• Title/Summary/Keyword: Capping layer

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Interspecies comparative morphological evaluation of the corneal epithelial stem cell niche: a pilot observational study

  • Popova, Petya;Malalana, Fernando;Biddolph, Simon;Ramos, Tiago;Parekh, Mohit;Chantrey, Julian;Ahmad, Sajjad
    • Journal of Veterinary Science
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    • v.23 no.4
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    • pp.62.1-62.10
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    • 2022
  • Background: The corneal and limbal morphology relevant to corneal epithelial maintenance in ten different species was examined using histological methods. Objectives: The presence of a Bowman's layer, limbal epithelial cell, and superficial stromal morphology was examined in the following species to evaluate the differences in corneal thickness and epithelium: Java sparrows, frogs, macaws, spoonbills, red pandas, penguins, horses, Dobermans, orangutans, and humans. Methods: Corneal sections (4 ㎛) were obtained from ten ocular globes from three different animal classes: Aves, Amphibia, and Mammalia. All sections were stained with hematoxylin and eosin and periodic acid-Schiff reaction. After microscopy, all stained slides were photographed and analyzed. Results: Significant morphological differences in the corneal and limbal epithelia and their underlying stroma between species were observed. The number of corneal epithelial cell layers and the overall corneal epithelial thickness varied significantly among the species. The presence of a Bowman's layer was only observed in primates (orangutans and humans). Presumed supranuclear melanin caps were noted in four species (orangutans, macaws, red pandas, and horses) in the limbal basal epithelial layer (putative site of corneal epithelial stem cells). The melanin granules covered the apex of the cell nucleus. Conclusions: Supranuclear melanin capping has been described as a process within the epidermis to reduce the concentration of ultraviolet-induced DNA photoproducts. Similarly, there may be a relationship between limbal stem cell melanin capping as a protective mechanism against ultra-violet radiation.

The Etching Characteristics of $MoSi_2$ film by ECR Etch (ECR Etch 에 의한 $MoSi_2$ 막의 식각 특성)

  • Lee, H.S.;Kang, H.B.;Park, G.S.;Lee, C.J.;Sung, Y.K.
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.809-812
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    • 1992
  • Charateristics of the ECR etch were Investigated about $MoSi_2$ layer which is widely used for the capping layer and barrier layer in VLSI metallization. The etch rate was evaluated according to gas ratio of $SF_6/BCl_3$, $N_2$ flow rate, RF power and chamber pressure. The chamber pressure, the most important factor, represented the maximum etch rate at about the pressure of 10 mTorr.

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Inductively coupled plasma etching of SnO2 as a new absorber material for EUVL binary mask

  • Lee, Su-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.124-124
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    • 2010
  • Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

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Effect of Mineral Trioxide Aggregate and Calcium Hydroxide on Reparative Dentin Formation in Rats

  • Ra, Ji-Young;Lee, Wan;Kim, Hyun-Jin
    • International Journal of Oral Biology
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    • v.37 no.2
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    • pp.77-83
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    • 2012
  • We investigated the pulpal response to direct pulp capping in rat molar teeth using mineral trioxide aggregate (MTA) and calcium hydroxide (CH). A palatal cavity was prepared in rat maxillary molar teeth. Either MTA or CH was placed on the exposed pulp and all cavities were restored with composite. Rats were sacrificed for histological evaluation after 12 hours and at 2, 7, 14 and 21 days. In both the MTA and CH groups, reparative dentin formation was clearly observed on histology after 14 days. The MTA-capped pulps were found to be mostly free from inflammation, and hard tissue of a tubular consistent barrier was observed. In contrast, in CH-capped teeth, excessive formation of reparative dentin toward residual pulp was evident. The pulpal cell response beneath the reparative dentin layer was examined by immunofluorescence using antibodies against DSP. After 2 days, a few DSP immunopositive cells, most of which showed a cuboidal shape, appeared beneath the predentin layer. At 7 days, DSP-immunopositive cells with columnar odontoblast-like cells were seen beneath the newly formed hard tissues. At 14 and 21 days, DSP was more abundant in the vicinity of the odontoblastic process along the dentinal tubules than in the mineralized reparative dentin. The CH group showed strong expression patterns in terms of DSP immunoreactivity. Our results thus indicate that MTA may be a more effective pulp capping material as it induces the differentiation of odontoblast-like cells and the formation of reparative dentin without the loss of residual pulp functions.

