• 제목/요약/키워드: Channel Junction

검색결과 202건 처리시간 0.024초

LDD MOSFET채널 전계의 특성 해석 (Characterization of Channel Electric Field in LDD MOSFET)

  • 한민구;박민형
    • 대한전기학회논문지
    • /
    • 제38권6호
    • /
    • pp.401-415
    • /
    • 1989
  • A simple but accurate analytical model for the lateral channel electric field in gate-offset structured Lightly Doped Drain MOSFET has been developed. Our model assumes Gaussian doping profile, rather than simple uniform doping, for the lightly doped region and our model can be applied to LDD structures where the junction depth of LDD is not identical to the heavily doped drain. The validity of our model has been proved by comparing our analytical results with two dimensional device simulations. Due to its simplicity, our model gives a better understanding of the mechanisms involved in reducing the electric field in the LDD MOSFET. The model shows clearly the dependencies of the lateral channel electric field on the drain and gate bias conditions and process, design parameters. Advantages of our analytical model over costly 2-D device simulations is to identify the effects of various parameters, such as oxide thickness, junction depth, gate/drain bias, the length and doping concentration of the lightly doped region, on the peak electric field that causes hot-electron pohenomena, individually. Our model can also find the optimum doping concentration of LDD which minimizes the peak electric field and hot-electron effects.

  • PDF

간극결합채널의 아미노말단이 채널개폐에 미치는 영향 (Effect of Amino Terminus of Gap Junction Hemichannel on Its Channel Gating)

  • 임재길;천미색;정진;오승훈
    • 생명과학회지
    • /
    • 제16권1호
    • /
    • pp.37-43
    • /
    • 2006
  • 간극결합은 이웃하는 두 세포 사이에 형성된 이온채널이며 또한 단일세포막에서도 작용한다. 간극결합채널을 형성하는 아미노 말단의 10번째 아미노산 잔기 부위까지가 개폐극성(gating polarity)과 전류-전압관계에 영향을 미친다. 정상적인 Cx32 채널은 음성의 개폐극성과 내향적인 정류현상을 보이는 반면, 음성전하를 띠는 aspartate로 치환된 T8D 채널은 반대의 개폐극성과 직선의 정류현상을 보인다. 이러한 개폐극성과 정류현상의 변화가 전하 자체에 의한 것인지 아니면 아미노 말단의 구조적인 변화에 의한 것인지는 아직 불명확하다. 이러한 문제점을 규명하기 위하여 아미노 말단의 8번째 아미노산 잔기를 cysteine기로 치환시킨 T8C 채널을 만들어 substituted-cysteine accessibility method (SCAM) 방법으로 이 채널의 생물리학적 특성을 조사하고자 하였다. T8C 채널은 정상적인 Cx32 채널처럼 음성의 개폐극성과 내향적인 정류현상을 보였으며, cysteine기로 치환이 정상적인 Cx32 채널의 원래 구조를 변화시키지 않았다는 것을 의미한다. 본 연구에서는 이런 전하효과를 규명하기 위하여 음성 전하를 갖는 MTSES-와 양성전하를 갖는 MTSET+를 사용하였다. MTSES-를 처리하면 T8C 채널은 T8D 채널의 특성처럼 양성의 개폐극성과 직선의 정류현상을 보였다. 그러나 양성전하를 갖는 MTSET+를 처리한 경우에는 T8C 채널은 본래의 특성을 그대로 유지하였다. 작은 분자의 MTS에 의해서 부여된 전하가 아미노 말단의 구조적인 변화를 초래하지는 않을 것으로 생각된다. 따라서 반대의 전하를 띠는 MTSES-와 MTSET+가 서로 상반대는 영향을 미치는 것으로 보아 본 연구에서 관찰된 개폐극성과 전류-전압의 변화는 아미노말단의 구조적인 변화라기보다는 MTS에 의해서 부여된 전하 자체에 기인한다고 할 수 있다. 또한 MTS가 아미노말단의 8번째 부위에 접근하여 반응을 일으킬 수 있다는 결과는 간극결합채널의 아미노말단이 채널의 통로(pore)를 형성한다는 가설을 뒷받침한다.

자연산화 $Al_2O_3$장벽층을 갖는 스핀의존 터널링 접합에서 자기저항특성의 접합면적 의존성 (Junction Area Dependence of Tunneling Magnetoresistance in Spin-dependent Tunneling Junction with Natural $Al_2O_3$Barrier)

  • 이긍원;이상석
    • 한국자기학회지
    • /
    • 제11권5호
    • /
    • pp.202-210
    • /
    • 2001
  • 자연산화 $Al_2$O$_3$층이 형성된 하부형태 터널링 자기저항 다층박막이 기본진공도 $10^{-9}$ Torr을 유지하는 UHV 챔버내에서 이온빔 스퍼터링과 dc 마그네트론 스퍼터링 법으로 증착되었다. 제작된 스핀의존터널링 (SDT) 접합소자의 최대 터널링자기저항(TMR)와 최소 접합저항과 면적곱(R$_{j}$ A) 각각 16~17%와 50-60$\Omega$$\mu\textrm{m}$$^2$이었다. 자기장하에서 열처리한 SDT접합에 대한 TMR향상과 (R$_{j}$ A) 감소의 변화는 미미하였다. 접합면적이 81$\mu\textrm{m}$$^2$에서 47$\mu\textrm{m}$$^2$까지 접합크기가 작이짐에 따라 TMR이 증가하고 (R$_{j}$ A)이 감소하는 의존성이 관찰되었다. 이러한 현상을 하부층 단자의 판흐름 저항값 의존효과와 스핀채널효과로 설명하였다.

