• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1284-1287
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• 2005

Peripheral pentacene region gives a significant influence on C-V characteristics of metal-oxide-pentacene capacitor structure. When the gate voltage goes toward negative, the effect of peripheral pentacene region becomes larger. Remaining gate DC bias constant and changing small signal frequency, the capacitance of peripheral pentacene changes along with frequency so that the total capacitance value also changes. The influence of peripheral pentacene region should be removed to measure accurate C-V characteristics, because it is hard to take into account the effect of the region quantitatively. After removing the influence of peripheral pentacene region, acceptor concentration, flat band voltage and depletion width of pentacene thin film are extracted from an accurate C-V curve as $1.58{\times}10^{17}cm^{-3}$, -1.54 V and 39.4 nm, respectively.

• 한국전기전자재료학회논문지
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• 제33권2호
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• pp.155-160
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• 2020

Ga₂O₃/n-type 4H-SiC heterojunction diodes were fabricated by RF magnetron sputtering. The optical properties of Ga₂O₃ and electrical properties of diodes were investigated. I-V characteristics were compared with simulation data from the Atlas software. The band gap of Ga₂O₃ was changed from 5.01 eV to 4.88 eV through oxygen annealing. The doping concentration of Ga₂O₃ was extracted from C-V characteristics. The annealed oxygen exhibited twice higher doping concentration. The annealed diodes showed improved turn-on voltage (0.99 V) and lower leakage current (3 pA). Furthermore, the oxygen-annealed diodes exhibited a temperature cross-point when temperature increased, and its ideality factor was lower than that of as-grown diodes.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1987년도 정기총회 및 창립40주년기념 학술대회 학회본부
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• pp.187-190
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• 1987

This paper is for the charge storage effect and C-V characteristics of MIS type diode which is the basic structural unit of charge-coupled device after growing the $Pb_{1-x}Sn_xTe$ crystal. $Pb_{1-x}Sn_xTe$ singlecrystal dbtained from the horizental furnace using Bridgman method. To judge whether the grown singlecrystal is suitable for specimen or not, it was investigated by X-ray diffraction analysis, thermogravimetry and differential thermal analysis. The C-V characteristics of the specimen caused to anodic oxidation was the best when the insulator film's depth was 250[$\AA$]. Measuring the C-V characteristics aftermanufacturing MIS type diode resulted that the whole capacitance was the largest when the supply voltage was low, 0.3[V] and the capacitance also varied according to the variance frequence when the supply voltage is over 0.5[V]. From the above result, even if the supply voltage is low, the $Pb_{1-x}Sn_xTe$ also have a good charge storage effect.

• 한국안전학회지
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• 제11권3호
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• pp.81-88
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• 1996

In order to investigate the electrical properties of transformer oils for large power, the characteristics of AC and Impulse breakdown in gap length of 1.0~2.5mm and that of volume resistivity were researched in temperature range of 20~$100^{\circ}C$. An geometrical capacitance of electrode with coaxial cylindrical shape for measuring the volume resistivity was 16pF, and highmegohm meter with model no. VMG-1000 was used, and also the applied voltage were DC 100, 250 and 500V. In the dependance of breakdown characteristics due to electrode gap length, it was confirmed that breakdown voltage was nearly uniform by volume effect according to the increase of gap. In the characteristics for AC breakdown, the dielectric strength was increased to $90^{\circ}C$ but decreased over $90^{\circ}C$, and also in case of impulse breakdown, it was increased to 7$0^{\circ}C$ and at dated $70^{\circ}C$ over in temperature range. The calculated mobility of oils in the characteristics for impulse breakdown were about $10^{-5}$~$10^{-4}cm^2/V{\cdot}S$, and the value of volume resistivity was almost invariable in low temperature range, regardless of voltage by the stable thermal properties, and it indicated a peak at $50^{\circ}C$ and had a sudden change to decrease over that temperature, and also the value of volume resistivity in 250V/mm at $80^{\circ}C$ is suitable for the International electrical standards, it was confirmed.

• 한국세라믹학회지
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• 제33권5호
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• pp.572-582
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• 1996

전류밀도, 70mA/cm2와 전류인가시간, 5초, 10초 조건의 양극반응으로 다공성 실리콘을 제작하여 800~110$0^{\circ}C$에서 열산화시킨 후 AI 전극을 증착시켜 만든 MOS(Metal Oxide Semiconductor) 구조의 C-V(Capacilance-Voltage) 특성을 조사하였다. 800, 90$0^{\circ}C$의 저온과 20~30분 이내의 단시간 산화에서는 산화막의 유전상수가 보통의 열산화막보다 크게 나타나고, 산화온도가 110$0^{\circ}C$의 고온과 60분 이상의 장시간 산화의 경우에는 3.9에 근접한 값을 갖는다. 이는 다공성 실리콘 산화막내에 존재하는 산화되지 않은 silicon들에 의한 효과와 표면적 증가에 의한 정전용량의 증가 효과가 복합적으로 작용하는 것이 그 원인이라 생각된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1993년도 추계학술대회 논문집
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• pp.137-140
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• 1993