Novel Enhanced Flexibility of ZnO Nanowires Based Nanogenerators Using Transparent Flexible Top Electrode

  • Gang, Mul-Gyeol;Ha, In-Ho;Kim, Seong-Hyeon;Jo, Jin-U;Ju, Byeong-Gwon;Lee, Cheol-Seung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.490.1-490.1
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    • 2014
  • The ZnO nanowire (NW)-based nanogenerators (NGs) can have rectifying current and potential generated by the coupled piezoelectric and semiconducting properties of ZnO by variety of external stimulation such as pushing, bending and stretching. So, ZnO NGs needed to enhance durability for stable properties of NGs. The durability of the metal electrodes used in the typical ZnO nanogenerators(NGs) is unstable for both electrical and mechanical stability. Indium tin oxide (ITO) is used as transparent flexible electrode but because of high cost and limited supply of indium, the fragility and lack of flexibility of ITO layers, alternatives are being sought. It is expected that carbon nanotube and Ag nanowire conductive coatings could be a prospective replacement. In this work, we demonstrated transparent flexible ZnO NGs by using CNT/Ag nanowire hybrid electrode, in which electrical and mechanical stability of top electrode has been improved. We grew vertical type ZnO NW by hydrothermal method and ZnO NW was coated with hybrid silicone coating solution as capping layer to enhance adhesion and durability of ZNW. We coated the CNT/Ag nanowire hybrid electrode by using bar coating system on a capping layer. Power generation of the ZnO NG is measured by using a picoammeter, a oscilloscope and confirmed surface condition with FE-SEM. As a results, the NGs using the CNT/Ag NW hybrid electrode show 75% transparency at wavelength 550 nm and small change of the resistance of the electrode after bending test. It will be discussed the effect of the improved flexibility of top electrode on power generation enhancement of ZnO NGs.

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Consolidation Settlement of Capped Sediment (II): Advective Transport of Pore Water and Analytical Prediction of Settlement (캡이 설치된 퇴적층의 압밀 침하 (II): 간극수의 이동 및 침하의 해석적 예측)

  • Kim, Tae-Hyung;Hong, Won-Pyo;Moo-Young, Horace-K
    • Journal of the Korean Geotechnical Society
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    • v.19 no.3
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    • pp.39-44
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    • 2003
  • Centrifuge test was conducted to simulate the effects of consolidation settlement of capped contaminated marine sediment. A fluorescent dye was used to monitor the movement of pore water through the cap layer. Dye tracer study clearly showed the consolidation induced advective transport of contaminants. Thus, the capping layer must be appropriately designed to reduce the effects of consolidation induced advective transport. The results from the centrifuge test were compared to predictions made by the Primary consolidation, Secondary compression, and Desiccation of Dredged Fill (PSDDF) computer program, which can qualitatively estimate the consolidation settlement of capped marine sediment. Although PSDDF approximated closely the secondary compression in the centrifuge test (i.e., compare data points from 18 to 25 prototype years), the maximum deviation between centrifuge test result and PSDDF prediction was 20 % about prototype time 6 years. Thus, designers should utilize PSDDF consolidation settlement results with caution.

Consolidation Settlement of Capped Sediment (I): Centrifuge Simulation by Modeling of Models Technique (캡이 설치된 퇴적층의 압밀 침하 (I) : 원심모형시험기를 이용한 모델링 방법)

  • Kim, Tae-Hyung;Hong, Won-Pyo;Moo-Young, Horace-K
    • Journal of the Korean Geotechnical Society
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    • v.19 no.3
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    • pp.33-38
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    • 2003
  • Marine sediment capping is a technique where clean sand is placed over contaminated sediment to reduce the migration of contaminants to the environment. The design of in-situ caps placed over marine sediment must take into consideration the self-weight consolidation of the cap and the consolidation of the sediment as a result of adding the cap layer. Centrifuge tests were adopted to simulate the effects of consolidation settlement of capped marine sediment caused by the placement of a clean sand layer. The modeling of models technique was utilized to verify the correct modeling procedures used in this study. Two centrifuge tests were conducted with the same boundary conditions at different gravitational accelerations of 100 g and 50 g. There was good agreement between these tests. It can be concluded that the centrifuge experiment is able to model consolidation settlement of capped marine sediment.

