• 제목/요약/키워드: Carbon contamination

검색결과 216건 처리시간 0.031초

Tribological Properties of DLC for Die Applications

  • Lee, Kyu-Yong;Liu, Zhen-Hua
    • Design & Manufacturing
    • /
    • 제6권1호
    • /
    • pp.24-28
    • /
    • 2012
  • Friction and wear affect all processes involved in the extraction of materials and their conversion into finished products in the die applications such as drawing, extrusion etc. Originating phenomenon from the contact surface between the tool and workpiece, they are usually a hindrance to materials process operations which usually result in damaging the tools, increasing energy consumption, the contamination of processed material by wear particles and also some problems associated with technologies to control friction and wear. The most well established method to control friction and wear is by the application of lubricant such as fluorocarbon. Besides, a surface technique so-called surface modification can be applied to solve the tribology problems of the die applications for both the economical and ecological reasons. In this article, we applied DLC(diamond-like carbon) thin film on alumina ceramic for HT test using the PIID(plasma ion immersion deposition), 4 groups of test specimens were tested up to $200^{\circ}C$ which is a little higher than the normal working temperature of die application. Pin-on-disc tribo-tester was used to test the friction and surfaces were characterized by SEM and EDS and else, the morphology changes of DLC coatings were studied. The present work indicated that the DLC had a great potential to reduce the friction and wear in the alumina die application without lubricants.

  • PDF

건설현장 절취사면의 산성배수 발생특성과 잠재적 산발생능력 평가 (Generation Characteristics and Prediction of Acid Rock Drainage(ARD) of Road Cut Slopes)

  • 이규호;김재곤;이진수;전철민;박삼규
    • 한국지반공학회:학술대회논문집
    • /
    • 한국지반공학회 2005년도 춘계 학술발표회 논문집
    • /
    • pp.491-498
    • /
    • 2005
  • Acid Rock Drainage(ARD) is the product formed by the atmospheric(i.e. by water, oxygen and carbon dioxide) oxidation of the relatively common iron-sulphur minerals pyrite($FeS_2$). ARD causes the acidification and heavy metal contamination of water and soil and the reduction of slope stability. In this study the generation characteristics and the prediction of ARD of various road cut slopes were studied. An attempt to classify the rocks into several groups according to their acid generation potentials was made. Acid Base Accounting(ABA) tests, commonly used as a screening tool in ARD predictions, were performed. Sixteen rock samples were classified into PAF(potentially acid forming) group and four rock samples into NAF(non-acid forming) group. The chemical analysis of water samples strongly suggested that ARD with high content of heavy metals and low pH could pollute the ground water and/or stream water.

  • PDF

Laboratory-scale Microcosm Studies in Assessing Enhanced Bioremediation Potential of BTEX and MTBE under Various Electron Acceptors in Contaminated Soil

  • 오인석;이시진;장순웅
    • 한국지하수토양환경학회:학술대회논문집
    • /
    • 한국지하수토양환경학회 2003년도 추계학술발표회
    • /
    • pp.368-371
    • /
    • 2003
  • Accidental release of petroleum products from underground storage tank(USTs) is one of the most common causes of groundwater contamination. BTEX is the major components of fuel oils, which are hazardous substances regulated by many nations. In addition to BTEX, other gasoline consituents such as MTBE(methyl-t-buthyl ether), anphthalene are also toxic to humans. Natual attenuation processes include physic, chemical, and biological trasformation. Aerobic and anaerobic biodegradation are believed to be the major processes that account for both containment of the petroleum-hydrocarbon plum and reduction of the contaminant concentrations. Aerobic bioremediation has been highly effective in the remediation of many fuel releases. However, Bioremediation of aromatic hydrocarbons in groundwater and sediments is ofen limited by the inability to provide sufficient oxygen to the contaminated zones due to the low water solubility of oxygen. Anaerobic processes refer to a variety of biodegradation mechanisms that use nitrate, ferric iron, sulfate, and carbon dioxide as terminal electron accepters. The objectives of this study was to conduct laboratory-scale microcosm studies in assessing enhanced bioremediation potential of BTEX and MTBE under various electron accepters(aerobic, nitrate, ferric iron, sulfate) in contaminated Soil. these results suggest that, presents evidence and a variety pattern of the biological removal of aromatic compounds under enhanced nitrate-, Fe(III)-, sulfate-reducing conditions.

