• 반도체디스플레이기술학회지
• /
• 제19권1호
• /
• pp.49-54
• /
• 2020

The voltage drop due to the thin cathode film at the large size top emission OLED panel was successfully compensated with making electrical contact between thin cathode and anode auxiliary electrode by 355nm wavelength of laser. It was found that the luminance uniformity dramatically increased from around 15% to more than 80% through this electrical compensation between thin cathode and anode auxiliary electrode. Moreover, the removing process for EL materials on the anode auxiliary electrode process by laser was very reliable and stable. Therefore, it is thought that the EL removal method using laser to make electrical contacts is very appropriate to mass production for such a large size top emission OLEDs to obtain high uniformity of luminance.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
• /
• pp.1-5
• /
• 2000

As the semiconductor devices are miniaturized, the number of the unit cleaning processes increases. In order to processes by conventional RCA cleaning process, the consumption of volume of liquid chemical and DI water became huge. Therefore, the problem of environmental issues are evolved by the increased consumption of chemicals. To resolve this matter, an advanced cleaning process by Electrolyzed Water was studied in this work. The electrolyzed water was made by an electrolysis equipment which was composed of three chambers of anode, cathode, and middle chambers. In the case of electrolyzed water with electrolytes in the middle chamber, oxidatively acidic water of anode and reductively alkaline water of cathode were obtained. The oxidation/reduction potentials and pH of anode water and cathode water were measured to be +l000mV and 4.8, and -530mV and 6.3, respectively. The Si-wafers contaminated with metallic impurities were cleaning with the electrolyzed water. To analysis the amounts of metallic impurities on Si-water surfaces, ICP-MS(Inductively Coupled Plasma-Mass spectrometer) was introduced. From results of ICP-MS measurements, it was concluded that the ability of electrolyzed water was equivalent to that of the conventional RCA cleaning.

• 대한용접접합학회:학술대회논문집
• /
• 대한용접접합학회 2002년도 Proceedings of the International Welding/Joining Conference-Korea
• /
• pp.746-751
• /
• 2002

In order to make clear the physical relation among the arc plasma, the anode heat transfer and the weld penetration, the results of experimental measurements of temperatures of arc plasma, the distributions of heat input and current on the anode and the weld penetration were presented The experimental results showed that the electron temperature above the anode and current and heat input density on the anode was dominated by the position of the cathode. Furthermore, it was showed that electron temperature of arc plasma was dominated by the cathode shape. These results were related with the results of the welded penetration measurements. As a result, it was showed that the electron temperature above the anode and current density distribution on the anode decided the heat input density distribution on the anode and that the heat input density on the anode remarkably dominated the size of the weld penetration in argon GTA welding process. Furthermore, it was suggested that the cathode played the important role in the determination of the weld penetration in argon GTA welding process.

• JSTS:Journal of Semiconductor Technology and Science
• /
• 제15권6호
• /
• pp.601-607
• /
• 2015

A set of novel silicon controlled rectifier (SCR) devices' characteristics have been analyzed and verified under the electrostatic discharge (ESD) stress. A ring-shaped diffusion was added to their anode or cathode in order to improve the holding voltage (Vh) of SCR structure by creating new current discharging path and decreasing the emitter injection efficiency (${\gamma}$) of parasitic Bipolar Junction Transistor (BJT). ESD current density distribution imitated by 2-dimensional (2D) TCAD simulation demonstrated that an additional current path exists in the proposed SCR. All the related devices were investigated and characterized based on transmission line pulse (TLP) test system in a standard $0.5-{\mu}m$ 24 V CDMOS process. The proposed SCR devices with ring-shaped anode (RASCR) and ring-shaped cathode (RCSCR) own higher Vh than that of Simple SCR (S_SCR). Especially, the Vh of RCSCR has been raised above 33 V. What's more, their holding current is kept over 800 mA, which makes it possible to design power clamp with SCR structure for on chip ESD protection and keep the protected chip away from latch-up risk.

• 한국전기전자재료학회논문지
• /
• 제19권4호
• /
• pp.373-378
• /
• 2006

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
• /
• pp.53-54
• /
• 2005

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

• Journal of Microbiology and Biotechnology
• /
• 제14권2호
• /
• pp.324-329
• /
• 2004

Oxygen diffuses through the cation-specific membrane, reducing the coulomb yield of the fuel cell. In the present study, attempts were made to enhance current generation from the fuel cell by lowering the oxygen diffusion, including the uses of ferricyanide as a cathode mediator and of a platinum-coated graphite electrode. Ferricyanide did not act as a mediator as expected, but as an oxidant in the cathode compartment of the microbial fuel cell. The microbial fuel cell with platinum-coated graphite cathode generated a maximum current 3-4 times higher than the control fuel cell with graphite cathode, and the critical oxygen concentration of the former was 2.0 mg $1^{-1}$, whilst that of the latter was 6.6 mg $1^{-1}$. Based on these results, it was concluded that inexpensive electrodes are adequate for the construction of an economically feasible microbial fuel cell with better performance as a novel wastewater treatment process.

