• 제목/요약/키워드: C-MEMS

검색결과 278건 처리시간 0.029초

초고온 MEMS용 TiN/3C-SiC의 Ohmic 특성 (Ohmic Characteristics of TiN/3C-SiC for High-temperature MEMS Applications)

  • 정수용;우형순;김규현;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.834-837
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    • 2003
  • In this study, Ohmic contacts make on 3C-SiC using TiN. Ohmic contact resistivity of TiN/3C-SiC was evaluated. Specific contact resistance was calculated by Circular-TLM(transmission line model) method and physics properties were measured using XRD, SEM, respectively. TiN contact is stable at high temperatures and a good diffusion barrier material. The TiN/3C-SiC contacts are thermally stable to annealing temperatures up to $1000^{\circ}C$. The TiN thin-film depostied on 3C-SiC substraes have good electrical properties. Therefore, the TiN/3C-SiC contact can be usefully applied for high-temperature MEMS applications over $500^{\circ}C$.

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초고온 MEMS용 다결정 3C-SiC의 Ohmic Contact 특성 (Ohmic contact characteristics of polycrystalline 3C-SiC for high-temperature MEMS applications)

  • 정귀상;온창민
    • 센서학회지
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    • 제15권6호
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    • pp.386-390
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    • 2006
  • This paper describes the ohmic contact formation of polycrystalline 3C-SiC films deposited on thermally grown Si wafers. In this work, a TiW (titanium tungsten) film as a contact material was deposited by RF magnetron sputter and annealed with the vacuum process. The specific contact resistance (${\rho}_{c}$) of the TiW contact was measured by using the C-TLM (circular transmission line method). The contact phase and interfacial reaction between TiW and 3C-SiC at high-temperature as also analyzed by XRD (X-ray diffraction) and SEM (scanning electron microscope). All of the samples didn't show cracks of the TiW film and any interfacial reaction after annealing. Especially, when the sample was annealed at $800^{\circ}$ for 30 min., the lowest contact resistivity of $2.90{\times}10{\Omega}cm^{2}$ was obtained due to the improved interfacial adhesion. Therefore, the good ohmic contact of polycrystalline 3C-SiC films using the TiW film is very suitable for high-temperature MEMS applications.

웨이퍼 레벨 진공 패키징된 MEMS 자이로스코프 센서의 파괴 인자에 관한 연구 (Study of Failure Mechanisms of Wafer Level Vacuum Packaging for MEMG Gyroscope Sensor)

  • 좌성훈;김운배;최민석;김종석;송기무
    • 마이크로전자및패키징학회지
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    • 제10권3호
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    • pp.57-65
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    • 2003
  • 본 연구에서는 웨이퍼 레벨 진공 패키징된 MEMS자이로스코프 소자의 신뢰성 시험 및 분석을 통하여 웨이퍼 레벨 진공 패키징의 파괴 메카니즘을 연구하였다. 진공 패키징의 주된 파괴 모드는 누설, 가스투과, 그리고 outgassing이다. 누설은 접합 계면이나 재질의 결함을 통하여 주로 발생되며, 접합폭을 증가시키거나 단결정 실리콘을 사용하면 누설이 감소한다. Outgassing은 실리콘 및 유리기판의 표면 및 내부에서 발생하며 주로 $H_2O$와, $CO_2$, $C_3H_5$ 및 유기 오염물질이었다. Epi-poly의 경우 SOI 웨이퍼보다 약 10배의 outgassing을 발생시킨다. 또한 유리기판을 샌드블라스트 공정을 사용하여 가공한 경우, 약 2.5배의 outgassing 양이 증가한다. Outgassing 제거를 위해서는 접합 전에 웨이퍼를 pre-baking하는 과정이 필수적이며, outgassing의 발생을 최대로 하기 위한 최적의 pre-baking조건은 실리콘과 유리 웨이퍼를 $400^{\circ}C$$500^{\circ}C$ 사이에서 pre-baking하는 것이다.

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MEMS based micro-fuel processor

  • ;장재혁;이홍렬;정창렬;길재형;김성한;차혜연
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 추계학술대회 논문집
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    • pp.611-612
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    • 2006
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CVD 절연막을 이용한 3C-SiC 기판의 초기직접접합에 관한 연구 (A Study on Pre-bonding of 3C-SiC Wafers using CVD Oxide)

  • 정귀상;정연식
    • 한국전기전자재료학회논문지
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    • 제15권10호
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    • pp.883-888
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    • 2002
  • SiC direct bonding technology is very attractive for both SiCOI(SiC-on-insulator) electric devices and SiC-MEMS(micro electro mechanical system) fields because of its application possibility in harsh environments. This paper presents pre-bonding techniques with variation of HF pre-treatment conditions for SiC wafer direct bonding using PECVD(plasma enhanced chemical vapor deposition) oxide. The PECYD oxide was characterized by XPS(X-ray photoelectron spectrometer) and AFM(atomic force microscopy). The characteristics of the bonded sample were measured under different bonding conditions of HF concentration and an applied pressure. The bonding strength was evaluated by the tensile strength method. The bonded interface was analyzed by using SEM(scanning electron microscope). Components existed in the interlayer were analyzed by using FT-IR(fourier transform infrared spectroscopy). The bonding strength was varied with HF pre-treatment conditions before the pre-bonding in the range of 5.3 kgf/cm$^2$to 15.5 kgf/cm$^2$.

