한 마이크로렌즈 제작)

  • 김철세;김재도;윤경구
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.2
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    • pp.33-39
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    • 2003
  • A new microlens fabrication technique, the excimer laser lithography is developed. This bases on the pulsed laser irradiation and the transfer of a chromium-on-quartz reticle on to the polymer surface with a proper projection optics system. An excimer laser lithography system with 1/4 and 1/20 demagnification ratios was constructed first, and the photoablation characteristics of the PMMA and Polyimide were experimentally examined using this system. For two different shapes of microlenses, a spherical lens and a cylindrical lens, fabrication techniques were investigated. One for the spherical lens is a combination of the mask pattern projection and fraction effect. The other for the cylindrical lens is a combination of the mask pattern projection and the relative movement of a specimen. The result shows that various shapes of micro optical components can be easily fabricated by the excimer laser lithography.

Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography

  • Yoon Bo Kyung;Hwang Wonseok;Park Youn Jung;Hwang Jiyoung;Park Cheolmin;Chang Joonyeon
    • Macromolecular Research
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    • v.13 no.5
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    • pp.435-440
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    • 2005
  • This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.

An Integrated Mach-Zehnder Interferometric Sensor based on Rib Waveguides (Rib 도파로 기반 집적 마흐젠더 간섭계 센서)

  • Choo, Sung-Joong;Park, Jung-Ho;Shin, Hyun-Joon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.47 no.4
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    • pp.20-25
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    • 2010
  • An integrated Mach-Zehnder interferometric sensor operating at 632.8 nm was designed and fabricated by the technology of planar rib waveguides. Rib waveguide based on silica system ($SiO_2-SiO_xN_y-SiO_2$) was geometrically designed to have single mode operation and high sensitivity. It was structured by semiconductor fabrication processes such as thin film deposition, photolithography, and RIE (Reactive Ion Etching). With the power observation, propagation loss measurement by cut-back method showed about 4.82 dB/cm for rib waveguides. Additionally the chromium mask process for an etch stop was employed to solve the core damaging problem in patterning the sensing zone on the chip. Refractive index measurement of water/ethanol mixture with this device finally showed a sensitivity of about $\pi$/($4.04{\times}10^{-3}$).

Fabrication Technology of Glass Micro-framework by Photolithographic Process (사진식각 공정에 의한 유리 미세구조물 제작 기술)

  • O, Jae-Yeol;Jo, Yeong-Rae;Kim, Hui-Su;Jeong, Hyo-Su
    • Korean Journal of Materials Research
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    • v.8 no.9
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    • pp.871-875
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    • 1998
  • High aspect ratio microstructures were fabricated by photolithography. The material for the microstructure was photosensitive glass which has good mechanical and electrical insulation properties. The photosensitive glass was exposed to ultraviolet light at 312nm through a chromium mask in which the structures are drawn. After heat treatment process over $500^{\circ}C$, the photosensitive glass was etched in a 10% hydrofluoric acid solution with ultrasonic conditions. Final dimension of the micro-framework was greatly dependent on the thickness of photosensitive glass, mask pattern, ultraviolet light exposure and etching conditions. The maximum aspect ratio of the micro-framework obtained from this work was over 30.

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Fabrication of 3-D Structures by Inclined and Rear-side Exposures (선택적 경사 노광과 후면 노광에 의한 3차원 구조물의 제작)

  • 이준섭;신현준;문성욱;송석호;김태엽
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.1
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    • pp.47-52
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    • 2004
  • 3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.

Clinical Aspects among Platers (도금공(鍍金工)에 대한 임상적(臨床的) 관찰(觀察))

  • Kim, Doo-Hie
    • Journal of Preventive Medicine and Public Health
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    • v.10 no.1
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    • pp.16-24
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    • 1977
  • This is a result of clinical examination for workers working with Chromic acid and Chromium compounds in the plating room of their companies. I selected two companies that the plating process and the kinds of plating were similar. One (SW Co.) was more or less improved the operating environment with the ventilation machine so on and another (SR Co.) did not it so. The former was examined at March 29th 1977, the latter was at June 28th 1976. But the respiratory communicable diseases, flue or common cold so on were not spreaded there at that time. The clinical aspects were compared between the group of SW, and SR. The swelling and hyperemic signs of nasal mucous membrane and the experience of nasal bleeding were about 50%, generally, in all the groups. The following problem was dizziness or vertigo. The nasal signs in the group of SW (improved ventilation of the room air) were relatively weak, but in another, it was some what severe; - there was necrotic sign with thick nasal clast. They were only used of gauze mask when the vapors of various solvents were deeply full in the room. And there was very high rate of bronchial signs, sputum or coughing in the group of SW improved ventilation so called, than another one. I suppose that it means chronic inflammatory change of the bronchial mucous membrane with deeper signs, due to the individual protectors were carelessly or not used according to the improving of the operating environment. Theses nasal signs mentioned the above were not nearly in the other groups had not been done the Chromium plating. The Status of RBC, Hb and Ht, of urine protein and urobilinogen were mostly in normal range. But the number of WBC was more or less showed with a positive correlation to the working duration.

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