• Title/Summary/Keyword: Chemical attack

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Dual Substituent Effects on Anilinolysis of Bis(aryl) Chlorothiophosphates

  • Barai, Hasi Rani;Lee, Hai Whang
    • Bulletin of the Korean Chemical Society
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    • v.34 no.12
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    • pp.3597-3601
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    • 2013
  • The reactions of bis(Y-aryl) chlorothiophosphates (1) with substituted anilines and deuterated anilines are investigated kinetically in acetonitrile at $55.0^{\circ}C$. The Hammett plots for substituent Y variations in the substrates show biphasic concave upwards with a break point at Y = H. The cross-interaction constants (${\rho}_{XY}$) are positive for both electron-donating and electron-withdrawing Y substituents. The kinetic results of 1 are compared with those of Y-aryl phenyl chlorothiophosphates (2). The cross-interaction between Y and Y, due to additional substituent Y, is significant enough to result in the change of the sign of ${\rho}_{XY}$ from negative with 2 to positive with 1. The effect of the cross-interaction between Y and Y on the rate changes from negative role with electron-donating Y substituents to positive role with electron-withdrawing Y substituents, resulting in biphasic concave upward free energy correlation with Y. A stepwise mechanism with a rate-limiting leaving group departure from the intermediate involving a predominant frontside attack hydrogen bonded, four-center-type transition state is proposed based on the positive sign of ${\rho}_{XY}$ and primary normal deuterium kinetic isotope effects.

Kinetics and Mechanism of the Anilinolysis of Bis(N,N-dimethylamino) Phosphinic Chloride in Acetonitrile

  • Barai, Hasi Rani;Lee, Hai-Whang
    • Bulletin of the Korean Chemical Society
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    • v.32 no.12
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    • pp.4361-4365
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    • 2011
  • The nucleophilic substitution reactions of bis(N,N-dimethylamino) phosphinic chloride (3) with substituted anilines ($XC_6H_4NH_2$) and deuterated anilines ($XC_6H_4ND_2$) are investigated kinetically in acetonitrile at $65.0^{\circ}C$. The anilinolysis rate of 3 is rather slow to be rationalized by the conventional stereoelectronic effects. The magnitudes of ${\rho}_X$ (= -6.42) and ${\beta}_X$ (= 2.27) values are exceptionally great. The deuterium kinetic isotope effects (DKIEs; $k_H/k_D$) are secondary inverse ($k_H/k_D$ = 0.69-0.96). A concerted $S_N2$ mechanism involving a backside attack is proposed on the basis of secondary inverse DKIEs and the variation trend of the $k_H/k_D$ values with X. The anilinolyses of six phosphinic chlorides in MeCN are briefly reviewed by means of DKIEs, steric effects of the two ligands, positive charge of the reaction center phosphorus atom, and selectivity parameters to obtain systematic information on phosphoryl transfer reaction mechanism.

Kinetics and Mechanism of the Benzylaminolysis of O,O-Dimethyl S-Aryl Phosphorothioates in Dimethyl Sulfoxide

  • Adhikary, Keshab Kumar;Barai, Hasi Rani;Lee, Hai-Whang
    • Bulletin of the Korean Chemical Society
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    • v.32 no.12
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    • pp.4304-4308
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    • 2011
  • Kinetic studies of the reactions of O,O-dimethyl Z-S-aryl phosphorothioates with X-benzylamines have been carried out in dimethyl sulfoxide at $85.0^{\circ}C$. The Hammett (log $k_2$ vs ${\sigma}_X$) and Br$\ddot{o}$nsted [log $k_2$ vs $pK_a$(X)] plots for substituent X variations in the nucleophiles are discrete with a break region between 4-Me and H, while the Hammett plots (log $k_2$ vs ${\sigma}_Z$) for substituent Z variations in the leaving groups are linear. The sign of the cross-interaction constant (${\rho}_{XZ}$) is positive for both the strongly and weakly basic nucleophiles. Greater magnitude of ${\rho}_{XZ}$ (= 2.54) value is observed with the weakly basic nucleophiles compared to with the strongly basic nucleophiles (${\rho}_{XZ}$ = 0.17). The deuterium kinetic isotope effects ($k_H/k_D$) involving deuterated benzylamines [$XC_6H_4CH_2ND_2$] are primary normal ($k_H/k_D$ > 1). The proposed mechanism is a stepwise with a rate-limiting leaving group expulsion from the intermediate involving a frontside nucleophilic attack with a hydrogen bonded, four-center-type transition state for both the strongly and weakly basic nucleophiles.

