• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.213-216
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• 1995

Strontium niobate, $Sr_2Nb_2O_{7}$ was prepared by the molten stilt synthesis (MSS) and the chemical coprecipitation method (CCP). Single phase $Sr_2Nb_2O_{7}$ was obtained by MSS and CCP at $750^{\circ}C$ and $800^{\circ}C$, respectively. An intermediate phase of composition, $Sr_{5}Nb_4O_{15}$, appeared at $700^{\circ}C$ when CCP method was employed. The resulting powder was observed to have finer particles and more uniform distribution of particle sizes, as compared to those obtained through the conventional method. Such powder characteristics allowed the use of a much lower sintering temperature of $1400^{\circ}C$. Grain-orientation along (0k0) direction, which is advantageous for improving dielectric properties, was also observed. The sintering characteristics and the dielectric properties prepared by MSS and CCP, were better than those by the conventional method.

• KSII Transactions on Internet and Information Systems (TIIS)
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• v.8 no.5
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• pp.1554-1566
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• 2014

Cloud Computing allows application providers seamlessly scaling their services and enables users scaling their usage according to their needs. In this paper, using queuing game model, we present service scheduling schemes which are used in software as a service (SaaS). The object is maximizing the Cloud Computing platform's (CCP's) payoff via controlling the service requests whether to join or balk, and controlling the value of CCP's admission fee. Firstly, we treat the CCP as one virtual machine (VM) and analyze the optimal queue length with a fixed admission fee distribution. If the position number of a new service request is bigger than the optimal queue length, it balks. Otherwise, it joins in. Under this scheme, the CCP's payoff can be maximized. Secondly, we extend this achievement to the multiple VMs situation. A big difference between single VM and multiple VMs is that the latter one needs to decide which VM the service requests turn to for service. We use a corresponding algorithm solve it. Simulation results demonstrate the good performance of our schemes.

• Journal of the Korean Applied Science and Technology
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• v.31 no.2
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• pp.285-295
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• 2014

Citrus essential oil were extracted from citron peel of cultivated in Gohong (CCP) using environmentally friendly supercritical carbon dioxide method. Antioxidant activity and aroma composition of the essential oils extracted by the SC-$CO_2$ method were evaluated by comparing with those extracted by organic solvent method. Fatty acid composition, DPPH scavenging, and antioxidant activity of the oils obtained by different extraction condition of SC-$CO_2$ method were investigated and their antioxidant activities were compared with commercially available lavender, eucalyptus and tea tree oils. As the results, linoleic acid was most abundantly found from CCP oil extracted by the SC-$CO_2$ method and cis-11,144-eicosadienoic acids was second abundantly found. Radical scavenging ability of DPPH was 98% when the concentration of CCP oil was 50 mg/mL. This scavenging ability increased with the increase of oil concentration. On the other hand, flavonoids content (84 mg/100g) of the CCP oil extracted by the SC-$CO_2$ method was slightly higher than that (75 mg/100g) by hexane extraction. The results, obtained from CCP oil by GC-MS, indicated that, among 66 components, the content of terpenes was 55.8% and limonene was 27.3%.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.507-507
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• 2012

컷오프 진단법은 두 개의 탐침 형태로 제작된 마이크로 웨이브 진단법으로, 간단한 수식을 통해 전자밀도, 전자온도 등을 측정할 수 있다. 컷오프 탐침은 방사 안테나, 측정 안테나와 네트워크 분석기로 구성되어 있다. 네트워크 분석기는 두 안테나 사이의 플라즈마 투과 스펙트럼을 만드는데 쓰이며, 스펙트럼 분석을 통해 플라즈마 변수들을 측정할 수 있다. 이 진단법은 장치나 분석방법이 매우 간단한 장점을 지니며, 약 1 mW 정도의 적은 파워를 사용하여 플라즈마 상태를 거의 변화시키지 않는 측정이 가능하다. 또한 CF4와 같은 공정 가스를 이용한 플라즈마에서도 사용이 가능하다. 그러나 컷오프 진단법을 사용한 측정은 다른 종류의 진단법과 마찬가지로, 약 1초 정도의 긴 시간을 필요로 하는 단점이 있어, 펄스 플라즈마나 토카막과 같이 빠르게 변하는 플라즈마를 측정하기에는 무리가 있다. 컷오프 탐침의 시간 분해능을 향상시키고자, 최근에 푸리에 컷오프 탐침(FCP)이 개발되었다. 펄스 형태의 단일신호를 플라즈마를 투과하기 전후로 비교하면 투과 스펙트럼 및 플라즈마 변수들을 얻을 수 있으며, 측정시간을 약 15 ns 정도로 줄일 수 있었다. 이 방법의 신뢰도 및 성능은 이미 CW 플라즈마와 펄스 플라즈마에서 확인되었다. 본 연구에서는 FCP의 초고속 측정의 장점을 이용해서 13.56 MHz의 CCP 및 400 kHz의 CCP에서 RF 위상에 따라 변하는 플라즈마를 측정하였으며, 이에 따라 RF CCP에서의 전자의 동역학 분석을 할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.472-472
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• 2011

