• 제목/요약/키워드: Carrier density

검색결과 549건 처리시간 0.038초

$CuInS_2$ 단결정 박막 성장과 광전기적 특성 (Growth and Optoelectrical Properties for $CuInS_2$ Single Crystal Thin Film)

  • 홍광준;이상열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.230-233
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    • 2004
  • The stochiometric mix of evaporating materials for the $CuInS_2$ single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuInS_2$ polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.524\;{\AA}$ and $11.142\;{\AA}$, respectively. To obtain the single crystal thin films, $CuInS_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperature were 640 t and 430 t, respectively and the thickness of the single crystal thin films was $2{\mu}m$. Hall effect on this sample was measured by the method of van dot Pauw and studied on carrier density and temperature dependence of mobility. The carrier density and mobility deduced from Hall data are $9.64{\times}10^{22}/m^3,\;2.95{\times}10^{-2}\;m^2/V{\cdot}s$ at 293 K, respectively The optical energy gaps were found to be 1.53 eV at room temperature. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the thin film, we have found that the values of spin orbit coupling splitting ${\Delta}So$ and the crystal field splitting ${\Delta}Cr$ were 0.0211 eV and 0.0045 eV at 10 K, respectively. From PL peaks measured at 10K, 807.7nm (1.5350ev) mean Ex peak of the free exciton emission, also 810.3nm (1.5301eV) expresses $I_2$ peak of donor-bound exciton emission and 815.6nm (1.5201eV) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 862.0nm (1.4383eV) was analyzed to be PL peak due to donor-acceptor pair(DAP).

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반응성 액상 소결법으로 제조한 다공성 Mg3Sb2계 화합물의 열전물성 (Thermoelectric Properties of Porous Mg3Sb2 Based Compounds Fabricated by Reactive Liquid Phase Sintering)

  • 장경욱;김인기;김일호
    • 한국재료학회지
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    • 제25권2호
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    • pp.68-74
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    • 2015
  • The porous $Mg_3Sb_2$ based compounds with 60~70% of relative density were prepared by powder compaction at room temperature and reactive liquid phase sintering at 1023 K for 4hrs. The stoichiometric $Mg_3Sb_2$ compounds were synthesized from elemental Sb and Mg powder in the mixing range of 61~63 at% Mg. The increased scattering effect due to the micro-pores reduced the mobility of the charge carrier and the phonon, which caused the electrical conductivity and the thermal conductivity to decrease, respectively. But the scattering effect was greater for the electrical conductivity than for the thermal conductivity. Excess Mg alloyed in the $Mg_3Sb_2$ compounds decreased the electrical conductivity, but had no effect on the thermal conductivity. On the other hand, the large increase of the Seebeck coefficient was the result of a decrease in the charge carrier density due to the excess Mg. Dimensionless figure of merit of the porous $Mg_3Sb_2$ compound reached a maximum value of 0.28 at 61 at% Mg. The obtained value was similar to that of $Mg_3Sb_2$ compounds having little pores.

Simple and Clean Transfer Method for Intrinsic Property of Graphene

  • 최순형;이재현;장야무진;김병성;최윤정;황종승;황성우;황동목
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.659-659
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    • 2013
  • Recently, graphene has been intensively studied due to the fascinating physical, chemical and electrical properties. It shows high carrier mobility, high current density, and high thermal conductivity compare with conventional semiconductor materials even it has single atomic thickness. Especially, since graphene has fantastic electrical properties many researchers are believed that graphene will be replacing Si based technology. In order to realize it, we need to prepare the large and uniform graphene. Chemical vapor deposition (CVD) method is the most promising technique for synthesizing large and uniform graphene. Unfortunately, CVD method requires transfer process from metal catalyst. In transfer process, supporting polymer film (Such as poly (methyl methacrylate)) is widely used for protecting graphene. After transfer process, polymer layer is removed by organic solvents. However, it is impossible to remove it completely. These organic residues on graphene surface induce quality degradation of graphene since it disturbs movement of electrons. Thus, in order to get an intrinsic property of graphene completely remove of the organic residues is the most important. Here, we introduce modified wet graphene transfer method without PMMA. First of all, we grow the graphene from Cu foil using CVD method. And then, we deposited several metal films on graphene for transfer layer instead of PMMA. Finally, we fabricate graphene FET devices. Our approaches show low defect density and non-organic residues in comparison with PMMA coated graphene through Raman spectroscopy, SEM and AFM. In addition, clean graphene FET shows intrinsic electrical characteristic and high carrier mobility.