  • PDF

Hydrogen Behaviors with different introduction methods in SiC-C Films

  • Huang, N.K.;Zou, P.;Liu, J.R.;Zhang, L.
    • 한국진공학회지
    • /
    • 제12권S1호
    • /
    • pp.1-6
    • /
    • 2003
  • SiC-C films were deposited with r. f. magnetron sputtering on substrates followed by argon ion bombardment. These films were then permeated by hydrogen gas under the pressure of $3.23\times10^{7}$ Pa for 3 hours at temperature of 500K or bombarded with hydrogen ion beam at 5 keV and a dose of $1\times10^{18}$ ions/$\textrm{cm}^2$. SIMS, AES and XPS were used to analyze hydrogen related species, chemical bonding states of C, Si as well as contamination oxygen due to hydrogen participation in the SiC-C films in order to study the different behaviors of hydrogen in carbon-carbide films due to different hydrogen introduction. Related mechanism about the effects of hydrogen on the element of the SiC-C films was discussed in this paper.

$CHF_3$/$C_2$$F_6$ 반응성이온 건식식각에 의한 실리콘 표면의 오염 및 제거에 관한 연구 (A Study on the Silicon surface and near-surface contamination by $CHF_3$/$C_2$$F_6$ RIE and its removal with thermal treatment and $O_2$ plasma exposure)

  • 권광호;박형호;이수민;곽병화;김보우;권오준;성영권
    • 전자공학회논문지A
    • /
    • 제30A권1호
    • /
    • pp.31-43
    • /
    • 1993
  • Thermal behavior and $O_{2}$ plasma effects on residue and penetrated impurities formed by reactive ion etching (RIE) in CHF$_{3}$/C$_{2}$F$_{6}$ have been investigated using X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS) techniques. Decomposition of polymer residue film begins between 200-300.deg. C, and above 400.deg. C carbon compound as graphite mainly forms by in-situ resistive heating. It reveals that thermal decomposition of residue can be completed by rapid thermal anneal above 800.deg. C under nitrogen atmosphere and out-diffusion of penetrated impurities is observed. The residue layer has been removed with $O_{2}$ plasma exposure of etched silicon and its chemical bonding states have been changed into F-O, C-O etc.. And $O_{2}$ plasma exposure results in the decrease of penetrated impurities.

  • PDF

자화된 유도결합형 $\textrm{C}_{4}\textrm{F}_{8}$ 플라즈마를 이용한 $\textrm{SiO}_2$ 건식 식각시 실리콘 표면에 발생하는 손상 및 오염에 관한 연구 (A Study of Damage and Contamination on Silicon by Magnetized Inductively Coupled $\textrm{C}_{4}\textrm{F}_{8}$ Plasma Etching of $\textrm{SiO}_2$)

  • 남욱준;김현수;윤종구;염근영
    • 한국재료학회지
    • /
    • 제8권9호
    • /
    • pp.825-830
    • /
    • 1998
  • 자화된 유도결합형 C4F8 플라즈마로 SiO2를 건식식각시 실리콘 표면에 발생하는 손상과 오염에 대하여 연구하였다. 오염의 분석을 위해서 XPS, SIMS, TEM을 사용하였으며, 손상정도를 측정하기 위해서 HRTEM과 Schottky-diode 구성을 통한 I-V특성 측정을 사용하였다. 유도 결합형 C4F8 플라스마에 0에서 18Gauss까지의 자장이 가해짐에 따라서 실리콘 표면에 생기는 잔류막의 두께가 SiO2식각속도와 선택비의 증가와 함께 증가하였으며, XPS를 통하여 그 조성이 fluorine-rich에서 carbon-rich 한 상태로 변화함을 알 수 있었다. 자장을 가하지 않는 상태에서는 표면에서 $40\AA$부근까지 고밀도의 손상층이 관찰되었으나, 자장을 가함에 따라서 노출된 손상층의 깊이는 깊어지나 그 밀도는 줄어들음을 HRTEM을 통하여 관찰 할 수 있었다. Schottky-diode를 통한 I-V특성곡선의 분석으로 자장이 증가함에 따라서 전기적인 손상이 감소함을 알 수 있었다.

  • PDF

Real-time Assay of Toxic Lead in In Vivo Living Plant Tissue

  • Ly, SuwYoung;Kim, Nack Joo;Youn, Minsang;Kim, Yongwook;Sung, Yeolmin;Kim, Dohoon;Chung, Tackhyun
    • Toxicological Research
    • /
    • 제29권4호
    • /
    • pp.293-298
    • /
    • 2013
  • A method of detecting lead was developed using square wave anodic stripping voltammetry (SWASV) with DNA-carbon nanotube paste electrode (CNTPE). The results indicated a sensitive oxidation peak current of lead on the DNA-CNTPE. The curves were obtained within a concentration range of 50 $ngL^{-1}-20mgL^{-1}$ with preconcentration time of 100, 200, and 400 sec at the concentration of $mgL^{-1}$, ${\mu}gL^{-1}$, and $ngL^{-1}$, respectively. The observed relative standard deviation was 0.101% (n = 12) in the lead concentration of 30.0 ${\mu}gL^{-1}$ under optimum conditions. The low detection limit (S/N) was pegged at 8 $ngL^{-1}$ ($2.6{\times}10^{-8}M$). Results showed that the developed method can be used in real-time assay in vivo without requiring any pretreatment and pharmaceutical samples, and food samples, as well as other materials requiring water source contamination analyses.