Pitting Characteristics and Electrochemical Polarization Behaviors in Al-Cu-Si-Mg-Ag-Zr Alloys with Ageing (Al-Cu-Li-Mg-Ag-Zr합금의 시효에 따른 전기화학적 분극 거동과 공식특성)

  • Min, B.C.;Chung, D.S.;Shon, T.W.;Cho, H.K.
    • Journal of the Korean Society for Heat Treatment
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    • v.9 no.2
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    • pp.103-111
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    • 1996
  • In this paper, we studied on both electrochemical polarization behaviors and pitting characteristics of ultra high strength Al-Cu-Li-Mg-Ag-Zr alloys(named C1 and C2) and 2090 alloy according to their treatments in the deaerated 3.5% NaCl, using by the potentiodynamic and the potentiostatic method, SEM micrograph and surface roughness including depth of pitting attack. With the cyclic polarization curves, the hysteresis of the C1 and C2 alloys appeared more remarkably than that of the 2090 alloy, because of precipitation microstructural difference between C1, C2 alloys and 2090 alloy. In the pitting experiments, the correlations between pitting growth and aging conditions were analyzed with the SEM micrograph and measurement of the pit depth.

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The Effect of Coating Thickness on the Electrochemical Properties of a Li-La-Ti-O-coated Li[Ni0.3Co0.4Mn0.3]O2 Cathode

  • Lee, Hye-Jin;Park, Yong-Joon
    • Bulletin of the Korean Chemical Society
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    • v.31 no.11
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    • pp.3233-3237
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    • 2010
  • A $Li[Ni_{0.3}Co_{0.4}Mn_{0.3}]O_2$ cathode was modified by coating with Li-La-Ti-O, and the effect of the coating thickness on their electrochemical properties was studied. The thickness of the coating on the surface of $Li[Ni_{0.3}Co_{0.4}Mn_{0.3}]O_2$ was increased by increasing the wt % of the coating material. The rate capability of the Li-La-Ti-O-coated electrode was superior to that of the pristine sample. 1- and 2-wt %-coated samples showed considerable improvement in capacity retention at high C rates. However, the rate capability of a 5-wt %-coated sample decreased. All the coated samples showed a high discharge capacity and slightly improved cyclic performance under a high cut-off voltage (4.8 V) condition. Results of a storage test confirmed that the Li-La-Ti-O coating layer was effective in suppressing the dissolution of the transition metals as it offered protection from the attack of the acidic electrolyte. In particular, the 2- and 5-wt %-coated samples showed a better protection effect than the 1-wt %-coated sample.

Molecular Modeling and Docking Studies of 3'-Hydroxy-N-methylcoclaurine 4'-O-Methyltransferase from Coptis chinensis

  • Zhu, Qiankun;Zhu, Mengli;Fan, Gaotao;Zou, Jiaxin;Feng, Peichun;Liu, Zubi;Wang, Wanjun
    • Bulletin of the Korean Chemical Society
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    • v.35 no.1
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    • pp.62-68
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    • 2014
  • Coptis chinensis 3'-hydroxy-N-methylcoclaurine 4'-O-methyltransferase (HOMT), an essential enzyme in the berberine biosynthetic pathway, catalyzes the methylation of 3'-hydroxy-N-methylcoclaurine (HMC) producing reticuline. A 3D model of HOMT was constructed by homology modeling and further subjected to docking with its ligands and molecular dynamics simulations. The 3D structure of HOMT revealed unique structural features which permitted the methylation of HMC. The methylation of HMC was proposed to proceed by deprotonation of the 4'-hydroxyl group via His257 and Asp258 of HOMT, followed by a nucleophilic attack on the SAM-methyl group resulting in reticuline. HOMT showed high substrate specificity for methylation of HMC. The study evidenced that Gly117, Thr312 and Asp258 in HOMT might be the key residues for orienting substrate for specific catalysis.