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DFB 반도체 레이저의 직접 주파수변조(DFM) 특성의 전기적 회로모델에 관한 연구 (A Study on the Electric Circuit Model for the Direct FM Characteristics of DFB Semiconductor Lasers)

  • 정순구;전광석;홍완희
    • 한국통신학회논문지
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    • 제19권12호
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    • pp.2426-2438
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    • 1994
  • 본 논문에서는 DFB 반도체 레이저의 직접 주파수변조 응답특성에 대한 새로운 전기적 회로모델을 제시하였다. 특히 본 논문에서는 캐리어농도의 변조효과뿐만 아니고 온도변조효과에 따른 DFB 반도체 레이저의 변조특성을 동시에 고려함으로써 DC에서 수 GHz의 변조주파수 범위에 이르는 주파수응답특성을 얻을 수 있었다. 온도변조효과에 의한 주파수응답특성은 레이저 다이오드의 구조로부터 회로모델링하여 기존의 실험치와 비교하였으며, 캐리어농도변조효과에 이한 회로모델링은 DFB 레이저의 율방정식(rate equations)을 선형화함으로써 소신호 회로모델을 구하고 이를 기존의 수치해석에 의해 제시된 결과치와 비교하여 전체적인 주파수응답특성이 잘 일치함을 알 수 있었다.

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단일 온도대역 수평 Bridgman(1-T HB) 법에 의한 GaAs 단결정 성장 (Single Crystal Growth of GaAs by Single Temperature Zone horizontal Bridgman(1-T HB) Method)

  • 오명환;주승기
    • 한국결정학회지
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    • 제7권1호
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    • pp.73-80
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    • 1996
  • 단일 온도대역 수평 Bridgman(1-T HB)법에 의해 2인치 직경의 GaAs 단결정을 성장시키기 위하여 그 장치를 설계·제작하였고, undoped, Si-doped 및 Zn-doped 단결정을 성장하였다. 단결정성의 측면에서 성장횟수별 비로 0.73의 단결정성을 보였고, 격자결함 밀도(etch pit density)는 n-type의 경우 평균 5,000/cm2, p-type의 경우 10,000/cm2, 그리고 undoped의 경우 20,000/cm2 정도를 보였다. 한편 undoped GaAs 단결정의 경우, Hall 측정에 의한 carrier 농도가 ∼1×1016/cm3인 것으로 나타나 기존의 이중 온도대역(2-T : double temperature zone) 또는 삼중 온도대역(3-T : three temperature zone) 수평 Bridgman 방식에 비하여 Si 유입량이 절반 수준인 것으로 측정되었다. 따라서 1-T HB 방식에 의하여 2-T나 3-T HB 방법보다 나은 수율을 갖고 더 순도가 높은 GaAs 단결정을 성장시킬 수 있었다.

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고섬광에 노출된 광센서의 손상 특성 : 열확산 모델 (Characteristics of Damage on Photosensor Irradiated by Intense Illumination : Thermal Diffusion Model)

  • 권찬호;신명숙;황현석;김홍래;김성식;박민규
    • 한국군사과학기술학회지
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    • 제15권2호
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    • pp.201-207
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    • 2012
  • Pulsed lasers at the 613 nm and 1064 nm wavelengths on nanoseconds have been utilized to characterize the damage on Si photodiode exposed to intense illumination. Morphological damages and structural changes at sites on the photodiode irradiated during microseconds of laser pulses were analyzed by FE-SEM images and XRD patterns, respectively. The removal of oxide coating, ripple, melting marks, ridges, and crater on photodiodes were definitely observed in order of increasing the pulse intensities generated above the damage threshold. Then, the degradation in photosensitivity of the Si photodiode irradiated by high power density pulses was measured as a function of laser irradiation time at the various wavelengths. The free charge carrier and thermal diffusion mechanisms could have been invoked to characterize the damage. The relative photosensitivity data calculated using the thermal diffusion model proposed in this paper have been compared with the experimental data irradiated above the damage threshold.