토양 중 브롬화다이옥신류의 분석법 고찰

  • 김태승;신선경;이정희
    • 한국지하수토양환경학회:학술대회논문집
    • /
    • 한국지하수토양환경학회 2003년도 총회 및 춘계학술발표회
    • /
    • pp.413-417
    • /
    • 2003
  • The last few decades have seen drastic growth in the use of brominated flame retardants(BFRs). There is the problems of polybrominated dibenzo-p-dioxins(PBDDS) and polybrominated dibenzofurans(PBDFs) generation as by-products in combustion process of BFRs. PBDDs/PBDFs are highlighted the new pollutants of environmental contamination, recently. In this study, the 10 kinds of PBDDs/PBDFs standards were used to perform the experiments of recoveries. The analysis of PBDDs/PBDFs in soil environmental samples. was carried out. In silica gel column cleanup, PBDDs/PBDFs eluted until 80mL of n-hexane, and the recovery was obtained 73∼105%. In multi-layer silica gel column cleanup, the recovery was obtained 56∼125% with various elution solvents. In alumina clean process, the standard mixture(PBDES, PBDDs/PBDFs) eluted the first fraction of 2% dichloromethane with n-hexane in the range of 0∼100mL, PBDEs compounds eluted in the second fraction of 50% dichloromethane with n-hexane. In activated carbon column cleanup, the PBBEs eluted to the first fraction(n-hexane) and second fraction(toluene), but PBDDs/PBDFs only eluted to the second fraction. The analytical methods of PBDDs/PBDFs for soil was established based on the experimental results of the environmental samples.

  • PDF

투과전자현미경에 타소질 불순물의 오염 최소화를 위한 실험 조건 (Experimentally Minimized Contaminative Condition of Carbonaceous Artifacts in Transmission Electron Microscope)

  • 김영민;최주형;송경;김양수;김윤중
    • Applied Microscopy
    • /
    • 제39권1호
    • /
    • pp.73-77
    • /
    • 2009
  • Contaminative artifacts such as carbonaceous materials on carbon-coated microgrids are unavoidable, which is induced by electron beam exposure inside electron microscopes. This phenomenon raise a source to produce confusing information to the samples investigated by analytical TEM, which should be alleviated as much as possible. As experimental precautions for reducing this unwanted effect, the use of $LN_2$ cooled anti-contaminator and pre-illumination of electron beam at low magnification can be helpful. Nevertheless, we should be cautious to set an illumination condition for microanalysis because the contaminative effect is dependent with the types of irradiation situations, which is well known to be a decisive factor for causing the carbonaceous artifacts. Accordingly, it is necessary that optimal illumination to minimize the contaminative effect should be selected for improving the accuracy of microanalysis. In this paper, we introduce the practical method to determine the optimal illumination condition by evaluating the contaminative effect as a function of instrumental spot size, which is directly linked with electron current density.

산소 플라즈마를 이용하여 원거리 플라즈마 원자층 증착법으로 형성된 하프늄 옥사이드 게이트 절연막의 특성 연구 (Characteristics of Hafnium Oxide Gate Dielectrics Deposited by Remote Plasma-enhanced Atomic Layer Deposition using Oxygen Plasma)

  • 조승찬;전형탁;김양도
    • 한국재료학회지
    • /
    • 제17권5호
    • /
    • pp.263-267
    • /
    • 2007
  • Hafnium oxide $(HfO_2)$ films were deposited on Si(100) substrates by remote plasma-enhanced atomic layer deposition (PEALD) method at $250^{\circ}C$ using TEMAH [tetrakis(ethylmethylamino)hafnium] and $O_2$ plasma. $(HfO_2)$ films showed a relatively low carbon contamination of about 3 at %. As-deposited and annealed $(HfO_2)$ films showed amorphous and randomly oriented polycrystalline structure. respectively. The interfacial layer of $(HfO_2)$ films deposited using remote PEALD was Hf silicate and its thickness increased with increasing annealing temperature. The hysteresis of $(HfO_2)$ films became lower and the flat band voltages shifted towards the positive direction after annealing. Post-annealing process significantly changed the physical, chemical, and electrical properties of $(HfO_2)$ films. $(HfO_2)$ films deposited by remote PEALD using TEMAH and $O_2$ plasma showed generally improved film qualities compare to those of the films deposited by conventional ALD.