A Kinetic Study on Michael-type Reactions of 1-(X-Substituted Phenyl)-2-propyn-1-ones with Amines: Effect of Amine Nature on Reactivity and Mechanism

  • Um, Ik-Hwan;Hwang, So-Jeong;Lee, Eun-Ju
    • Bulletin of the Korean Chemical Society
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    • v.29 no.4
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    • pp.767-771
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    • 2008
  • Second-order rate constants have been measured spectrophotometrically for the Michael-type reaction of 1-(Xsubstituted phenyl)-2-propyn-1-ones (2a-f) with amines in $H_2O$ at 25.0 ${\pm}$ 0.1 ${^{\circ}C}$. A linear Brønsted-type plot is obtained with ${\beta}_{nuc}$ = 0.25 ${\pm}$ 0.02, a typical $\beta_{nuc}$ value for reactions which proceed through a stepwise mechanism with attack of amine on the electrophilic center being the rate-determining step. Secondary alicyclic amines are found to be more reactive than isobasic primary amines. The Hammett plot for the reactions of 2a-f with morpholine is not linear, i.e., the substrate with a strong electron-donating group (e.g., 4-MeO) exhibits a negative deviation from the Hammett plot. However, the Yukawa-Tsuno plot for the same reactions exhibits an excellent linear correlation with ρ = 0.62 and r = 0.82. Thus, it has been proposed that the nonlinear Hammett plot is not due to a change in the ra te-determining step but due to ground-state stabilization through resonance interactions.

Aminolyses of 2,4-Dinitrophenyl and 3,4-Dinitrophenyl 2-Furoates: Effect of ortho-Substituent on Reactivity and Mechanism

  • Um, Ik-Hwan;Akhtar, Kalsoom
    • Bulletin of the Korean Chemical Society
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    • v.29 no.4
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    • pp.772-776
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    • 2008
  • Second-order rate constants ($k_N$) have been measured spectrophotometrically for reactions of 3,4-dintrophenyl 2-furoate (2) with a series of secondary alicyclic amines in 80 mol % $H_2O$/20 mol % dimethyl sulfoxide (DMSO) at 25.0 ${^{\circ}C}$. The Bronsted-type plot exhibits a downward curvature for the aminolysis of 2, which is similar to that reported for the corresponding reactions of 2,4-dintrophenyl 2-furoate (1). Substrate 2 is less reactive than 1 toward all the amines studied but the reactivity difference becomes smaller as the amine basicity increases. Dissection of the second-order rate constants into the microscopic rate constants has revealed that the reaction of 2 results in a smaller $k_2/k_{-1}$ ratio but slightly larger $k_1$ value than that of 1. Steric hindrance has been suggested to be responsible for the smaller $k_1$ value found for the reactions of 1, since the ortho-substituent of 1 would inhibit the attack of amines (i.e., the $k_1$ process).

Theoretical Studies on the Photoreaction Paths of the Monocyanopentaamminechromium(Ⅲ) Ion ([Cr(NH$_3$)$_5$CN]$^{2+}$이온의 광반응 경로에 대한 이론적 고찰)

  • Jong Jae Chung;Jong Ha Choi
    • Journal of the Korean Chemical Society
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    • v.29 no.1
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    • pp.38-44
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    • 1985
  • Photoreaction path for the monocyanochromium (Ⅲ) ion was inferred from the experimentally observed product ratio and theoretical analysis. The angular overlap model was used to analyze the d-orbital of various intermediates along a selected reaction coordinate and to determine quartet state energy level. A loss of equatorial ammine leads to pentacoordinated square pyramid with CN- ligand in an equatorial position. The SP(CNeq) intermediate undergoes a rearrangement by the N-Cr-CN bending. This process leads to a trigonal bipyramidal intermediate in which the CN- ligand is located in equatorial position. The subsequent association with a solvent molecule should probably proceed by lateral attack an one edge of the equatorial triangle. The assumption adopted above was consistent with experimental results.

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Influence of DI Water Pressure and Purified $N_2$Gas on the Inter Level Dielectric-Chemical Mechanical Polishing Process (탈이온수의 압력과 정제된 $N_2$가스가 ILD-CMP 공정에 미치는 영향)

  • 김상용;이우선;서용진;김창일;장의구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.10
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    • pp.812-816
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    • 2000
  • It is very important to understand the correlation of between inter dielectric(ILD) CMP process and various facility factors supplied to equipment to equipment system. In this paper, the correlation between the various facility factors supplied to CMP equipment system and ILD-CMP process was studied. To prevent the partial over-polishing(edge hot-spot) generated in the wafer edge area during polishing, we analyze various facilities supplied at supply system. With facility shortage of D.I water(DIW) pressure, we introduced an adding purified $N_2$(P$N_2$)gas in polishing head cleaning station for increasing a cleaning effect. DIW pressure and P$N_2$gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. We estimated two factors (DIW pressure and P$N_2$gas) for the improvement of CMP process. Especially, we obtained a uniform planarity in patterned wafer and prohibited more than 90% wafer edge over-polishing. In this study, we acknowledged that facility factors supplied to equipment system played an important role in ILD-CMP process.

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