MEE 기법으로 성장한 InGaAs 양자점의 크기 변화에 따른 광발광 특성분석

  • Ha, Seung-Gyu;Jo, Nam-Gi;Song, Jin-Dong;Park, Jae-Gyu;Lee, Dong-Han;Choe, Won-Jun;Lee, Jeong-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.116-116
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    • 2010
  • 단일 양자점의 특성 분석 및 이를 활용한 단광자 광원 등으로의 응용에 있어서 표면밀도 및 크기 등이 의도대로 조절된 양자점 성장이 필수적이며, 이와 관련하여 근적외선 파장 영역에서 발광 성분을 갖는 InGaAs/GaAs 양자점 시료를 MEE (Migration Enhanced Epitaxy) 기법으로 성장하였다. 이 때, 30 초 120 초 사이의 migration enhancing time 변화에 의하여 약 $350\;QDs/{\mu}m^2$에서 $3\;QDs/{\mu}m^2$ 사이의 범위로 양자점 표면 밀도가 조절되었으며 양자점의 크기도 변화하는 것을 확인하였다. 별도로 capping layer를 성장하지 않은 양자점 층에 대한 AFM 측정을 통하여 양자점의 크기를 예측하였으나, 실제 시료의 양자점 크기는 capping layer 성장시의 온도 및 압력에 따른 영향이나 물질 조성의 불균일성 등으로 인해 달라질 수 있으므로 비파괴 검사방법인 광발광 측정으로써 실제 양자점의 특성을 검증할 필요성이 존재한다. 먼저 양자점의 크기가 커짐에 따라 기저상태의 에너지 밴드갭 크기가 감소하는 경향이 있음을 확인하였다. 이는 양자점이 클수록 양자구속 효과가 작아지는 일반적인 경향과 일치한다. 또한, 양자점의 크기 차이에 따른 기저상태 및 고차 여기 상태의 에너지 밴드갭 차이의 변화 경향을 분석하였다. 일반적으로 양자점의 크기가 줄어들면 양자구속효과 또한 빠르게 증가하다가 결국에는 에너지 장벽(barrier)의 에너지 준위에서 포화상태에 도달하게 된다. 이러한 양자점 크기에 따른 양자구속효과 크기의 변화는 고차 여기 상태일수록 더욱 빠르며, 결국에는 양자 구속효과가 없어지는 상태(unbound exciton)에 이르기도 한다. 따라서 기저상태의 에너지 밴드갭은 양자점이 커짐에 따라 단조감소 경향을 보이나, 변화율의 차이 때문에 기저상태와 1차 여기상태의 에너지 차이인 level spacing 값은 단조감소 경향이 아닌 종 모양의 경향성을 보이며 측정 결과 또한 이와 일치하였다. 이와 같이 migration enhancing time의 조절로 광자와 상호작용하는 실질적인 양자점의 크기가 의도대로 조절되었음을 비파괴 광측정법으로 확인하였다.

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p-type CuI Thin-Film Transistors through Chemical Vapor Deposition Process (Chemical Vapor Deposition 공정으로 제작한 CuI p-type 박막 트랜지스터)

  • Seungmin Lee;Seong Cheol Jang;Ji-Min Park;Soon-Gil Yoon;Hyun-Suk Kim
    • Korean Journal of Materials Research
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    • v.33 no.11
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    • pp.491-496
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    • 2023
  • As the demand for p-type semiconductors increases, much effort is being put into developing new p-type materials. This demand has led to the development of novel new p-type semiconductors that go beyond existing p-type semiconductors. Copper iodide (CuI) has recently received much attention due to its wide band gap, excellent optical and electrical properties, and low temperature synthesis. However, there are limits to its use as a semiconductor material for thin film transistor devices due to the uncontrolled generation of copper vacancies and excessive hole doping. In this work, p-type CuI semiconductors were fabricated using the chemical vapor deposition (CVD) process for thin-film transistor (TFT) applications. The vacuum process has advantages over conventional solution processes, including conformal coating, large area uniformity, easy thickness control and so on. CuI thin films were fabricated at various deposition temperatures from 150 to 250 ℃ The surface roughness root mean square (RMS) value, which is related to carrier transport, decreases with increasing deposition temperature. Hall effect measurements showed that all fabricated CuI films had p-type behavior and that the Hall mobility decreased with increasing deposition temperature. The CuI TFTs showed no clear on/off because of the high concentration of carriers. By adopting a Zn capping layer, carrier concentrations decreased, leading to clear on and off behavior. Finally, stability tests of the PBS and NBS showed a threshold voltage shift within ±1 V.