• Title/Summary/Keyword: Chemical Vapor

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Experimental Study of the Growth of the SiC Rod using LCVD (LCVD를 이용한 SiC 로드 성장에 관한 실험적 연구)

  • Ryu, Jae-Eun;Lee, Byeong-Ro;Lee, Young-Lim
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.1615-1620
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    • 2003
  • The purpose of the study is not only to establish experimental system for laser chemical vapor deposition but also to find the characteristics of SiC rod growth that is the beginning step in developing technology of 3 dimensional prototyping with laser chemical vapor deposition. In this study, SiC rod was generated with varying TMS pressure for 5 minutes. Deposition rates with varying TMS pressure, shapes of rods, surface roughness and component organization were investigated, in particular.

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Graphene Synthesis on Pt Substrate using a Chemical Vapor Deposition Method (열화학기상증착법에 의한 백금 기판 위의 그래핀 합성)

  • Lee, Byeong-Joo;Jeong, Goo-Hwan
    • Journal of Industrial Technology
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    • v.35
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    • pp.89-94
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    • 2015
  • Graphene is a carbon-based two dimensional honeycomb lattice with monoatomic thickness and has attracted much attention due to its superior mechanical, electronic, and physical properties. Here, we present a synthesis of high quality graphene on Pt substrate using a chemical vapor deposition (CVD). We optimized synthesis condition with various parameters such as synthesis temperature, time, and cooling rate. Based on the results, we concluded that graphene synthesis is driven by mainly carbon adsorption on surface rather than precipitation of carbon which is dominant in other metal substrate. In addition, Pt substrate can be repeatedly used several times with high quality graphene.

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Neural Network Modeling of Charge Concentration of Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition (플라즈마 화학기상법을 이용하여 증착된 박막 전하 농도의 신경망 모델링)

  • Kim, Woo-Serk;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2006.04a
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    • pp.108-110
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    • 2006
  • A prediction model of charge concentration of silicon nitride (SiN) thin films was constructed by using neural network and genetic algorithm. SIN films were deposited by plasma enhanced chemical vapor deposition and the deposition process was characterized by means of $2^{6-1}$ fractional factorial experiment. Effect of five training factors on the model prediction performance was optimized by using genetic algorithm. This was examined as a function of the learring rate. The root mean squared error of optimized model was 0.975, which is much smaller than statistical regression model by about 45%. The constructed model can facilitate a Qualitative analysis of parameter effects on the charge concentration.

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Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

  • Jo, Sung-Il;Jeong, Goo-Hwan
    • Applied Science and Convergence Technology
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    • v.24 no.6
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    • pp.262-267
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    • 2015
  • We demonstrate the growth of single-walled carbon nanotubes (SWNTs) using ethylene-based chemical vapor deposition (CVD) and ferritin-induced catalytic particles toward growth temperature reduction. We first optimized the gas composition of $H_2$ and $C_2H_4$ at 500 and 30 sccm, respectively. On a planar $SiO_2$ substrate, high density SWNTs were grown at a minimum temperature of $760^{\circ}C$. In the case of growth using nanoporous templates, many suspended SWNTs were also observed from the samples grown at $760^{\circ}C$; low values of $I_D/I_G$ in the Raman spectra were also obtained. This means that the temperature of $760^{\circ}C$ is sufficient for SWNT growth in ethylene-based CVD and that ethylene is more effective that methane for low temperature growth. Our results provide a recipe for low temperature growth of SWNT; such growth is crucial for SWNT-based applications.

Characterization of Low-Temperature Graphene Growth with Plasma Enhanced Chemical Vapor Deposition

  • Ma, Yifei;Kim, Dae-Kyoung;Xin, Guoqing;Chae, Hee-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.421-421
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    • 2012
  • Graphene has drawn enormous attention owing to its outstanding properties, such as high charge mobility, excellent transparence and mechanical property. Synthesis of Graphene by chemical vapor deposition (CVD) is an attractive way to produce large-scale Graphene on various substrates. However the fatal limitation of CVD process is high temperature requirement(around $1,000^{\circ}C$), at which many substrates such as Al substrate cannot endure. Therefore, we propose plasma enhanced CVD (PECVD) and decrease the temperature to $400^{\circ}C$. Fig. 1 shows the typical structure of RF-PECVD instrument. The quality of Graphene is affected by several variables. Such as plasma power, distance between substrate and electronic coil, flow rate of source gas and growth time. In this study, we investigate the influence of these factors on Graphene synthesis in vacuum condition. And the results were checked by Raman spectra and conductivity measurement.

