Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 33 Issue 2
- /
- Pages.115-125
- /
- 2000
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
A Study on the Characteristics of TiN film deposited using Reactive Magnetron Sputter ion Plating
Reactive Magnetron Sputter ion Plating법으로 증착된 TiN 박막의 특성에 관한 연구
Abstract
TiN films were deposited onto Stellite 6B alloy (Co base) by the reactive magnetron sputter ion plating. As the bias increases, TiN film changes from columnar structure to dense structure with great hardness and smooth surface due to densification and resputtering by ion bombardment. The content of oxygen and carbon impurities in the TiN film decreases greatly when the substrate bias is applied. The preferred orientation of the TiN films changes from (200) to (111) with decreasing
Keywords