  • PDF

Formation of Chimeric Gap Junction Channels in Mammalian Ovarian Follicle

  • Oh Seunghoon
    • Reproductive and Developmental Biology
    • /
    • 제28권3호
    • /
    • pp.147-153
    • /
    • 2004
  • The oocyte and its surrounding granulosa cells co-exist in a closed compartment called a follicle, although they receive many signals from other parts of the body. It is well established that the intercellular communications between the oocyte and granulosa cells are required for normal oocyte development and ovulation during folliculogenesis. Gap junctions are intercellular channels allowing the direct transmission of ions and small molecules between coupled cells. Several lines of studies have shown that multiple connexins (Cx, subunits of gap junction) are expressed in mammalian ovarian follicles. Among them, two major connexins Cx37 and Cx43 are expressed in different manner. While the gap junction channels formed by Cx37 are localized between the oocyte and encompassing granulosa cells, the intercellular channels by Cx43 are located between granulosa cells. In this review, I will summarize the general properties of gap junction channels and discuss their possible formation (or compatibility) of intercellular channels formed by the oocyte and granulosa cells.

Spinal Gap Junction Channels in Neuropathic Pain

  • Jeon, Young Hoon;Youn, Dong Ho
    • The Korean Journal of Pain
    • /
    • 제28권4호
    • /
    • pp.231-235
    • /
    • 2015
  • Damage to peripheral nerves or the spinal cord is often accompanied by neuropathic pain, which is a complex, chronic pain state. Increasing evidence indicates that alterations in the expression and activity of gap junction channels in the spinal cord are involved in the development of neuropathic pain. Thus, this review briefly summarizes evidence that regulation of the expression, coupling, and activity of spinal gap junction channels modulates pain signals in neuropathic pain states induced by peripheral nerve or spinal cord injury. We particularly focus on connexin 43 and pannexin 1 because their regulation vastly attenuates symptoms of neuropathic pain. We hope that the study of gap junction channels eventually leads to the development of a suitable treatment tool for patients with neuropathic pain.

Linearity-Distortion Analysis of GME-TRC MOSFET for High Performance and Wireless Applications

  • Malik, Priyanka;Gupta, R.S.;Chaujar, Rishu;Gupta, Mridula
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • 제11권3호
    • /
    • pp.169-181
    • /
    • 2011
  • In this present paper, a comprehensive drain current model incorporating the effects of channel length modulation has been presented for multi-layered gate material engineered trapezoidal recessed channel (MLGME-TRC) MOSFET and the expression for linearity performance metrics, i.e. higher order transconductance coefficients: $g_{m1}$, $g_{m2}$, $g_{m3}$, and figure-of-merit (FOM) metrics; $V_{IP2}$, $V_{IP3}$, IIP3 and 1-dB compression point, has been obtained. It is shown that, the incorporation of multi-layered architecture on gate material engineered trapezoidal recessed channel (GME-TRC) MOSFET leads to improved linearity performance in comparison to its conventional counterparts trapezoidal recessed channel (TRC) and rectangular recessed channel (RRC) MOSFETs, proving its efficiency for low-noise applications and future ULSI production. The impact of various structural parameters such as variation of work function, substrate doping and source/drain junction depth ($X_j$) or negative junction depth (NJD) have been examined for GME-TRC MOSFET and compared its effectiveness with MLGME-TRC MOSFET. The results obtained from proposed model are verified with simulated and experimental results. A good agreement between the results is obtained, thus validating the model.

A 2-D Model for the Potential Distribution and Threshold Voltage of Fully Depleted Short-Channel Ion-Implanted Silicon MESFET's

  • Jit, S.;Morarka, Saurabh;Mishra, Saurabh
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • 제5권3호
    • /
    • pp.173-181
    • /
    • 2005
  • A new two dimensional (2-D) model for the potential distribution of fully depleted short-channel ion-implanted silicon MESFET's has been presented in this paper. The solution of the 2-D Poisson's equation has been considered as the superposition of the solutions of 1-D Poisson's equation in the lateral direction and the 2-D homogeneous Laplace equation with suitable boundary conditions. The minimum bottom potential at the interface of the depletion region due to the metal-semiconductor junction at the Schottky gate and depletion region due to the substrate-channel junction has been used to investigate the drain-induced barrier lowering (DIBL) and its effects on the threshold voltage of the device. Numerical results have been presented for the potential distribution and threshold voltage for different parameters such as the channel length, drain-source voltage, and implanted-dose and silicon film thickness.