• Title/Summary/Keyword: Capacitor structure

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Low-Power Buck-Boost Converter for Multi-Input Energy Harvesting Systems (다중입력 에너지 하베스팅 시스템을 위한 저전력 벅-부스트 변환기)

  • Jo, Gil-Je;Kwak, Myoung-Jin;Im, Ju-An;Yu, Chong-Gun
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2018.10a
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    • pp.31-34
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    • 2018
  • This paper presents a low-power buck-boost converter for multi-input energy harvesting systems. The designed circuit combines the energy harvested from three input channels in real time and stores it in a storage capacitor. The structure of the buck-boost converter is simplified by using one external inductor and applying time division technique using an arbiter. In addition, to improve the efficiency of the system, the controller circuits of the converter are designed so that current consumption is minimized. The proposed circuit is designed with $0.35{\mu}m$ CMOS process. Simulation results show that the designed circuit consumes up to 490nA of current when all three input channels are active, and the maximum power efficiency is 92%. The chip area of the designed circuit is $1310{\mu}m{\times}1100{\mu}m$.

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Non-stoichiometric AlOx Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics

  • Lee, Sun-Sook;Lee, Eun-Seok;Kim, Seok-Hwan;Lee, Byung-Kook;Jeong, Seok-Jong;Hwang, Jin-Ha;Kim, Chang-Gyoun;Chung, Taek-Mo;An, Ki-Seok
    • Bulletin of the Korean Chemical Society
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    • v.33 no.7
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    • pp.2207-2212
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    • 2012
  • Dimethylaluminum isopropoxide (DMAI, $(CH_3)_2AlO^iPr$) as a single precursor, which contains one aluminum and one oxygen atom, has been adopted to deposit non-stoichiometric aluminum oxide ($AlO_x$) films by low pressure metal organic chemical vapor deposition without an additional oxygen source. The atomic concentration of Al and O in the deposited $AlO_x$ film was measured to be Al:O = ~1:1.1 and any serious interfacial oxide layer between the film and Si substrate was not observed. Gaseous by-products monitored by quadruple mass spectrometry show that ${\beta}$-hydrogen elimination mechanism is mainly contributed to the $AlO_x$ CVD process of DMAI precursor. The current-voltage characteristics of the $AlO_x$ film in Au/$AlO_x$/Ir metalinsulator-metal (MIM) capacitor structure show high ON/OFF ratio larger than ${\sim}10^6$ with SET and RESET voltages of 2.7 and 0.8 V, respectively. Impedance spectra indicate that the switching and memory phenomena are based on the bulk-based origins, presumably the formation and rupture of filaments.

Frequency Dependent Properties of Tris(8-Hydroxyquinoline) Aluminum Thin Films

  • Lee, Yong-Soo;Park, Jae-Hoon;Choi, Jong-Sun
    • KIEE International Transactions on Electrophysics and Applications
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    • v.11C no.3
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    • pp.70-74
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    • 2001
  • Admittance or impedance spectroscopy is one of the powerful tools to study dielectric relaxation and loss processes in organic and inorganic materials. In this study, the frequency dependent properties of an indium tin oxide/tris(8-hydroxyquinoline) aluminum($Alq_3$)/aluminum structure have been studied. The conductance of the $Alq_3$ film increases with the DC applied voltage up to 4V and decreases above 4V in the low frequency region. This indicates that the resistance of the device decreases with the applied bias due to the carrier injection enhancement, thereafter the injected carriers form the space charge and the additional injection of carriers is prevented. The Cole-Cole plot of the admittance takes a one-semicircle shape, which means that the device can be modeled as a parallel resistor-capacitor network. The resistance and capacitance were estimated as 8.62k${\Omega}$ and 2.7nF, respectively, at 3V in the low frequency region. The dielectric constant ( ${\epsilon}'$ ) of the $Alq_3$ film is independent of the frequency in the low frequency region below 100kHz, while the frequency dependency was observed at above 100kHz. The dielectric loss factor ( ${\epsilon}"$ ) of the $Alq_3$ film shows the dielectric dispersion below 100kHz and dielectric absorption in higher frequency domain. The dispersion is thought to be related to the hopping process of the carriers. The ${\epsilon}"$ is proportional to the reciprocal of the frequency. The dielectric relaxation time was extracted to about 0.318${\mu}s$ from the dielectric absorption spectrum.

