Characterization of $HfO_2$ thin films for gate dielectric deposited by Chemical Vapor Deposition
(Gate dielectric 용 화학증착법(CVD)에 의해 증착된 $HfO_2$ 박막의 특성분석)
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- Proceedings of the Korean Ceranic Society Conference
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- 2000.10a
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- pp.160.1-160
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- 2000