• Title/Summary/Keyword: Carbon film

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Sensitive and Selective Electrochemical Glucose Biosensor Based on a Carbon Nanotube Electronic Film (탄소나노튜브 전자 필름을 이용한 고감도-고선택성 전기화학 글루코스 센서)

  • Lee, Seung-Woo;Lee, Dongwook;Seo, Byeong-Gwuan
    • Applied Chemistry for Engineering
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    • v.33 no.2
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    • pp.188-194
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    • 2022
  • This work presents a non-destructive and straightforward approach to assemble a large-scale conductive electronic film made of a pre-treated single-walled carbon nanotube (SWCNT) solution. For effective electron transfer between the immobilized enzyme and SWCNT electronic film, we optimized the pre-treatment step of SWCNT with p-terphenyl-4,4"-dithiol and dithiothreitol. Glucose oxidase (GOx, a model enzyme in this study) was immobilized on the SWCNT electronic film following the positively charged polyelectrolyte layer deposition. The glucose detection was realized through effective electron transfer between the immobilized GOx and SWCNT electronic film at the negative potential value (-0.45 V vs. Ag/AgCl). The SWCNT electronic film-based glucose biosensor exhibited a sensitivity of 98 ㎂/mM·cm2. In addition, the SWCNT electronic film biosensor showed the excellent selectivity (less than 4 % change) against a variety of redox-active interfering substances, such as ascorbic acid, uric acid, dopamine, and acetaminophen, by avoiding co-oxidation of the interfering substances at the negative potential value.

Ability of Nitride-doped Diamond Like Carbon Thin Film as an Alignment Layer according to Deposition Methods (배향막으로 사용된 NDLC 박막의 증착방법에 따른 능력)

  • Kim, Young-Hwan;Kim, Byoung-Yong;Oh, Byoung-Yun;Kang, Dong-Hun;Park, Hong-Gyu;Lee, Kang-Min;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.431-431
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    • 2007
  • In this paper, the LC alignment characteristics of the NDLC thin film deposited by PECVD and sputtering were reported respectively. The NDLC thin film deposited using sputter showed uniform LC alignment at the 1200 eV of the ion beam intensity and pretilt angle was about $2^{\circ}$ while the NDLC thin film deposited using the PECVD showed uniform LC alignment and high pretilt angle at the 1800 eV of the ion beam intensity. Concerning the ion beam intensity, uniform LC alignment of the NDLC thin film deposited by the sputtering was achieved at the lower intensity. And the pretilt angle of the NDLC thin film deposited by sputter was higher than those of NDLC thin film that was deposited using the PECVD. The uppermost of the thermal stability of NDLC thin film was $200^{\circ}C$, respectively. However, NDLC thin film deposited by the PECVD showed stability at high temperature without defects, compared to NDLC thin film deposited by the sputter.

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Studies on the Properties of the Plasma TEOS $SiO_2$ Film (PECVD TEOS $SiO_2$막의 특성에 관한 연구)

  • 이수천;이종무
    • Journal of the Korean Ceramic Society
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    • v.31 no.2
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    • pp.206-212
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    • 1994
  • Effects of the film deposition process parameters on the properties such as deposition rate, etch rate, refractive index, stress and step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate glass (TEOS) SiO2 film were investigated and analysed using SEM, FTIR and SIMS techniques. Increasing TEOS flow or decreasing O2 flow increased the deposition rate and the compressive stress of the oxide film but produced a less denser film. The deposition rate decreased owing to the decrease in the sticking coefficient of the TEOS and the O2 molecules onto the substrate Si with increasing the substrate temperature. Increasing the substrate temperature produced a denser film with a lower etch rate and the higher refractive index by lowering SiOH and moisture contents. Increasing the rf power increases the ion bombardment energy. This increase in energy, in turn, increases the deposition rate and tends to make the film denser. No appreciable changes were found in the deposition rate but the refractive index and the stress of the film decreased with increasing the deposition pressure. The carbon content in the plasma TEOS CVD oxide film prepared under our standard deposition conditions were very low according to the SIMS analysis results.

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A COMPUTATIONAL STUDY ON FREE CONVECTION FOR THERMAL PERFORMANCE EVALUATION OF A SWNT THIN-FILM HEATER (SWNT 투명박막히터의 열성능 평가를 위한 자유대류 열전달 해석)

  • Kwak, H.S.;Lee, S.E.;Park, K.S.;Kim, K.
    • 한국전산유체공학회:학술대회논문집
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    • 2009.04a
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    • pp.315-320
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    • 2009
  • A computational investigation is conducted on free convection from a thin plate having a surface heat source. The thermal configuration simulates the recently-proposed transparent film heater made of a single-walled carbon nanotube film on a glass substrate. The Navier-Stokes computations are carried out to study laminar free convection from the heater. Parallel numerical experiments are performed by using a simplified design analysis model which solve the conduction equation with the boundary conditions utilizing several existing correlations for convective heat transfer coefficient. Comparison leads to the most suitable boundary condition for the thermal model to evaluate the performance evaluation of a transparent thin-film heater.