• 전기화학회지
• /
• 제16권3호
• /
• pp.138-144
• /
• 2013

Electrochemical reductions of $UO_2$ at various anode-to-cathode distances (1.3, 2.3, 3.2, 3.7 and 5.8 cm) were carried out to investigate the effect of the anode-to-cathode distance on the electrochemical reduction rate. The geometry of the electrolysis cell in this study, apart from the anode-to-cathode distance, was identical for all of the electrolysis runs. Porous $UO_2$ pellets were electrolyzed by controlling a constant cell voltage in molten $Li_2O-LiCl$ at $650^{\circ}C$. A steel basket containing the porous $UO_2$ pellets and a platinum plate were used as the cathode and anode, respectively. The metallic products were characterized by means of a thermogravimetric analyzer, an X-ray diffractometer and a scanning electron microscope. The electrolysis runs conducted during this study revealed that a short anode-to-cathode distance is advantageous to achieve a high current density and accelerate the electrochemical reduction process.

• 한국방사성폐기물학회:학술대회논문집
• /
• 한국방사성폐기물학회 2017년도 추계학술논문요약집
• /
• pp.74-74
• /
• 2017

Electrorefining is a key step in pyroprocessing. The electrorefining process is generally composed of two recovery steps - the deposit of uranium onto a solid cathode and the recovery of the remaining uranium and TRU elements simultaneously by a liquid cadmium cathode. Uranium deposit recovered from the solid cathode is a dendritic powder. It is necessary to separate the adhered salt from the deposits prior to the consolidation of uranium deposit. The adhered salt is composed of lithium, potassium, uranium, and rare earth chlorides. Distillation process was employed for the cathode processing. One of the operation methods is distillation of the salt at low temperature ($900^{\circ}C$), and then melting of the deposit at high temperature to avoid a backward reaction. For the development of the salt distiller, the distillation behavior of the low vapor pressure chlorides should be studied. Rare earth chlorides in the adhered salt of uranium deposits have relatively low vapor pressures compared to the process salt (LiCl-KCl). In this study, the evaporation rates of the lanthanum and neodymium chlorides were measured for the salt separation from electrorefiner uranium deposits in the temperature range of $825{\sim}910^{\circ}C$. The evaporation rate of both chlorides increased with an increasing templerature. The evaporation rate of lanthanum chloride varied from 0.12 to $1.68g/cm^2/h$. Neodymium chloride was more volatile than lanthanum chloride. The evaporation rate of neodymium chloride varied from 0.20 to $4.55g/cm^2/h$. The evaporation rate of both chlorides are more than $1g/cm^2/h$ at $900^{\circ}C$. Even though the evaporation rates of both chlorides were less than that of the process salt, the contents of the lanthanide chlorides were small in the adhered salt. Therefore it can be concluded that $900^{\circ}C$ is suitable for the operation temperature of the salt distiller.

• 방사성폐기물학회지
• /
• 제13권4호
• /
• pp.315-319
• /
• 2015

전해환원공정의 금속전환체로부터 우라늄을 회수하는 전해정련공정의 수율을 높이기 위해 고수율 전해정련장치가 개발되었다. 전해정련장치의 수율을 증대시키기 위해서는 고체음극에 전착되는 우라늄 덴드라이트를 음극 표면으로부터 효율적으로 회수할 수 있어야 한다. 철강 재료의 음극을 고체음극으로 사용하면, 우라늄 덴드라이트가 전착되어 쉽게 떨어지고 않고 고착 되어 점착계수(sticking coefficient)가 높아진다. 본 연구에서는 효율적으로 고체음극의 점착계수를 낮출 수 있는 진동 탈리법을 개발하였고 이를 적용하였다. 고체음극에 진동을 가함으로써 고체 표면에서 우라늄 전착물이 흑연음극의 자발특성과 유사하게 효율적으로 탈리됨을 확인하였다. 이러한 진동모드에 의한 고체음극에서의 전착물의 탈리 특성을, 고수율 전해정련장치 개념으로 개발한 흑연음극의 자발탈리 특성과 비교 검토하였다. 그리고 우라늄 덴드라이트의 진동 탈리에 대한 인가전류밀도와 진동 스트로크에 의한 영향 등을 고찰하였다.