힘과 온도 측정을 위한 생체모방형 촉각센서 감지부 설계 (Design of sensing .element of bio-mimetic tactile sensor for measurement force and temperature)

  • 김종호;이상현;권휴상;박연규;강대임
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 추계학술대회 논문집
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    • pp.1029-1032
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    • 2002
  • This paper describes a design of a tactile sensor, which can measure three components force and temperature due to thermal conductive. The bio-mimetic tactile sensor, alternative to human's finger, is comprised of four micro force sensors and four thermal sensors, and its size being 10mm$\times$10mm. Each micro force sensor has a square membrane, and its force range is 0.1N - 5N in the three-axis directions. On the other hand, the thermal sensor for temperature measurement has a heater and four temperature sensor elements. The thermal sensor is designed to keep the temperature. $36.5^{\circ}C$, constant, like human skin, and measure the temperature $0^{\circ}C$ to $50^{\circ}C$. The MEMS technology is applied to fabricate the sensing element of the tactile sensor.

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마이크로 핫플레이트를 갖는 마이크로 가스센서의 열적성능에 관한 연구 (A Study on Thermal Performances of Micro Gas Sensor with Micro Hotplate)

  • 주영철;임준형;이주헌;김창교
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권5호
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    • pp.278-285
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    • 2006
  • A micro hotplate for micro gas sensor was fabricated by MEMS technology. In order to heat up the gas sensing material to a target temperature, a micro hotplate was built on the gas sensor. The sensing material was deposited on the heater and electrodes, and did not contact with the silicon base to minimize the heat loss to the silicon base. The electric power to heat up the gas sensor was measured. The temperature distribution of micro gas sensor was analyzed by a CFD program. The predicted electric power to heat up th sensing material showed a good agreement with the measured data. The design of micro gas sensor could be modified to increase the temperature uniformity and to decrease the electric power consumption by optimizing the layout of micro hotplate and electrodes.

초고온 시스템용 SiCN 마이크로 구조물 제작 (Fabrication SiCN micro structures for extreme high temperature systems)

  • 판 투이 탁;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.216-216
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    • 2009
  • This paper describes a novel processing technique for the fabrication of polymer-derived SiCN (silicone carbonitride) microstructures for extreme microelectromechanical system (MEMS) applications. A polydimethylsiloxane (PDMS) mold was formed on an SU-8 pattern using a standard UV photolithographic process. Next, the liquid precursor, polysilazane, was injected into the PDMS mold to fabricate free-standing SiCN microstructures. Finally, the solid polymer SiCN microstructure was cross-linked using hot isostatic pressure at $400^{\circ}C$ and 205 bar. The optimal pyrolysis and annealing conditions to form a ceramic microstructure capable of withstanding temperatures over $1400^{\circ}C$ were determined. Using the optimal process conditions, the fabricated SiCN ceramic microstructure possessed excellent characteristics includingshear strength (15.2 N), insulation resistance ($2.163{\times}10^{14}\;{\Omega}$, and BDV (1.2 kV, minimum). Since the fabricated ceramic SiCN microstructure has improved electrical and physical characteristics compared to bulk Si wafers, it may be applied to harsh environments and high-power MEMS applications such as heat exchangers and combustion chambers.

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압전 MEMS 진동에너지 수집소자를 위한 졸겔 공법기반의 Pb(ZrTi)O3 박막의 특성 분석 및 평가 (Characterization of Sol-gel Coated Pb(ZrTi)O3 Thin film for Piezoelectric Vibration MEMS Energy Harvester)

  • 박종철;박재영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1240_1241
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    • 2009
  • In this paper, sol-gel-spin coated $Pb(ZrTi)O_3$ thin film with $ZrO_2$ buffer-layer and $PbTiO_3$ seed-layer was investigated for vibration MEMS energy harvester to scavenge power from ambient vibration via d33 piezoelectric mode. Piezoelectric thin film deposition techniques on insulating layer is the important key for $d_{33}$ mode of piezoelectric vibration energy harvester. $ZrO_2$ buff-layer was utilized as an insulating layer. $PbTIO_3$ seed-layer was applied as an inter-layer between PZT and $ZrO_2$ layer to improve the crystalline of PZT thin film. The fabricated PZT thin film had a remanent polarization of 5.3uC/$cm^2$ and the coercive field of 60kV/cm. The fabricated energy harvester using PZT thin film with PTO seed-layer generated 1.1uW of electrical power to $2.2M{\Omega}$ of load with $4.4V_{pvp}$ from vibration of 0.39g at 528Hz.

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실리콘기판위에 양극접합된 MLCA의 기계적 특성 (Mechanical Characteristics of MLCA Anodic Bonded on Si wafers)

  • 김재민;이종춘;윤석진;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.160-163
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    • 2003
  • This paper describes on anodic bonding characteristics of MLCA(Multi Layer Ceramic Actuator) to Si-wafer using evaporated Pyrex #7740 glass thin-films for MEMS applications. Pyrex #7740 glass thin-films with same properties were deposited on MLCA under optimum RF magneto conditions(Ar 100 %, input power $1\;/cm^2$). After annealing in $450^{\circ}C$ for 1 hr, the anodic bonding of MLCA to Si-wafer was successfully performed at 600 V, $400^{\circ}C$ in - 760 mmHg. Then, the MLCA/Si bonded interface and fabricated Si diaphragm deflection characteristics were analyzed through the actuation test. It is possible to control with accurate deflection of Si diaphragm according to its geometries and its maximum non-linearity is 0.05-008 %FS. Moreover, any damages or separation of MICA/Si bonded interfaces do not occur during actuation test. Therefore, it is expected that anodic bonding technology of MICA/Si wafers could be usefully applied for the fabrication process of high-performance piezoelectric MEMS devices.

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