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An Experimental Study of the Modified Chemical Vapor Deposition Process -Temperature Distribution and Particle Deposition Measurements- (수정된 화학증착(MCVD)에 관한 실험적 연구 - 온도분포와 입자부착 측정)

  • 조재걸;최만수
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.18 no.11
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    • pp.3057-3065
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    • 1994
  • An experimental study has been made for heat transfer and particle deposition during the Modified Chemical Vapor Deposition process which is currently utilized to manufacture high quality optical waveguides. The distributions of tube wall temperatures, rates and efficiencies of particle deposition were measured. Results indicate that the temperature distributions of the tube wall in the axial direction yield the quasi-steady form in which temperature distributions fit in one curve if the relative distance from the moving torch is used as an axial coordinate. Due to the repeated heatings from the traversing torch, the wall temperatures are shown to reach the minimum ahead of torch and it is shown that the two torch formulation suggested by Park and Choi is valid to predict this minimum temperature. Measured wall temperatures, particle deposition efficiencies and tapered entry length are compared with the previous modelling results and shown to be in agreement.

Synthesis and Characteristics of FePt Nanopowder by Chemical Vapor Condensation Process

  • Yu, Ji-Hun;Lee, Dong-Won;Kim, Byoung-Kee;Jang, Tae-Suk
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09b
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    • pp.1196-1197
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    • 2006
  • FePt binary-alloy nanopowder has been successfully synthesized by chemical vapor condensation process with two metal organic precursors, i.e., iron pentacarbonyl and platinum acetylacetonate. Average particle size of the powder was less than 50 nm with very narrow size distribution, revealing high dispersion capability. Characteristics of the powder could be controlled by changing process parameters such as reaction temperature, chamber pressure, as well as gas flow rate. Magnetic properties of the synthesized FePt nanopowder were investigated and analyzed in terms of the powder characteristics.

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Preparation of Nanosized WO3 Powder by Chemical Vapor Condensation Process

  • Kim, Jin-Chun;Kim, Byoung-Kee
    • Journal of Powder Materials
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    • v.10 no.3
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    • pp.186-189
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    • 2003
  • A chemical vapor condensation (CVC) process using the pyrolysis of metal-organic precursors was applied to produce the nanosized $WO_3$ powders. Morphology and phase changes of the synthesized $WO_3$ powder as a function of CVC parameters were investigated by XRD, BET and TEM. The agglomerated nanosized monoclinic $WO_3$ powders with nearly spherical shape and 10-38 nm in mean diameter could be obtained. Conditions to produce the $WO_3$ nanopowders are presented in this paper.

Highly (111)-oriented SiC Films on Glassy Carbon Prepared by Laser Chemical Vapor Deposition

  • Li, Ying;Katsui, Hirokazu;Goto, Takashi
    • Journal of the Korean Ceramic Society
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    • v.53 no.6
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    • pp.647-651
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    • 2016
  • SiC films were prepared on glassy carbon substrates by laser chemical vapor deposition under a high pressure of $10^4Pa$ using a diode laser (wavelength = 808 nm) and a polysilaethylene precursor. (111)-oriented SiC films were formed at a deposition temperature ($T_{dep}$) range of 1150 - 1422 K. At $T_{dep}=1262K$, the SiC film with a high Lotgering factor of above 0.96 showed an exhibited pyramid-like surface morphology and flower-like grains. The highest deposition rate ($R_{dep}$) was $220{\mu}m\;h^{-1}$ at $T_{dep}=1262K$.

Fabrication of epitaxial ZnO layers on MOCVD-ZnO/(01-12) sapphire by chemical vapor transport

  • Hong, Sang-Hwui;Kato, Kenichi;Mimura, Kouji;Uchikoshi, Masahito;Abe, Seishi;Isshiki, Minoru
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.700-702
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    • 2009
  • We present the epitaxial growth of high-quality ZnO layers by chemical vapor transport (CVT) technique on (01-12) sapphire with a ZnO buffer layer growth by metal-organic chemical vapor deposition (MOCVD). The surface of the grown ZnO epitaxial layers has atomically flats and the RMS is 0.11 nm. PL spectrum of as-grown samples exhibits two emissions originated by interactions between photon and free excitons.

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