Electrical properties and thermal annealing effects of $C_{22}$-quinolium(TCNQ) Langmuir-Blodgett(LB) films were studied. Typical current-voltage(I-V) characteristics along the perpendicular direction chow an anomalous behavior of breakdown near the electric-field strength of $10^{6}$V/cm. To see the thermal influence of the specimen, current was measured as a function of temperature(20∼$180^{\circ}C$). It shows that the current increases about 4 orders of magnitude near 60∼$70^{\circ}C$ and remains constant far a while up to ∼$150^{\circ}C$ and then suddenly drops. Such increase of current near 60∼$70^{\circ}C$ seems tn be related to a softness of alkyl chains. Besides the electrical measurements, UV/visible absorption(300∼800 nm) of the thermally annealed sample was measured to see the internal-structure change. It is found that there are four characteristic peaks. At 494 nm, the optical absorption of the thermally annealed specimen at $60^{\circ}C$ starts increase and stays almost constant upto∼ $140^{\circ}C$. And eventually it disappears above $180^{\circ}C$. After heat treatment of the specimen up to $150^{\circ}C$, Uv/visible absorption was measured while cooling.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 춘계종합학술대회
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• pp.501-504
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• 2003

본 연구에서는 박막트랜지스터의 특성 향상을 위하여 강유전성 박막을 게이트 절연충으로 사용하기 위하여 강유전성 박막과 a-Si:H 의 계면특성을 조사하였다. 먼저 강유전성 박막 중에 대표적인 SrTiO$_3$를 E-BEAM 증착기로 박막을 형성시켰다. 형성된 박막은 $N_2$ 분위기에서 15$0^{\circ}C$~$600^{\circ}C$로 1시간 ANNEALING 하여 전자현미경으로 표면을 측정하였다. SrTiO$_3$의 유전상수는 50~100 정도였으며 항복전계는 1~l.5 MV/cm로 매우 우수한 유전특성을 갖고 있었다. 강유전체 박막 위에 a-SiN:H,a-Si:H(n-type a-Si:H) 등을 PECVD로 증착하여 MFNS구조를 형성하였다. 계면특성을 C-V PLOTTER로 측정한 결과 SrTiO$_3$ 박막은 SiN 과의 접합이 매우 안정되어 있었고 C-V특성은 SiN/a-Si:H 과 유사하였다. 그러나 FERROELECTRIC/a-S:H의 경우가 훨씬 CAPACITANCE값이 컸으며, 이는 강유전체 박막의 높은 유전상수에 기인 된 것이라 생각된다.

• 한국정보통신학회논문지
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• 제7권3호
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• pp.468-473
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• 2003

본 연구에서는 박막트랜지스터의 특성 향상을 위하여 강유전성 박막을 게이트 절연층으로 사용하기 위하여 강유전성 박막과 a-Si:H의 계면특성을 조사하였다. 먼저 강유전성 박막 중에 대표적인 SrTiO$_3$를 I-BEAM 증착기로 박막을 형성시켰다. 형성된 박막은 N2 분위기에서 $150^{\circ}C∼600^{\circ}C$로 1시간 ANNEALING하여 전자현미경으로 표면을 측정하였다. SrTiO$_3$의 유전상수는 50∼100 정도였으며 항복전계는 1∼l.5 MV/cm로 매우 우수한 유전특성을 갖고 있었다. 강유전체 박막 위에 a-SiN:H,a-Si:H(n-type a-Si:H) 등을 PECVD로 증착하여 MFNS구조를 형성하였다. 계면특성을 C-V PLOTTER로 측정한 결과 SrTiO$_3$ 박막은 SiN과의 접합이 매우 안정되어 있었고 C-V특성은 SiN/a-Si:H과 유사하였다. 그러나 FERROELECTRIC/a-S:H의 경우가 훨씬 CAPACITANCE 값이 컸으며, 이는 강유전체 박막의 높은 유전상수에 기인 된 것이라 생각된다.

• 한국전기전자재료학회논문지
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• 제24권4호
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• pp.261-265
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• 2011

This paper describes the fabrication and characteristics of a Au/Ni/Ti/3C-SiC Schottky diode with field plate (FP) edge termination. The Schottky contacts were annealed for 30 min at temperatures ranging from 0 to $800^{\circ}C$. At annealing temperature of $600^{\circ}C$, it showed an inhomogeneous Schottky barrier and had the best electrical characteristics. However, the annealing of $800^{\circ}C$ replaced it with ohmic behaviors because of the formation of many different types of nickel silicides. The fabricated Schottky diode had a breakdown voltage of 200 V, Schottky barrier height of 1.19 eV and worked normally even at $200^{\circ}C$.

• Journal of Welding and Joining
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• 제14권4호
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• pp.89-98
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• 1996

This study was performed to establish the characteristics of the heat affected zones from view point of the repair weldability for a damaged CrMoV steam turbine rotor steel. Characterization of the heat affected zones of the weldment was conducted with respect to various of postweld heat treatment temperatures, $566^{\circ}C$, $621^{\circ}C$ and $677^{\circ}C$. The evaluations of the heat affected zones were carried out in terms of microstructural characterization, microhardness measurements, Charpy v-notch impact, tensile and stress-rupture tests. The results indicated that the effect of the postweld heat treatment at $677^{\circ}C$ exhibited the favorable microstructure and mechanical properties for the stability of the heat affected zones. While the heat affected zone of the weldment, produced without postweld heat treatment, displayed the inferior toughness and microstructure indicating localized carbide precipitations on the grain boundary. It was also indicated that the stability of the heat affected zones were deteriorated by the formation of the cavitation on the grain boundaries.