The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

• Food Science of Animal Resources
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• v.40 no.5
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• pp.831-843
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• 2020

This study investigated the potential for using vegetable powders as a natural replacement for sodium nitrite and their effects on the physicochemical characteristics of alternatively cured pork products. We analyzed pork products subjected to four treatments: control (0.015% sodium nitrite), Chinese cabbabe powder (CCP) treatment (0.4% Chinese cabbage powder), radish powder (RP) treatment (0.4% radish powder), and spinach powder (SP) treatment (0.4% spinach powder). Among the vegetable powders prepared in this study, SP had the highest (p<0.05) nitrate content, while CCP had the lowest (p<0.05). The cooking yields from these treatments were not significantly different from each other. However, the products with vegetable powders had higher (p<0.05) pH and thiobarbituric acid reactive substances values than the control. Pork products with vegetable powders also showed lower CIE L^⁎ values and higher CIE b^⁎ values than the nitrite-added control. RP treatment had similar (p>0.05) CIE a^⁎ values to the control, while SP treatment had the lowest (p<0.05) CIE a^⁎ values. The residual nitrite content was lower (p<0.05) in the vegetable powder added pork products than in the control, although nitrosyl hemochrome and total pigment contents in the CCP and RP treatments were similar (p>0.05) to those in the control. The control, CCP, and RP treatments showed curing efficiencies greater than 80%, indicating that CCP and RP would be promising potential replacements for sodium nitrite. The results of this study suggest that RP may be a suitable natural replacement for sodium nitrite to produce alternatively cured meat products, compared to other leafy vegetable powders.

• Journal of the Korea Society for Simulation
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• v.20 no.4
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• pp.115-125
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• 2011

Manufacturing companies usually manage the process to achieve high quality using various types of control chart in statistical process control. When an assignable cause occurs in a process, the data in the control chart changes with different patterns by the specific causes. It is important in process control to classify the CCP (Control Chart Pattern) recognition for fast decision making. In former research, gathered data from process used to apply as raw data, leads to degrade the performance of recognizer and to decrease the learning speed. Therefore, feature based recognizer, employing feature extraction method, has been studied to enhance the classification accuracy and to reduce the dimension of data. We propose the method to extract features that take the distances between CCP data and reference vector generated from BDK (Bi-Directional Kohonen Network). We utilize those features as the input vectors in ANN (Artificial Neural Network) and compare with raw data applied ANN to evaluate the performance.

• Journal of Microbiology and Biotechnology
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• v.33 no.4
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• pp.493-499
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• 2023