6H-SiC wafer의 결정성 및 전기적 특성 (Crystallinity and electrical properties of 6H-SiC wafers)

  • 김화목;임창성;오근호
    • 한국결정성장학회지
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    • 제7권3호
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    • pp.393-399
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    • 1997
  • 승화법에 의한 6H-SiC 단결정의 최적 성장조건을 설정하여 고품질의 6H-Sic 단결정을 성장하였다. 성장된 결정의 직경은 약 33 mm, 길이는 약 11 mm였다. 성장된 결정을 절단하여 연마한 후 광학현미경을 이용하여 연마된 SiC wafer의 micropipe density와 planar defect density를 측정한 결과, micropipe density는 400개/$ \textrm{cm}^2$이었고 planar defect density는 50개/$\textrm{cm}^2$이었다. 이 6H-SiC wafer와 기판으로 사용된 Acheson 결정의 결정성을 비교하기 위하여 Raman 분광법과 double crystal X-ray diffraction 분석법이 사용되었다. 이 분석에 의해 승화법에 의해 성장된 6H-SiC wafer가 Acheson seed보다 결정성이 우수하였다. Hall effect 측정법에 의해 불순물이 첨가되지 않은 6H-SiC wafer의 전기적인 특성을 측정하였으며 그 결과 캐리어 농도는 $3.91{\times}10^{15}/\textrm {cm}^3$이었고, n-type이었다.

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Physics-Based SPICE Model of a-InGaZnO Thin-Film Transistor Using Verilog-A

  • Jeon, Yong-Woo;Hur, In-Seok;Kim, Yong-Sik;Bae, Min-Kyung;Jung, Hyun-Kwang;Kong, Dong-Sik;Kim, Woo-Joon;Kim, Jae-Hyeong;Jang, Jae-Man;Kim, Dong-Myong;Kim, Dae-Hwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제11권3호
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    • pp.153-161
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    • 2011
  • In this work, we report the physics-based SPICE model of amorphous oxide semiconductor (AOS) thin-film transistors (TFTs) and demonstrate the SPICE simulation of amorphous InGaZnO (a-IGZO) TFT inverter by using Verilog-A. As key physical parameter, subgap density-of-states (DOS) is extracted and used for calculating the electric potential, carrier density, and mobility along the depth direction of active thin-film. It is confirmed that the proposed DOS-based SPICE model can successfully reproduce the voltage transfer characteristic of a-IGZO inverter as well as the measured I-V characteristics of a-IGZO TFTs within the average error of 6% at $V_{DD}$=20 V.

Dry oxidation of Germanium through a capping layer

  • 정문화;김동준;여인환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.143.1-143.1
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    • 2016
  • Ge is a promising candidate to replace Si in MOSFET because of its superior carrier mobility, particular that of the hole. However Ge oxide is thermodynamically unstable. At elevated temperature, GeO is formed at the interface of Ge and GeO2, and its formation increases the interface defect density, degrading its device performance. In search for a method to surmount the problem, we investigated Ge oxidation through an inert capped oxide layer. For this work, we prepared low doped n-type Ge(100) wafer by removing native oxide and depositing a capping layer, and show that GeO2 interface can be successfully grown through the capping layer by thermal oxidation in a furnace. The thickness and quality of thus grown GeO2 interface was examined by ellipsometry, XPS, and AFM, along with I-V and C-V measurements performed at 100K to 300K. We will present the result of our investigation, and provide the discussion on the oxide growth rate, interface state density and electrical characteristics in comparison with other studies using the direct oxidation method.

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AF궤도회로에서 에너지 밀도가 정보신호 검출시간에 미치는 영향 (The Influence of Energy Density upon Detection Time of Information Signal in AF Track Circuit)

  • 김민석;황인광;이종우
    • 전기학회논문지
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    • 제60권6호
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    • pp.1146-1151
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    • 2011
  • There are two methods for train control in information transmission by using track circuit system and installing wayside transmitter. Information signal is transmitted to the on-board antenna by using rails. Continuous information about train intervals, speed and route is received by on-board antenna in AF track circuit system. The information signal is included with carrier wave and received by magnetic coupling in the on-board antenna. Therefore, it is important to define standard current level in the AF track circuit system. When current flowed to rails is low, magnetic sensors are not operated by decreasing magnetic field intensity. Hence, SNR is decreased because electric field intensity is decreased. When the SNR is decreased, there is the serious influence of noise upon demodulation. So, the frequency of information signal is not extracted in frequency response. Thus, it is possible to happen to train accident and delay as the information signal is not analyzed in the on-board antenna. In this paper, standard energy density is calculated by using Parseval's theory in UM71c track circuit. Hence, detection time of information signal is presented.