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A Study on the Characteristics of TiN film deposited using Reactive Magnetron Sputter ion Plating (Reactive Magnetron Sputter ion Plating법으로 증착된 TiN 박막의 특성에 관한 연구)

  • 이민구;김흥회;김선재;이창규;김영석
    • Journal of the Korean institute of surface engineering
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    • v.33 no.2
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    • pp.115-125
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    • 2000
  • TiN films were deposited onto Stellite 6B alloy (Co base) by the reactive magnetron sputter ion plating. As the bias increases, TiN film changes from columnar structure to dense structure with great hardness and smooth surface due to densification and resputtering by ion bombardment. The content of oxygen and carbon impurities in the TiN film decreases greatly when the substrate bias is applied. The preferred orientation of the TiN films changes from (200) to (111) with decreasing $N_2$/Ar ratio, and from (200) to (111) and then (220) with increasing the substrate bias. The change of the preferred orientation is discussed in terms of surface energy and strain energy which are related to the impurity contents and the ion bombardment damage. The hardness of the TiN film increases with increasing compressive stress generated in the film by virtue of ion bombardment. It becomes as high as up to 3500kgf/mm$^2$ when an appropriate substrate bias is applied.

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Flexible Antenna Radiator Fabricated Using the CNT/PVDF Composite Film (CNT/PVDF 복합막을 이용한 유연소자용 안테나 방사체)

  • Kim, YongJin;Lim, Young Taek;Lee, Sunwoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.3
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    • pp.196-200
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    • 2015
  • In this paper, we fabricated flexible antenna radiator using the CNT/PVDF (carbon nanotube / polyvinylidene fluoride) composite film. We used polymer film as a matrix material for the flexible devices, and introduced CNTs for adding conductivity into the film resulting in obtaining performances of the antenna radiator. Spray coating method was used to form the CNT/PVDF composite radiator, and pattern formation of the radiator was done by shadow mask during the spray coating process. We investigated the electrical properties of the CNT/PVDF composite films with the CNT concentration, and also estimated the radiator performance. Finally we discuss the feasibility of the CNT/PVDF composite radiator for the flexible antenna.

Evaluation of Thin Film Residual Stress through the Theoretical Analysis of Nanoindentation Curve (나노 압입곡선의 이론적 분석을 통한 박막의 잔류응력 평가)

  • Lee, Yun-Hee;Jang, Jae-Il;Kwon, Dong-Il
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.7
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    • pp.1270-1279
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    • 2002
  • Residual stress is a dominant obstacle to efficient production and safe usage of device by deteriorating the mechanical strength and failure properties. Therefore, we proposed a new thin film stress-analyzing technique using a nanoindentation method. For this aim, the shape change in the indentation load-depth curve during the stress-relief in film was theoretically modeled. The change in indentation depth by load-controlled stress relaxation process was related to the increase or decrease in the applied load using the elastic flat punch theory. Finally, the residual stress in thin film was calculated from the changed applied load based on the equivalent stress interaction model. The evaluated stresses for diamond-like carbon films from this nanoindentation analysis were consistent with the results from the conventional curvature method.

Tribolgical Characteristics of DLC Film using Substrates with Varying Hardness

  • Park, Jae-Hong;Jang, Beom-Taek;Kim, Seock-Sam
    • KSTLE International Journal
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    • v.9 no.1_2
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    • pp.31-35
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    • 2008
  • DLC (Diamond Like Carbon) films have predominant tribological properties like a high hardness, low friction and high chemical resistance; therefore, DLC films are applied in a wide range of industrial fields. This paper evaluated the characteristics of DLC films deposited on bearing steel with different hardness by RF-PECVD (Radio Frequency - Plasma Enhanced Chemical Vapor Deposition) method. Si-interlayer was deposited on bearing steel to improve adhesion strength by RF-Sputtering method. The DLC film structures were analyzed with Raman spectra and Gaussian function. Adhesion strength of DLC films was measured with a scratch tester. Friction and wear test were carried out with a ball-on -disc type to investigate the tribological characteristics. Experimental results showed that DLC films deposited on bearing steel under same deposition condition have typical structure DLC films regardless of hardness of bearing steel. Adhesion strength of DLC film is increased with a hardness of bearing steel. Friction coefficient of DLC film showed lower at the high hardness of bearing steel.

Properties of Polyacrylonitrile/Single Wall Carbon Nanotube Composite Films Prepared in Nitric Acid

  • Kim Seong Hoon;Min Byung Gil;Lee Sang Cheol
    • Fibers and Polymers
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    • v.6 no.2
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    • pp.108-112
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    • 2005
  • Nanocomposite films were prepared by casting the solution of polyacrylonitrile (PAN) and single wall nanotube (SWNT) in nitric acid subsequent to sonication. Even though SWNT shows good dispersion visually, the reinforcing effect was not satisfactory. The G-band Raman spectra of the drawn film clearly demonstrated that SWNTs in the film are well-oriented along the drawing axis of the film. The electrical resistivity of the film prepared using nitric acid was lower than that of the film using DMF. Thus, nitric acid is presumably more effective in dispersing nanotubes than DMF.

The Effect of Solvent and Doping Matter on the Electric Properties of Polyaniline Films (폴리아닐린 필름의 전기적 특성에 미치는 용매 및 도핑물질의 효과)

  • 김재욱
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.713-718
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    • 1997
  • Polyaniline free standing films cast from N-methyl-2-pyrrolidinone(NMP) solution, camphorsulfonic acid(HCSA), dodecylbenzensulfonic acid(HDBSA), inorganic matter(carbon black, graphite) and metal(silver) were prepared by processings. The properties of these films such as crystallinity, near-infrared absorption spectra and conductivity were investigated. The HCSA and HDBSA doped polyaniline films cast from m-cresol and chloroform solvents showed the metallic property and high crystallinity, respectively. The value of conductivity in the HCSA doped polyaniline film obtained 180 S/cm. We have obtained the value of conductivity 200 S/cm in the metal(silver) doped polyaniline film, which is higher than that of the HCSA doped polyaniline film. The metal(silver) doped polyaniline film shows good properties as a electromagnetic shielding material.

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