• Proceedings of the Korea Association of Crystal Growth Conference
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• 1997.10a
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• pp.141-144
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• 1997

High quality 3C-SiC epilayer was grown on Si(111) at 125$0^{\circ}C$ using chemical vapor deposition(CVD) technique by pyrolyzing tetramethylsilane(TMS). 3C-SiC epilayer was doped by tetramethylgallium(TMGa) during the CVD growth. The crystallinity of 3C-SiC was significantly enhanced by doping the gallium impurity.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1266-1269
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• 2007

Polycrystalline silicon (poly-Si) films were prepared directly on plastic substrates at a low (< $200^{\circ}C$) by using Catalytic Chemical Vapor Deposition (Cat-CVD) technique without subsequent annealing steps. Surface roughness of the poly-Si layer and the density of the gate dielectric layer were found to be influential to the TFT performance.

• Archives of Metallurgy and Materials
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• v.65 no.4
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• pp.1371-1375
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• 2020

A superior SiC based thermal protection coating process for carbon composite, which can be especially effective in a hot oxidizing atmosphere, was established in this study. A multi-coating process based on a combination of Chemical Vapor Reaction (CVR) and Chemical Vapor Deposition (CVD) was developed. Various protective coating layers on carbon composite were tested in hot oxidizing surroundings and the test results verified that the thermal ablation rate could be dramatically reduced down to 3.8% when the protective multi-coating was applied. The thermal protection mechanism of the coating layers was also investigated.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.22 no.5
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• pp.672-684
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• 1998

• Proceedings of the Korean Vacuum Society Conference
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• 2002.02a
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• pp.148-148
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• 2002

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.13.2-13.2
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• 2007

• Journal of the Korean Ceramic Society
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• v.35 no.7
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• pp.764-774
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• 1998

• Proceedings of the Korean Ceranic Society Conference
• /
• 2002.10a
• /
• pp.22.1-22
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• 2002

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2002.11a
• /
• pp.95-95
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• 2002

• Journal of Korean Society of Environmental Engineers
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• v.30 no.7
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• pp.688-693
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• 2008

TiO$_2$ photocatalyst films deposited beads were prepared by circulating fluidized bed chemical vapor deposition(CFB-CVD) using TTIP(Titanium Tetra Iso-Propoxyde). Photocatalytic activities of Photocatalyst beads were evaluated by decomposition rate of formaldehyde in aqueous solution using a photo-reactor. From the result of photocatalytic degradation of formaldehyde, decomposition rate were shown gradually increased according to the increase of UV intensity, circulating fluid velocity and addition amount of H$_2$O$_2$. However the decomposition rate of formaldehyde were decreased according to the increase of initial concentration and pH value.