In this study we evaluated the immune-enhancing effects of β-glucan, the main component of Euglena gracilis (Euglena), and Euglena on inflammatory factor expression in RAW264.7 macrophages and ICR mice with cyclophosphamide-induced immunosuppression. Macrophages were treated with β-glucan or Euglena for 48 h. The β-glucan and Euglena groups exhibited higher levels of inducible nitric oxide synthase, nitric oxide, and tumor necrosis factor (TNF)-α than the control (vehicle alone) group. Animals were fed saline and β-glucan (400 mg/kg body weight (B.W.)) or Euglena (400 or 800 mg/kg B.W.) for 19 days, and on days 17-19, cyclophosphamide (CCP, 80 mg/kg B.W.) was administered to induce immunosuppression in the ICR mouse model. CCP reduced the body weight, spleen index, and cytokine expression of the mice. To measure cytokine and receptor expression, splenocytes were treated with concanavalin A (ConA) or lipopolysaccharide (LPS) as a mitogen for 24 h. In vivo, ConA stimulation significantly upregulated the expression of interferon (IFN)-γ, interleukin (IL)-10, IL-12 receptor β1, IL-1β, and IL-2 in splenocytes from the β-glucan- or Euglena-treated groups compared with those in the splenocytes from the CCP-treated group; LPS stimulation increased the levels of the cytokines TNF-α, IL-1β, and IL-6 in splenocytes from the β-glucan- or Euglena- treated groups compared with those from the CCP-treated group, but most of these differences were not significant. These results demonstrate the effect of Euglena in ameliorating macrophages and immunosuppression in CCP-treated mice. Thus, Euglena has the potential to enhance macrophage- and splenocyte- mediated immune-stimulating responses.

• Journal of the Korean Vacuum Society
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• v.18 no.4
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• pp.288-295
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• 2009

We report the etch characteristics of GaAs and AlGaAs in the diffusion pump-based capacitively coupled $BCl_3$ plasma. Process variables were chamber pressure ($50{\sim}180$ mTorr), CCP power ($50{\sim}200\;W$) and $BCl_3$ gas flow rate ($2.5{\sim}10$ sccm). Surface profilometry was used for etch rate and surface roughness measurement after etching. Scanning electron microscopy was used to analyze the etched sidewall and surface morphology. Optical emission spectroscopy was used in order to characterize the emission peaks of the $BCl_3$ plasma during etching. We have achieved $0.25{\mu}m$/min of GaAs etch rate with only 5 sccm $BCl_3$ flow rate when the chamber pressure was in the range of 50{\sim}130 mTorr. The etch rates of AlGaAs were a little lower than those of GaAs at the conditions. However, the etch rates of GaAs and AlGaAs decreased significantly when the chamber pressure increased to 180 mTorr. GaAs and AlGaAs were not etched with 50 W CCP power. With $100{\sim}200\;W$ CCP power, etch rates of the materials increased over $0.3{\mu}m$/min. It was found that the etch rates of GaAs and AlGaAs were not always proportional to the increase of CCP power. We also found the interesting result that AlGaAs did not etched at 2.5 sccm $BCl_3$ flow rate at 75 mTorr and 100 W CCP power even though it was etched fast like GaAs with more $BCl_3$ gas flow rates. By contrast, GaAs was etched at ${{\sim}}0.3{\mu}m$/min at the 2.5 sccm $BCl_3$ flow rate condition. A broad molecular peak was noticed in the range of $500{\sim}700\;mm$ wavelength during the $BCl_3$ plasma etching. SEM photos showed that 10 sccm $BCl_3$ plama produced more undercutting on GaAs sidewall than 5 sccm $BCl_3$ plasma.

• Proceedings of the Korean Operations and Management Science Society Conference
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• 2004.05a
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• pp.556-559
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• 2004

본 논문은 제약이론의 프로세스 운영 개선기법에 기반하여 워크플로우에서 제약 자원을 찾고, 워크플로우의 운영 성과가 개선될 수 있도록 효율적인 업무 흐름 관리 방법을 개발하는 것을 목적으로 한다. 과거의 워크플로우 기록을 분석하여 제약업무담당자(CCP)를 결정하고, 제약 업무 담당자의 업무처리속도에 발생된 프로세스 인스턴스의 워크플로우 투입속도를 동기화하여 CCP의 업무부하가 일정수준으로 유지되도록 하며 비 제약 업무담당자의 여유능력이 향상되도록 한다. 이를 통해 CCP의 업무부하를 가능한 업무담당자들에 분산시킴으로써 프로세스 인스턴스의 처리가 원활히 이루어지도록 한다. 본 논문에서 개발한 알고리즘을 워크플로우 관리 시스템에 적용함으로써 전체 워크플로우가 효율적으로 운영되는 효과를 기대할 수 있다.