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Design of a Dual-Band Loop-Type Ground Antenna Using Lumped-Elements (집중 소자를 사용한 이중 대역 루프형 그라운드 안테나 설계)

  • Lee, Hyung-Jin;Liu, Yang;Lee, Jae-Seok;Kim, Hyung-Hoon;Kim, Hyeong-Dong
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.23 no.5
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    • pp.551-558
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    • 2012
  • This paper presents a dual band loop-type ground antenna using lumped-elements that control the impedance bandwidth and resonant frequency. The dual-band operation of the proposed antenna is realized by inserting an additional resonated loop feed structure into the reference ground antenna. As the proper value of the capacitor and the inductor are chosen, the impedance bandwidth of our antenna with voltage standing wave ratio(VSWR) equal to 3 is 85 MHz and 725 MHz at the 2.45 and 5.5 GHz frequency band, respectively. Its validity is demonstrated via both the computed and measured results. Good antenna patterns and efficiencies are achieved at the dual frequency bands, as well as the physically small antenna element size($10{\times}5mm^2$).

A Design of MMIC Mixer for I/Q Demodulator of Non-contact Near Field Microwave Probing System (비접촉 마이크로웨이브 프루브 시스템의 I/Q Demodulator를 위한 MMIC Mixer의 설계)

  • Ryu, Keun-Kwan;Kim, Sung-Chan
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.5
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    • pp.1023-1028
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    • 2012
  • A MMIC (Monolithic Microwave Integrated Circuit) mixer chip using the Schottky diode of an GaAs p-HEMT process has been developed for the I/Q demodulator of non-contact near field microwave probing system. A single balanced mixer type is adopted to achieve simple structure of the I/Q demodulator. A quadrature hybrid coupler and a quarter wavelength transmission line for 180 degree hybrid are realized with lumped elements of MIM capacitor and spiral inductor to reduce the mixer chip size. According to the on-wafer measurement, this MMIC mixer covers RF and LO frequencies of 1650MHz to 2050MHz with flat conversion loss. The MMIC mixer with miniature size of $2.5mm{\times}1.7mm$ demonstrates conversion loss below 12dB for both variations of RF and LO frequencies, LO-to-IF isolation above 43dB and RF-to-IF isolation above 23dB, respectively.

A Study on the Inverter Type Neon Power Supply Using a Piezoelectric Transformer (압전 변압기를 이용한 인버터식 네온관용 변압기에 관한 연구)

  • 변재영;김윤호
    • The Transactions of the Korean Institute of Power Electronics
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    • v.8 no.6
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    • pp.504-511
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    • 2003
  • In this paper, inverter type neon power supply using a piezoelectric transformer is fabricated and its characteristic is investigated. Developed neon power supply is composed of basic circuit and blocks, such as rectifier part, frequency oscillation part and piezoelectric transformer and resonant half bridge inverters. In this paper for complement the low power limitation, piezoelectric transformer at parallel connected driving by inverter is studied for noon tubes system of high power. When piezoelectric transformer is connected with parallel, LC filter connection method with parallel and selection of inductance L and capacitor C of primary side is suggested for reduce unbalanced current at the terminal of each transformer. Piezoelectric transformers use piezoelectric ceramic devices. Thus it is wireless therefore it has high power density, high Isolation level, low loss, more light, and miniaturization. In addition, high voltage transfer ratio is expected because there is no leakage inductance. Also, it has economic merit that the electrical loss Is low because structure is simple, small and tighter weight.

Mathematical Modeling and Simulation on the Control of Heart rate by Baroreceptor Control System in the Cardiovascular System (심혈관 시스템의 압수용체에 의한 심박동 제어의 수학적 모델링 및 시뮬레이션)

  • Choi, B.C.;Lee, S.J.;Eom, S.H.;Nam, G.K.;Lee, Y.W.;Jun, K.R.
    • Proceedings of the KOSOMBE Conference
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    • v.1996 no.11
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    • pp.80-85
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    • 1996
  • The various function of the cardiovascular system(CVS) and the dynamic characteristics on each part of human body can be acquired in the electric analog circuit model. According to the performed outcome by other researchers, viscos resistance, flow inertia, and vascular compliance in the CVS are analogous to resister, inductor, and capacitor in electric circuit, so the CVS models were represented by the electric circuit models. these approaches were to propose the suitable models interest part of body and to simulate the various characteristics on the CVS. In this paper, the electric circuit model considering the characteristics of morphologic structure is represented, the parameter values of model is sotted up, and the dynamic characteristics of the the CVS is simulated using VisSim, one of the simulation tools. The observed simulation results are similar to the cardiovascular functions of nomal adults who have no heart failure. Besides, the simulation is operated to observe the pathophysiological abnomal symptoms(for example, bleeding within a certain period). The controller by baroreceptor, which is one of controllers to control the CVS, is appended in the model. and the dynamic response characteristics and the procedure to return normal state is observed in simulation when the bleeding last within a certain period.

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Electrical Characteristics of BST Thin Films with Various Film Thickness (BST 박막의 두께 변화에 따른 전기적 특성에 관한 연구)

  • 강성준;정양희
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.6 no.5
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    • pp.696-702
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    • 2002
  • The BST $({Bal-xSrxTiO_3})$ (50/50) thin film has been grown by RF magnetron reactive sputtering and its characteristics such as crystallization, surface roughness, and electrical properties have been investigated with varying the film thickness. The crystallization and surface roughness of BST thin film are investigated by using XRD and AFM, respectively. The BST thin film annealed at $800^{\circ}C$ for 2 min has pure perovskite structure and good surface roughness of 16.1$\AA$. As the film thickness increases from 80 nm to 240 nm, the dielectric constant at 10 KHz increases from 199 to 265 and the leakage current density at 250 ㎸/cm decreases from $0.779 {\mu}A/{cm^2} to 0.184 {\mu}A/{cm^2}$. In the case of 240 nm-thick BST thin film, the charge storage density and leakage current density at 5V are 50.5 fC/${{\mu}m^2} and 0.182 {\mu}A/{cm^2}$, respectively. The values indicate that the BST thin film is a very useful dielectric material for the DRAM capacitor.

Polymorphic Phase Transition and Temperature Coefficient of Capacitance of Alkaline Niobate Based Ceramics

  • Bae, Seon-Gi;Shin, Hyea-Gyiung;Sohn, Eun-Young;Im, In-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.2
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    • pp.78-81
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    • 2013
  • $0.95(Na_{0.5}K_{0.5})NbO_3-0.05BaTiO_3+0.2wt%\;Ag_2O$ (hereafter, No excess NKN) ceramics and $0.95(Na_{0.5}K_{0.5})NbO_3-0.05BaTiO_3+0.2wt%\;Ag_2O$ with excess $(Na_{0.5}K_{0.5})NbO_3$ (hereafter, Excess NKN) were fabricated by the conventional solid state sintering method, and their phase transition properties and dielectric properties were investigated. The crystalline structure of No excess NKN ceramics and Excess NKN ceramics were shown characteristics of polymorphic phase transition (hereafter, PPT), especially shift from the orthorhombic to tetragonal phase by increasing sintering temperature range from $1,100^{\circ}C$ to $1,200^{\circ}C$. Also, the temperature coefficient of capacitance (hereafter, TCC) of No excess NKN ceramics and Excess NKN ceramics from $-40^{\circ}C$ to $100^{\circ}C$ was measured to evaluate temperature stability for applications in cold regions. The TCC of No excess NKN and Excess NKN ceramics showed positive TCC characteristics at a temperature range from $-40^{\circ}C$ to $100^{\circ}C$. Especially, Excess NKN showed a smaller TCC gradient than those of Excess NKN ceramics in range from $-40^{\circ}C$ to $100^{\circ}C$. Therefore, NKN piezoelectric ceramics combined with temperature compensated capacitor having negative temperature characteristics is desired for usage in cold regions.

Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure (HfO2/Hf/Si MOS 구조에서 나타나는 HfO2 박막의 물성 및 전기적 특성)

  • Bae, Kun-Ho;Do, Seung-Woo;Lee, Jae-Sung;Lee, Yong-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.2
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    • pp.101-106
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    • 2009
  • In this paper, Thin films of $HfO_2$/Hf were deposited on p-type wafer by Atomic Layer Deposition (ALD). We studied the electrical and material characteristics of $HfO_2$/Hf/Si MOS capacitor depending on thickness of Hf metal layer. $HfO_2$ films were deposited using TEMAH and $O_3$ at $350^{\circ}C$. Samples were then annealed using furnace heating to $500^{\circ}C$. Round-type MOS capacitors have been fabricated on Si substrates with $2000\;{\AA}$-thick Pt top electrodes. The composition rate of the dielectric material was analyzed using TEM (Transmission Electron Microscopy), XRD (X-ray Diffraction) and XPS (X-ray Photoelectron Spectroscopy). Also the capacitance-voltage (C-V), conductance-voltage (G-V), and current-voltage (I-V) characteristics were measured. We calculated the density of oxide trap charges and interface trap charges in our MOS device. At the interface between $HfO_2$ and Si, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. And finally, the generation of both oxide trap charge and interface trap charge in $HfO_2$ film was reduced effectively by using Hf metal layer.